JP5941347B2 - 構造化有機フィルムを含むインクジェットフェイスプレートのコーティング - Google Patents
構造化有機フィルムを含むインクジェットフェイスプレートのコーティング Download PDFInfo
- Publication number
- JP5941347B2 JP5941347B2 JP2012136401A JP2012136401A JP5941347B2 JP 5941347 B2 JP5941347 B2 JP 5941347B2 JP 2012136401 A JP2012136401 A JP 2012136401A JP 2012136401 A JP2012136401 A JP 2012136401A JP 5941347 B2 JP5941347 B2 JP 5941347B2
- Authority
- JP
- Japan
- Prior art keywords
- sof
- ink
- coating
- liquid
- building block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title claims description 50
- 239000011248 coating agent Substances 0.000 claims description 41
- 239000007788 liquid Substances 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 35
- 239000011541 reaction mixture Substances 0.000 claims description 28
- 239000000203 mixture Substances 0.000 claims description 27
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 239000003054 catalyst Substances 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 10
- 239000012528 membrane Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 125000004208 3-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C([H])C(*)=C1[H] 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 150000007974 melamines Chemical class 0.000 claims 1
- VZYZZKOUCVXTOJ-UHFFFAOYSA-N n-[4-[4-(n-(9,9-dimethylfluoren-2-yl)anilino)phenyl]phenyl]-9,9-dimethyl-n-phenylfluoren-2-amine Chemical compound C1=C2C(C)(C)C3=CC=CC=C3C2=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=C2C(C)(C)C3=CC=CC=C3C2=CC=1)C1=CC=CC=C1 VZYZZKOUCVXTOJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000976 ink Substances 0.000 description 99
- 239000010410 layer Substances 0.000 description 22
- 239000007787 solid Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 19
- 239000013310 covalent-organic framework Substances 0.000 description 16
- 230000009471 action Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 15
- 125000005647 linker group Chemical group 0.000 description 15
- 238000009736 wetting Methods 0.000 description 14
- 239000000654 additive Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 125000000524 functional group Chemical group 0.000 description 12
- 230000002209 hydrophobic effect Effects 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 125000004429 atom Chemical group 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000000049 pigment Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 239000003921 oil Substances 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 230000000996 additive effect Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 6
- 150000001335 aliphatic alkanes Chemical class 0.000 description 6
- 150000001408 amides Chemical class 0.000 description 6
- 230000005525 hole transport Effects 0.000 description 6
- 239000001993 wax Substances 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 238000009472 formulation Methods 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- 229920002799 BoPET Polymers 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000370 acceptor Substances 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- -1 deodorizers Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- ZCEOQPCADIEKPX-UHFFFAOYSA-N 4-(4-aminophenyl)-3-[4-(methoxymethyl)phenyl]aniline Chemical compound COCC1=CC=C(C=C1)C1=C(C=CC(=C1)N)C1=CC=C(C=C1)N ZCEOQPCADIEKPX-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000009499 grossing Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- OFXSXYCSPVKZPF-UHFFFAOYSA-N methoxyperoxymethane Chemical compound COOOC OFXSXYCSPVKZPF-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- KBSPJIWZDWBDGM-UHFFFAOYSA-N 1-Methylpyrene