JP5844847B2 - キャリア基板分離システム及び分離方法 - Google Patents
キャリア基板分離システム及び分離方法 Download PDFInfo
- Publication number
- JP5844847B2 JP5844847B2 JP2014107216A JP2014107216A JP5844847B2 JP 5844847 B2 JP5844847 B2 JP 5844847B2 JP 2014107216 A JP2014107216 A JP 2014107216A JP 2014107216 A JP2014107216 A JP 2014107216A JP 5844847 B2 JP5844847 B2 JP 5844847B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- carrier substrate
- stage
- carrier
- panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims description 979
- 238000000926 separation method Methods 0.000 title claims description 204
- 238000004519 manufacturing process Methods 0.000 claims description 189
- 230000005611 electricity Effects 0.000 claims description 12
- 230000003068 static effect Effects 0.000 claims description 12
- 238000003780 insertion Methods 0.000 claims description 3
- 230000037431 insertion Effects 0.000 claims description 3
- 230000007246 mechanism Effects 0.000 description 115
- 238000000034 method Methods 0.000 description 75
- 238000010438 heat treatment Methods 0.000 description 56
- 230000008569 process Effects 0.000 description 54
- 230000008878 coupling Effects 0.000 description 11
- 238000010168 coupling process Methods 0.000 description 11
- 238000005859 coupling reaction Methods 0.000 description 11
- 238000005530 etching Methods 0.000 description 10
- 238000007789 sealing Methods 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 230000003028 elevating effect Effects 0.000 description 7
- 239000012530 fluid Substances 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
- B32B43/006—Delaminating
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133305—Flexible substrates, e.g. plastics, organic film
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
Description
2 分離装置
3 ギャップ形成装置
4 第2ロボット
5 ステージ
6 第1ロボット
7 ローディング装置
21 第1ステージ
22 第2ステージ
900 製造基板
23 吸着部
24 オーリング
25 移動部
26 第1加熱機構
27 第2加熱機構
28 ギャップ調整部
29 静電気除去部
31 仮分離機構
32 昇降機構
33 測定機構
34 支持部
100 貼り合わせ基板
110 第1パネル基板
120 第2パネル基板
130 中間層
200 キャリア基板
210 第1キャリア基板
220 第2キャリア基板
300 吸入部
Claims (10)
- 第1パネル基板及び第2パネル基板を有する貼り合わせ基板と、前記第1パネル基板に貼り合わせられた第1キャリア基板と、前記第2パネル基板に貼り合わせられた第2キャリア基板とを有する製造基板がローディングされるローディング装置と、
前記第1パネル基板と前記第1キャリア基板との間にギャップを形成するか、または前記第2パネル基板と前記第2キャリア基板との間にギャップを形成するギャップ形成装置と、
前記ギャップ形成装置から移送された前記製造基板から、前記第1キャリア基板または前記第2キャリア基板を分離させる分離装置と、
前記ローディング装置、前記ギャップ形成装置、前記分離装置の間で前記製造基板を移送するためのロボットとを含む、キャリア基板分離システム。 - 前記ローディング装置から移送された前記製造基板、前記第1キャリア基板または前記第2キャリア基板のいずれか一方が分離された前記製造基板、前記第1キャリア基板、前記第2キャリア基板のうち少なくともいずれかが積載されているステージをさらに含み、
前記ロボットは、前記ローディング装置と前記ステージとの間に配置される第1ロボットと、前記ギャップ形成装置と前記分離装置との間に配置される第2ロボットとを含む、請求項1に記載のキャリア基板分離システム。 - 前記ギャップ形成装置は、
前記製造基板を支持する支持部と、
前記製造基板の外郭方向に、前記貼り合わせ基板よりさらに突出している前記第1キャリア基板または前記第2キャリア基板の突出部を、前記貼り合わせ基板から分離させるための分離部とを含む、請求項1に記載のキャリア基板分離システム。 - 前記ギャップ形成装置は、
前記突出部と前記分離部とを整列させるためのアライン部をさらに含む、請求項3に記載のキャリア基板分離システム。 - 前記ギャップ形成装置は、
前記分離部によって、前記第1キャリア基板または前記第2キャリア基板の突出部と前記貼り合わせ基板との間に形成されたギャップに挿入される挿入部をさらに含む、請求項3に記載のキャリア基板分離システム。 - 前記分離装置は、
前記製造基板を支持するための第1ステージと、
前記第1ステージから離隔して設置される第2ステージと、
前記第2ステージに形成された吸着孔に連結されるように前記第2ステージに設置され、前記貼り合わせ基板から前記第1のキャリア基板および前記第2のキャリア基板を分離するために、前記吸着孔を介して前記第1のキャリア基板および前記第2のキャリア基板を吸着する吸着部と、
