JP5614532B2 - 半導体基板、光電変換デバイス、半導体基板の製造方法、および光電変換デバイスの製造方法 - Google Patents
半導体基板、光電変換デバイス、半導体基板の製造方法、および光電変換デバイスの製造方法 Download PDFInfo
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- 229910052710 silicon Inorganic materials 0.000 claims description 23
- 239000010703 silicon Substances 0.000 claims description 23
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- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
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- 239000011574 phosphorus Substances 0.000 description 2
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- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
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- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910000078 germane Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 238000005247 gettering Methods 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- ZRLCXMPFXYVHGS-UHFFFAOYSA-N tetramethylgermane Chemical compound C[Ge](C)(C)C ZRLCXMPFXYVHGS-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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Description
(特許文献1)特開平5−3332号公報
Claims (23)
- シリコンを含むベース基板と、
前記ベース基板上に形成され、前記ベース基板の表面を露出する開口を有し、結晶成長を阻害する阻害体と、
前記開口の内部に露出された前記ベース基板の表面に接して、前記開口の内部に形成され、第1半導体、第2半導体および第3半導体を有する光吸収構造体と、
を備え、
前記第1半導体が、
第1伝導型第1半導体と、
前記第1伝導型第1半導体の上方に形成され、前記第1伝導型第1半導体と反対の伝導型を有する第2伝導型第1半導体と、
前記第1伝導型第1半導体と前記第2伝導型第1半導体との間に形成され、前記第1伝導型第1半導体および前記第2伝導型第1半導体よりも有効キャリア濃度が低い低キャリア濃度第1半導体と、を含み、
前記第2半導体が、
前記第2伝導型第1半導体に格子整合または擬格子整合し、前記第2伝導型第1半導体と反対の伝導型を有する第1伝導型第2半導体と、
前記第1伝導型第2半導体の上方に形成され、前記第1伝導型第2半導体と反対の伝導型を有する第2伝導型第2半導体と、
前記第1伝導型第2半導体と前記第2伝導型第2半導体との間に形成され、前記第1伝導型第2半導体および前記第2伝導型第2半導体よりも有効キャリア濃度が低い低キャリア濃度第2半導体と、を含み、
前記第3半導体が、
前記第2伝導型第2半導体に格子整合または擬格子整合する第1伝導型第3半導体と、
前記第1伝導型第3半導体の上方に形成され、前記第1伝導型第3半導体と反対の伝導型を有する第2伝導型第3半導体と、
前記第1伝導型第3半導体と前記第2伝導型第3半導体との間に形成され、前記第1伝導型第3半導体および前記第2伝導型第3半導体よりも有効キャリア濃度が低い低キャリア濃度第3半導体と、を含み、