Chemical compound C1=C2C(C)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 KBSPJIWZDWBDGM-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- VPUGDVKSAQVFFS-UHFFFAOYSA-N coronene Chemical compound C1=C(C2=C34)C=CC3=CC=C(C=C3)C4=C4C3=CC=C(C=C3)C4=C2C3=C1 VPUGDVKSAQVFFS-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- NZZFYRREKKOMAT-UHFFFAOYSA-N diiodomethane Chemical compound ICI NZZFYRREKKOMAT-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 150000002466 imines Chemical class 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 230000003075 superhydrophobic effect Effects 0.000 description 2
- AODWWPFTUICRBK-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8-hexadecafluorodecane-1,10-diol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(O)(F)F AODWWPFTUICRBK-UHFFFAOYSA-N 0.000 description 1
- UEVVKZOFWMPZAW-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octafluorohexane-1,6-diol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(O)(F)F UEVVKZOFWMPZAW-UHFFFAOYSA-N 0.000 description 1
- BOHFWWWQMGFMPJ-UHFFFAOYSA-N 1,2,3,4-tetraphenylpyrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=C2C=3C=CC=CC=3)=CC3=CC=CC4=CC=C2C1=C34 BOHFWWWQMGFMPJ-UHFFFAOYSA-N 0.000 description 1
- NMNSBFYYVHREEE-UHFFFAOYSA-N 1,2-dinitroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C([N+]([O-])=O)C([N+](=O)[O-])=CC=C3C(=O)C2=C1 NMNSBFYYVHREEE-UHFFFAOYSA-N 0.000 description 1
- UIURDDSZTJODOX-UHFFFAOYSA-N 1-ethenylbenzo[a]anthracene Chemical compound C1=CC=CC2=CC3=C4C(C=C)=CC=CC4=CC=C3C=C21 UIURDDSZTJODOX-UHFFFAOYSA-N 0.000 description 1
- IMZNOWXSCHXDLC-UHFFFAOYSA-N 1-ethenylperylene Chemical group C1=CC(C=2C(C=C)=CC=C3C=2C2=CC=C3)=C3C2=CC=CC3=C1 IMZNOWXSCHXDLC-UHFFFAOYSA-N 0.000 description 1
- WPMHMYHJGDAHKX-UHFFFAOYSA-N 1-ethenylpyrene Chemical compound C1=C2C(C=C)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 WPMHMYHJGDAHKX-UHFFFAOYSA-N 0.000 description 1
- VRIRHHMUAHTQFJ-UHFFFAOYSA-N 1-ethenyltetracene Chemical compound C1=CC=C2C=C(C=C3C(C=C)=CC=CC3=C3)C3=CC2=C1 VRIRHHMUAHTQFJ-UHFFFAOYSA-N 0.000 description 1
- ZWAMZDRREBOHIO-UHFFFAOYSA-N 1-ethylpyrene Chemical compound C1=C2C(CC)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 ZWAMZDRREBOHIO-UHFFFAOYSA-N 0.000 description 1
- KCIJNJVCFPSUBQ-UHFFFAOYSA-N 1-pyren-1-ylethanone Chemical compound C1=C2C(C(=O)C)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 KCIJNJVCFPSUBQ-UHFFFAOYSA-N 0.000 description 1
- PYKYYOSVJRAVGQ-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluorohexanedioic acid;hydrate Chemical compound O.OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(O)=O PYKYYOSVJRAVGQ-UHFFFAOYSA-N 0.000 description 1
- ZSDAMBJDFDRLSS-UHFFFAOYSA-N 2,3,5,6-tetrafluorobenzene-1,4-diol Chemical compound OC1=C(F)C(F)=C(O)C(F)=C1F ZSDAMBJDFDRLSS-UHFFFAOYSA-N 0.000 description 1
- JOERSAVCLPYNIZ-UHFFFAOYSA-N 2,4,5,7-tetranitrofluoren-9-one Chemical compound O=C1C2=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C2C2=C1C=C([N+](=O)[O-])C=C2[N+]([O-])=O JOERSAVCLPYNIZ-UHFFFAOYSA-N 0.000 description 1
- VHQGURIJMFPBKS-UHFFFAOYSA-N 2,4,7-trinitrofluoren-9-one Chemical compound [O-][N+](=O)C1=CC([N+]([O-])=O)=C2C3=CC=C([N+](=O)[O-])C=C3C(=O)C2=C1 VHQGURIJMFPBKS-UHFFFAOYSA-N 0.000 description 1
- KYTZCXQNLYKUQN-UHFFFAOYSA-N 2-(2-pentanoyl-9h-fluoren-1-yl)propanedinitrile Chemical compound C1=CC=C2CC3=C(C(C#N)C#N)C(C(=O)CCCC)=CC=C3C2=C1 KYTZCXQNLYKUQN-UHFFFAOYSA-N 0.000 description 1
- IJMQLOPGNQFHAR-UHFFFAOYSA-N 3-(n-[4-[4-(n-(3-hydroxyphenyl)anilino)phenyl]phenyl]anilino)phenol Chemical compound OC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(O)C=CC=2)=C1 IJMQLOPGNQFHAR-UHFFFAOYSA-N 0.000 description 1
