JP5866404B2 - 非対称な膜の形成方法 - Google Patents
非対称な膜の形成方法 Download PDFInfo
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- JP5866404B2 JP5866404B2 JP2014095428A JP2014095428A JP5866404B2 JP 5866404 B2 JP5866404 B2 JP 5866404B2 JP 2014095428 A JP2014095428 A JP 2014095428A JP 2014095428 A JP2014095428 A JP 2014095428A JP 5866404 B2 JP5866404 B2 JP 5866404B2
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- 239000001043 yellow dye Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
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Description
水フラックス測定値、及びMgCl2除去率値
上記で調製された非対称な膜の水フラックス及びMgCl2(塩化マグネシウム、塩)除去率値が、41.8cm2の活性表面積を有する撹拌式限外濾過セル(モデル8400;Millipore Corporation(Bedford,Massachusetts))で測定された。膜間圧力は、加圧窒素ガス下で、344.7kPa(50psi(平方インチ当たりのポンド))に設定された。水フラックスは、時間の関数としての膜を透過する水の量、非対称な膜の面積、及び設定圧力に基づいて計算された。MgCl2除去率(脱塩率)は、浸透(Cp)、及び供給量(Cf)(500ppmのMgCl2水溶液)の伝導率から、以下の等式に従って得られた。
伝導率(Cp及びCf)は、伝導率計測器(VWR Digital Conductivity Bench Meter;VWR International(West Chester,Pennsylvania))で測定され、浸透質量は、電子天秤(モデルTE3102S;Sartorius(Edgewood,New York))で測定された。伝導率及び浸透質量のデータは、Winwedge 32コンピューターソフトウェア(TAI Technologies(Philadelphia,Pennsylvania))を使用して、時間の関数として収集された。脱塩率値が停滞した後に減少し始めた後、測定は中止された。脱塩率は、試験の最後の供給濃度によって調整された。
非対称な膜は、連続的なプロセスによって調製された。米国特許第4,726,989号(Mrozinski)に記載されるポリプロピレン熱誘起相分離(TIPS)膜は、重合可能組成物でダイコーティングされて、コーティングされた多孔質基材を形成した。コーティングされた多孔質基材は、間隔を調節したニップの2つのライナーの間で積層された。2つのライナー(例えば、フィルム)の一方は第1主表面に積層され、他方のライナーは、第2主表面に積層されて、多層構造を形成した。30マイクロメートル(1.18mil)厚さの二軸延伸ポリプロピレンライナー(BOPP)フィルム(3M Company(St.Paul,Minnesota))は、約78.5パーセント(短波長紫外線)及び85.9パーセント(長波長紫外線)の透過率を有した。多層構造の縁部(すなわち、2つのライナーの縁部)は、感圧接着剤テープ(Scotch ATG Tape 926、3M(St.Paul,Minnesota))で封止された。多層構造は、BOPPライナーによって封入され、コーティングされた多孔質基材上の超過の重合可能組成物が最小化された。多層構造は、47”の長い紫外線ウィンドウを有するQuantum Microwave Multi−Lamp UV Curing System(モデル:Quant−23/48R、Quantum Technologies(Irvine,California))で照射された。Quantum UV Systemは、長波長紫外線ランプ(26169−3,UV A 365nm Peak Lamps TL60/10R、Philips(Somerset,New Jersey))、又は短波長紫外線ランプ(23596−0,Germicidal Sterlilamp 254nm Lamps TUV115W、Philips(Somerset,New Jersey))のいずれかを使用した。ライン速度は、機械速度ディスプレイを使用して調節された。多層構造が紫外線トレーによって運搬された際に、紫外線源の強度がPowerMap放射計(EIT UV Power MAPSpectral Response,UV:A,B,C,V,Range:Low,Head S/N 1408,Body S/N 1022(Sterling,Virginia)) によって測定された。重合可能組成物の重合可能種が重合され、多孔質基材内に保持される重合物質を形成した。多層基材がロール上に集められて、ライナーが取り外された。非対称膜が回収された。更なる試験の前に、非対称膜が蒸留水で洗浄された。
