JP6169719B2 - 物体の電解コーティングのためのデバイス及び方法 - Google Patents

物体の電解コーティングのためのデバイス及び方法 Download PDF

Info

Publication number
JP6169719B2
JP6169719B2 JP2015546894A JP2015546894A JP6169719B2 JP 6169719 B2 JP6169719 B2 JP 6169719B2 JP 2015546894 A JP2015546894 A JP 2015546894A JP 2015546894 A JP2015546894 A JP 2015546894A JP 6169719 B2 JP6169719 B2 JP 6169719B2
Authority
JP
Japan
Prior art keywords
electrolyte
power supply
anode
soluble
insoluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015546894A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015537123A5 (https=
JP2015537123A (ja
Inventor
ダクマー・ローレンツ
クラウス・メニンゲン
マルクス・ラーブ
Original Assignee
マシーネンファブリーク・ニーホフ・ゲーエムベーハー・ウント・コー・カーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by マシーネンファブリーク・ニーホフ・ゲーエムベーハー・ウント・コー・カーゲー filed Critical マシーネンファブリーク・ニーホフ・ゲーエムベーハー・ウント・コー・カーゲー
Publication of JP2015537123A publication Critical patent/JP2015537123A/ja
Publication of JP2015537123A5 publication Critical patent/JP2015537123A5/ja
Application granted granted Critical
Publication of JP6169719B2 publication Critical patent/JP6169719B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0607—Wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2015546894A 2012-12-18 2013-12-09 物体の電解コーティングのためのデバイス及び方法 Active JP6169719B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012024758.3 2012-12-18
DE102012024758.3A DE102012024758B4 (de) 2012-12-18 2012-12-18 Vorrichtung und Verfahren zum elektrolytischen Beschichten eines Gegenstandes und deren Verwendung
PCT/EP2013/003710 WO2014094998A1 (de) 2012-12-18 2013-12-09 Vorrichtung und verfahren zum elektrolytischen beschichten eines gegenstandes

Publications (3)

Publication Number Publication Date
JP2015537123A JP2015537123A (ja) 2015-12-24
JP2015537123A5 JP2015537123A5 (https=) 2016-04-14
JP6169719B2 true JP6169719B2 (ja) 2017-07-26

Family

ID=49841627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015546894A Active JP6169719B2 (ja) 2012-12-18 2013-12-09 物体の電解コーティングのためのデバイス及び方法

Country Status (10)

Country Link
US (1) US10047449B2 (https=)
EP (1) EP2935661B1 (https=)
JP (1) JP6169719B2 (https=)
CN (1) CN104685112A (https=)
DE (1) DE102012024758B4 (https=)
ES (1) ES3055815T3 (https=)
MX (1) MX348141B (https=)
PL (1) PL2935661T3 (https=)
RU (1) RU2635058C2 (https=)
WO (1) WO2014094998A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104313657A (zh) * 2014-11-10 2015-01-28 临安振有电子有限公司 Hdi印制线路板通孔的电沉积装置
JP6423320B2 (ja) * 2015-06-25 2018-11-14 田中貴金属工業株式会社 めっき装置及びめっき方法
TWI698554B (zh) * 2015-10-20 2020-07-11 香港商亞洲電鍍器材有限公司 電鍍機器及電鍍方法
WO2018053158A1 (en) * 2016-09-14 2018-03-22 Modumetal, Inc. System for reliable, high throughput, complex electric field generation, and method for producing coatings therefrom
EP4010516A1 (de) * 2019-08-05 2022-06-15 SMS Group GmbH Verfahren und anlage zum elektrolytischen beschichten eines elektrisch leitfähigen bandes und/oder gewebes mittels pulstechnik
US12209323B2 (en) * 2020-12-08 2025-01-28 Honeywell International Inc. Electroplating shield device and methods of fabricating the same
RU2751355C1 (ru) * 2021-02-26 2021-07-13 Акционерное общество "Саратовское предприятие промышленной электроники и энергетики" (АО "Промэлектроника") Способ нанесения гальванического покрытия на прецизионные металлические нити и установка для его реализации

