JP5883064B2 - 再湿潤可能な非対称な膜の形成方法 - Google Patents
再湿潤可能な非対称な膜の形成方法 Download PDFInfo
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- JP5883064B2 JP5883064B2 JP2014095437A JP2014095437A JP5883064B2 JP 5883064 B2 JP5883064 B2 JP 5883064B2 JP 2014095437 A JP2014095437 A JP 2014095437A JP 2014095437 A JP2014095437 A JP 2014095437A JP 5883064 B2 JP5883064 B2 JP 5883064B2
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- porous substrate
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Images
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Description
第1主表面、間隙孔、及び第2主表面を有する多孔質基材を提供する工程と、
重合可能組成物を多孔質基材の第1主表面に適用して、コーティングされた多孔質基材を提供する工程であって、重合可能組成物は、
i)少なくとも1つの重合可能種、
ii)親水性基及び疎水性基を含む少なくとも1つのコポリマー、及び
iii)少なくとも1つの光開始剤を含む、工程と、
重合可能組成物を重合し、再湿潤可能な非対称な膜を提供するために、コーティングされた多孔質基材を紫外線に曝露する工程であって、この膜は、第1主表面から第2主表面まで延びる重合物質の勾配を含み、重合物質によって占められてない間隙孔の部分内でコポリマーを備え、第2主表面は重合物質を実質的に有さない、工程と、を含む
別の態様では、再湿潤可能な非対称な膜が提供される。再湿潤可能な非対称な膜は、多孔質基材内に保持される重合物質、及びコポリマーを有する多孔質基材を含む。再湿潤可能な非対称な膜は、第1主表面から第2主表面に延びる重合物質の勾配を有し、それによってコポリマーが重合物質によって占められていない間隙孔の一部上に集まり、第2主表面は重合物質を実質的に含まない。
水フラックス測定値、及びMgCl2除去率値
調製された再湿潤可能な非対称な膜の水フラックス、及びMgCl2(塩化マグネシウム、塩)除去率値が、41.8cm2の活性表面積を有する撹拌式限外濾過セル(モデル8400;Millipore Corporation(Bedford,Massachusetts))で測定された。膜間圧力は、加圧窒素ガス下で、344.7kPa(50psi(平方インチ当たりのポンド))に設定された。水フラックスは、時間の関数としての膜を透過する水の量、非対称な膜の面積、及び設定圧力に基づいて計算された。MgCl2除去率(脱塩率)は、浸透(Cp)、及び供給量(Cf)(500ppmのMgCl2水溶液)の伝導率から、以下の等式に従って得られた。
伝導率(Cp及びCf)は、伝導率計測器(VWR Digital Conductivity Bench Meter;VWR International(West Chester,Pennsylvania))で測定され、浸透質量は、電子天秤(モデルTE3102S;Sartorius(Edgewood,New York))で測定された。伝導率及び浸透質量のデータは、Winwedge 32コンピューターソフトウェア(TAI Technologies(Philadelphia,Pennsylvania))を使用して、時間の関数として収集された。脱塩率値が停滞した後に減少し始めた後、測定は中止された。脱塩率は、試験の最後の供給濃度によって調整された。