ポリプロピレンミクロ孔質TIPS膜(泡立ち点孔径=0.58μm、約85〜95マイクロメートル(3.5〜3.6ミル)の厚さ、152.7L/m2・h・kPa(1052L/m2・h・psi)の水フラックス)が、重合可能組成物でダイコーティングされた。重合可能組成物は、3−アクリルアミドプロピルトリメチルアンモニウムクロライド((APTAC)、水中で75重量%、Sigma Aldrich(St.Louis,Missouri))とN,N’−メチレンビスアシルアミド(97%、Alfa Aesar(Ward Hill,Massachusetts))と1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン(Irgacure 2959、Ciba Specialty Chemicals(Tarrytown,New York))とをエタノール/水溶媒混合物(60/40(体積:体積比))中に含んだ。APTAC濃度は、エタノール/水混合物中で0.55モル/kgであった。エタノール/水中のN,N’−メチレンビスアシルアミド、及び、Irgacure 2959は、重合可能種のAPTACに対してそれぞれ10モルパーセント、及び2モルパーセントの濃度を有した。多孔質基材に対して前処理は必要でなかった。コーティングされた多孔質基材を形成するために、重合可能組成物がポリプロピレンミクロ孔質TIPS膜に適用された。コーティングされた多孔質基材は、多層構造を形成する前に、及び紫外線源による照射の前に、「非対称な膜のプロセス」に記載されるように調製された。多層構造は、連続的なプロセス装置により、約30.5cm/分のライン速度で運搬された。コーティングされた膜の第1主表面(側面A)が、短波長紫外線源(5.77mW/cm2の光強度)で照射された。湿潤した膜は、約110〜120マイクロメートル(4.4〜4.6ミル)の厚さであった。膜の分離性能が表1に掲載される。
比較例1は、実施例1と同様に調製されたが、ただし紫外線源(長波長紫外線)を使用して膜の一方の側面を照射した。コーティングされた膜の第1主表面(側面A)が、長波長紫外線(28.55mW/cm2の光強度)で照射された。湿潤した膜は、約110〜120マイクロメートル(4.4〜4.6ミル)の厚さであった。膜の分離性能が表1に掲載される。
実施例2(実施例1の膜)及び比較例2(比較例1の膜)は、負電荷を帯びた色素(商標名METANIL YELLOWで、Alfa Aesar(Heysham,Lancashire,England)から市販)で個別に着色された。実施例2及び比較例2の膜が、バイアル瓶の中の水性色素溶液中に浸されて、約24時間にわたって撹拌された。膜がバイアル瓶から取り出されて脱イオン水ですすがれ、乾燥された。側面Aは、実施例2及び比較例2の第1主表面を表わし、側面Bはその第2主表面を表わした。表2はこの結果を掲載する。
ポリプロピレンミクロ孔質TIPS膜(泡立ち点孔径=0.72μm、約120〜130マイクロメートル(4.2〜4.3ミル)の厚さ、214.1L/m2・h・kPa(1475L/m2・h・psi)の水フラックス)が、図1の重合可能種でダイコーティングされた。ポリプロピレン膜の前処理は必要ではなかった。コーティングされた多孔質基材を形成するために、重合可能種がポリプロピレンミクロ孔質TIPS膜に適用された。コーティングされた多孔質基材は、多層構造を形成する前に、及び短波長紫外線源による照射の前に、「非対称な膜のプロセス」に記載されるように調製された。多層構造は、連続的なプロセス装置により、約50cm/分のライン速度で運搬された。コーティングされた膜の第1主表面(側面A)は、異なる短波長紫外線光強度(PowerMap放射計によって測定される光強度)で照射された。実施例3〜4に示される膜の分離性能が、表3に示される。
実施例3〜4で使用されたポリプロピレン多孔質TIPS膜は、実施例1の重合可能組成物でダイコーティングされた。PP膜の前処理は必要ではなかった。コーティングされた多孔質基材を形成するために、重合可能種がポリプロピレン多孔質TIPS膜に適用された。コーティングされた多孔質基材は、多層構造を形成する前に、及び短波長紫外線源による照射の前に、「非対称な膜のプロセス」に記載されるように調製された。多層構造は、連続的なプロセス装置上で、表4に示される様々なライン速度で運搬された。コーティングされた膜の第1主表面(側面A)は、異なる短波長紫外線光強度(PowerMap放射計によって測定される光強度)で照射された。実施例5〜13の膜の分離性能が、表4に掲載される。
