JP5841596B2 - 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 - Google Patents
非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 Download PDFInfo
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
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- C—CHEMISTRY; METALLURGY
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/046—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not
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Description
イオンのエネルギー分布が非常に広くなる。また、プラズマCVD法を用いることにより、光反応や加熱では得ることが困難な5eV〜9eVという高い励起エネルギーを比較的容易に得ることができる。これにより、プラズマCVD法によれば、多種多様な励起種を生成することが可能となる。本発明の一態様に係るa−C:H:Si:N膜は、例えば、プラズマCVD法において、上述した原料ガスに窒素を含むガスを混合することにより形成される。
付与された極性)と強固に結合することができる。元素Mを含むフッ素系カップリング剤にはフッ素含有シランカップリング剤以外に,例えば、チタネート系、アルミネート系、ジルコネート系のフッ素含有カップリング剤が含まれる。
後では、各測定点において、110°程度の高い接触角を示している。したがって、5分間程度の短時間の超音波洗浄(疲労)であれは、フッ素シランカップリング剤層の固定能力は十分発現されている。図4(B)は、超音波洗浄(疲労)を2時間行った後の参考例の水の接触角の測定結果を示す。図4(B)に示すように、水との接触角は全測定点において90°付近まで低下している。よって、超音波のエネルギーによって、フッ素系シランカップリング剤層が失われたと推測される。このように、参考例の試料においては、フッ素系シランカップリング剤層を長期間にわたって保持できないことが確認できた。したがって、フッ素系シランカップリング剤層を長期間にわたって保持することが求められる用途、例えば、金型表面処理や部品搬送用フィーダーの表面処理等には、参考例の試料を用いることは難しい。
Claims (8)
- 基体を準備する工程と、前記基体に直接または間接に、少なくともその表面にケイ素及び窒素を含有する非晶質炭素膜層を設ける工程と、前記非晶質炭素膜層と極性による水素結合及び/又は前記非晶質炭素膜層の官能基との縮合反応による−O−M結合(ここで、Mは、Si、Ti、Al、及びZrから成る群より選択されるいずれかの元素。)を形成可能なカップリング剤を介して,前記非晶質炭素膜層に撥水撥油層を設ける工程と、を備える方法。
- 前記カップリング剤がシランカップリング剤である、請求項1に記載の方法。
- 前記非晶質炭素膜層に、窒素によるプラズマ処理を行う工程をさらに備える、請求項1又は請求項2に記載の方法。
- 基体を準備する工程と、前記基体に直接または間接に、少なくともその表面にケイ素及び窒素を含有する非晶質炭素膜層を設ける工程と、前記非晶質炭素膜層に、前記非晶質炭素膜層と極性による水素結合及び/又は前記非晶質炭素膜層の官能基との縮合反応による−O−M結合(ここで、Mは、Si、Ti、Al、及びZrから成る群より選択されるいずれかの元素。)を形成可能なフッ素系カップリング剤からなる撥水撥油層を設ける工程と、を備える方法。
- 前記フッ素系カップリング剤がフッ素含有シランカップリング剤である、請求項4に記載の方法。
- 前記非晶質炭素膜層に、窒素によるプラズマ処理を行う工程をさらに備える、請求項4又は請求項5に記載の方法。
- 前記非晶質炭素膜層が、二層以上の層からなり、その最上層の少なくとも表面にケイ素及び窒素を含有させたことを特徴とする請求項1から請求項4のいずれか1項に記載の方法。
- 基体と、該基体の少なくとも一面側に直接または間接に設けられ、ケイ素及び窒素を含有する非晶質炭素膜層と、 前記非晶質炭素膜層に設けられ、前記非晶質炭素膜層と極性による水素結合及び/又は前記非晶質炭素膜層の官能基との縮合反応による−O−M結合(ここで、Mは、Si、Ti、Al、及びZrから成る群より選択されるいずれかの元素。)を形成可能なフッ素系カップリング剤から成る撥水撥油層と、を備え、
前記該非晶質炭素膜層が、二層以上の層からなり、少なくともその最上層の少なくとも表面にケイ素及び窒素を含有させた積層体。
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JP2013519511A JP5841596B2 (ja) | 2011-06-06 | 2012-06-06 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
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JP2011126042 | 2011-06-06 | ||
JP2013519511A JP5841596B2 (ja) | 2011-06-06 | 2012-06-06 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
PCT/JP2012/064578 WO2012169540A1 (ja) | 2011-06-06 | 2012-06-06 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
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JP5841596B2 true JP5841596B2 (ja) | 2016-01-13 |
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JP (1) | JP5841596B2 (ja) |
KR (1) | KR101468666B1 (ja) |
