JP5634947B2 - 基板搬送装置、露光装置、基板搬送方法、及び処理方法 - Google Patents
基板搬送装置、露光装置、基板搬送方法、及び処理方法 Download PDFInfo
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- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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Description
本願は、2003年10月8日に出願された特願2003−349550号に対し優先権を主張し、その内容をここに援用する。
R=k1・λ/NA … (1)
δ=±k2・λ/NA2 … (2)
ここで、λは露光波長、NAは投影光学系の開口数、k1、k2はプロセス係数である。(1)式、(2)式より、解像度Rを高めるために、露光波長λを短くして、開口数NAを大きくすると、焦点深度δが狭くなることが分かる。
Claims (69)
- 投影光学系と液体とを介したパターンの像によって露光された基板を搬送する基板搬送装置において、
露光後であって現像される前の前記基板に付着した前記液体を検出する液体検出器を備えることを特徴とする基板搬送装置。 - 前記液体検出器の検出結果に基づいて、前記露光後の基板に付着した液体を除去するか否かを判定する判定装置を有することを特徴とする請求項1記載の基板搬送装置。
- 前記露光後の基板に付着した液体を除去する除去装置を有することを特徴とする請求項1または2記載の基板搬送装置。
- 前記除去装置は、前記液体検出器の検出結果に基づいて、前記基板に付着した液体を除去する除去条件を設定することを特徴とする請求項3記載の基板搬送装置。
- 前記除去条件は、前記液体を除去するために必要な時間を含むことを特徴とする請求項4記載の基板搬送装置。
- 前記液体検出器は、前記基板の露光前における基板表面に関する第1情報と、前記基板の露光後における基板表面に関する第2情報とを比較して、前記液体を検出することを特徴とする請求項1〜5のいずれか一項記載の基板搬送装置。
- 前記第1情報は、前記基板の露光前における前記基板表面を撮像した撮像情報であり、前記第2情報は、前記基板の露光後における前記基板表面を撮像した撮像情報であることを特徴とする請求項6記載の基板搬送装置。
- 前記第1情報は前記基板表面の反射率情報を含み、前記第2情報は前記基板表面の反射率情報と前記液体の反射率情報とを含むことを特徴とする請求項6または7記載の基板搬送装置。
- 前記液体検出器は、前記基板の露光後における前記基板表面に対して検出光を照射する照射部と、前記基板表面で反射した前記検出光を受光する受光部とを有することを特徴とする請求項1〜8のいずれか一項記載の基板搬送装置。
- 前記液体検出器は、前記基板表面を撮像する請求項1〜9のいずれか一項記載の基板搬送装置。
- 前記液体の検出結果に基づいて、露光された前記基板に付着する液体の位置情報が取得される請求項1〜10のいずれか一項記載の基板搬送装置。
- 前記液体の検出結果に基づいて、露光された前記基板に付着する液体大きさに関する情報が取得される請求項1〜11のいずれか一項記載の基板搬送装置。
- 前記液体の検出結果に基づいて、露光された前記基板に付着する液体の量に関する情報が取得される請求項1〜12のいずれか一項記載の基板搬送装置。
- 投影光学系と液体とを介してパターンの像を投影して基板を露光する露光装置において、 前記基板を保持する基板テーブルと、 前記液体を介して露光された後であって現像される前の前記基板に付着する残留液体を検出する液体検出器と、を備えることを特徴とする露光装置。
- 前記液体検出器は、前記基板の露光後における前記基板表面に対して検出光を照射する照射部と、前記基板表面で反射した前記検出光を受光する受光部とを有する請求項14記載の露光装置。
- 前記液体検出器は、前記基板と前記液体検出器とが相対的に移動しているときに、前記残留液体を検出する請求項14または15記載の露光装置。
- 前記液体検出器は、前記基板の搬送経路上で移動可能である請求項16記載の露光装置。