本発明はまた、以下の内容を包含する。
(1)非対称な膜を形成する方法であって、
第1主表面及び第2主表面を有する多孔質基材を提供する工程と、
重合可能組成物を前記多孔質基材に適用し、コーティングされた多孔質基材を提供する工程であって、前記重合可能組成物が、
i)少なくとも1つの重合可能種、及び
ii)少なくとも1つの光開始剤を含む、工程と、
前記コーティングされた多孔質基材を340nm未満のピーク放射波長を有する紫外線源に暴露し、前記重合可能種を重合して非対称な膜を形成する工程であって、前記非対称な膜は前記多孔質基材中に保持される重合物質を有し、前記重合物質は前記第1主表面において、前記第2主表面におけるよりも高い濃度を有する、工程とを含む、方法。
(2)340nm未満のピーク放射波長を有する紫外線源に暴露した後に、前記非対称な膜を洗浄する工程を更に含む、項目(1)に記載の方法。
(3)前記多孔質基材がミクロ孔質である、項目(1)又は(2)に記載の方法。
(4)前記多孔質基材がミクロ孔質の熱誘起相分離膜を含む、項目(1)〜(3)のいずれか一項に記載の方法。
(5)前記多孔質基材が親水性である、項目(1)に記載の方法。
(6)前記多孔質基材が疎水性である、項目(1)に記載の方法。
(7)前記多孔質基材がフィルム、不織布ウェブ、織布ウェブ、繊維、又はこれらの組み合わせを含む、項目(1)に記載の方法。
(8)前記多孔質基材が微粒子を更に含む、項目(7)に記載の方法。
(9)前記繊維が中空繊維である、項目(7)に記載の方法。
(10)前記多孔質基材がポリオレフィン、ポリアミド、フッ素化ポリマー、ポリ(エーテル)スルホン、セルロース誘導体、ポリ(エーテル)イミド、ポリアクリロニトリル、ポリ塩化ビニル、セラミックス、又はこれらの組み合わせを含む、項目(1)に記載の方法。
(11)前記多孔質基材がポリオレフィンを含む、項目(10)に記載の方法。
(12)前記ポリオレフィンがポリエチレン又はポリプロピレンを含む、項目(11)に記載の方法。
(13)前記多孔質基材がポリアミドを含む、項目(10)に記載の方法。
(14)前記ポリアミドがナイロン6,6を含む、項目(13)に記載の方法。
(15)前記適用する工程が、ダイコーティング、ロールコーティング、ディップコーティング、スプレーコーティング、カーテンコーティング、スライドコーティング、又はこれらの組み合わせを含む、項目(1)に記載の方法。
(16)前記重合可能組成物を適用する工程が、前記多孔質基材を浸漬するか、又は満たす工程を含む、項目(1)〜(15)のいずれか一項に記載の方法。
(17)前記重合可能組成物を適用する工程が前記多孔質基材の厚さの一部を、前記第1主表面から少なくとも1マイクロメートルまで浸漬するか、又は満たす工程を含む、項目(1)〜(15)のいずれか一項に記載の方法。
(18)前記重合可能種の少なくとも1つが、アクリレート、(メタ)アクリレート、(メタ)アクリルアミド、スチレン、アリル、ビニルエーテル、又はこれらの組み合わせを含む、項目(1)に記載の方法。
(19)前記重合可能種の少なくとも1つがイオン基を含む、項目(18)に記載の方法。
(20)前記イオン基がスルホン酸、又はスルホン酸塩を含む、項目(19)に記載の方法。
(21)前記イオン基がアミン又は第四級アンモニウム塩を含む、項目(19)に記載の方法。
(22)前記イオン基がカルボン酸又はカルボン酸塩を含む、項目(19)に記載の方法。
(23)前記イオン基がホスホン酸又はホスホン酸塩を含む、項目(19)に記載の方法。
(24)前記イオン基が正電荷を帯びているか、負電荷を帯びているか、又はこれらの組み合わせである、項目(19)に記載の方法。
(25)前記重合可能種の少なくとも1つがイオン基を含む、項目(18)〜(24)のいずれか一項に記載の方法。
(26)非イオン基を含む少なくとも1つの重合可能種を更に含む、項目(25)に記載の方法。
(27)前記重合可能組成物が溶媒を更に含む、項目(1)〜(26)のいずれか一項に記載の方法。
(28)前記コーティングされた多孔質基材の前記暴露が不活性環境を含む、項目(1)〜(27)のいずれか一項に記載の方法。
(29)340nm未満のピーク放射を有する前記紫外線源が狭帯域紫外線源である、項目(1)に記載の方法。
(30)前記紫外線源が複数の単色放射線源を含む、項目(1)に記載の方法。
(31)前記複数の単色放射線源が、エキシマランプ源、低圧水銀ランプ源、発光ダイオード、レーザー源、又はこれらの組み合わせを含む、項目(30)に記載の方法。