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WO2014011251A2 (en) * | 2012-03-26 | 2014-01-16 | Silcotek Corp. | Coated article and chemical vapor deposition process |
WO2016035765A1 (ja) * | 2014-09-03 | 2016-03-10 | ダイキン工業株式会社 | 防汚性物品 |
JPWO2016056466A1 (ja) * | 2014-10-05 | 2017-07-20 | 太陽誘電ケミカルテクノロジー株式会社 | 抗菌積層構造体及びその製造方法 |
WO2016132562A1 (ja) * | 2015-02-18 | 2016-08-25 | 株式会社ユーテック | 撥水性高硬度膜、金型及び撥水性高硬度膜の製造方法 |
JP6441973B2 (ja) * | 2017-01-24 | 2018-12-19 | 星和電機株式会社 | 基体保護膜及び付着防止部材 |
JP6956850B2 (ja) * | 2018-03-16 | 2021-11-02 | 日鉄ステンレス株式会社 | クリヤ塗装ステンレス鋼板 |
US11157717B2 (en) * | 2018-07-10 | 2021-10-26 | Next Biometrics Group Asa | Thermally conductive and protective coating for electronic device |
JP6595062B2 (ja) * | 2018-09-04 | 2019-10-23 | 太陽誘電株式会社 | 構造体及び構造体の製造方法 |
CN109994371B (zh) * | 2019-03-26 | 2021-10-15 | 上海华力集成电路制造有限公司 | 一种改善氮掺杂碳化物堆叠后的清洁产生水痕的方法 |
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JPH06215367A (ja) | 1993-01-18 | 1994-08-05 | Matsushita Electric Ind Co Ltd | 磁気記録媒体の製造方法 |
KR0134942B1 (ko) * | 1993-06-11 | 1998-06-15 | 이다가끼 유끼오 | 비정질 경질 탄소막 및 그 제조 방법 |
JP2889116B2 (ja) | 1993-06-11 | 1999-05-10 | 株式会社ゼクセル | 非晶質硬質炭素膜及びその製造方法 |
JPH09265616A (ja) * | 1996-03-26 | 1997-10-07 | Citizen Watch Co Ltd | 磁気ヘッドおよびその製造方法 |
JP4246827B2 (ja) | 1998-12-15 | 2009-04-02 | Tdk株式会社 | ダイヤモンド状炭素膜を被覆した部材 |
JP2001266328A (ja) | 2000-01-13 | 2001-09-28 | Fuji Electric Co Ltd | 磁気記録媒体、およびその保護膜の濡れ性を改良する方法 |
JP2001195729A (ja) * | 2000-01-17 | 2001-07-19 | Fujitsu Ltd | 記録媒体の製造方法及び記録媒体 |
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JP4387765B2 (ja) * | 2003-11-12 | 2009-12-24 | 独立行政法人産業技術総合研究所 | ダイアモンド様被覆物の表面処理剤 |
US20100247917A1 (en) | 2007-11-07 | 2010-09-30 | Yuki Nitta | Carbon thin film and method of forming the same |
FR2934608B1 (fr) | 2008-08-01 | 2010-09-17 | Commissariat Energie Atomique | Revetement a couche mince supraglissante, son procede d'obtention et un dispositif comprenant un tel revetement. |
JP2010067637A (ja) | 2008-09-08 | 2010-03-25 | Toyota Industries Corp | 放熱部材並びにそれを用いた半導体装置及びそれらの製造方法 |
JP5467452B2 (ja) * | 2009-03-04 | 2014-04-09 | 学校法人東京電機大学 | 非晶質状炭素膜の表面改質方法 |
JP5628893B2 (ja) | 2010-03-03 | 2014-11-19 | 太陽化学工業株式会社 | 非晶質炭素膜からなる層への固定化方法及び積層体 |
JP5750293B2 (ja) * | 2010-04-09 | 2015-07-15 | 太陽化学工業株式会社 | 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 |
US9186879B2 (en) | 2010-05-28 | 2015-11-17 | Taiyo Yuden Chemical Technology Co., Ltd. | Screen-printing stencil having amorphous carbon films and manufacturing method therefor |
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US9238350B2 (en) | 2016-01-19 |
TW201302323A (zh) | 2013-01-16 |
CN103635313B (zh) | 2016-06-08 |
TWI511801B (zh) | 2015-12-11 |
WO2012169540A1 (ja) | 2012-12-13 |
US20140120350A1 (en) | 2014-05-01 |
KR101468666B1 (ko) | 2014-12-04 |
KR20130140876A (ko) | 2013-12-24 |
CN103635313A (zh) | 2014-03-12 |
JPWO2012169540A1 (ja) | 2015-02-23 |
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