JP5778141B2 - 基板上に材料を印刷するための方法 - Google Patents

基板上に材料を印刷するための方法 Download PDF

Info

Publication number
JP5778141B2
JP5778141B2 JP2012517906A JP2012517906A JP5778141B2 JP 5778141 B2 JP5778141 B2 JP 5778141B2 JP 2012517906 A JP2012517906 A JP 2012517906A JP 2012517906 A JP2012517906 A JP 2012517906A JP 5778141 B2 JP5778141 B2 JP 5778141B2
Authority
JP
Japan
Prior art keywords
layer
mask
printing
photopolymerizable
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012517906A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012532343A5 (enExample
JP2012532343A (ja
Inventor
リー ルドルフ マイケル
リー ルドルフ マイケル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2012532343A publication Critical patent/JP2012532343A/ja
Publication of JP2012532343A5 publication Critical patent/JP2012532343A5/ja
Application granted granted Critical
Publication of JP5778141B2 publication Critical patent/JP5778141B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T403/00—Joints and connections
    • Y10T403/57—Distinct end coupler
    • Y10T403/5741—Separate screw or pin-type connections

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Methods (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP2012517906A 2009-07-02 2010-07-01 基板上に材料を印刷するための方法 Expired - Fee Related JP5778141B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22266909P 2009-07-02 2009-07-02
US61/222,669 2009-07-02
PCT/US2010/040723 WO2011002967A1 (en) 2009-07-02 2010-07-01 Method for printing a material onto a substrate

Publications (3)

Publication Number Publication Date
JP2012532343A JP2012532343A (ja) 2012-12-13
JP2012532343A5 JP2012532343A5 (enExample) 2013-06-27
JP5778141B2 true JP5778141B2 (ja) 2015-09-16

Family

ID=42697258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012517906A Expired - Fee Related JP5778141B2 (ja) 2009-07-02 2010-07-01 基板上に材料を印刷するための方法

Country Status (4)

Country Link
US (1) US8899148B2 (enExample)
EP (1) EP2448764B1 (enExample)
JP (1) JP5778141B2 (enExample)
WO (1) WO2011002967A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
US8652761B2 (en) * 2011-02-18 2014-02-18 David A. Recchia Photosensitive resin laminate and thermal processing of the same
WO2013032860A1 (en) * 2011-08-26 2013-03-07 E. I. Du Pont De Nemours And Company Method for preparing a relief printing form
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US9711744B2 (en) * 2012-12-21 2017-07-18 3M Innovative Properties Company Patterned structured transfer tape
JP6592246B2 (ja) * 2015-01-27 2019-10-16 株式会社コムラテック 電子回路基板およびその製造方法
CN104536210B (zh) * 2015-02-03 2017-09-29 京东方科技集团股份有限公司 一种配向膜印刷板的制备方法
US9678429B2 (en) 2015-08-18 2017-06-13 Macdermid Printing Solutions, Llc Method of creating hybrid printing dots in a flexographic printing plate
JP6278942B2 (ja) * 2015-10-21 2018-02-14 日本航空電子工業株式会社 フレキソ印刷による絶縁膜の形成方法
BR112018067374B1 (pt) 2016-02-26 2023-05-02 Trio Labs, Inc Sistema para fabricação de compósito em pó e método para fabricação de um compósito em pó