(32)前記紫外線源が複数の蛍光放射線源を含む、項目(1)に記載の方法。
(33)前記紫外線源が、単色放射線源、蛍光放射線源、又はこれらの組み合わせを含む、項目(29)〜(32)のいずれか一項に記載の方法。
(34)前記紫外線源が、約140nm〜約320nmの範囲内のピーク放射波長を含む、項目(1)に記載の方法。
(35)前記紫外線源が約200nm〜約300nmの範囲内のピーク放射波長を含む、項目(1)に記載の方法。
(36)前記非対称な膜の前記第1主表面が親水性であり、前記非対称な膜の前記第2主表面が疎水性である、項目(1)に記載の方法。
(37)前記非対称な膜の前記第1主表面が疎水性であり、前記非対称な膜の前記第2主表面が親水性である、項目(1)に記載の方法。
(38)前記コーティングされた多孔質基材を、透明な第1層と第2層との間に位置付けて多層構造を形成し、前記透明な第1層が前記第1主表面に隣接して位置付けられ、前記第2層が前記第2主表面に隣接して位置付けられ、前記透明な第1層が前記紫外線源に最も近く、前記コーティングされた多孔質基材を340nm未満のピーク放射波長を有する前記紫外線源に暴露する工程が、前記多層構造を紫外線に暴露する工程を含む、項目(1)に記載の方法。
(39)前記コーティングされた多孔質基材を340nm未満のピーク放射波長を有する前記紫外線源で処理した後に、前記透明な第1層、及び前記第2層を前記多層構造から取り除く工程を更に含む、項目(38)に記載の方法。
(40)前記重合可能組成物が架橋剤を更に含む、項目(1)に記載の方法。
(41)項目(1)〜(40)のいずれか一項に記載の方法によって形成される非対称な膜。
Claims (6)
- 非対称な膜を形成する方法であって、
第1主表面、間隙性孔、及び第2主表面を有する多孔質基材を提供する工程と、
重合可能組成物を前記多孔質基材の前記第1主表面、前記間隙性孔、及び前記第2主表面に適用し、コーティングされた多孔質基材を提供する工程であって、前記重合可能組成物が、
i)少なくとも1つの重合可能種、及び
ii)少なくとも1つの光開始剤を含み、
光阻害剤を含まない、工程と、
前記コーティングされた多孔質基材を340nm未満のピーク放射波長を有する紫外線源に暴露し、前記重合可能種を重合して非対称な膜を形成する工程であって、前記非対称な膜は前記多孔質基材中に保持される重合物質を有し、前記重合物質は前記第1主表面において、前記第2主表面におけるよりも高い濃度を有する、工程とを含み、
前記コーティングされた多孔質基材を、透明な第1層と第2層との間に位置付けて多層構造を形成する工程であって、前記透明な第1層が前記第1主表面に隣接して位置付けられ、前記第2層が前記第2主表面に隣接して位置付けられ、前記透明な第1層が前記紫外線源に最も近い、工程をさらに含み、前記コーティングされた多孔質基材を340nm未満のピーク放射波長を有する前記紫外線源に暴露する工程が、前記多層構造を紫外線に暴露する工程を含み、並びに前記コーティングされた多孔質基材を340nm未満のピーク放射波長を有する前記紫外線源で処理した後に、前記透明な第1層及び前記第2層を前記多層構造から取り除く工程をさらに含む、方法。 - 340nm未満のピーク放射波長を有する紫外線源に暴露した後に、前記非対称な膜を洗浄する工程を更に含む、請求項1に記載の方法。
- 前記多孔質基材がミクロ孔質の熱誘起相分離膜を含む、請求項1に記載の方法。
- 前記多孔質基材がポリオレフィン、ポリアミド、フッ素化ポリマー、ポリ(エーテル)スルホン、セルロース誘導体、ポリ(エーテル)イミド、ポリアクリロニトリル、ポリ塩化ビニル、セラミックス、又はこれらの組み合わせを含む、請求項1に記載の方法。
- 前記重合可能種の少なくとも1つが、アクリレート、(メタ)アクリレート、(メタ)アクリルアミド、スチレン、アリル、ビニルエーテル、又はこれらの組み合わせを含む、請求項1に記載の方法。
- 前記重合可能種の少なくとも1つが、スルホン酸又はスルホン酸塩、アミン又は第四級アンモニウム塩、カルボン酸又はカルボン酸塩、及びホスホン酸又はホスホン酸塩から選択されるイオン基を含む、請求項5に記載の方法。
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WO2010002501A3 (en) | 2010-02-25 |
US20170341032A1 (en) | 2017-11-30 |
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US20170341031A1 (en) | 2017-11-30 |
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