JP5623390B2 - 真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法 - Google Patents

真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法 Download PDF

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Publication number
JP5623390B2
JP5623390B2 JP2011510915A JP2011510915A JP5623390B2 JP 5623390 B2 JP5623390 B2 JP 5623390B2 JP 2011510915 A JP2011510915 A JP 2011510915A JP 2011510915 A JP2011510915 A JP 2011510915A JP 5623390 B2 JP5623390 B2 JP 5623390B2
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coating chamber
vacuum coating
gas
vacuum
chamber
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JP2011510915A
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Japanese (ja)
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JP2011522117A (ja
Inventor
シュテファン バンゲルト
シュテファン バンゲルト
ホセ マニュエル ディエゲス‐カンポ
ホセ マニュエル ディエゲス‐カンポ
ミヒャエル コーニグ
ミヒャエル コーニグ
ネティ エム クリシュナ
ネティ エム クリシュナ
ビュング スング レオ クワック
ビュング スング レオ クワック
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Applied Materials Inc
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Applied Materials Inc
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Priority claimed from EP08009925.2A external-priority patent/EP2130940B1/en
Priority claimed from US12/130,572 external-priority patent/US8083859B2/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2011522117A publication Critical patent/JP2011522117A/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Secondary Cells (AREA)
JP2011510915A 2008-05-30 2009-04-08 真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法 Expired - Fee Related JP5623390B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP08009925.2A EP2130940B1 (en) 2008-05-30 2008-05-30 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber
EP08009925.2 2008-05-30
US12/130,572 US8083859B2 (en) 2008-05-30 2008-05-30 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber
US12/130,572 2008-05-30
PCT/EP2009/054214 WO2009144071A1 (en) 2008-05-30 2009-04-08 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber

Publications (2)

Publication Number Publication Date
JP2011522117A JP2011522117A (ja) 2011-07-28
JP5623390B2 true JP5623390B2 (ja) 2014-11-12

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JP2011510915A Expired - Fee Related JP5623390B2 (ja) 2008-05-30 2009-04-08 真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法

Country Status (5)

Country Link
JP (1) JP5623390B2 (ko)
KR (1) KR101613982B1 (ko)
CN (1) CN102046833B (ko)
TW (1) TWI391506B (ko)
WO (1) WO2009144071A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5202420B2 (ja) * 2009-04-09 2013-06-05 株式会社アルバック 真空部品に付着した薄膜の除去方法
JP5553898B2 (ja) * 2010-07-13 2014-07-16 株式会社アルバック 成膜装置及び成膜装置の洗浄方法
JP5839556B2 (ja) * 2011-11-18 2016-01-06 株式会社半導体エネルギー研究所 成膜方法
RU2503083C1 (ru) * 2012-05-22 2013-12-27 Закрытое акционерное общество "Инновационный центр "Бирюч" (ЗАО "ИЦ "Бирюч") Дифференциальный спектрометр ионной подвижности
TWI495754B (zh) * 2013-02-01 2015-08-11 Adpv Technology Ltd Intetrust Vacuum coating equipment vacuum measurement device
CN105274465B (zh) * 2015-11-17 2018-01-30 沈阳仪表科学研究院有限公司 真空镀膜腔内部件洁净粗糙表面的再生方法
JP7378220B2 (ja) * 2019-04-17 2023-11-13 株式会社アルバック 成膜装置及び真空部品処理方法
CN110928012A (zh) * 2019-12-06 2020-03-27 深圳市康盛光电科技有限公司 一种调光膜用ito导电膜的防电击穿制备方法
CN112501616B (zh) * 2020-11-10 2023-03-07 合肥综合性国家科学中心能源研究院(安徽省能源实验室) 一种清除粘附于金属样件表面锂合金的方法及装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5055169A (en) * 1989-03-17 1991-10-08 The United States Of America As Represented By The Secretary Of The Army Method of making mixed metal oxide coated substrates
ES2089039T3 (es) * 1990-02-09 1996-10-01 Applied Materials Inc Procedimiento para la eliminacion de material excedente de una camara para la deposicion por chisporroteo y dispositivo para la realizacion del mismo.
DE19609970A1 (de) * 1996-03-14 1997-09-18 Leybold Systems Gmbh Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
JP2002206160A (ja) 2001-01-09 2002-07-26 Sumitomo Electric Ind Ltd 薄膜製造装置、薄膜形成方法および薄膜製造装置用部材
US20020185067A1 (en) * 2001-06-07 2002-12-12 International Business Machines Corporation Apparatus and method for in-situ cleaning of a throttle valve in a CVD system
JP2003007290A (ja) * 2001-06-19 2003-01-10 Sanyo Electric Co Ltd リチウム二次電池用電極の製造装置
JP2003229365A (ja) * 2002-02-04 2003-08-15 Central Glass Co Ltd 混合クリーニングガス組成物
DE10358275A1 (de) * 2003-12-11 2005-07-21 Wiessner Gmbh Vorrichtung und Verfahren zum Reinigen wenigstens einer Prozesskammer zum Beschichten wenigstens eines Substrats
KR100893955B1 (ko) * 2004-02-19 2009-04-20 도쿄엘렉트론가부시키가이샤 기판 처리 장치에 있어서의 처리실의 클리닝 방법 및 클리닝의 종점 검출 방법
KR100989974B1 (ko) * 2005-02-02 2010-10-26 도쿄엘렉트론가부시키가이샤 클리닝 방법 및 플라즈마 처리 방법
EP2081682B1 (en) * 2006-09-08 2018-05-30 Signa Chemistry, Inc. Lithium reagent porous metal oxide compositions

Also Published As

Publication number Publication date
CN102046833A (zh) 2011-05-04
JP2011522117A (ja) 2011-07-28
KR101613982B1 (ko) 2016-04-20
TWI391506B (zh) 2013-04-01
TW201006942A (en) 2010-02-16
CN102046833B (zh) 2013-03-27
KR20110015659A (ko) 2011-02-16
WO2009144071A1 (en) 2009-12-03

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