JP2012532343A - 基板上に材料を印刷するための方法 - Google Patents
基板上に材料を印刷するための方法 Download PDFInfo
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T403/00—Joints and connections
- Y10T403/57—Distinct end coupler
- Y10T403/5741—Separate screw or pin-type connections
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Methods (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Description
凸版印刷フォームを作製するのに用いられる本発明の感光性前駆体要素は、少なくとも1つの光重合性層を含む。凸版印刷フォームは、フレキソ印刷フォームおよび活版印刷フォームを含む。凸版印刷は、印刷フォームが画像領域から印刷する印刷の方法であり、ここで、印刷フォームの画像領域は浮出し状であり、非画像領域は凹状である。任意選択的に、感光性要素は支持体を含む。任意選択的に、感光性要素は、光重合性層と隣接する化学線不透過性材料の層を含む。一実施形態において、感光性要素は、少なくとも、バインダー、少なくとも1種のエチレン性不飽和化合物、および光開始剤から構成される光重合性組成物の層を含む。別の実施形態において、光重合性組成物の層は、エラストマーバインダー、少なくとも1種のエチレン性不飽和化合物、および光開始剤を含む。ある実施形態において、凸版印刷フォームは、密着印画に必要な圧縮に対応するエラストマー印刷フォームである(すなわち、光重合性層はエラストマー層である)。
「線毎インチ」(LPI)は、中間調スクリーンを使用するシステムの印刷解像度の測定値である。それは、中間調グリッドの線の密集の程度の尺度である。LPIが高くなるほど、一般に、画像の細部がより鮮明で、鮮鋭度が高くなることを示す。
密度=log10{1/反射率}(式中、反射率は{反射光の強度/入射光の強度}である)。
有効な印刷ドット面積=(1−10-Dt)/(1−10-Ds)
式中、Dt=色調密度であり、Ds=ベタ密度である。
顕微鏡または光学デバイスなどの一般的な画像形成技術を用いて、印刷フォームの観測されるドット面積を測定し得る。好適な光学デバイスの一例は、Beta Industries(Carlstadt、NJ)製のBetaflexフレキソ分析器ユニットであり、このユニットは、凸版印刷フォームの浮出し構造を、ドット面積、スクリーン線数、およびドット品質などのレリーフ特性の測定および分析のための画像として捕らえる。
紫外線不透過性層が上に配置されたCYREL(登録商標)光重合性印刷プレート、タイプDPI(フォトポリマーおよび支持体の厚さが0.067インチ(0.17cm))という2つの感光性前駆体印刷要素に、赤外レーザー放射線で放射線不透過性層を融除することによって同様に画像形成して、CYREL(登録商標)Digital Imagerにおいてある範囲の開口(マスクにおいて1%、5%、10%、20%、50%、70%、90%の面積の開口)を有する要素上にin−situマスクを形成した。開口サイズを、ニコン測定顕微鏡を用いて1つのプレート上で測定して、実際のマスク開口サイズを推定した。スクリーン線数解像度は、インチ当たり150線であった。本発明の方法による高解像度の印刷またはコーティングについて記載される範囲から外れているが、この実施例は、(修正されたデジタルワークフローの)本発明の方法が、関連するマスクにおける対応する開口よりわずかに小さいに過ぎない、ひいては理想に近い、凸版印刷フォームのレリーフ構造の浮出し面要素の特徴サイズを形成することができることを示した。
この実施例は、1)フィルム中間体を使用した従来のアナログプレート作製、2)上述したように、in−situマスクを形成し、大気中酸素の存在下でマスクを介して像様露光した従来のデジタルプレート作製(デジタルワークフロー)、および3)上で細かく見たように、in−situマスクを形成し、不活性ガス、例えば、窒素、および190,000〜100ppmの濃度の酸素の存在下で、マスクを介して像様露光した、修正されたデジタルワークフロープレート作製方法という3つの異なるプレート作製方法の比較を示す。
放射線不透過性デジタル層を有するCYREL(登録商標)光重合性印刷要素、タイプDPI(フォトポリマー層および支持体の厚さが0.045インチ(0.114cm))を用いて、修正されたデジタルワークフローの本発明の方法にしたがって作製されるとき、浮出し面要素の極小の構造を形成する能力を評価した。CYREL(登録商標)Digital Imagerにおいてin−situマスクを形成するように融除することによって、デジタル層に画像形成した。要素に画像形成して、インチ当たり10,000、8,000および4,000走査線の解像度および300、400および600DPI(ドット毎インチ)の空間解像度での複数の画像パターンを有するin−situマスクを形成した。要素を、実施例1に記載されるような露光チャンバに入れ、不活性ガスとしての窒素の存在下および100ppmより高く1000ppm未満の酸素の濃度で、化学線に像様露光した。露光された要素を、従来の溶剤処理条件を用いて溶剤処理して、画像パターンの各々において浮出し面要素のレリーフ構造を有する印刷プレートを形成した。
Claims (20)
- 基板上に材料を印刷するための方法であって:
a)バインダー、エチレン性不飽和化合物、および光開始剤を含有する光重合性組成物の層を含む感光性要素から凸版印刷フォームを提供する工程であって:
i)前記光重合性層に隣接し、化学線に対して不透過性の領域を貫く複数の開口を有するin−situマスクを形成する工程であって、前記開口がインチ当たり250線以上のスクリーン線数解像度を有する工程と;
ii)不活性ガスおよび190,000百万分率(ppm)〜100ppmの濃度の酸素を有する環境において、前記マスク開口を介して、前記光重合性層を化学線に露光する工程と;
iii)工程ii)から得られる要素を処理して、インチ当たり250線以上のスクリーン線数解像度を有する複数の浮出し面を有するレリーフ構造を形成する工程と
を含む工程と;
b)前記複数の浮出し面に前記材料を塗布する工程と;
c)前記材料を前記複数の浮出し面から前記基板に接触させ、それによって前記材料を前記基板に転写する工程と
を含むことを特徴とする方法。 - 前記接触工程が、前記基板上に前記材料の層を形成することを特徴とする請求項1に記載の方法。
- 前記材料の層の2つ以上の領域を有するパターンが、前記基板上に形成されることを特徴とする請求項2に記載の方法。
- 前記基板上の前記材料が、50〜5000オングストロームの厚さを有することを特徴とする請求項1に記載の方法。
- 前記基板上の前記材料の層が、約200〜1500オングストロームの厚さを有することを特徴とする請求項2に記載の方法。
- 前記マスクの前記開口が、全画素面積の20〜80%であるドット面積を有することを特徴とする請求項2に記載の方法。
- 前記接触工程が、前記材料のグラフィック画像を前記基板上に形成し、前記グラフィック画像は、中間調の図、テキスト、線特徴、およびそれらの組合せからなる群から選択されることを特徴とする請求項1に記載の方法。
- 前記レリーフ構造の前記複数の浮出し面のスクリーン線数解像度が、前記マスクのスクリーン線数解像度と同一または実質的に同一であることを特徴とする請求項1に記載の方法。
- 前記マスク開口の解像度が、250線毎インチ(LPI)、300LPI、350LPI、400LPI、および600LPIからなる群から選択されることを特徴とする請求項1に記載の方法。
- 前記浮出し面の解像度が、400線毎インチ以上であることを特徴とする請求項1に記載の方法。
- 各浮出し面が、約10〜約90マイクロメートルの直径を有する上面を有することを特徴とする請求項1に記載の方法。
- 前記材料が液晶配列材料であることを特徴とする請求項1に記載の方法。
- 前記材料がポリイミドであることを特徴とする請求項1に記載の方法。
- 前記材料が、ワニス、インク、および接着剤からなる群から選択されることを特徴とする請求項1に記載の方法。
- 前記環境における酸素の濃度が、80,000ppm以下であることを特徴とする請求項1に記載の方法。
- 前記不活性ガスが、アルゴン、ヘリウム、ネオン、クリプトン、キセノン、窒素、二酸化炭素、およびそれらの組合せからなる群から選択されることを特徴とする請求項1に記載の方法。
- 化学線不透過性材料の層が、前記光重合性層上または前記光重合性層に隣接して配置され、工程i)が、前記化学線不透過性層をレーザー放射線で像様露光して、前記in−situマスクを形成する工程を含むことを特徴とする請求項1に記載の方法。
- レーザー放射線での前記像様露光工程が、(a)前記光重合性層から前記化学線不透過性層を選択的に融除する工程、および(b)前記化学線不透過性層の部分を前記光重合性層に選択的に転写する工程からなる群から選択されることを特徴とする請求項17に記載の方法。
- 前記処理工程iii)が:
a)工程ii)の要素を、溶剤溶液、水溶液、半水溶液、および水からなる群から選択される少なくとも1種の洗浄溶液で処理する工程;および
b)工程ii)の要素を、領域を溶融、流動、または軟化させるのに十分な温度に加熱し、前記領域を除去する工程
からなる群から選択されることを特徴とする請求項1に記載の方法。 - 250線毎インチ以上のスクリーン線数解像度を有する複数の浮出し面を含むレリーフ構造を有するエラストマー層を有する凸版印刷フォームを作製するための方法であって:
a)バインダー、エチレン性不飽和化合物、および光開始剤を含む光重合性材料のエラストマー層を含む感光性要素を提供する工程と;
b)前記光重合性層に隣接し、化学線に対して不透過性の領域を貫く複数の開口を有するin−situマスクを形成する工程であって、前記開口が、250線毎インチ以上のスクリーン線数解像度を有する工程と;
c)不活性ガスおよび190,000百万分率(ppm)〜100ppmの濃度の酸素を有する環境において、前記マスク開口を介して、前記光重合性層を化学線に露光する工程と;
d)工程c)から得られる要素を処理して、250線毎インチ以上のスクリーン線数解像度を有する複数の浮出し面を有するレリーフ構造を形成する工程と
を含むことを特徴とする方法。
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EP2448764B1 (en) | 2016-03-02 |
EP2448764A1 (en) | 2012-05-09 |
WO2011002967A1 (en) | 2011-01-06 |
US20120060711A1 (en) | 2012-03-15 |
JP5778141B2 (ja) | 2015-09-16 |
US8899148B2 (en) | 2014-12-02 |
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