再湿潤可能な対称な膜が、連続的なプロセスによって調製された。米国特許第4,726,989号(Mrozinski)に記載されるポリプロピレン熱誘起相分離(TIPS)膜は、重合可能組成物でダイコーティングされて、コーティングされた多孔質基材を形成した。コーティングされた多孔質基材は、間隔を調節したニップの2つのライナーの間で積層された。2つのライナー(例えば、フィルム)の一方は第1主表面に積層され、他方のライナーは、第2主表面に積層されて、多層構造を形成した。30マイクロメートル(1.18mil)厚さの二軸延伸ポリプロピレンライナー(BOPP)フィルム(3M Company(St.Paul,Minnesota))は、約78.5パーセント(短波長紫外線)及び85.9パーセント(長波長紫外線)の透過率を有した。多層構造の縁部(すなわち、2つのライナーの縁部)は、感圧接着剤テープ(Scotch ATG Tape 926、3M(St.Paul,Minnesota))で封止された。多層構造は、BOPPライナーによって封入され、コーティングされた多孔質基材上の超過の重合可能組成物が最小化された。多層構造は、47”の長い紫外線ウィンドウを有するQuantum Microwave Multi−Lamp UV Curing System(モデル:Quant−23/48R、Quantum Technologies(Irvine,California))で照射された。Quantum UV Systemは、長波長紫外線ランプ(26169−3,UV A 365nm Peak Lamps TL60/10R、Philips(Somerset,New Jersey))、又は短波長紫外線ランプ(23596−0,Germicidal Sterlilamp 254nm Lamps TUV115W、Philips(Somerset,New Jersey))のいずれかを使用した。ライン速度は、機械速度ディスプレイを使用して調節された。多層構造が紫外線トレーによって運搬された際に、紫外線源の強度がPowerMap放射計(EIT UV Power MAPSpectral Response,UV:A,B,C,V,Range:Low,Head S/N 1408,Body S/N 1022(Sterling,Virginia)) によって測定された。重合可能組成物が重合され、多孔質基材内に保持される重合物質を形成した。多層基材がロール上に集められて、ライナーが取り外された。再湿潤可能な非対称な膜が再生された。更なる試験の前に、再湿潤可能な非対称膜が蒸留水で洗浄された。
ポリプロピレンミクロ孔質TIPS膜(泡立ち点孔径=0.8μm、約105〜115μm(マイクロメートル)(4.5ミル)の厚さ)が、重合可能組成物でダイコーティングされた。重合可能組成物は、(3−アクリルアミドプロピル)トリメチルアンモニウムクロライド((APTAC)、水中で75重量%、Sigma Aldrich(St.Louis,Missouri))と、ブチルビニルエーテル((BVE)98%;Alfa Aesar(Avocado,Lancaster,England))と、N,N’−メチレンビスアシルアミド(99%;Alfa Aesar(Ward Hill,Massachusetts))と、1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン(Irgacure2959;Ciba Specialty Chemicals(Tarrytown,New York))とをエタノール/水混合物(70/30(体積:体積比))中に含んだ。APTAC濃度は0.48mol/kg、N,N’−メチレンビスアシルアミド濃度は、APTAC濃度に対して20モル%であり、Irgacure 2959濃度は、APTACの濃度に対して2モル%であった。APTACとBVEのモル比は、55:45であった。前処理は必要ではなかった。コーティングされた多孔質基材を形成するために、重合可能組成物がポリプロピレンTIPS膜に適用された。コーティングされた多孔質基材は、多層構造を形成する前に、及び紫外線源による照射の前に、「再湿潤可能な非対称な膜のプロセス」に記載されるように調製された。多層構造は、連続的なプロセス装置により、約30.5cm/分のライン速度で運搬された。コーティングされた多孔質膜の第1主表面(側面A)は、短波長紫外線源(PowerMap放射計(EIT(Sterling,VA)で測定した際に約6.0mW/cm2の光強度)によって照射された。例1の結果が表2に掲載される。
例1が、イソプロパノール((IPA)、99%;Brenntag(Butler,Wisconsin))中に10分間浸漬され、その後、例2の形成のために風乾された。例2が、水フラックス及び脱塩率を試験するために試験ホルダーに取り付けられた。膜は、試験後に透明でなく、膜が完全に再湿潤していないことを示唆した。例2の結果が表2に掲載される。
