JP6110581B2 - 高周波信号伝送回路形成用表面処理銅箔、銅張積層板及びプリント配線板 - Google Patents

高周波信号伝送回路形成用表面処理銅箔、銅張積層板及びプリント配線板 Download PDF

Info

Publication number
JP6110581B2
JP6110581B2 JP2016562598A JP2016562598A JP6110581B2 JP 6110581 B2 JP6110581 B2 JP 6110581B2 JP 2016562598 A JP2016562598 A JP 2016562598A JP 2016562598 A JP2016562598 A JP 2016562598A JP 6110581 B2 JP6110581 B2 JP 6110581B2
Authority
JP
Japan
Prior art keywords
copper
copper foil
frequency signal
signal transmission
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016562598A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2016088884A1 (ja
Inventor
裕昭 津吉
裕昭 津吉
俊宏 細井
俊宏 細井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Application granted granted Critical
Publication of JP6110581B2 publication Critical patent/JP6110581B2/ja
Publication of JPWO2016088884A1 publication Critical patent/JPWO2016088884A1/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/02Single bars, rods, wires, or strips
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Non-Insulated Conductors (AREA)
JP2016562598A 2014-12-05 2015-12-04 高周波信号伝送回路形成用表面処理銅箔、銅張積層板及びプリント配線板 Active JP6110581B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014247460 2014-12-05
JP2014247460 2014-12-05
PCT/JP2015/084186 WO2016088884A1 (ja) 2014-12-05 2015-12-04 高周波信号伝送回路形成用表面処理銅箔、銅張積層板及びプリント配線板

Publications (2)

Publication Number Publication Date
JP6110581B2 true JP6110581B2 (ja) 2017-04-05
JPWO2016088884A1 JPWO2016088884A1 (ja) 2017-04-27

Family

ID=56091819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016562598A Active JP6110581B2 (ja) 2014-12-05 2015-12-04 高周波信号伝送回路形成用表面処理銅箔、銅張積層板及びプリント配線板

Country Status (5)

Country Link
JP (1) JP6110581B2 (ko)
KR (1) KR101931895B1 (ko)
CN (1) CN107109663B (ko)
TW (1) TWI611738B (ko)
WO (1) WO2016088884A1 (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019187558A1 (ja) * 2018-03-30 2019-10-03 住友大阪セメント株式会社 光導波路素子
US11770904B2 (en) 2019-02-04 2023-09-26 Panasonic Intellectual Property Management Co., Ltd. Surface-treated copper foil, and copper-clad laminate plate, resin-attached copper foil and circuit board each using same
US11866536B2 (en) 2019-02-04 2024-01-09 Panasonic Intellectual Property Management Co., Ltd. Copper-clad laminate plate, resin-attached copper foil, and circuit board using same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6832581B2 (ja) * 2016-07-15 2021-02-24 ナミックス株式会社 プリント配線板に用いる銅箔の製造方法
JP7013003B2 (ja) * 2017-11-10 2022-01-31 ナミックス株式会社 粗面化処理された銅表面を有する物体
JP7456578B2 (ja) * 2019-05-09 2024-03-27 ナミックス株式会社 銅表面の加工装置
CN110029336B (zh) * 2019-05-24 2021-05-14 电子科技大学 一种多层印制电路板制造用铜表面处理液及处理方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4916154B2 (ja) * 2005-10-12 2012-04-11 Jx日鉱日石金属株式会社 回路用銅又は銅合金箔
KR20130027484A (ko) * 2010-03-01 2013-03-15 후루카와 덴키 고교 가부시키가이샤 동박의 표면처리방법, 표면처리된 동박, 및 리튬 이온 2차 전지의 음극 컬렉터용 동박
JP5901066B2 (ja) * 2012-04-27 2016-04-06 三井金属鉱業株式会社 樹脂組成物、樹脂層付金属箔、金属張積層板及びプリント配線板
CN105102678B (zh) * 2013-02-14 2018-06-12 三井金属矿业株式会社 表面处理铜箔及用表面处理铜箔得到的覆铜层压板
WO2015040998A1 (ja) * 2013-09-20 2015-03-26 三井金属鉱業株式会社 銅箔、キャリア箔付銅箔及び銅張積層板
KR101734795B1 (ko) * 2014-01-27 2017-05-11 미쓰이금속광업주식회사 조화 처리 구리박, 동장 적층판 및 프린트 배선판

