JP5770434B2 - 電子顕微鏡装置 - Google Patents
電子顕微鏡装置 Download PDFInfo
- Publication number
- JP5770434B2 JP5770434B2 JP2010143543A JP2010143543A JP5770434B2 JP 5770434 B2 JP5770434 B2 JP 5770434B2 JP 2010143543 A JP2010143543 A JP 2010143543A JP 2010143543 A JP2010143543 A JP 2010143543A JP 5770434 B2 JP5770434 B2 JP 5770434B2
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- wavelength
- light
- optical
- electron
- illumination
- Prior art date
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- 230000003287 optical effect Effects 0.000 claims description 115
- 238000005286 illumination Methods 0.000 claims description 45
- 238000001514 detection method Methods 0.000 claims description 44
- 230000005540 biological transmission Effects 0.000 claims description 38
- 238000010894 electron beam technology Methods 0.000 claims description 26
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 230000006866 deterioration Effects 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 238000005259 measurement Methods 0.000 description 32
- 238000007689 inspection Methods 0.000 description 29
- 238000010586 diagram Methods 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2443—Scintillation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/248—Components associated with the control of the tube
- H01J2237/2482—Optical means
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Microscoopes, Condenser (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
2 走査型電子顕微鏡
3 光学顕微鏡
4 干渉計
5 制御部
8 測定対象
11 電子
12 電子検出器
13 LED
24 計測用光源
25 異物検出装置
26 異物検出用光源
27 散乱光検出器
33 電子/光変換部材
34 波長フィルタ
36 波長検出素子
40 波長フィルタ
Claims (1)
- 電子ビームを走査する走査手段と、電子ビームが走査された試料から発せられる電子を検出する電子検出器を有し、該電子検出器からの検出結果に基づき走査電子像を得る走査型電子顕微鏡と、照明光を射出する発光源を有し、前記試料に照明光を照射して該試料からの反射光を受光して光学像を得る光学顕微鏡と、前記走査型電子顕微鏡、前記光学顕微鏡の作動を制御する制御部とを具備し、
前記電子検出器は電子/光変換する蛍光体層と、該蛍光体層からの蛍光の波長帯域の全て或は略全てが透過する様に制限した波長フィルタと、該波長フィルタを透過した前記蛍光を受光し、光/電気変換する波長検出素子を有し、前記照明光の前記波長フィルタを透過する波長帯域の光量が前記走査電子像の劣化限度を超えない様にし、
前記光学顕微鏡の照明光学系が照明用波長選択フィルタを有し、前記発光源はLEDであり、前記照明用波長選択フィルタは、前記波長フィルタの透過波長帯に対応する波長の透過率を制限し、前記波長フィルタの不透過波長帯に対応する波長を透過し、
前記制御部は、前記光学顕微鏡が取得する光学画像の波長帯の内、前記照明用波長選択フィルタを透過した波長帯を増幅し、色調補正することを特徴とする電子顕微鏡装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010143543A JP5770434B2 (ja) | 2010-06-24 | 2010-06-24 | 電子顕微鏡装置 |
CA2743374A CA2743374C (en) | 2010-06-24 | 2011-06-16 | Electron microscope device |
US13/165,046 US8692194B2 (en) | 2010-06-24 | 2011-06-21 | Electron microscope device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010143543A JP5770434B2 (ja) | 2010-06-24 | 2010-06-24 | 電子顕微鏡装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012009247A JP2012009247A (ja) | 2012-01-12 |
JP5770434B2 true JP5770434B2 (ja) | 2015-08-26 |
Family
ID=45351645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010143543A Active JP5770434B2 (ja) | 2010-06-24 | 2010-06-24 | 電子顕微鏡装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8692194B2 (ja) |
JP (1) | JP5770434B2 (ja) |
CA (1) | CA2743374C (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5492409B2 (ja) * | 2008-12-26 | 2014-05-14 | 株式会社堀場製作所 | 電子顕微鏡装置 |
JP5829415B2 (ja) * | 2011-03-30 | 2015-12-09 | 株式会社島津製作所 | 電子線分析装置 |
EP2777143A4 (en) | 2011-11-10 | 2015-11-11 | Lei Guo | SEMICONDUCTOR POWER CONVERTERS |
US8785950B2 (en) * | 2011-11-10 | 2014-07-22 | Lei Guo | Chip with semiconductor electricity conversion structure |
CN102496649A (zh) | 2011-11-10 | 2012-06-13 | 郭磊 | 一种半导体直流光电变压器 |
US9564291B1 (en) * | 2014-01-27 | 2017-02-07 | Mochii, Inc. | Hybrid charged-particle beam and light beam microscopy |
JP6656728B2 (ja) | 2015-10-01 | 2020-03-04 | 学校法人 中村産業学園 | 相関顕微鏡 |
