JP5795747B2 - ペリクルフレーム及びペリクル - Google Patents

ペリクルフレーム及びペリクル Download PDF

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Publication number
JP5795747B2
JP5795747B2 JP2012085314A JP2012085314A JP5795747B2 JP 5795747 B2 JP5795747 B2 JP 5795747B2 JP 2012085314 A JP2012085314 A JP 2012085314A JP 2012085314 A JP2012085314 A JP 2012085314A JP 5795747 B2 JP5795747 B2 JP 5795747B2
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JP
Japan
Prior art keywords
pellicle frame
pellicle
resin
frame according
resin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012085314A
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English (en)
Japanese (ja)
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JP2013214013A (ja
Inventor
一敏 関原
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2012085314A priority Critical patent/JP5795747B2/ja
Priority to KR1020130005759A priority patent/KR102044230B1/ko
Priority to TW102111908A priority patent/TWI460533B/zh
Priority to CN2013101141962A priority patent/CN103365074A/zh
Publication of JP2013214013A publication Critical patent/JP2013214013A/ja
Application granted granted Critical
Publication of JP5795747B2 publication Critical patent/JP5795747B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Containers Having Bodies Formed In One Piece (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
  • Laminated Bodies (AREA)
JP2012085314A 2012-04-04 2012-04-04 ペリクルフレーム及びペリクル Active JP5795747B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012085314A JP5795747B2 (ja) 2012-04-04 2012-04-04 ペリクルフレーム及びペリクル
KR1020130005759A KR102044230B1 (ko) 2012-04-04 2013-01-18 펠리클 프레임 및 펠리클
TW102111908A TWI460533B (zh) 2012-04-04 2013-04-02 防塵薄膜組件框架及防塵薄膜組件
CN2013101141962A CN103365074A (zh) 2012-04-04 2013-04-03 防尘薄膜组件框架及防尘薄膜组件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012085314A JP5795747B2 (ja) 2012-04-04 2012-04-04 ペリクルフレーム及びペリクル

Publications (2)

Publication Number Publication Date
JP2013214013A JP2013214013A (ja) 2013-10-17
JP5795747B2 true JP5795747B2 (ja) 2015-10-14

Family

ID=49366735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012085314A Active JP5795747B2 (ja) 2012-04-04 2012-04-04 ペリクルフレーム及びペリクル

Country Status (4)

Country Link
JP (1) JP5795747B2 (ko)
KR (1) KR102044230B1 (ko)
CN (1) CN103365074A (ko)
TW (1) TWI460533B (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101552940B1 (ko) 2013-12-17 2015-09-14 삼성전자주식회사 흑연-함유 박막을 포함하는 극자외선 리소그래피용 펠리클 막
JP6373079B2 (ja) * 2014-06-13 2018-08-15 日本電産サンキョー株式会社 センサ装置およびエンコーダ
CN104139911B (zh) * 2014-07-28 2016-05-11 马宁 一种流量可控式储物槽
KR101920172B1 (ko) * 2015-02-24 2018-11-19 미쯔이가가꾸가부시끼가이샤 펠리클막, 펠리클 프레임체, 펠리클 및 그 제조 방법
JP6461659B2 (ja) * 2015-03-19 2019-01-30 旭化成株式会社 ペリクル枠体及びペリクル
JP6509603B2 (ja) * 2015-03-20 2019-05-08 日本特殊陶業株式会社 ペリクル枠の製造方法
TWI588597B (zh) * 2015-10-26 2017-06-21 Micro Lithography Inc A method and structure for extending the lifetime of a photomask
CN106028229B (zh) * 2016-07-28 2021-06-22 广东方振新材料精密组件有限公司 一种听筒薄膜的制备方法
JP7357432B2 (ja) * 2017-10-10 2023-10-06 信越化学工業株式会社 Ｅｕｖ用ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、及び半導体の製造方法
CN108378123A (zh) * 2018-03-20 2018-08-10 魔水科技（北京）有限公司 一种分体式小型隔离杀菌箱

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6335100B1 (en) * 1985-05-31 2002-01-01 Sumitomo Rubber Industries, Ltd. Structural material and process for its production
JPH0687903B2 (ja) * 1989-12-05 1994-11-09 住友ゴム工業株式会社 テニスラケットフレーム
JP2515222B2 (ja) * 1993-03-03 1996-07-10 美津濃株式会社 ラケットフレ―ム
JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル
JPH0885728A (ja) * 1994-07-20 1996-04-02 Mitsui Petrochem Ind Ltd 含フッ素樹脂薄膜の製造方法
JP3493090B2 (ja) * 1995-12-15 2004-02-03 信越化学工業株式会社 ペリクル
TW337002B (en) * 1996-11-19 1998-07-21 Mitsui Kagaku Kk Pellicle
JP2002318451A (ja) 2001-04-24 2002-10-31 Asahi Kasei Electronics Co Ltd ペリクル用枠体及びその製造方法
US20060139772A1 (en) * 2004-12-27 2006-06-29 Canon Kabushiki Kaisha Method of fixing optical member and optical unit
JP4324944B2 (ja) * 2005-06-29 2009-09-02 信越ポリマー株式会社 精密部材収納容器
KR101264571B1 (ko) * 2007-07-06 2013-05-14 아사히 가세이 이-매터리얼즈 가부시키가이샤 대형 펠리클 프레임체 및 그 프레임체의 파지 방법
JP2009025562A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd ペリクルフレーム
JP2009139879A (ja) * 2007-12-11 2009-06-25 Toppan Printing Co Ltd ペリクル
US7975871B2 (en) * 2008-04-04 2011-07-12 Graphic Packaging International, Inc. Container with injection-molded feature and tool for forming container
JP5134436B2 (ja) * 2008-05-27 2013-01-30 信越化学工業株式会社 リソグラフィ用ペリクル
JP5133229B2 (ja) * 2008-12-05 2013-01-30 信越ポリマー株式会社 ペリクル収納容器
JP5341997B2 (ja) * 2009-07-16 2013-11-13 三井化学株式会社 ペリクルフレームおよびそれを含むペリクル

Also Published As

Publication number Publication date
CN103365074A (zh) 2013-10-23
JP2013214013A (ja) 2013-10-17
TW201403216A (zh) 2014-01-16
KR20130112737A (ko) 2013-10-14
TWI460533B (zh) 2014-11-11
KR102044230B1 (ko) 2019-11-13

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