前記第1ステージに形成された吸入孔に連結されるように前記第1ステージに設置され、前記製造基板を前記第1ステージに密着させるために、前記吸入孔を介して前記製造基板を吸入する吸入部とを含む、請求項1に記載のキャリア基板分離システム。 - 前記第2ステージから前記第1ステージの外郭方向に突出するように前記第2ステージに結合されており、前記第2ステージの外郭に沿って閉ループを形成するオーリングをさらに含む、請求項6に記載のキャリア基板分離システム。
- 前記第1ステージと前記第2ステージとの間に挿入されて、前記第1ステージと前記第2ステージとの間隔を一定に維持させるためのギャップ調整部をさらに含む、請求項6に記載のキャリア基板分離システム。
- 前記第1ステージと前記第2ステージとの間に挿入されて、前記第1キャリア基板又は前記第2キャリア基板が分離された前記貼り合わせ基板に接触して、前記貼り合わせ基板から静電気を除去するための静電気除去部をさらに含む、請求項6に記載のキャリア基板分離システム。
- 第1パネル基板及び第2パネル基板を有する貼り合わせ基板と、前記第1パネル基板に貼り合わせられた第1キャリア基板と、前記第2パネル基板に貼り合わせられた第2キャリア基板とを有する製造基板を、ギャップ形成装置に移送させ、前記第1パネル基板に付着している前記第1キャリア基板と前記第1パネル基板との間に第1ギャップを形成するステップと、
前記第1ギャップが形成されている前記製造基板を分離装置に移送させ、前記第1キャリア基板を前記第1パネル基板から分離させるステップと、
前記第1キャリア基板が分離された前記製造基板を前記ギャップ形成装置に移送させ、前記第2パネル基板に付着している前記第2キャリア基板と前記第2パネル基板との間に第2ギャップを形成するステップと、
前記第2ギャップが形成されている前記製造基板を前記分離装置に移送させ、前記第2キャリア基板を前記第2パネル基板から分離させるステップとを含む、キャリア基板分離方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2013-0058733 | 2013-05-24 | ||
KR1020130058733A KR102082271B1 (ko) | 2013-05-24 | 2013-05-24 | 캐리어기판 분리 시스템 및 분리 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014228871A JP2014228871A (ja) | 2014-12-08 |
JP5844847B2 true JP5844847B2 (ja) | 2016-01-20 |
Family
ID=51964430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014107216A Active JP5844847B2 (ja) | 2013-05-24 | 2014-05-23 | キャリア基板分離システム及び分離方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5844847B2 (ja) |
KR (1) | KR102082271B1 (ja) |
CN (1) | CN104183468B (ja) |
TW (1) | TWI509723B (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102300081B1 (ko) * | 2015-04-27 | 2021-09-08 | 삼성디스플레이 주식회사 | 합착 장치 및 이를 이용한 곡면 표시 장치의 제조 방법 |
CN104900564B (zh) * | 2015-05-12 | 2017-10-17 | 京东方科技集团股份有限公司 | 剥离设备 |
JP6515789B2 (ja) * | 2015-11-17 | 2019-05-22 | 富士通株式会社 | 表示装置の分離方法及び分離装置 |
JP6499109B2 (ja) * | 2016-03-29 | 2019-04-10 | 日本特殊陶業株式会社 | 保持装置の分離方法および製造方法 |
TWI663115B (zh) * | 2016-12-23 | 2019-06-21 | 盟立自動化股份有限公司 | 用於剝離兩基板的裝置及方法 |
JP6765761B2 (ja) * | 2016-12-27 | 2020-10-07 | 株式会社ディスコ | 静電チャック装置及び静電吸着方法 |
KR20180124198A (ko) * | 2017-05-10 | 2018-11-21 | 코닝 인코포레이티드 | 기판 처리 방법들 |
KR102572801B1 (ko) * | 2018-03-20 | 2023-08-29 | 코닝 인코포레이티드 | 디본딩 서포트 장치 및 이를 이용한 디본딩 방법 |
KR102560167B1 (ko) * | 2018-10-04 | 2023-07-25 | 코닝 인코포레이티드 | 디본딩 서포트 장치 및 이를 이용한 디본딩 방법 |
CN112478783B (zh) * | 2020-12-09 | 2022-03-29 | 河北光兴半导体技术有限公司 | 基板玻璃分离机及分离方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10244545A (ja) * | 1997-03-04 | 1998-09-14 | Canon Inc | 離型方法及び離型装置 |
JPH115064A (ja) * | 1997-06-16 | 1999-01-12 | Canon Inc | 試料の分離装置及びその方法並びに基板の製造方法 |
CN1243327A (zh) * | 1998-07-27 | 2000-02-02 | 佳能株式会社 | 样品加工装置和方法 |
KR20000012011A (ko) * | 1998-07-27 | 2000-02-25 | 미다라이 후지오 | 시료처리장치 및 시료처리방법 |
JP4809600B2 (ja) * | 2003-10-28 | 2011-11-09 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
KR100698054B1 (ko) * | 2003-12-02 | 2007-03-23 | 엘지.필립스 엘시디 주식회사 | 액정표시소자의 합착 장치 |
CN101316777B (zh) * | 2006-09-29 | 2012-01-18 | 信越工程株式会社 | 工件移送方法和静电吸盘装置以及基板粘贴方法 |
KR101395821B1 (ko) * | 2006-11-29 | 2014-05-16 | 엘아이지에이디피 주식회사 | 기판 합착기 |
JP4729003B2 (ja) * | 2007-06-08 | 2011-07-20 | リンテック株式会社 | 脆質部材の処理方法 |
KR100902660B1 (ko) * | 2007-11-09 | 2009-06-15 | 주식회사 에이디피엔지니어링 | 입체영상용 디스플레이 패널 합착장치 |
US7846813B2 (en) * | 2008-02-04 | 2010-12-07 | Fairchild Semiconductor Corporation | Method and apparatus for bonded substrates |
US9063605B2 (en) * | 2009-01-09 | 2015-06-23 | Apple Inc. | Thin glass processing using a carrier |
KR101311652B1 (ko) * | 2009-02-06 | 2013-09-25 | 아사히 가라스 가부시키가이샤 | 전자 디바이스의 제조 방법 및 이것에 이용하는 박리 장치 |
US8852391B2 (en) * | 2010-06-21 | 2014-10-07 | Brewer Science Inc. | Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate |
JP5374462B2 (ja) * | 2010-08-23 | 2013-12-25 | 東京エレクトロン株式会社 | 剥離システム、剥離方法、プログラム及びコンピュータ記憶媒体 |
JP2013052998A (ja) * | 2011-09-06 | 2013-03-21 | Asahi Glass Co Ltd | 剥離装置、及び電子デバイスの製造方法 |
JP5422767B1 (ja) * | 2013-05-09 | 2014-02-19 | 信越エンジニアリング株式会社 | 貼り合わせ分離方法及び分離装置 |
-
2013
- 2013-05-24 KR KR1020130058733A patent/KR102082271B1/ko active IP Right Grant
-
2014
- 2014-05-23 TW TW103118180A patent/TWI509723B/zh active
- 2014-05-23 JP JP2014107216A patent/JP5844847B2/ja active Active
- 2014-05-26 CN CN201410225354.6A patent/CN104183468B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
TWI509723B (zh) | 2015-11-21 |
CN104183468B (zh) | 2018-03-16 |
KR20140138452A (ko) | 2014-12-04 |
CN104183468A (zh) | 2014-12-03 |
KR102082271B1 (ko) | 2020-04-16 |
TW201448092A (zh) | 2014-12-16 |
JP2014228871A (ja) | 2014-12-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5844847B2 (ja) | キャリア基板分離システム及び分離方法 | |
TWI507770B (zh) | 顯示裝置的基板接合設備及製造接合基板的方法 | |
TWI585028B (zh) | 剝離裝置及剝離方法 | |
TWI511225B (zh) | Substrate transfer device and substrate assembly line | |
WO2012029110A1 (ja) | 表示パネルの製造方法及びその製造システム | |
KR102028913B1 (ko) | 기판 탈착 장치 및 이를 이용한 평판표시장치의 제조방법 | |
JP2007212572A (ja) | 貼合せ基板の製造方法、及び貼合せ基板製造装置 | |
TWI699582B (zh) | 貼合器件的製造裝置及製造方法 | |
KR101970566B1 (ko) | 디스플레이패널 제조용 캐리어기판 분리장치 및 디스플레이패널 제조방법 | |
KR101689057B1 (ko) | 합착 장치 및 이를 이용한 합착 방법 | |
KR101394312B1 (ko) | 웨이퍼 정렬장치 | |
JP6049820B1 (ja) | 貼合デバイスの製造装置及び製造方法 | |
KR102033349B1 (ko) | 커버기판 제조방법, 캐리어기판 분리장치 및 디스플레이패널 제조방법 | |
KR101404057B1 (ko) | 기판 합착 장치용 라미네이팅 장치 및 방법, 및 이를 구비한 기판 합착 장치 및 방법 | |
JPH09283392A (ja) | 基板の重ね合わせ方法及び装置 | |
JP5877264B1 (ja) | 貼合デバイスの製造装置及び製造方法 | |
JP2013254056A (ja) | 表示基板貼り合わせ装置、表示基板貼り合わせ方法および表示基板の製造方法 | |
JP6788322B2 (ja) | 基板組立装置とそのテーブル構造 | |
JPH09316399A (ja) | 基板貼合せ装置及び基板貼合せ方法 | |
KR101372974B1 (ko) | 기판의 합착 방법 및 장치 | |
KR101380371B1 (ko) | 기판 경화시스템 및 경화방법 | |
KR101540054B1 (ko) | 기판합착장치 및 기판합착방법 | |
JP2003137616A (ja) | 基板の貼り合わせ方法 | |
KR101730578B1 (ko) | 임프린팅 장치 및 임프린팅 방법 | |
KR20150031106A (ko) | 디스플레이 패널의 합착 장치 및 합착 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150526 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20150826 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150903 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20151104 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20151119 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5844847 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R157 | Certificate of patent or utility model (correction) |
Free format text: JAPANESE INTERMEDIATE CODE: R157 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |