MX348141B - Dispositivo y metodo para recubrimiento electrolitico de objeto. - Google Patents
Dispositivo y metodo para recubrimiento electrolitico de objeto.Info
- Publication number
- MX348141B MX348141B MX2015004743A MX2015004743A MX348141B MX 348141 B MX348141 B MX 348141B MX 2015004743 A MX2015004743 A MX 2015004743A MX 2015004743 A MX2015004743 A MX 2015004743A MX 348141 B MX348141 B MX 348141B
- Authority
- MX
- Mexico
- Prior art keywords
- direct current
- current source
- electrolyte
- electrically conductive
- negative pole
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0607—Wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
La presente invención se relaciona con un objeto (18), como por ejemplo un alambre, que es recubierto electrolíticamente de la manera que se sumerge en un recipiente de electrolito (10) conteniendo un electrolito (12) en el cual se sumergen al menos parcialmente un ánodo (14) soluble que está conectado en forma electroconductora con un polo positivo de una primera fuente de corriente directa (16), y al menos un ánodo (22) insoluble que está conectado en forma electroconductora con una segunda fuente de corriente directa (24), y se conecta en forma electroconductora con un polo negativo de la primera fuente de corriente directa (16) y con un polo negativo de la segunda fuente de corriente directa (24). Las dos fuentes de corriente directa (26, 24) pueden ser operadas independientemente entre sí para mantener el contenido metálico en el electrolito (12) dentro de un rango definido.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012024758.3A DE102012024758B4 (de) | 2012-12-18 | 2012-12-18 | Vorrichtung und Verfahren zum elektrolytischen Beschichten eines Gegenstandes und deren Verwendung |
| PCT/EP2013/003710 WO2014094998A1 (de) | 2012-12-18 | 2013-12-09 | Vorrichtung und verfahren zum elektrolytischen beschichten eines gegenstandes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MX2015004743A MX2015004743A (es) | 2015-07-23 |
| MX348141B true MX348141B (es) | 2017-05-30 |
Family
ID=49841627
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2015004743A MX348141B (es) | 2012-12-18 | 2013-12-09 | Dispositivo y metodo para recubrimiento electrolitico de objeto. |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US10047449B2 (es) |
| EP (1) | EP2935661B1 (es) |
| JP (1) | JP6169719B2 (es) |
| CN (1) | CN104685112A (es) |
| DE (1) | DE102012024758B4 (es) |
| ES (1) | ES3055815T3 (es) |
| MX (1) | MX348141B (es) |
| PL (1) | PL2935661T3 (es) |
| RU (1) | RU2635058C2 (es) |
| WO (1) | WO2014094998A1 (es) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104313657A (zh) * | 2014-11-10 | 2015-01-28 | 临安振有电子有限公司 | Hdi印制线路板通孔的电沉积装置 |
| JP6423320B2 (ja) * | 2015-06-25 | 2018-11-14 | 田中貴金属工業株式会社 | めっき装置及びめっき方法 |
| TWI698554B (zh) * | 2015-10-20 | 2020-07-11 | 香港商亞洲電鍍器材有限公司 | 電鍍機器及電鍍方法 |
| AR109648A1 (es) * | 2016-09-14 | 2019-01-09 | Modumetal Inc | Sistema confiable, de alta capacidad, para la generación de campos eléctricos complejos, y método para producir recubrimientos con los mismos |
| CN114174559A (zh) * | 2019-08-05 | 2022-03-11 | Sms集团有限公司 | 使用脉冲技术对导电带材和/或织物进行电解涂层的方法和设备 |
| US12209323B2 (en) * | 2020-12-08 | 2025-01-28 | Honeywell International Inc. | Electroplating shield device and methods of fabricating the same |
| RU2751355C1 (ru) * | 2021-02-26 | 2021-07-13 | Акционерное общество "Саратовское предприятие промышленной электроники и энергетики" (АО "Промэлектроника") | Способ нанесения гальванического покрытия на прецизионные металлические нити и установка для его реализации |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1465034A (en) | 1921-11-03 | 1923-08-14 | Frank L Antisell | Process for the electrolytic deposition of copper |
| US2823180A (en) * | 1953-11-25 | 1958-02-11 | Rothschild Edgar | Method and means for coating wires |
| FR2392502A1 (fr) | 1977-05-24 | 1978-12-22 | Wonder | Procede et dispositif pour fabriquer des electrodes negatives, notamment en cadmium ou en zinc, pour generateurs electrochimiques et electrodes negatives ainsi obtenues |
| US4169780A (en) * | 1977-05-24 | 1979-10-02 | Societe Les Piles Wonder | Process and apparatus for making negative electrodes, in particular in cadmium or zinc, for electrochemical generators, and the negative electrodes thus obtained |
| DE3012168A1 (de) | 1980-03-27 | 1981-10-01 | Schering Ag Berlin Und Bergkamen, 1000 Berlin | Verfahren zur galvanischen abscheidung von kupferniederschlaegen |
| US4514266A (en) * | 1981-09-11 | 1985-04-30 | Republic Steel Corporation | Method and apparatus for electroplating |
| JPS6386886A (ja) * | 1986-09-29 | 1988-04-18 | Nippon Steel Corp | 電気合金めつき帯鋼の製造方法 |
| JPS63317698A (ja) * | 1987-06-20 | 1988-12-26 | Toyota Motor Corp | 電気めっき液の金属イオン濃度と水素イオン濃度の制御装置 |
| CN87211969U (zh) * | 1987-08-22 | 1988-07-20 | 北京高熔金属材料厂 | 钨丝镀金用连续电镀装置 |
| US5228965A (en) | 1990-10-30 | 1993-07-20 | Gould Inc. | Method and apparatus for applying surface treatment to metal foil |
| JPH04191394A (ja) * | 1990-11-26 | 1992-07-09 | Furukawa Electric Co Ltd:The | 銅被覆鋼線の製造方法 |
| JPH04284691A (ja) * | 1991-03-13 | 1992-10-09 | Arumetsukusu:Kk | プリント配線板の電気めっき方法 |
| US5100517A (en) | 1991-04-08 | 1992-03-31 | The Goodyear Tire & Rubber Company | Process for applying a copper layer to steel wire |
| DE4235227A1 (de) | 1992-10-13 | 1994-04-14 | Galvanotechnik Juergen Rossman | Verfahren zur Metallkonzentrations-Stabilisierung im Elektrolyten eines sauren Kupferbades bei der Verkupferung von Tiefdruckzylindern in der Druckindustrie |
| JP2943551B2 (ja) * | 1993-02-10 | 1999-08-30 | ヤマハ株式会社 | メッキ方法及びその装置 |
| DE19539865A1 (de) | 1995-10-26 | 1997-04-30 | Lea Ronal Gmbh | Durchlauf-Galvanikanlage |
| CN1477238A (zh) * | 2002-08-20 | 2004-02-25 | 株式会社Smc | 电镀装置 |
| RU2431000C2 (ru) * | 2009-06-22 | 2011-10-10 | Николай Иванович Толкачев | Способ электролитического никелирования |
-
2012
- 2012-12-18 DE DE102012024758.3A patent/DE102012024758B4/de active Active
-
2013
- 2013-12-09 PL PL13811125.7T patent/PL2935661T3/pl unknown
- 2013-12-09 JP JP2015546894A patent/JP6169719B2/ja active Active
- 2013-12-09 EP EP13811125.7A patent/EP2935661B1/de active Active
- 2013-12-09 CN CN201380049504.6A patent/CN104685112A/zh active Pending
- 2013-12-09 MX MX2015004743A patent/MX348141B/es active IP Right Grant
- 2013-12-09 WO PCT/EP2013/003710 patent/WO2014094998A1/de not_active Ceased
- 2013-12-09 ES ES13811125T patent/ES3055815T3/es active Active
- 2013-12-09 RU RU2015117784A patent/RU2635058C2/ru active
-
2015
- 2015-06-17 US US14/742,542 patent/US10047449B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| RU2015117784A (ru) | 2017-01-23 |
| DE102012024758A1 (de) | 2014-06-18 |
| MX2015004743A (es) | 2015-07-23 |
| US20150284867A1 (en) | 2015-10-08 |
| WO2014094998A1 (de) | 2014-06-26 |
| PL2935661T3 (pl) | 2026-03-02 |
| CN104685112A (zh) | 2015-06-03 |
| EP2935661B1 (de) | 2025-09-10 |
| JP6169719B2 (ja) | 2017-07-26 |
| US10047449B2 (en) | 2018-08-14 |
| EP2935661A1 (de) | 2015-10-28 |
| ES3055815T3 (en) | 2026-02-16 |
| JP2015537123A (ja) | 2015-12-24 |
| BR112015012707A2 (pt) | 2017-07-11 |
| DE102012024758B4 (de) | 2024-02-01 |
| RU2635058C2 (ru) | 2017-11-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG | Grant or registration |