JP2011211221A - 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法 - Google Patents
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法 Download PDFInfo
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Abstract
【解決手段】基板搬送装置は、投影光学系と液体とを介したパターンの像によって露光された基板を搬送する。基板搬送装置は、基板に残留した液体を検出可能な液体検出器を備え、液体検出器は、基板の露光前における基板表面に関する第1情報と、基板の露光後における基板表面に関する第2情報とを比較して、残留液体を検出する。
【選択図】図1
Description
本願は、2003年10月8日に出願された特願2003−349550号に対し優先権を主張し、その内容をここに援用する。
R=k1・λ/NA … (1)
δ=±k2・λ/NA2 … (2)
ここで、λは露光波長、NAは投影光学系の開口数、k1、k2はプロセス係数である。(1)式、(2)式より、解像度Rを高めるために、露光波長λを短くして、開口数NAを大きくすると、焦点深度δが狭くなることが分かる。
Claims (39)
- 投影光学系と液体とを介したパターンの像によって露光された基板を搬送する基板搬送装置において、
前記基板に残留した前記液体を検出可能な液体検出器を備え、
前記液体検出器は、前記基板の露光前における基板表面に関する第1情報と、前記基板の露光後における基板表面に関する第2情報とを比較して、前記残留液体を検出する基板搬送装置。 - 前記液体検出器の検出結果に基づいて、前記基板に対する液体除去動作を行うか否かを判定する判定装置を有する請求項1記載の基板搬送装置。
- 前記基板に残留した液体を除去する除去装置を有する請求項1記載の基板搬送装置。
- 前記除去装置は、前記液体検出器の検出結果に基づいて、前記基板に残留した液体を除去する除去条件を設定する請求項3記載の基板搬送装置。
- 前記除去条件は、前記液体を除去するために必要な時間を含む請求項4記載の基板搬送装置。
- 前記液体検出器は、前記基板に液体が残留しているか否かを検出する請求項1〜5のいずれか一項記載の基板搬送装置。
- 前記第1情報は、前記基板の露光前における前記基板表面を撮像した撮像情報であり、 前記第2情報は、前記基板の露光後における前記基板表面を撮像した撮像情報である請求項1〜6記載の基板搬送装置。
- 前記第1情報は前記基板表面の反射率情報を含み、前記第2情報は前記基板表面の反射率情報と前記液体の反射率情報とを含む請求項1〜7のいずれか一項記載の基板搬送装置。
- 前記液体検出器は、前記基板の露光後における前記基板表面に対して検出光を照射する照射部と、前記基板表面で反射した前記検出光を受光する受光部とを有する請求項1〜8のいずれか一項記載の基板搬送装置。
- 投影光学系と液体とを介したパターンの像によって露光された基板を搬送する基板搬送装置において、
前記基板に残留した前記液体を検出可能な液体検出器を備え、
前記液体検出器は、前記基板の裏面の液体が付着しているか否かを検出する基板搬送装置。 - 前記検出結果に基づいて、前記基板の裏面に付着している液体の除去を行う請求項9記載の基板搬送装置。
- 投影光学系と液体とを介してパターンの像を基板に投影して、前記基板を露光する露光装置において、
請求項1〜11のいずれか一項記載の基板搬送装置を用いて、前記露光された基板を搬送する露光装置。 - 投影光学系と液体とを介したパターンの像によって露光された基板を搬送する基板搬送方法において、
前記露光された基板を搬送することと、
前記露光された基板上の残留液体を検出することと、を含み、
前記残留液体の検出は、前記基板の露光前における前記基板表面と前記基板の露光後における前記基板表面とを比較して行う基板搬送方法。 - 前記検出結果に基づいて、前記基板に対する液体除去動作を行うか否かを判定することをさらに含む請求項13記載の基板搬送方法。
- 前記基板に残留した液体を除去することをさらに含む請求項13記載の基板搬送方法。
- 前記検出結果に基づいて、前記基板に残留した液体を除去する除去条件を設定することをさらに含む請求項13記載の基板搬送方法。
- 前記残留液体の検出は、前記基板の露光後における前記基板表面に対して検出光を照射するとともに、前記基板表面で反射した前記検出光を受光し、前記受光結果に基づいて行う請求項13〜16のいずれか一項記載の基板搬送方法。