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019187558A1 (ja) * 2018-03-30 2019-10-03 住友大阪セメント株式会社 光導波路素子
JP2019179122A (ja) * 2018-03-30 2019-10-17 住友大阪セメント株式会社 光導波路素子
US11327347B2 (en) 2018-03-30 2022-05-10 Sumitomo Osaka Cement Co., Ltd. Optical waveguide element
JP7135384B2 (ja) 2018-03-30 2022-09-13 住友大阪セメント株式会社 光導波路素子
US11770904B2 (en) 2019-02-04 2023-09-26 Panasonic Intellectual Property Management Co., Ltd. Surface-treated copper foil, and copper-clad laminate plate, resin-attached copper foil and circuit board each using same
US11866536B2 (en) 2019-02-04 2024-01-09 Panasonic Intellectual Property Management Co., Ltd. Copper-clad laminate plate, resin-attached copper foil, and circuit board using same

Also Published As

Publication number Publication date
TW201640964A (zh) 2016-11-16
JPWO2016088884A1 (ja) 2017-04-27
WO2016088884A1 (ja) 2016-06-09
CN107109663B (zh) 2020-03-10
KR101931895B1 (ko) 2018-12-21
CN107109663A (zh) 2017-08-29
TWI611738B (zh) 2018-01-11
KR20170078798A (ko) 2017-07-07

Similar Documents

Publication Publication Date Title
JP6110581B2 (ja) 高周波信号伝送回路形成用表面処理銅箔、銅張積層板及びプリント配線板
JP6297124B2 (ja) 銅箔、キャリア箔付銅箔及び銅張積層板
JP6342078B2 (ja) 粗化処理銅箔、銅張積層板及びプリント配線板
JP5129642B2 (ja) 表面処理銅箔及びその表面処理銅箔を用いて得られる銅張積層板並びにその銅張積層板を用いて得られるプリント配線板
JP5871426B2 (ja) 高周波伝送用表面処理銅箔、高周波伝送用積層板及び高周波伝送用プリント配線板
TWI627307B (zh) 印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板
TWI434965B (zh) A roughening method for copper foil, and a copper foil for a printed wiring board which is obtained by the roughening method
US20120285734A1 (en) Roughened copper foil, method for producing same, copper clad laminated board, and printed circuit board
KR101998923B1 (ko) 저유전성 수지 기재용 처리 동박 및 그 처리 동박을 사용한 구리 피복 적층판 그리고 프린트 배선판
WO2021193246A1 (ja) 粗化処理銅箔、銅張積層板及びプリント配線板
WO2013187420A1 (ja) 表面処理銅箔及びそれを用いた積層板、プリント配線板、電子機器、並びに、プリント配線板の製造方法
JP4296250B2 (ja) 高周波回路用銅箔およびその製造方法
WO2022176648A1 (ja) 表面処理銅箔
TWI647096B (zh) 表面處理銅箔及其製造方法
JP5443157B2 (ja) 高周波用銅箔及びそれを用いた銅張積層板とその製造方法
WO2021131359A1 (ja) 表面処理銅箔及びその製造方法
TWI808700B (zh) 粗化處理銅箔、銅箔積層板及印刷佈線板
JP6827083B2 (ja) 表面処理銅箔、銅張積層板、及びプリント配線板
WO2022050001A1 (ja) 銅箔および積層体、並びにそれらの製造方法
WO2022209990A1 (ja) 粗化処理銅箔、銅張積層板及びプリント配線板
KR20230095677A (ko) 내열성을 가지는 표면처리동박, 이를 포함하는 동박적층판 및 프린트 배선판
TWM560998U (zh) 應用於高頻訊號傳輸的銅箔以及線路板組件

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20161012

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20161012

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20161125

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20161221

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170208

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170303

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170309

R150 Certificate of patent or registration of utility model

Ref document number: 6110581

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250