DE112012004204B4 - Elektronenmikroskopisches Verfahren und Elektronenmikroskop - Google Patents

Elektronenmikroskopisches Verfahren und Elektronenmikroskop Download PDF

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Publication number
DE112012004204B4
DE112012004204B4 DE112012004204.2T DE112012004204T DE112012004204B4 DE 112012004204 B4 DE112012004204 B4 DE 112012004204B4 DE 112012004204 T DE112012004204 T DE 112012004204T DE 112012004204 B4 DE112012004204 B4 DE 112012004204B4
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Prior art keywords
sample
ionic liquid
electron
medium containing
electrons
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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DE112012004204.2T
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German (de)
English (en)
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DE112012004204T5 (de
Inventor
c/o Hitachi Ltd. Miwa Takefumi
c/o Hitachi High-Techno. Corp. Ose Yoichi
c/o Hitachi High-Technologies Corp Nakazawa Eiko
c/o Hitachi High-Techno. Corp. Konomi Mami
c/o Hitachi High-Techno. Corp. Watanabe Shunya
c/o Hitachi Ltd. Kimura Yoshinobu
c/o Hitachi Ltd. Tsuno Natsuki
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi High Tech Corp
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Publication of DE112012004204T5 publication Critical patent/DE112012004204T5/de
Application granted granted Critical
Publication of DE112012004204B4 publication Critical patent/DE112012004204B4/de
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261—In terms of molecular thickness or light wave length

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  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
DE112012004204.2T 2011-11-02 2012-10-16 Elektronenmikroskopisches Verfahren und Elektronenmikroskop Expired - Fee Related DE112012004204B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011241040A JP5951223B2 (ja) 2011-11-02 2011-11-02 電子顕微法、電子顕微鏡および観察標体作製装置
JP2011-241040 2011-11-02
PCT/JP2012/076704 WO2013065475A1 (ja) 2011-11-02 2012-10-16 電子顕微法の観察標体、電子顕微法、電子顕微鏡および観察標体作製装置

Publications (2)

Publication Number Publication Date
DE112012004204T5 DE112012004204T5 (de) 2014-09-11
DE112012004204B4 true DE112012004204B4 (de) 2020-08-13

Family

ID=48191832

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112012004204.2T Expired - Fee Related DE112012004204B4 (de) 2011-11-02 2012-10-16 Elektronenmikroskopisches Verfahren und Elektronenmikroskop

Country Status (5)

Country Link
US (1) US9202668B2 (enExample)
JP (1) JP5951223B2 (enExample)
CN (1) CN103907004B (enExample)
DE (1) DE112012004204B4 (enExample)
WO (1) WO2013065475A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5723801B2 (ja) 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
US9086343B2 (en) * 2012-03-09 2015-07-21 Hitachi High-Technologies Corporation Methods for observing samples and preprocessing thereof
EP3062082B1 (en) * 2015-02-25 2018-04-18 Fei Company Preparation of sample for charged-particle microscopy
JP6357583B2 (ja) * 2015-04-24 2018-07-11 株式会社日立ハイテクノロジーズ イオン液体を用いた試料の観察方法及び標本の生産方法
US9633816B2 (en) * 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
TWI594288B (zh) * 2016-03-14 2017-08-01 台灣電鏡儀器股份有限公司 電子顯微鏡
CN107608141B (zh) * 2017-09-13 2020-10-09 深圳市华星光电半导体显示技术有限公司 显示面板及其制备方法、显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090173882A1 (en) * 2006-01-20 2009-07-09 Susumu Kuwabata Liquid Medium For Preventing Charge-Up in Electron Microscope and Method of Observing Sample Using The Same
JP2010025656A (ja) * 2008-07-17 2010-02-04 Jeol Ltd イオン液体を用いた試料の処理方法及び処理システム
US20110057100A1 (en) * 2008-04-28 2011-03-10 Hitachi High-Technologies Corporation Transmission Electron Microscope, and Method of Observing Specimen
JP2011124162A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 荷電粒子線装置及び試料観察方法
DE112011103384T5 (de) * 2010-10-08 2013-08-14 Hitachi High-Technologies Corporation Verfahren zum Betrachten einer auf einer Flüssigkeitsoberfläche schwimmenden Probe im Rasterelektronenmikroskop

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000195459A (ja) 1998-12-24 2000-07-14 Canon Inc 試料観察方法および走査型電子顕微鏡
JP2000338017A (ja) * 1999-05-27 2000-12-08 Canon Inc 走査電子顕微鏡観察用試料の前処理装置及び前処理方法
CN100360708C (zh) * 2004-05-12 2008-01-09 中国科学院金属研究所 透射电镜用薄膜样品的制备方法
JP5474312B2 (ja) * 2007-06-20 2014-04-16 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及びその制御方法
CN101458180B (zh) * 2007-12-13 2011-10-05 中芯国际集成电路制造(上海)有限公司 预处理tem样品以及对样品进行tem测试的方法
JP2010118564A (ja) * 2008-11-14 2010-05-27 Hitachi High-Technologies Corp パターンの検査装置、およびパターンの検査方法
CN101776543A (zh) * 2009-01-13 2010-07-14 中芯国际集成电路制造(上海)有限公司 透射电子显微镜检测样片的制备方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090173882A1 (en) * 2006-01-20 2009-07-09 Susumu Kuwabata Liquid Medium For Preventing Charge-Up in Electron Microscope and Method of Observing Sample Using The Same
US20110057100A1 (en) * 2008-04-28 2011-03-10 Hitachi High-Technologies Corporation Transmission Electron Microscope, and Method of Observing Specimen
JP2010025656A (ja) * 2008-07-17 2010-02-04 Jeol Ltd イオン液体を用いた試料の処理方法及び処理システム
JP2011124162A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 荷電粒子線装置及び試料観察方法
DE112011103384T5 (de) * 2010-10-08 2013-08-14 Hitachi High-Technologies Corporation Verfahren zum Betrachten einer auf einer Flüssigkeitsoberfläche schwimmenden Probe im Rasterelektronenmikroskop

Also Published As

Publication number Publication date
DE112012004204T5 (de) 2014-09-11
CN103907004B (zh) 2016-10-26
JP2013096890A (ja) 2013-05-20
US20140264018A1 (en) 2014-09-18
WO2013065475A1 (ja) 2013-05-10
CN103907004A (zh) 2014-07-02
JP5951223B2 (ja) 2016-07-13
US9202668B2 (en) 2015-12-01

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R082 Change of representative
R016 Response to examination communication
R018 Grant decision by examination section/examining division
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Owner name: HITACHI HIGH-TECH CORPORATION, JP

Free format text: FORMER OWNER: HITACHI HIGH-TECHNOLOGIES CORPORATION, TOKYO, JP

R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee