JP5711472B2 - 配線基板及びその製造方法並びに半導体装置 - Google Patents

配線基板及びその製造方法並びに半導体装置 Download PDF

Info

Publication number
JP5711472B2
JP5711472B2 JP2010132303A JP2010132303A JP5711472B2 JP 5711472 B2 JP5711472 B2 JP 5711472B2 JP 2010132303 A JP2010132303 A JP 2010132303A JP 2010132303 A JP2010132303 A JP 2010132303A JP 5711472 B2 JP5711472 B2 JP 5711472B2
Authority
JP
Japan
Prior art keywords
layer
pad
wiring board
forming
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010132303A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011258772A5 (https=
JP2011258772A (ja
Inventor
中村　順一
順一 中村
金子　健太郎
健太郎 金子
俊一郎 松元
俊一郎 松元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2010132303A priority Critical patent/JP5711472B2/ja
Priority to US13/154,565 priority patent/US8749073B2/en
Publication of JP2011258772A publication Critical patent/JP2011258772A/ja
Publication of JP2011258772A5 publication Critical patent/JP2011258772A5/ja
Application granted granted Critical
Publication of JP5711472B2 publication Critical patent/JP5711472B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/685—Shapes or dispositions thereof comprising multiple insulating layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/685—Shapes or dispositions thereof comprising multiple insulating layers
    • H10W70/687—Shapes or dispositions thereof comprising multiple insulating layers characterized by the outer layers being for protection, e.g. solder masks, or for protection against chemical or mechanical damage
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/11—Printed elements for providing electric connections to or between printed circuits
    • H05K1/111—Pads for surface mounting, e.g. lay-out
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0364—Conductor shape
    • H05K2201/0367—Metallic bump or raised conductor not used as solder bump
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09009—Substrate related
    • H05K2201/09036—Recesses or grooves in insulating substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09009—Substrate related
    • H05K2201/09072—Hole or recess under component or special relationship between hole and component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10015—Non-printed capacitor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0369—Etching selective parts of a metal substrate through part of its thickness, e.g. using etch resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0376—Etching temporary metallic carrier substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/30—Details of processes not otherwise provided for in H05K2203/01 - H05K2203/17
    • H05K2203/308—Sacrificial means, e.g. for temporarily filling a space for making a via or a cavity or for making rigid-flexible PCBs
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing of the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4682—Manufacture of core-less build-up multilayer circuits on a temporary carrier or on a metal foil
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7424—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self-supporting substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/744—Details of chemical or physical process used for separating the auxiliary support from a device or a wafer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/601—Capacitive arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241—Dispositions, e.g. layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251—Materials
    • H10W72/252—Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H10W74/012—Manufacture or treatment of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/114—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/114—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
    • H10W74/117—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations the substrate having spherical bumps for external connection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
    • H10W74/142—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations exposing the passive side of the semiconductor body
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
JP2010132303A 2010-06-09 2010-06-09 配線基板及びその製造方法並びに半導体装置 Active JP5711472B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010132303A JP5711472B2 (ja) 2010-06-09 2010-06-09 配線基板及びその製造方法並びに半導体装置
US13/154,565 US8749073B2 (en) 2010-06-09 2011-06-07 Wiring board, method of manufacturing the same, and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010132303A JP5711472B2 (ja) 2010-06-09 2010-06-09 配線基板及びその製造方法並びに半導体装置

Publications (3)

Publication Number Publication Date
JP2011258772A JP2011258772A (ja) 2011-12-22
JP2011258772A5 JP2011258772A5 (https=) 2013-05-16
JP5711472B2 true JP5711472B2 (ja) 2015-04-30

Family

ID=45095563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010132303A Active JP5711472B2 (ja) 2010-06-09 2010-06-09 配線基板及びその製造方法並びに半導体装置

Country Status (2)

Country Link
US (1) US8749073B2 (https=)
JP (1) JP5711472B2 (https=)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8952540B2 (en) * 2011-06-30 2015-02-10 Intel Corporation In situ-built pin-grid arrays for coreless substrates, and methods of making same
DE102012106425A1 (de) * 2012-07-17 2014-01-23 Epcos Ag Bauelement
US8816513B2 (en) * 2012-08-22 2014-08-26 Texas Instruments Incorporated Electronic assembly with three dimensional inkjet printed traces
JP5768023B2 (ja) * 2012-08-29 2015-08-26 日東電工株式会社 電子部品封止用熱硬化性樹脂シート、樹脂封止型半導体装置、及び樹脂封止型半導体装置の製造方法
GB2537060B (en) * 2012-09-25 2017-02-15 Cambridge Silicon Radio Ltd Composite reconstituted wafer structures
KR101462770B1 (ko) 2013-04-09 2014-11-20 삼성전기주식회사 인쇄회로기판과 그의 제조방법 및 그 인쇄회로기판을 포함하는 반도체 패키지
KR101516072B1 (ko) * 2013-07-09 2015-04-29 삼성전기주식회사 반도체 패키지 및 그 제조 방법
US20150041183A1 (en) * 2013-08-06 2015-02-12 Kinsus Interconnect Technology Corp. Chip board package structure
US9078373B1 (en) 2014-01-03 2015-07-07 International Business Machines Corporation Integrated circuit structures having off-axis in-hole capacitor and methods of forming
WO2015170539A1 (ja) * 2014-05-08 2015-11-12 株式会社村田製作所 樹脂多層基板およびその製造方法
US9679841B2 (en) * 2014-05-13 2017-06-13 Qualcomm Incorporated Substrate and method of forming the same
US9171739B1 (en) * 2014-06-24 2015-10-27 Stats Chippac Ltd. Integrated circuit packaging system with coreless substrate and method of manufacture thereof
US9902006B2 (en) * 2014-07-25 2018-02-27 Raytheon Company Apparatus for cleaning an electronic circuit board
TWI611523B (zh) * 2014-09-05 2018-01-11 矽品精密工業股份有限公司 半導體封裝件之製法
TWI582861B (zh) * 2014-09-12 2017-05-11 矽品精密工業股份有限公司 嵌埋元件之封裝結構及其製法
TWI554174B (zh) * 2014-11-04 2016-10-11 上海兆芯集成電路有限公司 線路基板和半導體封裝結構
TWI595613B (zh) * 2014-11-18 2017-08-11 矽品精密工業股份有限公司 半導體封裝件及其製法
EP3271941A4 (en) * 2015-03-19 2018-10-24 Intel Corporation Radio die package with backside conductive plate
JP6550260B2 (ja) * 2015-04-28 2019-07-24 新光電気工業株式会社 配線基板及び配線基板の製造方法
US10043769B2 (en) * 2015-06-03 2018-08-07 Micron Technology, Inc. Semiconductor devices including dummy chips
KR101672640B1 (ko) * 2015-06-23 2016-11-03 앰코 테크놀로지 코리아 주식회사 반도체 디바이스
TWI582905B (zh) * 2016-01-07 2017-05-11 晨星半導體股份有限公司 晶片封裝結構及其製作方法
JP6770331B2 (ja) * 2016-05-02 2020-10-14 ローム株式会社 電子部品およびその製造方法
WO2018201648A1 (zh) * 2017-05-03 2018-11-08 华为技术有限公司 Pcb、封装结构、终端及pcb的加工方法
EP3468312B1 (en) * 2017-10-06 2023-11-29 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Method of manufacturing a component carrier having a three dimensionally printed wiring structure
KR101982056B1 (ko) * 2017-10-31 2019-05-24 삼성전기주식회사 팬-아웃 반도체 패키지 모듈
CN109803481B (zh) * 2017-11-17 2021-07-06 英业达科技有限公司 多层印刷电路板及制作多层印刷电路板的方法
US10546817B2 (en) * 2017-12-28 2020-01-28 Intel IP Corporation Face-up fan-out electronic package with passive components using a support
KR102102389B1 (ko) * 2018-09-18 2020-04-21 전자부품연구원 고전력 및 고주파수 응용을 위한 반도체 패키지 및 그 제조방법
US11583171B2 (en) * 2019-08-22 2023-02-21 Omnivision Technologies, Inc. Surface-mount device platform and assembly
JP7382175B2 (ja) * 2019-08-26 2023-11-16 ローム株式会社 半導体装置
JP2021093417A (ja) * 2019-12-09 2021-06-17 イビデン株式会社 プリント配線板、及び、プリント配線板の製造方法
US11716117B2 (en) * 2020-02-14 2023-08-01 Texas Instruments Incorporated Circuit support structure with integrated isolation circuitry
JP7597526B2 (ja) * 2020-06-22 2024-12-10 株式会社村田製作所 表面実装型受動部品
US20220069489A1 (en) * 2020-08-28 2022-03-03 Unimicron Technology Corp. Circuit board structure and manufacturing method thereof
DE102021202801B4 (de) * 2021-03-23 2022-10-13 Hanon Systems Efp Deutschland Gmbh Schaltung mit einer Leiterplatte und Fahrzeug mit zumindest einer derartigen Schaltung
KR20230135215A (ko) * 2022-03-15 2023-09-25 삼성디스플레이 주식회사 회로 기판 및 이를 포함하는 표시 장치
CN115621230B (zh) * 2022-09-27 2025-11-28 武汉新芯集成电路股份有限公司 芯片封装方法及半导体封装结构
CN115440675A (zh) * 2022-09-29 2022-12-06 珠海越亚半导体股份有限公司 一种半导体封装结构及其制备方法
US12300561B2 (en) * 2023-06-16 2025-05-13 Deca Technologies Usa, Inc. Fully molded structure with multi-height components comprising backside conductive material and method for making the same
KR20250001646A (ko) * 2023-06-29 2025-01-07 삼성전자주식회사 반도체 패키지

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3452502B2 (ja) * 1999-03-08 2003-09-29 株式会社東海理化電機製作所 モールドパッケージ
EP1122778A3 (en) * 2000-01-31 2004-04-07 Sanyo Electric Co., Ltd. Circuit device and manufacturing method of circuit device
US6546620B1 (en) * 2000-06-29 2003-04-15 Amkor Technology, Inc. Flip chip integrated circuit and passive chip component package fabrication method
TW523857B (en) * 2001-12-06 2003-03-11 Siliconware Precision Industries Co Ltd Chip carrier configurable with passive components
JP3755510B2 (ja) * 2002-10-30 2006-03-15 株式会社デンソー 電子部品の実装構造およびその製造方法
JP2005108950A (ja) * 2003-09-29 2005-04-21 Matsushita Electric Ind Co Ltd セラミックモジュール部品およびその製造方法
US7145234B2 (en) * 2004-01-15 2006-12-05 Via Technologies, Inc. Circuit carrier and package structure thereof
JP2005236035A (ja) * 2004-02-19 2005-09-02 Sanyo Electric Co Ltd 半導体装置およびその製造方法
TWI243462B (en) * 2004-05-14 2005-11-11 Advanced Semiconductor Eng Semiconductor package including passive component
JP2006179606A (ja) * 2004-12-21 2006-07-06 Nitto Denko Corp 配線回路基板
JP4334005B2 (ja) * 2005-12-07 2009-09-16 新光電気工業株式会社 配線基板の製造方法及び電子部品実装構造体の製造方法
JP2007214332A (ja) * 2006-02-09 2007-08-23 Matsushita Electric Ind Co Ltd 半導体実装モジュールと、この半導体実装モジュールの製造方法
JP4963879B2 (ja) 2006-06-16 2012-06-27 株式会社ソニー・コンピュータエンタテインメント 半導体装置および半導体装置の製造方法
JP5101169B2 (ja) * 2007-05-30 2012-12-19 新光電気工業株式会社 配線基板とその製造方法
JP5101451B2 (ja) * 2008-10-03 2012-12-19 新光電気工業株式会社 配線基板及びその製造方法

Also Published As

Publication number Publication date
US8749073B2 (en) 2014-06-10
US20110304016A1 (en) 2011-12-15
JP2011258772A (ja) 2011-12-22

Similar Documents

Publication Publication Date Title
JP5711472B2 (ja) 配線基板及びその製造方法並びに半導体装置
JP5026400B2 (ja) 配線基板及びその製造方法
JP5221315B2 (ja) 配線基板及びその製造方法
JP5339928B2 (ja) 配線基板及びその製造方法
JP4842167B2 (ja) 多層配線基板の製造方法
JP5210839B2 (ja) 配線基板及びその製造方法
US9232657B2 (en) Wiring substrate and manufacturing method of wiring substrate
JP4592751B2 (ja) プリント配線基板の製造方法
JP5649490B2 (ja) 配線基板及びその製造方法
US20090310323A1 (en) Printed circuit board including electronic component embedded therein and method of manufacturing the same
CN104428892B (zh) 用于基板核心层的方法和装置
KR101696705B1 (ko) 칩 내장형 pcb 및 그 제조 방법과, 그 적층 패키지
US10098243B2 (en) Printed wiring board and semiconductor package
JP4073945B1 (ja) 多層配線基板の製造方法
JP2009135162A (ja) 配線基板及び電子部品装置
JP2010245280A (ja) 配線基板の製造方法及び配線基板
US20150334844A1 (en) Printed wiring board
JP2015211194A (ja) プリント配線板および半導体パッケージ、ならびにプリント配線板の製造方法
CN102625579A (zh) 电子部件内置线路板
JP6669330B2 (ja) 電子部品内蔵型印刷回路基板及びその製造方法
JP2015225895A (ja) プリント配線板および半導体パッケージ、ならびにプリント配線板の製造方法
JP2003188314A (ja) 素子内蔵基板の製造方法および素子内蔵基板
JP5571817B2 (ja) 印刷回路基板及び印刷回路基板の製造方法
KR20150065029A (ko) 인쇄회로기판, 그 제조방법 및 반도체 패키지
JP2004134679A (ja) コア基板とその製造方法、および多層配線基板

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130402

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130402

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20131017

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140128

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140311

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20141202

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141225

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20150202

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150224

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150306

R150 Certificate of patent or registration of utility model

Ref document number: 5711472

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150