JP5951223B2 - 電子顕微法、電子顕微鏡および観察標体作製装置 - Google Patents

電子顕微法、電子顕微鏡および観察標体作製装置 Download PDF

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JP5951223B2
JP5951223B2 JP2011241040A JP2011241040A JP5951223B2 JP 5951223 B2 JP5951223 B2 JP 5951223B2 JP 2011241040 A JP2011241040 A JP 2011241040A JP 2011241040 A JP2011241040 A JP 2011241040A JP 5951223 B2 JP5951223 B2 JP 5951223B2
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sample
ionic liquid
electron
medium containing
liquid medium
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JP2013096890A5 (enExample
JP2013096890A (ja
Inventor
貴文 三羽
貴文 三羽
小瀬　洋一
洋一 小瀬
英子 中澤
英子 中澤
麻美 許斐
麻美 許斐
俊哉 渡邉
俊哉 渡邉
木村　嘉伸
嘉伸 木村
津野　夏規
夏規 津野
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2011241040A priority Critical patent/JP5951223B2/ja
Priority to CN201280051975.6A priority patent/CN103907004B/zh
Priority to US14/354,917 priority patent/US9202668B2/en
Priority to PCT/JP2012/076704 priority patent/WO2013065475A1/ja
Priority to DE112012004204.2T priority patent/DE112012004204B4/de
Publication of JP2013096890A publication Critical patent/JP2013096890A/ja
Publication of JP2013096890A5 publication Critical patent/JP2013096890A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261—In terms of molecular thickness or light wave length

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  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2011241040A 2011-11-02 2011-11-02 電子顕微法、電子顕微鏡および観察標体作製装置 Active JP5951223B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011241040A JP5951223B2 (ja) 2011-11-02 2011-11-02 電子顕微法、電子顕微鏡および観察標体作製装置
CN201280051975.6A CN103907004B (zh) 2011-11-02 2012-10-16 电子显微法的观察样品、电子显微法、电子显微镜以及观察样品制作装置
US14/354,917 US9202668B2 (en) 2011-11-02 2012-10-16 Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen
PCT/JP2012/076704 WO2013065475A1 (ja) 2011-11-02 2012-10-16 電子顕微法の観察標体、電子顕微法、電子顕微鏡および観察標体作製装置
DE112012004204.2T DE112012004204B4 (de) 2011-11-02 2012-10-16 Elektronenmikroskopisches Verfahren und Elektronenmikroskop

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011241040A JP5951223B2 (ja) 2011-11-02 2011-11-02 電子顕微法、電子顕微鏡および観察標体作製装置

Publications (3)

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JP2013096890A JP2013096890A (ja) 2013-05-20
JP2013096890A5 JP2013096890A5 (enExample) 2014-11-27
JP5951223B2 true JP5951223B2 (ja) 2016-07-13

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JP2011241040A Active JP5951223B2 (ja) 2011-11-02 2011-11-02 電子顕微法、電子顕微鏡および観察標体作製装置

Country Status (5)

Country Link
US (1) US9202668B2 (enExample)
JP (1) JP5951223B2 (enExample)
CN (1) CN103907004B (enExample)
DE (1) DE112012004204B4 (enExample)
WO (1) WO2013065475A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5723801B2 (ja) 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
US9086343B2 (en) * 2012-03-09 2015-07-21 Hitachi High-Technologies Corporation Methods for observing samples and preprocessing thereof
EP3062082B1 (en) * 2015-02-25 2018-04-18 Fei Company Preparation of sample for charged-particle microscopy
JP6357583B2 (ja) * 2015-04-24 2018-07-11 株式会社日立ハイテクノロジーズ イオン液体を用いた試料の観察方法及び標本の生産方法
US9633816B2 (en) * 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
TWI594288B (zh) * 2016-03-14 2017-08-01 台灣電鏡儀器股份有限公司 電子顯微鏡
CN107608141B (zh) * 2017-09-13 2020-10-09 深圳市华星光电半导体显示技术有限公司 显示面板及其制备方法、显示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000195459A (ja) 1998-12-24 2000-07-14 Canon Inc 試料観察方法および走査型電子顕微鏡
JP2000338017A (ja) * 1999-05-27 2000-12-08 Canon Inc 走査電子顕微鏡観察用試料の前処理装置及び前処理方法
CN100360708C (zh) * 2004-05-12 2008-01-09 中国科学院金属研究所 透射电镜用薄膜样品的制备方法
EP1978355B1 (en) * 2006-01-20 2016-07-27 Hitachi High-Technologies Corporation Method of observing sample using a liquid medium for preventing charge-up in an electron microscope
JP5474312B2 (ja) * 2007-06-20 2014-04-16 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及びその制御方法
CN101458180B (zh) * 2007-12-13 2011-10-05 中芯国际集成电路制造(上海)有限公司 预处理tem样品以及对样品进行tem测试的方法
JP5226378B2 (ja) * 2008-04-28 2013-07-03 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡、及び試料観察方法
JP2010025656A (ja) * 2008-07-17 2010-02-04 Jeol Ltd イオン液体を用いた試料の処理方法及び処理システム
JP2010118564A (ja) * 2008-11-14 2010-05-27 Hitachi High-Technologies Corp パターンの検査装置、およびパターンの検査方法
CN101776543A (zh) * 2009-01-13 2010-07-14 中芯国际集成电路制造(上海)有限公司 透射电子显微镜检测样片的制备方法
JP5442417B2 (ja) * 2009-12-14 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5707082B2 (ja) * 2010-10-08 2015-04-22 株式会社日立ハイテクノロジーズ 液体の表面を浮遊する試料の走査電子顕微鏡観察方法

Also Published As

Publication number Publication date
DE112012004204T5 (de) 2014-09-11
CN103907004B (zh) 2016-10-26
JP2013096890A (ja) 2013-05-20
US20140264018A1 (en) 2014-09-18
WO2013065475A1 (ja) 2013-05-10
CN103907004A (zh) 2014-07-02
DE112012004204B4 (de) 2020-08-13
US9202668B2 (en) 2015-12-01

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