- QMHTZTOPYZKQLC-UHFFFAOYSA-N 4-bromopyrene Chemical compound C1=CC=C2C(Br)=CC3=CC=CC4=CC=C1C2=C34 QMHTZTOPYZKQLC-UHFFFAOYSA-N 0.000 description 1
- IXAFAYIIDHDJHN-UHFFFAOYSA-N 4-methylpyrene Natural products C1=CC=C2C(C)=CC3=CC=CC4=CC=C1C2=C34 IXAFAYIIDHDJHN-UHFFFAOYSA-N 0.000 description 1
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 1
- XYPMAZCBFKBIFK-UHFFFAOYSA-N 9,10-dinitroanthracene Chemical compound C1=CC=C2C([N+](=O)[O-])=C(C=CC=C3)C3=C([N+]([O-])=O)C2=C1 XYPMAZCBFKBIFK-UHFFFAOYSA-N 0.000 description 1
- PLAZXGNBGZYJSA-UHFFFAOYSA-N 9-ethylcarbazole Chemical compound C1=CC=C2N(CC)C3=CC=CC=C3C2=C1 PLAZXGNBGZYJSA-UHFFFAOYSA-N 0.000 description 1
- VIJYEGDOKCKUOL-UHFFFAOYSA-N 9-phenylcarbazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2C2=CC=CC=C21 VIJYEGDOKCKUOL-UHFFFAOYSA-N 0.000 description 1
- LSZJZNNASZFXKN-UHFFFAOYSA-N 9-propan-2-ylcarbazole Chemical compound C1=CC=C2N(C(C)C)C3=CC=CC=C3C2=C1 LSZJZNNASZFXKN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- YYGRIGYJXSQDQB-UHFFFAOYSA-N Benzo[b]chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC5=CC=CC=C5C=C4C=CC3=C21 YYGRIGYJXSQDQB-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- 229920003270 Cymel® Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 239000004609 Impact Modifier Substances 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229910008651 TiZr Inorganic materials 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000008365 aqueous carrier Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 125000003636 chemical group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 150000003997 cyclic ketones Chemical class 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- WWMVHQYWYMHBJN-UHFFFAOYSA-N di(pyren-1-yl)diazene Chemical compound C1=CC(N=NC=2C3=CC=C4C=CC=C5C=CC(C3=C54)=CC=2)=C2C=CC3=CC=CC4=CC=C1C2=C43 WWMVHQYWYMHBJN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000002917 insecticide Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 239000008206 lipophilic material Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000643 oven drying Methods 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000009958 sewing Methods 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14008—Structure of acoustic ink jet print heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
- B41J29/38—Drives, motors, controls or automatic cut-off devices for the entire printing mechanism
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1656—Antifouling paints; Underwater paints characterised by the film-forming substance
- C09D5/1662—Synthetic film-forming substance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/174,046 US8353574B1 (en) | 2011-06-30 | 2011-06-30 | Ink jet faceplate coatings comprising structured organic films |
| US13/174,046 | 2011-06-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013014763A JP2013014763A (ja) | 2013-01-24 |
| JP2013014763A5 JP2013014763A5 (enExample) | 2015-07-23 |
| JP5941347B2 true JP5941347B2 (ja) | 2016-06-29 |
Family
ID=47355338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012136401A Expired - Fee Related JP5941347B2 (ja) | 2011-06-30 | 2012-06-15 | 構造化有機フィルムを含むインクジェットフェイスプレートのコーティング |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8353574B1 (enExample) |
| JP (1) | JP5941347B2 (enExample) |
| KR (1) | KR101839621B1 (enExample) |
| CN (1) | CN102850935A (enExample) |
| CA (1) | CA2781356C (enExample) |
| DE (1) | DE102012210353A1 (enExample) |
| RU (1) | RU2587791C2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9523928B2 (en) | 2014-09-26 | 2016-12-20 | Xerox Corporation | Fluorinated structured organic film photoreceptor layers |
