JP6212253B2 - 基板洗浄装置及び基板洗浄方法 - Google Patents

基板洗浄装置及び基板洗浄方法 Download PDF

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Publication number
JP6212253B2
JP6212253B2 JP2012250960A JP2012250960A JP6212253B2 JP 6212253 B2 JP6212253 B2 JP 6212253B2 JP 2012250960 A JP2012250960 A JP 2012250960A JP 2012250960 A JP2012250960 A JP 2012250960A JP 6212253 B2 JP6212253 B2 JP 6212253B2
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JP
Japan
Prior art keywords
supply line
pure water
cleaning
chemical liquid
substrate
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JP2012250960A
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English (en)
Japanese (ja)
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JP2014099530A (ja
JP2014099530A5 (enExample
Inventor
富士彦 豊増
富士彦 豊増
丸山　徹
徹 丸山
三教 小松
三教 小松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP2012250960A priority Critical patent/JP6212253B2/ja
Priority to TW107131138A priority patent/TWI696502B/zh
Priority to TW102140846A priority patent/TWI637793B/zh
Priority to KR1020130136805A priority patent/KR102065957B1/ko
Priority to US14/080,685 priority patent/US10373845B2/en
Priority to CN201310573996.0A priority patent/CN103817103B/zh
Publication of JP2014099530A publication Critical patent/JP2014099530A/ja
Publication of JP2014099530A5 publication Critical patent/JP2014099530A5/ja
Priority to JP2017177560A priority patent/JP6475801B2/ja
Application granted granted Critical
Publication of JP6212253B2 publication Critical patent/JP6212253B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
JP2012250960A 2012-11-15 2012-11-15 基板洗浄装置及び基板洗浄方法 Active JP6212253B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2012250960A JP6212253B2 (ja) 2012-11-15 2012-11-15 基板洗浄装置及び基板洗浄方法
TW107131138A TWI696502B (zh) 2012-11-15 2013-11-11 基板洗淨裝置
TW102140846A TWI637793B (zh) 2012-11-15 2013-11-11 基板洗淨裝置及基板洗淨方法
KR1020130136805A KR102065957B1 (ko) 2012-11-15 2013-11-12 기판 세정 장치 및 기판 세정 방법
US14/080,685 US10373845B2 (en) 2012-11-15 2013-11-14 Substrate cleaning apparatus and substrate cleaning method
CN201310573996.0A CN103817103B (zh) 2012-11-15 2013-11-15 基板清洗装置及基板清洗方法
JP2017177560A JP6475801B2 (ja) 2012-11-15 2017-09-15 基板洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012250960A JP6212253B2 (ja) 2012-11-15 2012-11-15 基板洗浄装置及び基板洗浄方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017177560A Division JP6475801B2 (ja) 2012-11-15 2017-09-15 基板洗浄装置

Publications (3)

Publication Number Publication Date
JP2014099530A JP2014099530A (ja) 2014-05-29
JP2014099530A5 JP2014099530A5 (enExample) 2015-08-06
JP6212253B2 true JP6212253B2 (ja) 2017-10-11

Family

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Family Applications (2)

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JP2012250960A Active JP6212253B2 (ja) 2012-11-15 2012-11-15 基板洗浄装置及び基板洗浄方法
JP2017177560A Active JP6475801B2 (ja) 2012-11-15 2017-09-15 基板洗浄装置

Family Applications After (1)

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JP2017177560A Active JP6475801B2 (ja) 2012-11-15 2017-09-15 基板洗浄装置

Country Status (5)

Country Link
US (1) US10373845B2 (enExample)
JP (2) JP6212253B2 (enExample)
KR (1) KR102065957B1 (enExample)
CN (1) CN103817103B (enExample)
TW (2) TWI637793B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6159282B2 (ja) * 2014-03-27 2017-07-05 株式会社荏原製作所 基板処理装置、および基板処理装置の配管洗浄方法
KR102357784B1 (ko) * 2014-06-09 2022-02-04 가부시키가이샤 에바라 세이사꾸쇼 세정 약액 공급장치 및 세정 약액 공급 방법
US10340159B2 (en) 2014-06-09 2019-07-02 Ebara Corporation Cleaning chemical supplying device, cleaning chemical supplying method, and cleaning unit
JP6378555B2 (ja) * 2014-06-26 2018-08-22 株式会社荏原製作所 洗浄ユニット
MY182464A (en) * 2014-10-31 2021-01-25 Ebara Corp Substrate cleaning roll, substrate cleaning apparatus, and substrate cleaning method
CN107799436B (zh) * 2016-08-29 2023-07-07 株式会社荏原制作所 基板处理装置及基板处理方法
JP6971676B2 (ja) * 2016-08-29 2021-11-24 株式会社荏原製作所 基板処理装置および基板処理方法
JP6486986B2 (ja) 2017-04-03 2019-03-20 株式会社荏原製作所 液体供給装置及び液体供給方法
CN107611010A (zh) * 2017-08-31 2018-01-19 长江存储科技有限责任公司 一种晶圆清洗方法
CN109647766A (zh) * 2017-10-12 2019-04-19 中国铁建高新装备股份有限公司 一种自动清洗烘干工具清洗机
US10460926B2 (en) * 2017-11-17 2019-10-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for chemical mechanical polishing process
KR102382789B1 (ko) 2020-02-26 2022-04-06 주식회사 이앤에이치 기판 세정 장치 및 기판 세정 방법
CN120497167A (zh) * 2022-06-16 2025-08-15 华海清科股份有限公司 用于晶圆处理的供给通道的清洗方法、装置和系统
KR102844262B1 (ko) * 2024-01-29 2025-08-11 엘에스이 주식회사 기판 세정 장치