Family Cites Families (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB574244A (en) 1958-07-25 1945-12-28 Sparklets Ltd Improvements in or relating to means for producing a spray of atomised liquid
NL101499C (enExample) 1951-08-20
BE552701A (enExample) 1955-12-23
NL287134A (enExample) 1959-08-05
BE611541A (enExample) 1961-01-13
US3264103A (en) 1962-06-27 1966-08-02 Du Pont Photopolymerizable relief printing plates developed by dry thermal transfer
US4323636A (en) 1971-04-01 1982-04-06 E. I. Du Pont De Nemours And Company Photosensitive block copolymer composition and elements
CA1099435A (en) 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US3796602A (en) 1972-02-07 1974-03-12 Du Pont Process for stripping polymer masks from circuit boards
US4045231A (en) 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
JPS538655A (en) 1976-07-13 1978-01-26 Teijin Ltd Method of removing nonnset resin
US4177074A (en) 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
JPS55135838A (en) 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
DE3137416A1 (de) 1981-09-19 1983-03-31 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
US4431723A (en) 1981-09-21 1984-02-14 E. I. Du Pont De Nemours And Company Aqueous processible, alcohol resistant flexographic printing plates
JPS5863939A (ja) * 1981-10-13 1983-04-16 Asahi Chem Ind Co Ltd 印刷原版及びその製造方法
US4460675A (en) 1982-01-21 1984-07-17 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4427759A (en) 1982-01-21 1984-01-24 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4517279A (en) 1982-08-31 1985-05-14 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems
US4540649A (en) 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same
US4753865A (en) 1986-01-22 1988-06-28 E. I. Du Pont De Nemours And Company Photosensitive compositions containing microgels
US4726877A (en) 1986-01-22 1988-02-23 E. I. Du Pont De Nemours And Company Methods of using photosensitive compositions containing microgels
GB8700599D0 (en) 1987-01-12 1987-02-18 Vickers Plc Printing plate precursors
US4806506A (en) 1987-09-14 1989-02-21 E. I. Du Pont De Nemours And Company Process for detackifying photopolymer flexographic printing plates
US4894315A (en) 1988-08-30 1990-01-16 E. I. Du Pont De Nemours And Company Process for making flexographic printing plates with increased flexibility
US4956252A (en) 1988-08-30 1990-09-11 E. I. Dupont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
NL8900784A (nl) 1989-03-30 1990-10-16 Grafische Handelsonderneming G Belichtingsinrichting voor het kopieren van beeldoriginelen.
JPH03239263A (ja) * 1990-02-16 1991-10-24 Fujitsu Ltd 光硬化性樹脂組成物
JPH0427113A (ja) 1990-04-23 1992-01-30 Tadahiro Omi レジスト処理装置、レジスト処理方法及びレジストパターン
EP0460919A3 (en) 1990-06-05 1993-04-28 Nippon Paint Co., Ltd. Process for exposing a photosensitive resin composition to light
US5215859A (en) 1990-07-26 1993-06-01 Minnesota Mining And Manufacturing Company Backside ionizing irradiation in a flexographic printing plate process
US5175072A (en) 1990-07-26 1992-12-29 Minnesota Mining And Manufacturing Company Flexographic printing plate process
US5015556A (en) 1990-07-26 1991-05-14 Minnesota Mining And Manufacturing Company Flexographic printing plate process
EP0469735B1 (en) 1990-07-31 1998-06-10 Minnesota Mining And Manufacturing Company Device for forming flexographic printing plate
DE69128274T2 (de) 1990-11-05 1998-04-23 Ciba Geigy Ag Photopolymerisierbare Zusammensetzungen
SE502087C2 (sv) 1991-05-28 1995-08-07 Misomex Ab Förfarande och anordning för laserkopiering med höj- och sänkbar laserenhet
DE4133290A1 (de) 1991-10-08 1993-04-15 Herberts Gmbh Verfahren zur herstellung von mehrschichtlackierungen unter verwendung von radikalisch und/oder kationisch polymerisierbaren klarlacken
JP3150746B2 (ja) 1992-03-06 2001-03-26 大阪酸素工業株式会社 立体構造物の表面に樹脂被膜を形成するための装置
US5719009A (en) 1992-08-07 1998-02-17 E. I. Du Pont De Nemours And Company Laser ablatable photosensitive elements utilized to make flexographic printing plates
US5607814A (en) 1992-08-07 1997-03-04 E. I. Du Pont De Nemours And Company Process and element for making a relief image using an IR sensitive layer
US5262275A (en) 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
JPH06214377A (ja) * 1993-01-19 1994-08-05 Toshiba Corp Ａｐｒ印刷版
US5679485A (en) 1993-03-31 1997-10-21 Nippon Zeon Co., Ltd. Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same
US5301610A (en) 1993-04-30 1994-04-12 E. I. Du Pont De Nemours And Company Method and apparatus for making spiral wound sleeves for printing cylinders and product thereof
US6210854B1 (en) 1993-08-27 2001-04-03 E. I. Du Pont De Nemours And Company Aqueous developable flexographic printing plate
JP3044689B2 (ja) 1994-10-14 2000-05-22 日本ゼオン株式会社 感光性エラストマー組成物及び感光性ゴム版
DE69512007T2 (de) 1994-12-13 2000-01-27 Macdermid Imaging Technology Inc., Waterbury Weichreliefsphotopolymerdruckplatten für Flexographie
US5863704A (en) 1995-04-26 1999-01-26 Nippon Zeon Company, Ltd. Photosensitive composition and photosensitive rubber plate