例2の膜は、溶媒交換のために水浴に移送し、それによって例3を形成する前に、イソプロパノール(例えば、前処理)に浸漬されて膜を湿潤させた。完全に湿潤した膜としての例3は、水フラックス及び脱塩率を試験された。例3の結果が表2に掲載される。
ポリプロピレン多孔質TIPS膜(泡立ち点孔径=0.72マイクロメートル、約105〜115マイクロメートル(4.3ミル)の厚さ)が、重合可能組成物でダイコーティングされた。重合可能組成物は、(3−アクリルアミドプロピル)トリメチルアンモニウムクロライド((APTAC);エチレンビニルアルコールコポリマー(EVAL 27、約27モル%のエチレン含有量;Sigma Aldrich(St.Louis,Missouri))と、N,N’−メチレンビスアシルアミドと、1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン(Irgacure 2959)とをエタノール/水混合物(70/30(体積:体積比))中に含んだ。APTAC濃度は0.45mol/kg、N,N’−メチレンビスアシルアミド濃度は、APTAC濃度に対して10モル%であり、Irgacure 2959濃度は、APTACの濃度に対して2モル%であった。多孔質基材は、前処理を必要としなかった。重合可能組成物中のEVAL 27の濃度は、2.5重量%であった。コーティングされた多孔質基材を形成するために、重合可能組成物がポリプロピレンTIPS膜に適用された。コーティングされた多孔質基材は、多層構造を形成する前に、及び紫外線源による照射の前に、「再湿潤可能な非対称な膜のプロセス」に記載されるように調製された。多層構造は、連続的なプロセス装置により、約30.5cm/分のライン速度で運搬された。コーティングされた多孔質膜の第1主表面(側面A)が、短波長紫外線源(約6.0mW/cm2の光強度)で照射された。湿潤した膜は、水が定期的に(3回)交換されるようにして、水に少なくとも2時間にわたって浸漬することによって洗浄された。例4は切断され、水フラックス及び脱塩率を試験された。例4の結果が、表3に掲載される。
例5を形成するために、例4の膜が10分間にわたってエタノールに浸漬された。例5は、周囲条件で12時間にわたって風乾された。乾燥後の例5は、白色を有した。乾燥した膜は水に浸漬されて、透明になった。例5が、水フラックス及び脱塩率の測定のために試験ホルダーに取り付けられた。例5の結果が、表3に掲載される。
ポリプロピレン多孔質TIPS膜(泡立ち点孔径=0.72マイクロメートル、約105〜115マイクロメートル(4.3ミル)の厚さ)が、重合可能組成物でダイコーティングされた。重合可能組成物は、(3−アクリルアミドプロピル)トリメチルアンモニウムクロライド((APTAC);エチレンビニルアルコールコポリマー(EVAL 27、約27モル%のエチレン含有量)と、N,N’−メチレンビスアシルアミドと、1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン(Irgacure 2959)とをエタノール/水混合物(60/40体積:体積比)中に含んだ。APTAC濃度は0.45mol/kg、N,N’−メチレンビスアシルアミド濃度は、APTAC濃度に対して10モル%であり、Irgacure 2959濃度は、APTACの濃度に対して2モル%であった。重合可能組成物中のEVAL 27の濃度は、2.5重量%であった。多孔質基材は、前処理を必要としなかった。コーティングされた多孔質基材を形成するために、重合可能組成物がポリプロピレンTIPS膜に適用された。コーティングされた多孔質基材は、多層構造を形成する前に、及び紫外線源による照射の前に、「再湿潤可能な非対称な膜のプロセス」に記載されるように調製された。多層構造は、連続的なプロセス装置により、約30.5cm/分のライン速度で運搬された。コーティングされた多孔質膜の第1主表面(側面A)が、短波長紫外線源(約6.0mW/cm2の光強度)で照射された。湿潤した膜は、水が定期的に(3回)交換されるようにして、水に少なくとも2時間にわたって浸漬することによって洗浄された。例6は切断され、水フラックス及び脱塩率を試験された。例6の結果が、表3に掲載される。
例7を形成するために、例6の膜が10分間にわたってエタノールに浸漬された。例7は、周囲条件で12時間にわたって風乾された。乾燥後の例7は、白色を有した。乾燥した膜は水に浸漬されて、透明になった。例7が、水フラックス及び脱塩率の測定のために試験ホルダーに取り付けられた。例7の結果が、表3に掲載される。