- 投影光学系と液体とを介したパターンの像によって露光された基板を搬送する基板搬送方法において、
前記露光された基板を搬送することと、
前記露光された基板上の残留液体を検出することと、を含み、
前記残留液体の検出は、前記基板の裏面に付着している液体の検出を含む基板搬送方法。 - 前記検出結果に基づいて、前記基板の裏面に付着している液体の除去を行う請求項18記載の基板搬送方法。
- 露光方法において、
投影光学系と液体とを介してパターンの像を基板に投影して、前記基板を露光することと、
請求項13〜19のいずれか一項記載の基板搬送方法を用いて、前記露光された基板を搬送することと、を含む露光方法。 - 請求項20記載の露光方法を用いるデバイス製造方法。
- デバイス製造に用いられる装置であって、
液浸露光後の基板を搬送する基板搬送装置と、
前記液浸露光後の前記基板の現像処理前に、前記液浸露光後の前記基板上に残留する液体を検出可能な液体検出器とを備え、
前記液体検出器は、前記液浸露光後の前記基板の表面情報と、前記液浸露光前の前記基板の表面情報と比較することによって、前記残留液体を検出するデバイス製造装置。 - 前記液体検出器の検出結果に基づいて、前記除去装置で液体除去動作を行うか否かが判定される請求項22記載の装置。
- デバイス製造に用いられる装置であって、
液浸露光後の基板を搬送する基板搬送装置と、
前記液浸露光後の前記基板の現像処理前に、前記液浸露光後の前記基板上に残留する液体を検出可能な液体検出器とを備え、
前記液体検出器は、前記基板の裏面に付着している液体を検出するデバイス製造装置。 - 前記液体検出器の検出結果に基づいて、前記基板に対する液体除去動作を行う請求項22〜24のいずれか一項記載の装置。
- 前記液体検出器は、前記液浸露光後の前記基板の表面からの光を受光可能な受光部を有する請求項22〜25のいずれか一項記載の装置。
- 前記液体検出器は、前記液浸露光後の前記基板の表面を撮像する撮像装置を含む請求項26記載の装置。
- 前記液体検出器は、前記液浸露光後の前記基板の表面に検出光を照射可能な照射部を有する請求項26又は27記載の装置。
- 投影光学系をさらに備え、
前記投影光学系と前記基板との間の液体を介して前記基板上にパターン像を投影することによって、前記基板の液浸露光を行う請求項22〜28のいずれか一項記載の装置。 - 前記基板の露光中に、前記基板上から前記液体を回収する回収機構をさらに備え、
前記基板上の残留液体は、前記回収機構で回収しきれなかった液体を含む請求項29記載の装置。 - 前記基板の露光中に、前記基板を保持するステージをさらに備え、
前記液体検出器の検出動作は、前記液浸露光後の前記基板が前記ステージからアンロードされた後に行われる請求項29又は30記載の装置。 - 請求項29〜31のいずれか一項に記載のデバイス製造装置を使って、基板の液浸露光を実行することと、
前記液浸露光後の前記基板の現像処理を実行することと、
を含むデバイス製造方法。 - 液体を介して基板上にパターン像を投影することによって前記基板の液浸露光を実行することと、
前記液浸露光後の前記基板の現像処理前に、前記液浸露光後の前記基板上に残留する液体を検出可能な液体検出器の検出動作を実行することと、を含み、
前記液体検出器は、前記液浸露光後の前記基板の表面情報を、前記液浸露光前の前記基板の表面情報と比較することによって、前記残留液体を検出する露光方法。 - 前記液体検出器の検出結果に基づいて、前記基板に対する液体除去動作を行うか否かを判定する請求項33記載の方法。
- 液体を介して基板上にパターン像を投影することによって前記基板の液浸露光を実行することと、
前記液浸露光後の前記基板の現像処理前に、前記液浸露光後の前記基板上に残留する液体を検出可能な液体検出器の検出動作を実行することと、を含み、
前記液体検出器は、前記液浸露光後の前記基板の裏面に付着している液体を検出する露光方法。 - 前記液浸露光後の前記基板から残留液体を除去することをさらに含む請求項33〜35のいずれか一項記載の方法。
- 前記基板の露光中に前記基板上から液体を回収することをさらに含む請求項33〜36のいずれか一項記載の方法。
- 前記基板をステージ上に保持することをさらに含み、
前記検出動作は、前記ステージから前記液浸露光後の液体をアンロードした後に行われる請求項33〜37のいずれか一項記載の方法。 - 請求項33〜38のいずれか一項に記載の露光方法を用いて基板の液浸露光を実行することと、
前記液浸露光された前記基板の現像処理を実行することと、を含むデバイス製造方法。
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