| CN104399436B (zh) * | 2014-11-07 | 2016-10-19 | 上海交通大学 | 酞菁锌-芘-共价有机框架/单壁碳纳米管复合物的制备方法 |
| JP2017185705A (ja) * | 2016-04-06 | 2017-10-12 | 東芝テック株式会社 | インクジェットヘッド記録装置 |
| CN106154400A (zh) * | 2016-09-19 | 2016-11-23 | 福州大学 | 一种改善喷墨打印量子点网点导光板的方法 |
| US11167375B2 (en) | 2018-08-10 | 2021-11-09 | The Research Foundation For The State University Of New York | Additive manufacturing processes and additively manufactured products |
| WO2020043157A1 (zh) * | 2018-08-29 | 2020-03-05 | Tcl集团股份有限公司 | 量子点网点导光板及其制备方法 |
| US11958292B2 (en) | 2021-03-19 | 2024-04-16 | Funai Electric Co., Ltd. | Solvent compatible nozzle plate |
| US12202788B2 (en) | 2022-09-15 | 2025-01-21 | Xerox Corporation | Gradient membranes formed from free standing structured organic films and methods thereof |
Family Cites Families (110)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2324550A (en) | 1939-03-08 | 1943-07-20 | American Can Co | Lithographic printing ink and the method of making the same |
| US3430418A (en) | 1967-08-09 | 1969-03-04 | Union Carbide Corp | Selective adsorption process |
| US3801315A (en) | 1971-12-27 | 1974-04-02 | Xerox Corp | Gravure imaging system |
| US4078927A (en) | 1973-12-13 | 1978-03-14 | Xerox Corporation | Photoconductive printing master |
| CA1098755A (en) | 1976-04-02 | 1981-04-07 | Milan Stolka | Imaging member with n,n'-diphenyl-n,n'-bis (phenylmethyl)-¬1,1'-biphenyl|-4,4'-diamine in the charge transport layer |
| US4081274A (en) | 1976-11-01 | 1978-03-28 | Xerox Corporation | Composite layered photoreceptor |
| US4265990A (en) | 1977-05-04 | 1981-05-05 | Xerox Corporation | Imaging system with a diamine charge transport material in a polycarbonate resin |
| US4304829A (en) | 1977-09-22 | 1981-12-08 | Xerox Corporation | Imaging system with amino substituted phenyl methane charge transport layer |
| US4306008A (en) | 1978-12-04 | 1981-12-15 | Xerox Corporation | Imaging system with a diamine charge transport material in a polycarbonate resin |
| US4299897A (en) | 1978-12-15 | 1981-11-10 | Xerox Corporation | Aromatic amino charge transport layer in electrophotography |
| US4257699A (en) | 1979-04-04 | 1981-03-24 | Xerox Corporation | Metal filled, multi-layered elastomer fuser member |
| US4233384A (en) | 1979-04-30 | 1980-11-11 | Xerox Corporation | Imaging system using novel charge transport layer |
| US4291110A (en) | 1979-06-11 | 1981-09-22 | Xerox Corporation | Siloxane hole trapping layer for overcoated photoreceptors |
| DE3048141C2 (de) | 1979-12-25 | 1982-12-23 | Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa | Einrichtung zum gleichförmigen Aufladen eines fotoleitfähigen Aufzeichnungsmaterials |
| US4286033A (en) | 1980-03-05 | 1981-08-25 | Xerox Corporation | Trapping layer overcoated inorganic photoresponsive device |
| US4338387A (en) | 1981-03-02 | 1982-07-06 | Xerox Corporation | Overcoated photoreceptor containing inorganic electron trapping and hole trapping layers |
| DE3369751D1 (en) | 1982-04-06 | 1987-03-12 | Nec Corp | Development apparatus of latent electrostatic images |
| US4489593A (en) | 1982-09-09 | 1984-12-25 | Omicron Technology Corporation | Method and apparatus for determining the amount of gas adsorbed or desorbed from a solid |
| US4464450A (en) | 1982-09-21 | 1984-08-07 | Xerox Corporation | Multi-layer photoreceptor containing siloxane on a metal oxide layer |
| US4457994A (en) | 1982-11-10 | 1984-07-03 | Xerox Corporation | Photoresponsive device containing arylmethanes |
| US6375917B1 (en) | 1984-12-06 | 2002-04-23 | Hyperion Catalysis International, Inc. | Apparatus for the production of carbon fibrils by catalysis and methods thereof |