本発明はまた、以下の内容を包含する。
(1)再湿潤可能な非対称な膜の形成方法であって、
第1主表面、間隙孔、及び第2主表面を有する多孔質基材を提供する工程と、
重合可能組成物を前記多孔質基材の前記第1主表面に適用して、コーティングされた多孔質基材を提供する工程であって、前記重合可能組成物は、
iv)少なくとも1つの重合可能種、
v)親水性基及び疎水性基を含む少なくとも1つのコポリマー、及び
vi)少なくとも1つの光開始剤を含む、工程と、
前記重合可能組成物を重合し、前記再湿潤可能な非対称な膜を提供するために、前記コーティングされた多孔質基材を紫外線に曝露する工程であって、前記膜は、前記第1主表面から前記第2主表面まで延びる重合物質の勾配を含み、前記重合物質によって占められてない前記間隙孔の部分内でコポリマーを備え、前記第2主表面は前記重合物質を実質的に有さない、工程と、を含む、再湿潤可能な非対称な膜の形成方法。
(2)前記重合可能組成物が溶媒を更に含む、項目(1)に記載の方法。
(3)前記溶媒の少なくとも一部を前記再湿潤可能な非対称な膜から取り除く工程を更に含む、項目(2)に記載の方法。
(4)前記重合可能な組成物が架橋剤を更に含む、項目(1)に記載の方法。
(5)前記コポリマーを前記重合物質によって占められていない前記間隙孔の前記部分上に沈殿させるために、前記再湿潤可能な非対称な膜を液浴に浸漬する工程を更に含む、項目(1)に記載の方法。
(6)前記多孔質基材がミクロ孔質である、項目(1)〜(5)のいずれか一項に記載の方法。
(7)前記多孔質基材がミクロ孔質の熱誘起相分離膜を含む、項目(1)〜(5)のいずれか一項に記載の方法。
(8)前記多孔質基材がポリオレフィン、ポリアミド、フッ素化ポリマー、ポリ(エーテル)スルホン、セルロース誘導体、ポリ(エーテル)イミド、ポリアクリロニトリル、ポリ塩化ビニル、セラミックス、又はこれらの組み合わせを含む、項目(1)に記載の方法。
(9)前記多孔質基材がポリオレフィンを含む、項目(8)に記載の方法。
(10)前記ポリオレフィンがポリエチレン又はポリプロピレンを含む、項目(9)に記載の方法。
(11)前記多孔質基材がポリアミドを含む、項目(8)に記載の方法。
(12)前記ポリアミドがナイロン6,6を含む、項目(11)に記載の方法。
(13)前記重合可能種の少なくとも1つが、アクリレート、メタクリレート、(メタ)アクリルアミド、スチレン、アリル、ビニルエーテル、又はこれらの組み合わせを含む、項目(1)に記載の方法。
(14)前記重合可能種の少なくとも1つがイオン基を含む、項目(1)に記載の方法。
(15)前記イオン基がスルホン酸又はスルホン酸塩を含む、項目(14)に記載の方法。
(16)前記イオン基がアミン又は四級アンモニウム塩を含む、項目(14)に記載の方法。
(17)前記イオン基がカルボン酸又はカルボン酸塩を含む、項目(14)に記載の方法。
(18)前記イオン基がホスホン酸又はホスホン酸塩を含む、項目(14)に記載の方法。
(19)前記イオン基が正電荷を帯びているか、負電荷を帯びているか、又はこれらの組み合わせである、項目(14)に記載の方法。
(20)前記重合可能種の少なくとも1つがイオン基を含む、項目(14)〜(19)のいずれか一項に記載の方法。
(21)非イオン基を含む少なくとも1つの重合可能種を更に含む、項目(20)に記載の方法。
(22)前記重合可能組成物が架橋剤を更に含む、項目(1)〜(21)のいずれか一項に記載の方法。
(23)前記紫外線源が複数の単色放射線源を含む、項目(1)に記載の方法。
(24)前記複数の単色放射線源が、エキシマランプ源、水銀ランプ源、発光ダイオード、レーザー源、又はこれらの組み合わせを含む、項目(23)に記載の方法。
(25)前記紫外線源が複数の蛍光放射線源を含む、項目(1)に記載の方法。
(26)前記紫外線源が単色放射線源、蛍光放射線源、又はこれらの組み合わせを含む、項目(23)〜(25)のいずれか一項に記載の方法。
(27)前記紫外線源が約340nm未満のピーク放射波長を含む、項目(1)に記載の方法。
(28)前記コーティングされた多孔質基材を、透明な第1層と第2層との間に位置付けて多層構造を形成する工程であって、前記透明な第1層は前記第1主表面に隣接して位置付けられ、前記第2層は前記第2主表面に隣接して位置付けられ、前記透明な第1層は前記紫外線源に最も近い、工程を更に含み、前記コーティングされた多孔質基材を前記紫外線源に曝露する工程が、前記多層構造を前記紫外線に曝露する工程を含む、項目(1)に記載の方法。
(29)前記コーティングされた多孔質基材を、340nm未満のピーク放射波長を有する前記紫外線源で処理した後に、前記透明な第1層及び前記第2層を前記多層構造から取り除く工程を更に含む、項目(28)に記載の方法。
(30)項目(1)〜(29)のいずれか一項に記載の方法によって形成される再湿潤可能な親水性の膜。
(31)多孔質基材内に保持される重合物質及びコポリマーを有する前記多孔質基材を含む再湿潤可能な非対称な膜であって、前記コポリマーが、前記重合物質によって占められていない間隙孔の一部上に集まり、第2主表面が、前記重合物質を実質的に有さないように、前記重合物質は第1主表面において、前記第2主表面におけるよりも高い濃度を有する、再湿潤可能な非対称な膜。
(32)項目(31)に記載の軟水化膜。
Claims (8)
- 再湿潤可能な非対称な膜の形成方法であって、
第1主表面、間隙孔、及び第2主表面を有する多孔質基材を提供する工程と、
重合可能組成物を前記多孔質基材の前記第1主表面に適用して、コーティングされた多孔質基材を提供する工程であって、前記重合可能組成物は、
i)少なくとも1つの重合可能種、
ii)エチレンビニルアルコールコポリマーを含む親水性基及び疎水性基を含む少なくとも1つのコポリマー、
iii)少なくとも1つの光開始剤、及び
iv)溶媒を含む、工程と、
前記重合可能組成物を重合し、前記再湿潤可能な非対称な膜を提供するために、前記コーティングされた多孔質基材の一方の側面を紫外線に曝露する工程と、
前記再湿潤可能な非対称な膜から溶媒の少なくとも一部を蒸発により除去する工程であって、前記膜は、前記第1主表面上に重合物質を含み、前記膜は、前記第1主表面から前記第2主表面まで延びる重合物質の勾配を含み、前記第2主表面は前記重合物質によって占められてない前記間隙孔の部分内でコポリマーを備え、前記第2主表面は前記重合物質を実質的に有さない、工程と、を含む、60ダイン超の表面湿潤エネルギーを示す再湿潤可能な非対称な膜の形成方法。 - 前記コポリマーを前記重合物質によって占められていない前記間隙孔の前記部分上に沈殿させるために、前記再湿潤可能な非対称な膜を液浴に浸漬する工程を更に含む、請求項1に記載の方法。
- 前記多孔質基材がミクロ孔質である、請求項1に記載の方法。
- 前記重合可能種の少なくとも1つが、アクリレート、メタクリレート、(メタ)アクリルアミド、スチレン、アリル、ビニルエーテル、又はこれらの組み合わせを含む、請求項1に記載の方法。
- 前記重合可能種の少なくとも1つが、スルホン酸またはスルホン酸塩、アミンまたは四級アンモニウム塩、カルボン酸またはカルボン酸塩、及びホスホン酸またはホスホン酸塩から選択されるイオン基を含む、請求項1に記載の方法。
- 前記紫外線源が約340nm未満のピーク放射波長を含む、請求項1に記載の方法。
- 前記コーティングされた多孔質基材を、透明な第1層と第2層との間に位置付けて多層構造を形成する工程であって、前記透明な第1層は前記第1主表面に隣接して位置付けられ、前記第2層は前記第2主表面に隣接して位置付けられ、前記透明な第1層は前記紫外線源に最も近い、工程を更に含み、前記コーティングされた多孔質基材を前記紫外線源に曝露する工程が、前記多層構造を前記紫外線に曝露する工程、並びに前記コーティングされた多孔質基材を、340nm未満のピーク放射波長を有する前記紫外線源で処理した後に、前記透明な第1層及び前記第2層を前記多層構造から取り除く工程を含む、請求項1に記載の方法。
- 多孔質基材内に保持される重合物質及びエチレンビニルアルコールを含むコポリマーを有する前記多孔質基材を含む再湿潤可能な非対称な膜であって、前記コポリマーが、前記重合物質によって占められていない間隙孔の一部上に集まり、前記間隙孔が前記重合物質及び前記コポリマーの混合物で部分的に充填され、間隙孔のそれぞれが、前記混合物と前記コポリマーのコーティングとの間の境界面を含み、前記コポリマーは前記境界面から前記第2主表面まで延在する間隙孔上に存在し、第2主表面が、前記重合物質を実質的に有さないように、前記重合物質は前記第1主表面上で重合されており並びに第1主表面において前記第2主表面におけるよりも高い濃度を有し、60ダイン超の表面湿潤エネルギーを示す再湿潤可能な非対称な膜。
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