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1465034A (en) 1921-11-03 1923-08-14 Frank L Antisell Process for the electrolytic deposition of copper
US2823180A (en) * 1953-11-25 1958-02-11 Rothschild Edgar Method and means for coating wires
US4169780A (en) * 1977-05-24 1979-10-02 Societe Les Piles Wonder Process and apparatus for making negative electrodes, in particular in cadmium or zinc, for electrochemical generators, and the negative electrodes thus obtained
FR2392502A1 (fr) 1977-05-24 1978-12-22 Wonder Procede et dispositif pour fabriquer des electrodes negatives, notamment en cadmium ou en zinc, pour generateurs electrochimiques et electrodes negatives ainsi obtenues
DE3012168A1 (de) * 1980-03-27 1981-10-01 Schering Ag Berlin Und Bergkamen, 1000 Berlin Verfahren zur galvanischen abscheidung von kupferniederschlaegen
US4514266A (en) * 1981-09-11 1985-04-30 Republic Steel Corporation Method and apparatus for electroplating
JPS6386886A (ja) * 1986-09-29 1988-04-18 Nippon Steel Corp 電気合金めつき帯鋼の製造方法
JPS63317698A (ja) * 1987-06-20 1988-12-26 Toyota Motor Corp 電気めっき液の金属イオン濃度と水素イオン濃度の制御装置
CN87211969U (zh) * 1987-08-22 1988-07-20 北京高熔金属材料厂 钨丝镀金用连续电镀装置
US5228965A (en) * 1990-10-30 1993-07-20 Gould Inc. Method and apparatus for applying surface treatment to metal foil
JPH04191394A (ja) * 1990-11-26 1992-07-09 Furukawa Electric Co Ltd:The 銅被覆鋼線の製造方法
JPH04284691A (ja) * 1991-03-13 1992-10-09 Arumetsukusu:Kk プリント配線板の電気めっき方法
US5100517A (en) 1991-04-08 1992-03-31 The Goodyear Tire & Rubber Company Process for applying a copper layer to steel wire
DE4235227A1 (de) 1992-10-13 1994-04-14 Galvanotechnik Juergen Rossman Verfahren zur Metallkonzentrations-Stabilisierung im Elektrolyten eines sauren Kupferbades bei der Verkupferung von Tiefdruckzylindern in der Druckindustrie
JP2943551B2 (ja) * 1993-02-10 1999-08-30 ヤマハ株式会社 メッキ方法及びその装置
DE19539865A1 (de) 1995-10-26 1997-04-30 Lea Ronal Gmbh Durchlauf-Galvanikanlage
CN1477238A (zh) * 2002-08-20 2004-02-25 株式会社Smc 电镀装置
RU2431000C2 (ru) * 2009-06-22 2011-10-10 Николай Иванович Толкачев Способ электролитического никелирования

Also Published As

Publication number Publication date
DE102012024758A1 (de) 2014-06-18
US10047449B2 (en) 2018-08-14
CN104685112A (zh) 2015-06-03
MX2015004743A (es) 2015-07-23
WO2014094998A1 (de) 2014-06-26
DE102012024758B4 (de) 2024-02-01
US20150284867A1 (en) 2015-10-08
JP2015537123A (ja) 2015-12-24
MX348141B (es) 2017-05-30
BR112015012707A2 (pt) 2017-07-11
EP2935661B1 (de) 2025-09-10
RU2015117784A (ru) 2017-01-23
EP2935661A1 (de) 2015-10-28
ES3055815T3 (en) 2026-02-16
PL2935661T3 (pl) 2026-03-02
RU2635058C2 (ru) 2017-11-08

Similar Documents

Publication Publication Date Title
JP6169719B2 (ja) 物体の電解コーティングのためのデバイス及び方法
AU2019203950B2 (en) Method and system to maintain electrolyte stability for all-iron redox flow batteries
PL107640B1 (pl) Urzadzenie do elektrolitycznego osadzania metalu z roztworu wodnego i sposob elektrolitycznego osadzania metalu z roztworu wodnego
CA2391038A1 (en) Method and device for regulating the metal ion concentration in an electrolyte fluid as well as application of said method and use of said device
CA3045718C (en) Method and apparatus for producing hydrogen having reversible electrodes
RU2476630C2 (ru) Способ и установка электролитического лужения непрерывно движущейся стальной полосы в блоке электроосаждения
AU2015252689B2 (en) Insertable electrode device that does not generate acid mist or other gases, and method
KR100558129B1 (ko) 전해질내의 물질의 농도를 조절하는 방법 및 장치
CN114207191A (zh) 用于借助于脉冲技术电解涂覆钢带的方法和设备
JP5898346B2 (ja) 陽極および電解槽の運転方法
US12320027B2 (en) Membrane anode system for electrolytic zinc-nickel alloy deposition
CN2269241Y (zh) 半渗透式离子析出装置
CN205188470U (zh) 一种环保连续控制电镀设备
JP3370896B2 (ja) Ｚｎ−Ｎｉ系合金電気メッキ浴へのＺｎイオンの供給方法および装置
JP3035299U (ja) 半浸透イオン透析装置
CN1174251A (zh) 分离式二次元电镀法
TW201508100A (zh) 在流電金屬沉積製程開始前用於調控流電電解質及電極活化之方法
Saba et al. The electroremoval of copper from dilute waste solutions using Swiss-roll electrode cell
Popov et al. Current density distribution in electrochemical cells
Varentsova et al. Electrolysis with Flow-Through Carbon Electrodes in the Process of Electrolytic Processing of Ammine Rinsing Solutions of Cadmium Plating
JPH1060694A (ja) 二段階電気メッキ法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160224

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160224

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20161214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20161219

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20170321

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170519

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170605

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170628

R150 Certificate of patent or registration of utility model

Ref document number: 6169719

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250