| US5165909A (en) | 1984-12-06 | 1992-11-24 | Hyperion Catalysis Int'l., Inc. | Carbon fibrils and method for producing same |
| US5707916A (en) | 1984-12-06 | 1998-01-13 | Hyperion Catalysis International, Inc. | Carbon fibrils |
| US4664995A (en) | 1985-10-24 | 1987-05-12 | Xerox Corporation | Electrostatographic imaging members |
| US4871634A (en) | 1987-06-10 | 1989-10-03 | Xerox Corporation | Electrophotographic elements using hydroxy functionalized arylamine compounds |
| US4855203A (en) | 1987-08-31 | 1989-08-08 | Xerox Corporation | Imaging members with photogenerating compositions obtained by solution processes |
| JPH01164402A (ja) | 1987-10-14 | 1989-06-28 | Exxon Res & Eng Co | ポリ尿素膜及び芳香族化合物と非芳香族化合物との分離のためのその用途 |
| US4917711A (en) | 1987-12-01 | 1990-04-17 | Peking University | Adsorbents for use in the separation of carbon monoxide and/or unsaturated hydrocarbons from mixed gases |
| US5017432A (en) | 1988-03-10 | 1991-05-21 | Xerox Corporation | Fuser member |
| US4921769A (en) | 1988-10-03 | 1990-05-01 | Xerox Corporation | Photoresponsive imaging members with polyurethane blocking layers |
| US4921773A (en) | 1988-12-30 | 1990-05-01 | Xerox Corporation | Process for preparing an electrophotographic imaging member |
| ZA907803B (en) | 1989-09-28 | 1991-07-31 | Hyperion Catalysis Int | Electrochemical cells and preparing carbon fibrils |
| US5110693A (en) | 1989-09-28 | 1992-05-05 | Hyperion Catalysis International | Electrochemical cell |
| US5061965A (en) | 1990-04-30 | 1991-10-29 | Xerox Corporation | Fusing assembly with release agent donor member |
| US5126310A (en) | 1990-08-23 | 1992-06-30 | Air Products And Chemicals, Inc. | Highly dispersed cuprous compositions |
| US5166031A (en) | 1990-12-21 | 1992-11-24 | Xerox Corporation | Material package for fabrication of fusing components |
| US5141788A (en) | 1990-12-21 | 1992-08-25 | Xerox Corporation | Fuser member |
| US5139910A (en) | 1990-12-21 | 1992-08-18 | Xerox Corporation | Photoconductive imaging members with bisazo compositions |
| US5569635A (en) | 1994-05-22 | 1996-10-29 | Hyperion Catalysts, Int'l., Inc. | Catalyst supports, supported catalysts and methods of making and using the same |
| JPH06340081A (ja) | 1993-04-19 | 1994-12-13 | Xerox Corp | 全幅インクジェットプリンタ用プリントヘッドメンテナンス装置 |
| US5455136A (en) | 1993-05-03 | 1995-10-03 | Xerox Corporation | Flexible belt with a skewed seam configuration |
| US5370931A (en) | 1993-05-27 | 1994-12-06 | Xerox Corporation | Fuser member overcoated with a fluoroelastomer, polyorganosiloxane and copper oxide composition |
| US5366772A (en) | 1993-07-28 | 1994-11-22 | Xerox Corporation | Fuser member |
| US5368913A (en) | 1993-10-12 | 1994-11-29 | Fiberweb North America, Inc. | Antistatic spunbonded nonwoven fabrics |
| US5368967A (en) | 1993-12-21 | 1994-11-29 | Xerox Corporation | Layered photoreceptor with overcoat containing hydrogen bonded materials |
| JP2827937B2 (ja) | 1994-11-22 | 1998-11-25 | 富士ゼロックス株式会社 | 下引き層を有する電子写真感光体および電子写真装置 |
| US6939625B2 (en) | 1996-06-25 | 2005-09-06 | Nôrthwestern University | Organic light-emitting diodes and methods for assembly and enhanced charge injection |
| US5702854A (en) | 1996-09-27 | 1997-12-30 | Xerox Corporation | Compositions and photoreceptor overcoatings containing a dihydroxy arylamine and a crosslinked polyamide |
| US6020426A (en) | 1996-11-01 | 2000-02-01 | Fuji Xerox Co., Ltd. | Charge-transporting copolymer, method of forming charge-transporting copolymer, electrophotographic photosensitive body, and electrophotographic device |
| US6107117A (en) | 1996-12-20 | 2000-08-22 | Lucent Technologies Inc. | Method of making an organic thin film transistor |
| FR2758739B1 (fr) | 1997-01-24 | 1999-02-26 | Ceca Sa | Perfectionnement dans les procedes psa de purification de l'hydrogene |
| US5853906A (en) | 1997-10-14 | 1998-12-29 | Xerox Corporation | Conductive polymer compositions and processes thereof |
| US6783849B2 (en) | 1998-03-27 | 2004-08-31 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Molecular layer epitaxy method and compositions |
| JP3899733B2 (ja) | 1998-07-03 | 2007-03-28 | 株式会社豊田中央研究所 | 多孔材料及び多孔材料の製造方法 |
| US5976744A (en) | 1998-10-29 | 1999-11-02 | Xerox Corporation | Photoreceptor overcoatings containing hydroxy functionalized aromatic diamine, hydroxy functionalized triarylamine and crosslinked acrylated polyamide |
| US6002907A (en) | 1998-12-14 | 1999-12-14 | Xerox Corporation | Liquid immersion development machine having a reliable non-sliding transfusing assembly |
| US6107439A (en) | 1998-12-22 | 2000-08-22 | Xerox Corporation | Cross linked conducting compositions |
| US6340382B1 (en) | 1999-08-13 | 2002-01-22 | Mohamed Safdar Allie Baksh | Pressure swing adsorption process for the production of hydrogen |
| FR2811241B1 (fr) | 2000-07-07 | 2002-12-13 | Ceca Sa | Procede pour la purification de melanges gazeux a base d'hydrogene utilisant une zeolite x au calcium |
| GB0026121D0 (en) | 2000-10-25 | 2000-12-13 | Lsi Logic Europ Ltd | Apparatus and method for detecting a predetermined pattern of bits in a bitstream |
| US6505921B2 (en) | 2000-12-28 | 2003-01-14 | Eastman Kodak Company | Ink jet apparatus having amplified asymmetric heating drop deflection |
| US6819244B2 (en) | 2001-03-28 | 2004-11-16 | Inksure Rf, Inc. | Chipless RF tags |
| DE60216257T2 (de) | 2001-04-17 | 2007-06-14 | Matsushita Electric Industrial Co., Ltd., Kadoma | Leitfähiger organischer Dünnfilm, Verfahren zu dessen Herstellung, sowie Elektrde und elektrisches Kabel, die davon Gebrauch machen |
| WO2002088148A1 (en) | 2001-04-30 | 2002-11-07 | The Regents Of The University Of Michigan | Isoreticular metal-organic frameworks, process for forming the same, and systematic design of pore size and functionality therein,with application for gas storage |
| US6713643B2 (en) | 2001-05-24 | 2004-03-30 | Board Of Trustees Of Michigan State University | Ultrastable organofunctional microporous to mesoporous silica compositions |
| DE10155935A1 (de) | 2001-11-14 | 2003-05-28 | Infineon Technologies Ag | Intelligentes Etikett |
| FR2832141B1 (fr) | 2001-11-14 | 2004-10-01 | Ceca Sa | Procede de purification de gaz de synthese |
| KR20030094099A (ko) | 2002-06-03 | 2003-12-11 | 쉬플리 캄파니, 엘.엘.씨. | 전자 디바이스 제조 |
| JP4185341B2 (ja) | 2002-09-25 | 2008-11-26 | パイオニア株式会社 | 多層バリア膜構造、有機エレクトロルミネッセンス表示パネル及び製造方法 |
| JP3580426B1 (ja) | 2003-05-12 | 2004-10-20 | シャープ株式会社 | 有機光導電性材料、それを用いた電子写真感光体および画像形成装置 |
| JP4461215B2 (ja) | 2003-09-08 | 2010-05-12 | 独立行政法人産業技術総合研究所 | 低誘電率絶縁材料とそれを用いた半導体装置 |
| US7202002B2 (en) | 2004-04-30 | 2007-04-10 | Samsung Electronics Co., Ltd. | Hydrazone-based charge transport materials |
| US7179324B2 (en) | 2004-05-19 | 2007-02-20 | Praxair Technology, Inc. | Continuous feed three-bed pressure swing adsorption system |
| US7177572B2 (en) | 2004-06-25 | 2007-02-13 | Xerox Corporation | Biased charge roller with embedded electrodes with post-nip breakdown to enable improved charge uniformity |
| US20060182993A1 (en) | 2004-08-10 | 2006-08-17 | Mitsubishi Chemical Corporation | Compositions for organic electroluminescent device and organic electroluminescent device |
| JP4642447B2 (ja) | 2004-08-27 | 2011-03-02 | 株式会社リコー | 芳香族ポリエステル樹脂及びそれを用いた電子写真用感光体 |
| CN101189244A (zh) | 2004-10-22 | 2008-05-28 | 密歇根大学董事会 | 共价连接的有机骨架和多面体 |
| JP2006169276A (ja) | 2004-12-13 | 2006-06-29 | Seiko Epson Corp | 導電性材料、導電性材料用組成物、導電層、電子デバイスおよび電子機器 |
| US7404846B2 (en) | 2005-04-26 | 2008-07-29 | Air Products And Chemicals, Inc. | Adsorbents for rapid cycle pressure swing adsorption processes |
| JP5549900B2 (ja) | 2005-06-24 | 2014-07-16 | 旭硝子株式会社 | 架橋性含フッ素芳香族プレポリマー及びその用途 |
| US7384717B2 (en) | 2005-09-26 | 2008-06-10 | Xerox Corporation | Photoreceptor with improved overcoat layer |
| US7714040B2 (en) | 2005-11-30 | 2010-05-11 | Xerox Corporation | Phase change inks containing curable amide gellant compounds |
| US8883384B2 (en) | 2005-12-13 | 2014-11-11 | Xerox Corporation | Binderless overcoat layer |
| EP1984378B1 (de) | 2006-02-10 | 2010-07-28 | Basf Se | Verfahren zur herstellung poröser organischer gerüstmaterialien |
| US8258197B2 (en) | 2006-02-24 | 2012-09-04 | University Of South Carolina | Synthesis of a highly crystalline, covalently linked porous network |
| JP4331256B2 (ja) | 2006-04-12 | 2009-09-16 | パナソニック株式会社 | 有機分子膜構造体の形成方法 |
| KR101304697B1 (ko) | 2006-06-07 | 2013-09-06 | 삼성전자주식회사 | 적층 유도 화합물을 사용한 유기 반도체 소재, 이를포함하는 조성물, 이를 이용한 유기 반도체 박막 및 유기전자 소자 |
| US7645548B2 (en) | 2006-11-06 | 2010-01-12 | Xerox Corporation | Photoreceptor overcoat layer masking agent |
| JP5559545B2 (ja) | 2007-01-24 | 2014-07-23 | ザ レジェンツ オブ ザ ユニヴァースティ オブ カリフォルニア | 結晶性3d−および2d−共有結合性有機骨格 |
| US7999160B2 (en) | 2007-03-23 | 2011-08-16 | International Business Machines Corporation | Orienting, positioning, and forming nanoscale structures |
| US8367152B2 (en) | 2007-04-27 | 2013-02-05 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of light-emitting device |
| US8065904B1 (en) | 2007-06-18 | 2011-11-29 | Sandia Corporation | Method and apparatus for detecting an analyte |
| US7628466B2 (en) | 2007-06-20 | 2009-12-08 | Xerox Corporation | Method for increasing printhead reliability |
| CA2691549C (en) | 2007-06-27 | 2014-10-28 | Georgia Tech Research Corporation | Sorbent fiber compositions and methods of temperature swing adsorption |
| US7591535B2 (en) | 2007-08-13 | 2009-09-22 | Xerox Corporation | Maintainable coplanar front face for silicon die array printhead |
| GB2451865A (en) | 2007-08-15 | 2009-02-18 | Univ Liverpool | Microporous polymers from alkynyl monomers |
| US8309285B2 (en) | 2007-11-07 | 2012-11-13 | Xerox Corporation | Protective overcoat layer and photoreceptor including same |
| KR100832309B1 (ko) | 2007-11-21 | 2008-05-26 | 한국과학기술원 | 금속 양이온이 도핑된 수소저장용 유기물질 골격구조 물질유도체 및 그의 사용방법 |
| US20090149565A1 (en) | 2007-12-11 | 2009-06-11 | Chunqing Liu | Method for Making High Performance Mixed Matrix Membranes |
| DE102008011840B4 (de) | 2008-02-20 | 2011-07-21 | Technische Universität Dresden, 01069 | Mikroporöses hydrophobes Polyorganosilan, Verfahren zur Herstellung und Verwendung |
| DE102008011189A1 (de) | 2008-02-26 | 2009-08-27 | Merck Patent Gmbh | Polykondensationsnetzwerke zur Gasspeicherung |
| WO2009127896A1 (en) | 2008-04-18 | 2009-10-22 | Universite D'aix-Marseille I | Synthesis of an ordered covalent monolayer network onto a surface |
| US8709134B2 (en) | 2009-02-02 | 2014-04-29 | The Regents Of The University Of California | Reversible ethylene oxide capture in porous frameworks |
| JP5542160B2 (ja) | 2009-03-04 | 2014-07-09 | ゼロックス コーポレイション | 構造化有機薄膜を製造するための混合溶媒法 |
| US8241400B2 (en) | 2009-07-15 | 2012-08-14 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for the production of carbon dioxide utilizing a co-purge pressure swing adsorption unit |
| JP2011070023A (ja) | 2009-09-25 | 2011-04-07 | Fuji Xerox Co Ltd | 電子写真感光体、電子写真感光体の製造方法、プロセスカートリッジ、および画像形成装置。 |
