CN103907004B - 电子显微法的观察样品、电子显微法、电子显微镜以及观察样品制作装置 - Google Patents

电子显微法的观察样品、电子显微法、电子显微镜以及观察样品制作装置 Download PDF

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Publication number
CN103907004B
CN103907004B CN201280051975.6A CN201280051975A CN103907004B CN 103907004 B CN103907004 B CN 103907004B CN 201280051975 A CN201280051975 A CN 201280051975A CN 103907004 B CN103907004 B CN 103907004B
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China
Prior art keywords
ionic liquid
mentioned
electron
sample
test portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201280051975.6A
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English (en)
Chinese (zh)
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CN103907004A (zh
Inventor
三羽贵文
小濑洋
小濑洋一
中泽英子
许斐麻美
渡边俊哉
木村嘉伸
津野夏规
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Publication of CN103907004A publication Critical patent/CN103907004A/zh
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Expired - Fee Related legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261—In terms of molecular thickness or light wave length

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
CN201280051975.6A 2011-11-02 2012-10-16 电子显微法的观察样品、电子显微法、电子显微镜以及观察样品制作装置 Expired - Fee Related CN103907004B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011241040A JP5951223B2 (ja) 2011-11-02 2011-11-02 電子顕微法、電子顕微鏡および観察標体作製装置
JP2011-241040 2011-11-02
PCT/JP2012/076704 WO2013065475A1 (ja) 2011-11-02 2012-10-16 電子顕微法の観察標体、電子顕微法、電子顕微鏡および観察標体作製装置

Publications (2)

Publication Number Publication Date
CN103907004A CN103907004A (zh) 2014-07-02
CN103907004B true CN103907004B (zh) 2016-10-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280051975.6A Expired - Fee Related CN103907004B (zh) 2011-11-02 2012-10-16 电子显微法的观察样品、电子显微法、电子显微镜以及观察样品制作装置

Country Status (5)

Country Link
US (1) US9202668B2 (enExample)
JP (1) JP5951223B2 (enExample)
CN (1) CN103907004B (enExample)
DE (1) DE112012004204B4 (enExample)
WO (1) WO2013065475A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5723801B2 (ja) 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
US9086343B2 (en) * 2012-03-09 2015-07-21 Hitachi High-Technologies Corporation Methods for observing samples and preprocessing thereof
EP3062082B1 (en) * 2015-02-25 2018-04-18 Fei Company Preparation of sample for charged-particle microscopy
JP6357583B2 (ja) * 2015-04-24 2018-07-11 株式会社日立ハイテクノロジーズ イオン液体を用いた試料の観察方法及び標本の生産方法
US9633816B2 (en) * 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
TWI594288B (zh) * 2016-03-14 2017-08-01 台灣電鏡儀器股份有限公司 電子顯微鏡
CN107608141B (zh) * 2017-09-13 2020-10-09 深圳市华星光电半导体显示技术有限公司 显示面板及其制备方法、显示装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338017A (ja) * 1999-05-27 2000-12-08 Canon Inc 走査電子顕微鏡観察用試料の前処理装置及び前処理方法
CN1696334A (zh) * 2004-05-12 2005-11-16 中国科学院金属研究所 透射电镜用薄膜样品的制备方法
CN101458180A (zh) * 2007-12-13 2009-06-17 中芯国际集成电路制造(上海)有限公司 预处理tem样品以及对样品进行tem测试的方法
US20090173882A1 (en) * 2006-01-20 2009-07-09 Susumu Kuwabata Liquid Medium For Preventing Charge-Up in Electron Microscope and Method of Observing Sample Using The Same
CN101776543A (zh) * 2009-01-13 2010-07-14 中芯国际集成电路制造(上海)有限公司 透射电子显微镜检测样片的制备方法
JP2011124162A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 荷電粒子線装置及び試料観察方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000195459A (ja) 1998-12-24 2000-07-14 Canon Inc 試料観察方法および走査型電子顕微鏡
JP5474312B2 (ja) * 2007-06-20 2014-04-16 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及びその制御方法
JP5226378B2 (ja) * 2008-04-28 2013-07-03 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡、及び試料観察方法
JP2010025656A (ja) * 2008-07-17 2010-02-04 Jeol Ltd イオン液体を用いた試料の処理方法及び処理システム
JP2010118564A (ja) * 2008-11-14 2010-05-27 Hitachi High-Technologies Corp パターンの検査装置、およびパターンの検査方法
JP5707082B2 (ja) * 2010-10-08 2015-04-22 株式会社日立ハイテクノロジーズ 液体の表面を浮遊する試料の走査電子顕微鏡観察方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338017A (ja) * 1999-05-27 2000-12-08 Canon Inc 走査電子顕微鏡観察用試料の前処理装置及び前処理方法
CN1696334A (zh) * 2004-05-12 2005-11-16 中国科学院金属研究所 透射电镜用薄膜样品的制备方法
US20090173882A1 (en) * 2006-01-20 2009-07-09 Susumu Kuwabata Liquid Medium For Preventing Charge-Up in Electron Microscope and Method of Observing Sample Using The Same
CN101458180A (zh) * 2007-12-13 2009-06-17 中芯国际集成电路制造(上海)有限公司 预处理tem样品以及对样品进行tem测试的方法
CN101776543A (zh) * 2009-01-13 2010-07-14 中芯国际集成电路制造(上海)有限公司 透射电子显微镜检测样片的制备方法
JP2011124162A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 荷電粒子線装置及び試料観察方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Development of new techniques for scanning electron microscope observation using ionic liquid;Satoshi Arimoto,et.al;《Electrochimica Acta》;20080106;第53卷;第6228–6234页 *
纳米晶双相稀土永磁合金透射电镜薄膜样品的制备;叶云;《分析测试技术与仪器》;19990930;第5卷(第3期);第181-183页 *

Also Published As

Publication number Publication date
DE112012004204T5 (de) 2014-09-11
JP2013096890A (ja) 2013-05-20
US20140264018A1 (en) 2014-09-18
WO2013065475A1 (ja) 2013-05-10
CN103907004A (zh) 2014-07-02
JP5951223B2 (ja) 2016-07-13
DE112012004204B4 (de) 2020-08-13
US9202668B2 (en) 2015-12-01

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Granted publication date: 20161026