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Publication number Priority date Publication date Assignee Title
JPS596162B2 (ja) 1979-08-10 1984-02-09 東レ株式会社 多液混合方法
US5950645A (en) * 1993-10-20 1999-09-14 Verteq, Inc. Semiconductor wafer cleaning system
JPH1070101A (ja) 1996-08-27 1998-03-10 Hitachi Ltd 半導体装置の製造方法ならびに製造装置、洗浄方法ならびに洗浄装置、加工装置、流体混合用配管、および、洗浄用液体供給部材
JP3495208B2 (ja) * 1996-11-05 2004-02-09 大日本スクリーン製造株式会社 基板処理装置
US6240933B1 (en) * 1997-05-09 2001-06-05 Semitool, Inc. Methods for cleaning semiconductor surfaces
JP3529251B2 (ja) 1997-10-13 2004-05-24 大日本スクリーン製造株式会社 基板処理装置
JP3891389B2 (ja) * 2000-05-29 2007-03-14 東京エレクトロン株式会社 液処理方法及び液処理装置
JP4902091B2 (ja) * 2000-12-28 2012-03-21 義治 山本 半導体基板の洗浄装置
TWI261875B (en) * 2002-01-30 2006-09-11 Tokyo Electron Ltd Processing apparatus and substrate processing method
JP2004128251A (ja) * 2002-10-03 2004-04-22 Elpida Memory Inc 塗布機及び塗布方法
JP2004281464A (ja) * 2003-03-12 2004-10-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP4494840B2 (ja) * 2003-06-27 2010-06-30 大日本スクリーン製造株式会社 異物除去装置、基板処理装置および基板処理方法
JP2005353717A (ja) * 2004-06-09 2005-12-22 Renesas Technology Corp 半導体装置の製造方法および半導体製造装置
KR100646414B1 (ko) * 2004-10-01 2006-11-15 세메스 주식회사 다수의 약액들을 공급하는 약액 공급 시스템 및 그의 제어방법
KR100639710B1 (ko) * 2005-03-17 2006-10-30 세메스 주식회사 약액 혼합 공급 방법
JP2007311559A (ja) * 2006-05-18 2007-11-29 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
KR100847590B1 (ko) * 2006-06-19 2008-07-21 조현찬 반도체 장비용 약액 공급 장치, 이를 위한 모니터링 제어장치 및 모니터링이 가능한 반도체 장비용 약액 공급 장치
JP2008277576A (ja) * 2007-04-27 2008-11-13 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
US8491726B2 (en) 2007-09-26 2013-07-23 Tokyo Electron Limited Liquid processing apparatus and process liquid supplying method
JP5198187B2 (ja) * 2007-09-26 2013-05-15 東京エレクトロン株式会社 液処理装置および処理液供給方法
JP5424597B2 (ja) * 2008-09-08 2014-02-26 大日本スクリーン製造株式会社 基板処理装置

Also Published As

Publication number Publication date
KR102065957B1 (ko) 2020-01-14
JP6475801B2 (ja) 2019-02-27
KR20140063436A (ko) 2014-05-27
TW201433372A (zh) 2014-09-01
US10373845B2 (en) 2019-08-06
JP2014099530A (ja) 2014-05-29
TWI696502B (zh) 2020-06-21
TWI637793B (zh) 2018-10-11
JP2017216483A (ja) 2017-12-07
CN103817103B (zh) 2017-05-10
CN103817103A (zh) 2014-05-28
US20140216505A1 (en) 2014-08-07
TW201900291A (zh) 2019-01-01

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