ES2089039T3 - Procedimiento para la eliminacion de material excedente de una camara para la deposicion por chisporroteo y dispositivo para la realizacion del mismo. - Google Patents
Procedimiento para la eliminacion de material excedente de una camara para la deposicion por chisporroteo y dispositivo para la realizacion del mismo.Info
- Publication number
- ES2089039T3 ES2089039T3 ES91101670T ES91101670T ES2089039T3 ES 2089039 T3 ES2089039 T3 ES 2089039T3 ES 91101670 T ES91101670 T ES 91101670T ES 91101670 T ES91101670 T ES 91101670T ES 2089039 T3 ES2089039 T3 ES 2089039T3
- Authority
- ES
- Spain
- Prior art keywords
- chamber
- sparkling
- elimination
- realization
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
METODO PARA LA LIMPIEZA EN SITU DEL EXCESO DEL MATERIAL DEPOSITADO EN EL ANODO, EN UNA CAMARA DE DEPOSICION FISICA DE VAPOR (14), DURANTE UN CICLO DE LIMPIEZA, EN LA QUE SE HA EFECTUADO EL VACIO EN DICHA CAMARA (14) . UNA MEZCLA DE GAS QUE INCLUYE UN GAS REACTIVO, SE INTRODUCE DENTRO DE LA CAMARA DE DEPOSITO FISICO DE VAPOR (14). EL GAS REACTIVO SE ACTIVA MEDIANTE LA DESCARGA DE PLASMA. DURANTE LA LIMPIEZA, LA MEZCLA DE GAS ES CAMBIADA DE FORMA CONTINUA EN LA CAMARA DE DEPOSICION DE VAPOR (14), JUNTO CON LOS PRODUCTOS DE REACCION.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47778890A | 1990-02-09 | 1990-02-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2089039T3 true ES2089039T3 (es) | 1996-10-01 |
Family
ID=23897364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES91101670T Expired - Lifetime ES2089039T3 (es) | 1990-02-09 | 1991-02-07 | Procedimiento para la eliminacion de material excedente de una camara para la deposicion por chisporroteo y dispositivo para la realizacion del mismo. |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0441368B1 (es) |
JP (1) | JP2628795B2 (es) |
KR (1) | KR100220292B1 (es) |
DE (1) | DE69119253T2 (es) |
ES (1) | ES2089039T3 (es) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391275A (en) * | 1990-03-02 | 1995-02-21 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
US5907220A (en) * | 1996-03-13 | 1999-05-25 | Applied Materials, Inc. | Magnetron for low pressure full face erosion |
WO2002037543A2 (en) * | 2000-10-31 | 2002-05-10 | Applied Materials, Inc. | Method and apparatus for cleaning a deposition chamber |
EP2130940B1 (en) | 2008-05-30 | 2017-04-05 | Applied Materials, Inc. | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
WO2009144071A1 (en) * | 2008-05-30 | 2009-12-03 | Applied Materials, Inc. | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
US8083859B2 (en) | 2008-05-30 | 2011-12-27 | Applied Materials, Inc. | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61140506A (ja) * | 1984-12-13 | 1986-06-27 | Tokuyama Soda Co Ltd | 除草剤組成物 |
US4786352A (en) * | 1986-09-12 | 1988-11-22 | Benzing Technologies, Inc. | Apparatus for in-situ chamber cleaning |
JPH0692636B2 (ja) * | 1987-05-28 | 1994-11-16 | 株式会社島津製作所 | プラズマcvd装置 |
EP0296891B1 (en) * | 1987-06-26 | 1996-01-10 | Applied Materials, Inc. | Process for self-cleaning of a reactor chamber |
-
1991
- 1991-02-07 EP EP91101670A patent/EP0441368B1/en not_active Expired - Lifetime
- 1991-02-07 ES ES91101670T patent/ES2089039T3/es not_active Expired - Lifetime
- 1991-02-07 DE DE69119253T patent/DE69119253T2/de not_active Expired - Fee Related
- 1991-02-08 KR KR1019910002154A patent/KR100220292B1/ko not_active IP Right Cessation
- 1991-02-08 JP JP3018067A patent/JP2628795B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0441368B1 (en) | 1996-05-08 |
KR100220292B1 (ko) | 1999-09-15 |
EP0441368A1 (en) | 1991-08-14 |
JP2628795B2 (ja) | 1997-07-09 |
DE69119253D1 (de) | 1996-06-13 |
JPH0770771A (ja) | 1995-03-14 |
KR910015719A (ko) | 1991-09-30 |
DE69119253T2 (de) | 1996-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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