WO2017057729A1 (ja) * | 2015-10-01 | 2017-04-06 | 学校法人 中村産業学園 | 相関顕微鏡 |
EP3157041A1 (en) * | 2015-10-13 | 2017-04-19 | FEI Company | Investigation of high-temperature specimens in a charged particle microscope |
CN108646167B (zh) * | 2018-04-27 | 2020-12-04 | 中科晶源微电子技术(北京)有限公司 | 用于半导体器件的激光辅助的电子束检测设备和方法 |
WO2020234987A1 (ja) * | 2019-05-21 | 2020-11-26 | 株式会社日立ハイテク | 荷電粒子線装置 |
JP7377375B2 (ja) * | 2020-10-26 | 2023-11-09 | 株式会社日立ハイテク | 荷電粒子線装置 |
TWI773172B (zh) * | 2021-03-06 | 2022-08-01 | 頂極科技股份有限公司 | 用於半導體製程零配件的質變檢測的資料處理方法及系統 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5543663Y2 (ja) * | 1974-05-11 | 1980-10-14 | ||
JPH01120749A (ja) * | 1987-11-02 | 1989-05-12 | Hitachi Ltd | 電子顕微鏡の自動焦点合せ装置 |
JPH01122555A (ja) | 1987-11-06 | 1989-05-15 | Jeol Ltd | 粒子線マイクロアナライザー |
JPH0756788B2 (ja) * | 1987-12-04 | 1995-06-14 | 株式会社日立製作所 | 電子顕微鏡 |
EP0459392B1 (en) | 1990-05-30 | 1999-08-18 | Hitachi, Ltd. | Method and apparatus for processing a minute portion of a specimen |
JPH04280053A (ja) * | 1991-03-06 | 1992-10-06 | Jeol Ltd | 走査電子顕微鏡 |
JP3227224B2 (ja) * | 1992-10-09 | 2001-11-12 | 日本原子力研究所 | 光学フィルターによりシンチレータ出力パルス波高及び立ち上がり時間が制御可能なホスウィッチ検出器 |
JPH07208963A (ja) * | 1994-01-20 | 1995-08-11 | Nikon Corp | 複合型顕微鏡 |
JP3719794B2 (ja) * | 1996-11-11 | 2005-11-24 | 株式会社トプコン | 反射電子検出装置及びそれを有する走査型電子顕微鏡装置 |
JP3534582B2 (ja) | 1997-10-02 | 2004-06-07 | 株式会社日立製作所 | パターン欠陥検査方法および検査装置 |
JP4089798B2 (ja) * | 1998-04-13 | 2008-05-28 | 株式会社トプコン | 表面検査装置 |
US6407373B1 (en) * | 1999-06-15 | 2002-06-18 | Applied Materials, Inc. | Apparatus and method for reviewing defects on an object |
US6373070B1 (en) * | 1999-10-12 | 2002-04-16 | Fei Company | Method apparatus for a coaxial optical microscope with focused ion beam |
FR2806527B1 (fr) * | 2000-03-20 | 2002-10-25 | Schlumberger Technologies Inc | Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique |
JP4610798B2 (ja) * | 2001-06-19 | 2011-01-12 | エスアイアイ・ナノテクノロジー株式会社 | レーザ欠陥検出機能を備えた走査型電子顕微鏡とそのオートフォーカス方法 |
JP2003100247A (ja) * | 2001-09-27 | 2003-04-04 | Jeol Ltd | 荷電粒子ビーム装置 |
US7157703B2 (en) | 2002-08-30 | 2007-01-02 | Ebara Corporation | Electron beam system |
US20040218172A1 (en) * | 2003-01-24 | 2004-11-04 | Deverse Richard A. | Application of spatial light modulators for new modalities in spectrometry and imaging |
NL1027462C2 (nl) * | 2004-11-09 | 2006-05-10 | Koninkl Philips Electronics Nv | Werkwijze voor het lokaliseren van fluorescente markers. |
JP5066393B2 (ja) | 2007-06-06 | 2012-11-07 | 株式会社日立ハイテクノロジーズ | 異物・欠陥検査・観察システム |
JP5110977B2 (ja) * | 2007-06-22 | 2012-12-26 | 株式会社日立ハイテクノロジーズ | 欠陥観察装置及びその方法 |
JP2009301812A (ja) * | 2008-06-12 | 2009-12-24 | Hitachi High-Technologies Corp | 試料検査装置、及び試料検査方法 |
CN102137913B (zh) * | 2008-08-07 | 2013-11-27 | 皇家飞利浦电子股份有限公司 | 闪烁材料 |
US7961397B2 (en) * | 2008-08-29 | 2011-06-14 | Omniprobe, Inc | Single-channel optical processing system for energetic-beam microscopes |
JP5325522B2 (ja) * | 2008-10-15 | 2013-10-23 | 株式会社堀場製作所 | 複合型観察装置 |
JP5492409B2 (ja) * | 2008-12-26 | 2014-05-14 | 株式会社堀場製作所 | 電子顕微鏡装置 |
JP5303781B2 (ja) | 2008-12-26 | 2013-10-02 | 株式会社堀場製作所 | 電子顕微鏡装置 |
JP2012138324A (ja) * | 2010-12-28 | 2012-07-19 | Topcon Corp | 二次電子検出器、及び荷電粒子ビーム装置 |
-
2010
- 2010-06-24 JP JP2010143543A patent/JP5770434B2/ja active Active
-
2011
- 2011-06-16 CA CA2743374A patent/CA2743374C/en not_active Expired - Fee Related
- 2011-06-21 US US13/165,046 patent/US8692194B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20110315877A1 (en) | 2011-12-29 |
CA2743374A1 (en) | 2011-12-24 |
US8692194B2 (en) | 2014-04-08 |
JP2012009247A (ja) | 2012-01-12 |
CA2743374C (en) | 2014-04-29 |
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