US5506086A (en) 1995-05-01 1996-04-09 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate
US6238837B1 (en) 1995-05-01 2001-05-29 E.I. Du Pont De Nemours And Company Flexographic element having an infrared ablatable layer
US5654125A (en) 1995-05-01 1997-08-05 E. I. Du Pont De Nemours And Company Laser apparatus and process of use
EP0830217B1 (de) 1995-05-04 1999-11-24 NÖLLE GmbH Vorrichtung zum härten einer schicht auf einem substrat
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
DE19536805A1 (de) 1995-10-02 1997-04-03 Basf Lacke & Farben Zur Herstellung von Flexodruckplatten durch digitale Informationsübertragung geeignetes mehrschichtiges Aufzeichnungselement
US5766819A (en) 1995-11-29 1998-06-16 E. I. Dupont De Nemours And Company Donor elements, assemblages, and associated processes with flexible ejection layer(s) for laser-induced thermal transfer
US5888697A (en) 1996-07-03 1999-03-30 E. I. Du Pont De Nemours And Company Flexographic printing element having a powder layer
US5771809A (en) 1996-10-18 1998-06-30 Hecht; Myer H. Method of making a coating plate with raised printing areas
US6143451A (en) 1996-11-26 2000-11-07 E. I. Du Pont De Nemours And Company Imaged laserable assemblages and associated processes with high speed and durable image-transfer characteristics for laser-induced thermal transfer
US6217965B1 (en) 1997-05-23 2001-04-17 Creo Srl Flexographic varnishing plates
US5840463A (en) 1997-07-14 1998-11-24 E. I. Du Pont De Nemours And Company Photosensitive donor element assemblages and associated process for laser-induced thermal transfer
EP0908778B1 (en) 1997-09-16 2002-11-27 Asahi Kasei Kabushiki Kaisha Photosensitive element for flexographic printing
EP0945753B1 (en) 1998-03-25 2003-03-05 Noritsu Koki Co., Ltd. Photographic processing apparatus
DE19909152C2 (de) 1999-03-02 2001-06-07 Du Pont Deutschland Photopolymerisierbares Aufzeichnungselement und Verfahren zur Herstellung von flexographischen Druckformen
US6797454B1 (en) 1999-09-07 2004-09-28 E. I. Du Pont De Nemours And Company Method and apparatus for thermal processing a photosensitive element
DE19957900A1 (de) 1999-12-01 2001-06-07 Basf Ag Lichthärtung von strahlungshärtbaren Massen unter Schutzgas
EP1160627A3 (en) 2000-06-01 2004-08-18 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
DE10061116A1 (de) 2000-12-07 2002-06-13 Basf Drucksysteme Gmbh Fotoempfindliches flexographisches Druckelement mit mindestens zwei IR-ablativen Schichten
US6773859B2 (en) 2001-03-06 2004-08-10 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate and a photosensitive element for use in the process
US7348123B2 (en) 2001-04-18 2008-03-25 E.I. Du Pont De Nemours And Company Process for preparing a flexographic printing plate
US6766740B1 (en) 2002-02-21 2004-07-27 Precision Rubber Plate Co., Inc. Apparatus and method using a UV light collimator to expose a photopolymer plate
CA2477779A1 (en) 2002-03-14 2003-09-25 E.I. Du Pont De Nemours And Company Photosensitive element for use as flexographic printing plate
DE10241851A1 (de) 2002-09-09 2004-03-18 Basf Drucksysteme Gmbh Verfahren zur Herstellung von Flexodruckformen durch thermische Entwicklung
JP4080839B2 (ja) 2002-10-21 2008-04-23 シャープ株式会社 フレキソ印刷版の製造方法および印刷物の製造方法
MXPA05008777A (es) 2003-02-19 2005-10-18 Asahi Kasei Chemicals Corp Proceso para producir placa de impresion revelable con agua para el uso en implesion en relieve.
US20040234886A1 (en) 2003-03-12 2004-11-25 Rudolph Michael Lee Photosensitive element for use as flexographic printing plate
JP2005017352A (ja) 2003-06-23 2005-01-20 Fuji Photo Film Co Ltd フレキソ印刷版の製版方法
DE112004001662B4 (de) 2003-09-12 2013-08-08 Eastman Kodak Co. (N.D.Ges.D. Staates New Jersey) Verfahren zur Erzeugung einer Reliefdruckplatte
JP2005283778A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 印刷版の作製方法および印刷版露光装置
JP2005283961A (ja) 2004-03-30 2005-10-13 Fuji Photo Film Co Ltd 印刷版露光装置
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
US7632625B2 (en) 2004-05-25 2009-12-15 Roberts David H Method of pre-exposing relief image printing plate
CN101018819B (zh) 2004-09-13 2011-12-07 旭化成电子材料株式会社 制备光敏树脂的固化产物的方法
US7401552B2 (en) 2004-09-16 2008-07-22 Agfa Graphics N.V. Method for manufacturing a flexographic printing master
US7081331B2 (en) 2004-11-12 2006-07-25 Ryan Vest Method for thermally processing photosensitive printing sleeves
WO2008034810A2 (en) 2006-09-18 2008-03-27 Agfa Graphics Nv A device and a process for coating a peripheral surface of a sleeve body
JP2009034913A (ja) * 2007-08-02 2009-02-19 Nakan Corp フレキソ印刷版およびその製造方法、薄膜および液晶表示素子の製造方法
US7767383B2 (en) * 2007-08-08 2010-08-03 Roberts David H Method of pre-exposing relief image printing plate
JP5128210B2 (ja) * 2007-09-03 2013-01-23 イーストマン コダック カンパニー 凸版印刷版の製造方法
ES2578680T3 (es) 2007-09-07 2016-07-29 Precision Rubber Plate Co., Inc Sistema y método para exponer un placa de polímero digital
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
US20090245613A1 (en) * 2008-03-31 2009-10-01 Wu Judy Wailing Method And System For Producing Digital Electronic Document Security Graphics Files

Also Published As

Publication number Publication date
WO2011002967A1 (en) 2011-01-06
EP2448764B1 (en) 2016-03-02
EP2448764A1 (en) 2012-05-09
JP2012532343A (ja) 2012-12-13
US20120060711A1 (en) 2012-03-15
US8899148B2 (en) 2014-12-02

Similar Documents

Publication Publication Date Title
JP5778141B2 (ja) 基板上に材料を印刷するための方法
US8236479B2 (en) Method for printing a pattern on a substrate
JP6901410B2 (ja) 印刷版原版、原版の製造方法、及び原版からの印刷版の作製方法
US9223218B2 (en) Photosensitive resin laminate and thermal processing of the same
US8241835B2 (en) Device and method for preparing relief printing form
US9477152B2 (en) Printing form precursor having indicia and a method for preparing a printing form from the precursor
JP6028057B2 (ja) 感光性樹脂積層体及びその熱加工
IL224158A (en) A method for producing flexographic printing plates that uses ultrasonic radiation from light-emitting diodes
JP6219954B2 (ja) 凸版印刷版の製造方法
JP6133866B2 (ja) 凸版印刷フォームの調製方法
JP5623018B2 (ja) 凸版印刷フォームを作製するための装置および方法
US9713919B2 (en) Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
CN117795421A (zh) 印刷版前体及其印刷版

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130510

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130510

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140416

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140422

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140722

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140729

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140822

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140829

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140918

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140926

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141021

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141202

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150224

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150609

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150708

R150 Certificate of patent or registration of utility model

Ref document number: 5778141

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees