JP5886420B2 - ラジカル架橋性基を有するポリシロキサン組成物 - Google Patents

ラジカル架橋性基を有するポリシロキサン組成物 Download PDF

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Publication number
JP5886420B2
JP5886420B2 JP2014511263A JP2014511263A JP5886420B2 JP 5886420 B2 JP5886420 B2 JP 5886420B2 JP 2014511263 A JP2014511263 A JP 2014511263A JP 2014511263 A JP2014511263 A JP 2014511263A JP 5886420 B2 JP5886420 B2 JP 5886420B2
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group
polysiloxane
mass
polysiloxane composition
meth
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Japanese (ja)
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JPWO2013157643A1 (ja
Inventor
由香 金田
由香 金田
徹 勝又
徹 勝又
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Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/14—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Insulating Materials (AREA)
  • Insulating Bodies (AREA)
JP2014511263A 2012-04-20 2013-04-19 ラジカル架橋性基を有するポリシロキサン組成物 Expired - Fee Related JP5886420B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014511263A JP5886420B2 (ja) 2012-04-20 2013-04-19 ラジカル架橋性基を有するポリシロキサン組成物

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2012097034 2012-04-20
JP2012097034 2012-04-20
JP2012186228 2012-08-27
JP2012186228 2012-08-27
JP2014511263A JP5886420B2 (ja) 2012-04-20 2013-04-19 ラジカル架橋性基を有するポリシロキサン組成物
PCT/JP2013/061674 WO2013157643A1 (ja) 2012-04-20 2013-04-19 ラジカル架橋性基を有するポリシロキサン組成物

Publications (2)

Publication Number Publication Date
JPWO2013157643A1 JPWO2013157643A1 (ja) 2015-12-21
JP5886420B2 true JP5886420B2 (ja) 2016-03-16

Family

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Family Applications (1)

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JP2014511263A Expired - Fee Related JP5886420B2 (ja) 2012-04-20 2013-04-19 ラジカル架橋性基を有するポリシロキサン組成物

Country Status (5)

Country Link
JP (1) JP5886420B2 (ko)
KR (1) KR101566138B1 (ko)
CN (1) CN104245846B (ko)
TW (1) TWI491675B (ko)
WO (1) WO2013157643A1 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
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JP2013539072A (ja) * 2010-09-16 2013-10-17 エルジー・ケム・リミテッド 感光性樹脂組成物、ドライフィルムソルダーレジスト及び回路基板
TWI500703B (zh) * 2013-12-26 2015-09-21 Chi Mei Corp 光硬化性塗佈組成物、光硬化塗佈膜及觸控面板
WO2015118992A1 (ja) * 2014-02-07 2015-08-13 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 付加硬化型シリコーン組成物
JP6744576B2 (ja) * 2014-03-31 2020-08-19 日産化学株式会社 反応性含フッ素シリコーン化合物を含む重合性組成物
KR102035434B1 (ko) * 2015-07-09 2019-10-22 도쿄 오카 고교 가부시키가이샤 규소 함유 수지 조성물
US11189778B2 (en) 2016-03-07 2021-11-30 Ricoh Company, Ltd. Element, cell, and power generation device
US20190101828A1 (en) * 2016-04-25 2019-04-04 Toray Industries, Inc. Resin composition, cured film of same and method for manufacturing same, and solid-state image sensor
JP6916619B2 (ja) * 2016-12-28 2021-08-11 東京応化工業株式会社 ポリシラン化合物、組成物、硬化物及び基板の製造方法、並びにアニオン重合選択的促進剤
JP6999408B2 (ja) 2016-12-28 2022-02-04 東京応化工業株式会社 樹脂組成物、樹脂組成物の製造方法、膜形成方法及び硬化物
KR101975149B1 (ko) * 2017-09-14 2019-05-03 스미또모 가가꾸 가부시키가이샤 비수 전해액 이차 전지용 세퍼레이터
CN116478406A (zh) * 2023-04-04 2023-07-25 浙江精一新材料科技有限公司 一种用于光阀的聚硅氧烷及光阀

Family Cites Families (13)

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IT1271131B (it) * 1994-11-30 1997-05-26 Ciba Geigy Spa Composti piperidinici contenenti gruppi silanici come stabilizzanti per materiali organici
US5814695A (en) * 1995-09-08 1998-09-29 General Electric Company Silicone molding compositions having extended useful life
FR2819517B1 (fr) * 2000-10-03 2003-03-21 Atofina Composition comprenant un nitroxyde, un promoteur et eventuellement un initiateur de radicaux libres
US7465769B2 (en) * 2006-10-09 2008-12-16 Dow Global Technologies Inc. Nitroxide compounds for minimizing scorch in crosslinkable compositions
ATE525419T1 (de) * 2007-03-15 2011-10-15 Dow Global Technologies Llc Isocyanat- und diisocyanatverbindungen zur anvernetzungsminimierung sowie diisocyanatverbindungen zur härtungsförderung bei vernetzbaren zusammensetzungen
EP2155816A1 (en) * 2007-06-08 2010-02-24 Union Carbide Chemicals & Plastics Technology LLC Crosslinkable compositions having reduced scorch inhibitor migration, method of reducing such migration, and articles made therefrom
JP5413710B2 (ja) * 2008-06-11 2014-02-12 日本電気株式会社 電極活物質と、その製造方法及びそれを用いた電池
JP2010153649A (ja) * 2008-12-25 2010-07-08 Tosoh Corp 環状シロキサン組成物および薄膜
JP5526399B2 (ja) * 2009-01-16 2014-06-18 日本電気株式会社 電極活物質、その製造方法及び二次電池
DE102010013196B4 (de) 2010-03-29 2015-10-29 Hilti Aktiengesellschaft Chemische Zweikomponenten-Mörtelmasse mit verbesserter Haftung an der Oberfläche von halbgereinigten und/oder feuchten Bohrlöchern in mineralischem Untergrund und ihre Verwendung
WO2011136170A1 (ja) * 2010-04-26 2011-11-03 株式会社スリーボンド 光硬化性シリコーンゲル組成物及びその用途
JP2012219109A (ja) * 2011-04-04 2012-11-12 Nec Corp ラジカル化合物、その製造方法及び二次電池
JP2012221574A (ja) * 2011-04-04 2012-11-12 Nec Corp ラジカル化合物及びその製造方法、電極活物質、並びに二次電池

Also Published As

Publication number Publication date
CN104245846A (zh) 2014-12-24
TWI491675B (zh) 2015-07-11
KR20140128404A (ko) 2014-11-05
WO2013157643A1 (ja) 2013-10-24
TW201402700A (zh) 2014-01-16
KR101566138B1 (ko) 2015-11-04
CN104245846B (zh) 2016-08-24
JPWO2013157643A1 (ja) 2015-12-21

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