- 前記液体検出器は、前記基板が露光された後であって前記基板テーブルとは異なる保持部材に前記基板が保持される前に、前記残留液体を検出する請求項14〜17のいずれか一項記載の露光装置。
- 前記保持部材は、前記残留液体を除去する除去装置に配置される保持テーブルを含む請求項18記載の露光装置。
- 前記液体検出器は、前記基板表面を撮像する請求項14〜19のいずれか一項記載の露光装置。
- 前記液体検出器は、露光前の前記基板表面の第1情報と、露光後の前記基板表面の第2情報に基づいて、前記残留液体を検出する請求項14〜20のいずれか一項記載の露光装置。
- 前記第1情報は、前記基板の露光前における前記基板表面を撮像した撮像情報を含み、前記第2情報は、前記基板の露光後における前記基板表面を撮像した撮像情報を含む請求項21記載の露光装置。
- 前記第1情報は、露光前の前記基板表面の反射率情報を含み、 前記第2情報は、露光後の前記基板表面の反射率情報および前記液体の反射率情報を含む請求項21または22記載の露光装置。
- 前記液体検出器の検出結果に基づいて、前記残留液体の位置情報が取得される請求項14〜23のいずれか一項記載の露光装置。
- 前記液体検出器の検出結果に基づいて、前記残留液体の大きさに関する情報が取得される請求項14〜24のいずれか一項記載の露光装置。
- 前記液体検出器の検出結果に基づいて、前記残留液体の量に関する情報が取得される請求項14〜25のいずれか一項記載の露光装置。
- 前記液体検出器の検出結果に基づいて、前記基板に対する液体除去動作を行なうか判定する判定装置をさらに備える請求項14〜26のいずれか一項記載の露光装置。
- 前記液体検出器で検出された前記残留液体を除去する除去装置をさらに備える請求項14〜27のいずれか一項記載の露光装置。
- 前記除去装置は、前記基板が露光された後であって前記基板テーブルとは異なる保持部材に前記基板が保持される前に、前記残留液体を除去する請求項28記載の露光装置。
- 前記保持部材は、前記除去装置に配置される保持テーブルを含む請求項29記載の露光装置。
- 前記除去装置は、前記基板を回転させて前記残留液体を除去する請求項28〜30のいずれか一項記載の露光装置。
- 前記除去装置は、前記基板に気体を吹き付けて前記残留液体を除去する請求項28〜31のいずれか一項記載の露光装置。
- 前記除去装置は、吸湿材を用いて前記残留液体を吸湿する請求項28〜32のいずれか一項記載の露光装置。
- 前記除去装置は、前記液体検出器の検出結果に基づいて、前記残留液体を除去する除去条件を設定する請求項28〜33のいずれか一項記載の露光装置。
- 前記除去条件は、前記液体を除去するために必要な時間を含む請求項34記載の露光装置。
- 前記液体検出器は、前記基板を回転または傾斜させて前記残留液体を検出する請求項14〜35のいずれか一項記載の露光装置。
- 前記液体検出器は、カメラ、赤外センサー、散乱光を検出する検出器のいずれか1つを含む請求項14〜36のいずれか一項記載の露光装置。
- 前記液体検出器は、露光された前記基板が前記投影光学系下から移動した後に、前記残留液体を検出する請求項14〜37のいずれか一項記載の露光装置。
- 投影光学系と液体とを介したパターンの像によって露光された基板を搬送する基板搬送方法において、 前記投影光学系と前記液体を介して露光された後であって現像される前の前記基板に付着した液体を検出することを特徴とする基板搬送方法。
- 前記液体の検出結果に基づいて、前記基板に付着した液体を除去するか否かを判定することを特徴とする請求項39記載の基板搬送方法。
- 前記液体の検出結果に基づいて、前記基板に付着した液体を除去することをさらに含む請求項39又は40記載の基板搬送方法。
- 前記液体の検出結果に基づいて、前記基板に付着した液体を除去する除去条件を設定することを特徴とする請求項41記載の基板搬送方法。
- 前記液体の検出は、前記基板の露光前における前記基板表面と前記基板の露光後における前記基板表面とを比較して行うことを特徴とする請求項39〜42のいずれか一項記載の基板搬送方法。
- 前記液体の検出は、前記基板の露光後における前記基板表面に対して検出光を照射するとともに、前記基板表面で反射した前記検出光を受光し、前記受光結果に基づいて行うことを特徴とする請求項39〜43のいずれか一項記載の基板搬送方法。