| US8226207B2 (en) * | 2009-11-24 | 2012-07-24 | Xerox Corporation | Coating for an ink jet printhead front face |
| US8318892B2 (en) | 2010-07-28 | 2012-11-27 | Xerox Corporation | Capped structured organic film compositions |
| US8119315B1 (en) | 2010-08-12 | 2012-02-21 | Xerox Corporation | Imaging members for ink-based digital printing comprising structured organic films |
| US8119314B1 (en) * | 2010-08-12 | 2012-02-21 | Xerox Corporation | Imaging devices comprising structured organic films |
-
2011
- 2011-06-30 US US13/174,046 patent/US8353574B1/en active Active
-
2012
- 2012-06-15 JP JP2012136401A patent/JP5941347B2/ja not_active Expired - Fee Related
- 2012-06-20 DE DE102012210353A patent/DE102012210353A1/de active Pending
- 2012-06-22 CA CA2781356A patent/CA2781356C/en not_active Expired - Fee Related
- 2012-06-29 KR KR1020120071062A patent/KR101839621B1/ko not_active Expired - Fee Related
- 2012-06-29 RU RU2012127214/12A patent/RU2587791C2/ru active
- 2012-07-02 CN CN2012102285162A patent/CN102850935A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| RU2012127215A (ru) | 2014-01-10 |
| CA2781356A1 (en) | 2012-12-30 |
| US8353574B1 (en) | 2013-01-15 |
| RU2587791C2 (ru) | 2016-06-20 |
| KR20130004158A (ko) | 2013-01-09 |
| CN102850935A (zh) | 2013-01-02 |
| DE102012210353A1 (de) | 2013-01-03 |
| US20130002764A1 (en) | 2013-01-03 |
| JP2013014763A (ja) | 2013-01-24 |
| KR101839621B1 (ko) | 2018-03-16 |
| RU2012127214A (ru) | 2014-01-20 |
| CA2781356C (en) | 2016-08-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5941347B2 (ja) | 構造化有機フィルムを含むインクジェットフェイスプレートのコーティング | |
| JP5894508B2 (ja) | フッ素化構造化有機フィルム組成物 | |
| JP5705058B2 (ja) | 規則的な構造の有機膜を備える、インクによるデジタル印刷のための画像形成体 | |
| JP7310128B2 (ja) | 接触部材、印刷装置、及び印刷方法 | |
| CA2742524C (en) | Periodic structured organic films | |
| US8529997B2 (en) | Methods for preparing structured organic film micro-features by inkjet printing | |
| JP5591179B2 (ja) | 撥油性表面コーティング | |
| CN113924214B (zh) | 接触部件、干燥装置和印刷装置 | |
| JP7755801B2 (ja) | 乾燥装置及び印刷装置 | |
| US20140255610A1 (en) | Thermally stable oleophobic anti-wetting coating for inkjet printhead face | |
| CN100453592C (zh) | 环氧树脂组合物、表面处理方法、液体喷射记录头及液体喷射记录装置 | |
| CN113811450B (zh) | 接触元件、干燥装置和打印设备 | |
| JP6189769B2 (ja) | フッ素化オルガノシロキサン網目構造のための配合組成物 | |
| JP2007253611A (ja) | インクジェット記録ヘッドの製造方法 | |
| JP6289357B2 (ja) | フッ素化オルガノシロキサン網目構造組成物 | |
| CN115605352A (zh) | 干燥装置、印刷装置及印刷方法 | |
| JP7367402B2 (ja) | 印刷装置、接触部材、及び乾燥装置 | |
| JP6433875B2 (ja) | テザー型有機シロキシネットワークフィルム組成物 | |
| JP2003277478A (ja) | エポキシ樹脂組成物 | |
| RU2574593C2 (ru) | Композиции фторированных структурированных органических пленок | |
| JP2014030927A (ja) | 液体吐出ヘッドおよび液体吐出記録装置 | |
| JP2003313270A (ja) | エポキシ樹脂組成物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20130819 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150605 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150605 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20150605 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20150722 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150728 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20151028 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151117 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160201 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160329 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160331 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160426 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160520 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5941347 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |