JP5660710B2 - ターゲットの製造方法、磁気記録媒体の製造方法 - Google Patents

ターゲットの製造方法、磁気記録媒体の製造方法 Download PDF

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Publication number
JP5660710B2
JP5660710B2 JP2010174208A JP2010174208A JP5660710B2 JP 5660710 B2 JP5660710 B2 JP 5660710B2 JP 2010174208 A JP2010174208 A JP 2010174208A JP 2010174208 A JP2010174208 A JP 2010174208A JP 5660710 B2 JP5660710 B2 JP 5660710B2
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mol
magnetic
target
layer
oxide
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JP2012033247A (ja
JP2012033247A5 (enExample
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福島　隆之
隆之 福島
篤志 橋本
篤志 橋本
剛平 黒川
剛平 黒川
克哉 原
克哉 原
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Resonac Holdings Corp
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Showa Denko KK
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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP2010174208A 2010-08-03 2010-08-03 ターゲットの製造方法、磁気記録媒体の製造方法 Active JP5660710B2 (ja)

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JP2010174208A JP5660710B2 (ja) 2010-08-03 2010-08-03 ターゲットの製造方法、磁気記録媒体の製造方法

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JP2010174208A JP5660710B2 (ja) 2010-08-03 2010-08-03 ターゲットの製造方法、磁気記録媒体の製造方法

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JP2012033247A JP2012033247A (ja) 2012-02-16
JP2012033247A5 JP2012033247A5 (enExample) 2014-03-06
JP5660710B2 true JP5660710B2 (ja) 2015-01-28

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6144570B2 (ja) * 2013-08-05 2017-06-07 昭和電工株式会社 磁気記録媒体の製造方法、磁気記録媒体及び磁気記録再生装置
MY184023A (en) * 2016-02-19 2021-03-17 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording medium, and magnetic thin film
CN107303127B (zh) * 2016-04-25 2019-08-09 佛山市顺德区美的电热电器制造有限公司 一种烹饪锅具及其制造方法
TWI671418B (zh) * 2017-09-21 2019-09-11 日商Ｊｘ金屬股份有限公司 濺鍍靶、積層膜之製造方法、積層膜及磁記錄媒體
MY209580A (en) * 2019-11-01 2025-07-23 Univ Tohoku Sputtering target for heat-assisted magnetic recording medium
JP7625112B1 (ja) 2024-03-29 2025-01-31 Ｊｘ金属株式会社 磁性材ターゲット及び磁性材ターゲット組立品
JP7625111B1 (ja) 2024-03-29 2025-01-31 Ｊｘ金属株式会社 磁性材ターゲット及び磁性材ターゲット組立品
JP7625109B1 (ja) 2024-03-29 2025-01-31 Ｊｘ金属株式会社 磁性材ターゲット及び磁性材ターゲット組立品
JP7625113B1 (ja) 2024-03-29 2025-01-31 Ｊｘ金属株式会社 磁性材ターゲット及び磁性材ターゲット組立品
JP7625110B1 (ja) 2024-03-29 2025-01-31 Ｊｘ金属株式会社 磁性材ターゲット及び磁性材ターゲット組立品

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001011601A (ja) * 1999-07-01 2001-01-16 Nikko Materials Co Ltd 光メディア保護膜用材料
JP2006176810A (ja) * 2004-12-21 2006-07-06 Mitsubishi Materials Corp 磁気記録膜形成用ＣｏＣｒＰｔ−ＳｉＯ２スパッタリングターゲットの製造方法
JP2009132976A (ja) * 2007-11-30 2009-06-18 Mitsubishi Materials Corp 比透磁率の低い垂直磁気記録媒体膜形成用スパッタリングターゲット
JPWO2010074171A1 (ja) * 2008-12-26 2012-06-21 三井金属鉱業株式会社 スパッタリングターゲットおよび膜の形成方法

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