- 前記液体の検出結果に基づいて、露光された前記基板に付着する液体の位置情報が取得される請求項39〜44のいずれか一項記載の基板搬送方法。
- 前記液体の検出結果に基づいて、露光された前記基板に付着する液体大きさに関する情報が取得される請求項39〜45のいずれか一項記載の基板搬送方法。
- 前記液体の検出結果に基づいて、露光された前記基板に付着する液体の量に関する情報が取得される請求項39〜46のいずれか一項記載の基板搬送方法。
- 投影光学系と液体とを介してパターンの像を基板に投影して前記基板を露光する露光装置に用いられる処理方法において、
前記液体を介して前記パターンの像が投影された基板を前記投影光学系下から移動させること、および、前記パターンの像が投影された後であって現像される前の前記基板に付着する残留液体に関する情報を取得すること、を含むことを特徴とする処理方法。 - 前記残留液体に関する情報は、露光された前記基板からの検出光を液体検出器で受光することにより取得される請求項48記載の処理方法。
- 前記液体検出器は、前記基板表面を撮像する請求項49記載の処理方法。
- 前記液体検出器は、前記基板の露光後における前記基板表面に対して前記検出光を照射する照射部と、前記基板表面で反射した前記検出光を受光する受光部とを有する請求項49または50記載の処理方法。
- 前記液体検出器は、前記基板の搬送経路上で移動可能である請求項49〜51のいずれか一項記載の処理方法。
- 前記液体検出器は、カメラ、赤外センサー、散乱光を検出する検出器のいずれかを含む請求項49〜52のいずれか一項記載の処理方法。
- 前記液体検出器は、露光前の前記基板表面の第1情報と、露光後の前記基板表面の第2情報に基づいて、前記残留液体に関する情報を取得する請求項49〜53のいずれか一項記載の処理方法。
- 前記第1情報は、前記基板の露光前における前記基板表面を撮像した撮像情報を含み、前記第2情報は、前記基板の露光後における前記基板表面を撮像した撮像情報を含む請求項54記載の処理方法。
- 前記第1情報は、露光前の前記基板表面の反射率情報を含み、 前記第2情報は、露光後の前記基板表面の反射率情報および前記液体の反射率情報を含む請求項54または55記載の処理方法。
- 前記基板と前記液体検出器とが相対的に移動しているときに、前記残留液体に関する情報が取得される請求項48〜56のいずれか一項記載の処理方法。
- 前記残留液体に関する情報は、前記残留液体の位置情報を含む請求項48〜57のいずれか一項記載の処理方法。
- 前記残留液体に関する情報は、前記残留液体の大きさに関する情報を含む請求項48〜58のいずれか一項記載の処理方法。
- 前記残留液体に関する情報は、前記残留液体の量に関する情報を含む請求項48〜59のいずれか一項記載の処理方法。
- 取得した前記残留液体に関する情報に基づいて、前記基板に対する液体除去動作を行なうか判定すること、をさらに有する請求項48〜60のいずれか一項記載の処理方法。
- 前記液体除去動作は、前記基板を回転させることを含む請求項61記載の処理方法。
- 前記液体除去動作は、前記基板に気体を吹き付けることを含む請求項61または62記載の処理方法。
- 前記液体除去動作は、吸湿材により前記残留液体を吸湿することを含む請求項61〜63のいずれか一項記載の処理方法。
- 前記基板を回転または傾斜させて前記残留液体に関する情報を取得する請求項48〜64のいずれか一項記載の処理方法。
- 投影光学系と液体とを介して基板を露光する露光装置であって、
前記基板を保持する基板テーブルと、
前記基板の裏面に付着する液体を検出する液体検出器と、
前記基板テーブルとの間で基板の搬送を行う搬送アームと、を備え、
前記液体検出器は、前記搬送アームに保持された前記基板の裏面に付着した液体を検出することを特徴とする露光装置。 - 前記基板が現像される前に、前記基板の裏面に付着した液体が検出される請求項66に記載の露光装置。
- 前記液体検出器の検出結果に基づいて前記基板の裏面に付着した液体を除去する除去装置をさらに備える請求項66または67に記載の露光装置。
- 前記除去装置は、前記基板の裏面に気体を吹き付けることにより、前記基板の裏面に付着した液体を除去する請求項68に記載の露光装置。
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