前記第1半導体、前記第2半導体、および前記第3半導体から選択された1以上の半導体は、前記第1半導体、前記第2半導体、および前記第3半導体のそれぞれにおける前記ベース基板に平行な面の中心からの距離がより大きな位置において、より大きな禁制帯幅となる組成分布を有する
半導体基板。 - 前記第1半導体は、第1禁制帯幅を有する材料を有し、
前記第2半導体は、前記第1禁制帯幅より大きな第2禁制帯幅を有する材料を有し、
前記第3半導体は、前記第2禁制帯幅より大きな第3禁制帯幅を有する材料を有する請求項1に記載の半導体基板。 - 前記第1半導体は、Cx1Siy1Gez1Sn1−x1−y1−z1(0≦x1<1、0≦y1≦1、0≦z1≦1、かつ0<x1+y1+z1≦1)からなり、
前記第2半導体は、Alx2Iny2Ga1−x2−y2Asz2Pw1N1−z2−w1(0≦x2≦1、0≦y2≦1、かつ0≦x2+y2≦1,および0≦z2≦1、0≦w1≦1、かつ0≦z2+w1≦1)からなり、
前記第3半導体は、Alx3Iny3Ga1−x3−y3Asz3P1−z3(0≦x3≦1、0≦y3≦1、0≦z3≦1、かつ0≦x3+y3≦1)からなる請求項2に記載の半導体基板。 - 前記光吸収構造体は、光の照射を受けてキャリアを励起し、
前記ベース基板と前記第1伝導型第1半導体との間、前記第2伝導型第1半導体と前記第1伝導型第2半導体との間、前記第2伝導型第2半導体と前記第1伝導型第3半導体との間、および前記第2伝導型第3半導体の前記低キャリア濃度第3半導体と接する面と反対の面上の少なくとも一つの位置に、前記キャリアの再結合を抑制する再結合抑制層を有する請求項1から請求項3の何れか一項に記載の半導体基板。 - 前記光吸収構造体の側壁に接して形成された、前記側壁における前記キャリアの再結合を抑制する再結合抑制体をさらに備える請求項4に記載の半導体基板。
- 前記第2伝導型第1半導体と前記第1伝導型第2半導体との間、および、前記第2伝導型第2半導体と前記第1伝導型第3半導体との間の少なくとも一つの位置に、P型不純物が高濃度にドープされたP型不純物層およびN型不純物が高濃度にドープされたN型不純物層を有するトンネル接合層をさらに備える請求項1から請求項5の何れか一項に記載の半導体基板。
- 前記第1半導体および前記第2半導体の積層方向における前記ベース基板からの距離に応じて前記第1半導体の組成が変化している請求項1から請求項6の何れか一項に記載の半導体基板。
- 前記第1半導体は、前記ベース基板からの距離が大きいほどシリコンの割合が少ない組成を有する請求項7に記載の半導体基板。
- 前記阻害体は複数の前記開口を有し、前記複数の開口内に形成された複数の前記光吸収構造体を備える請求項1から請求項8の何れか一項に記載の半導体基板。
- 請求項1から請求項9の何れか一項に記載の半導体基板を備え、前記光吸収構造体への入射光を電力に変換する光電変換デバイス。
- 前記入射光の少なくとも一部を集光して前記光吸収構造体に入射する集光部をさらに備える請求項10に記載の光電変換デバイス。
- 前記集光部は、前記入射光が含む第1色領域の光を集光して前記低キャリア濃度第1半導体に入射し、前記第1色領域より短波長域の第2色領域の光を集光して前記低キャリア濃度第2半導体に入射する請求項11に記載の光電変換デバイス。
- 前記光吸収構造体における前記入射光が入射する面に配置された透明電極と、
前記透明電極に接続された配線と
をさらに備え、
前記配線は、前記入射光が前記透明電極に入射する経路に重なることなく配置されている請求項11または請求項12に記載の光電変換デバイス。 - 前記ベース基板に含まれる前記シリコンと前記光吸収構造体とが電気的に結合され、前記入射光の入射を受けて、前記透明電極と前記シリコンとの間に起電力を発生する
請求項13に記載の光電変換デバイス。 - 前記ベース基板が、前記シリコンのバルク領域から電気的に分離されかつ前記光吸収構造体と電気的に結合しているウェル領域を有し、
前記入射光の入射を受けて、前記透明電極と前記ウェル領域との間に起電力を発生する請求項13に記載の光電変換デバイス。 - 前記集光部の表面を覆い、前記第1半導体の禁制帯幅に相当する波長より長い波長の光を吸収または反射する光学膜をさらに備える請求項11から請求項15の何れか一項に記載の光電変換デバイス。
- 前記入射光が前記光吸収構造体に入射する経路に配置された重金属を含有する耐放射線膜をさらに備える請求項11から請求項16の何れか一項に記載の光電変換デバイス。
- 前記阻害体は複数の前記開口を有し、
前記複数の開口内に形成された複数の前記光吸収構造体を有し、
前記複数の光吸収構造体のそれぞれに対応する前記集光部を備える請求項11から請求項17の何れか一項に記載の光電変換デバイス。 - 前記複数の光吸収構造体の各々は、互いに直列または並列に接続されている請求項18に記載の光電変換デバイス。
- 前記互いに直列または並列に接続されている前記複数の光吸収構造体は、他の互いに直列または並列に接続されている複数の光吸収構造体と並列または直列に接続されている請求項19に記載の光電変換デバイス。
- シリコンを含むベース基板の上方に阻害体を形成する段階と、
前記阻害体に、前記ベース基板の表面を露出する開口を形成する段階と、
前記開口の内部に、第1伝導型第1半導体を形成する段階と、
前記第1伝導型第1半導体の上方に、低キャリア濃度第1半導体を形成する段階と、
前記低キャリア濃度第1半導体の上方に、前記第1伝導型第1半導体と反対の伝導型を有する第2伝導型第1半導体を形成する段階と、
前記第2伝導型第1半導体の上方に、前記第2伝導型第1半導体に格子整合または擬格子整合する第1伝導型第2半導体を形成する段階と、
前記第1伝導型第2半導体の上方に、低キャリア濃度第2半導体を形成する段階と、
前記低キャリア濃度第2半導体の上方に、前記第1伝導型第2半導体と反対の伝導型を有する第2伝導型第2半導体を形成する段階と、
前記第2伝導型第2半導体の上方に、前記第2伝導型第2半導体に格子整合または擬格子整合する第1伝導型第3半導体を形成する段階と、
前記第1伝導型第3半導体の上方に、低キャリア濃度第3半導体を形成する段階と、
前記低キャリア濃度第3半導体の上方に、前記第1伝導型第3半導体と反対の伝導型を有する第2伝導型第3半導体を形成する段階と、
を備え、
前記低キャリア濃度第1半導体は、前記第1伝導型第1半導体および前記第2伝導型第1半導体よりも低い有効キャリア濃度を有し、
前記低キャリア濃度第2半導体は、前記第1伝導型第2半導体および前記第2伝導型第2半導体よりも低い有効キャリア濃度を有し、
前記低キャリア濃度第3半導体は、前記第1伝導型第3半導体および前記第2伝導型第3半導体よりも低い有効キャリア濃度を有し、
前記第1伝導型第1半導体、前記低キャリア濃度第1半導体および前記第2伝導型第1半導体を含む第1半導体と、前記第1伝導型第2半導体、前記低キャリア濃度第2半導体および前記第2伝導型第2半導体を含む第2半導体と、前記第1伝導型第3半導体、前記低キャリア濃度第3半導体および前記第2伝導型第3半導体を含む第3半導体とから選択された1以上の半導体を、前記第1半導体、前記第2半導体、および前記第3半導体のそれぞれにおける前記ベース基板に平行な面の中心からの距離がより大きな位置において、より大きな禁制帯幅となるよう組成分布を形成する
半導体基板の製造方法。 - 前記第1半導体を形成する段階と、前記第2半導体を形成する段階との間において、前記第1半導体を加熱する請求項21に記載の半導体基板の製造方法。
- 請求項21または請求項22に記載の半導体基板の製造方法を適用して、少なくとも前記第1半導体および前記第2半導体を有する光吸収構造体を形成する段階と、
前記光吸収構造体を直列または並列に接続する段階と
を備える光電変換デバイスの製造方法。
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TW201019375A (en) | 2008-10-02 | 2010-05-16 | Sumitomo Chemical Co | Semiconductor wafer, electronic device, and method for making a semiconductor wafer |
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WO2010140371A1 (ja) | 2010-12-09 |
CN102449775B (zh) | 2014-07-02 |
US8835980B2 (en) | 2014-09-16 |
CN102449775A (zh) | 2012-05-09 |
US20120074463A1 (en) | 2012-03-29 |
TWI495119B (zh) | 2015-08-01 |
KR20120018143A (ko) | 2012-02-29 |
TW201108423A (en) | 2011-03-01 |
JP2011014897A (ja) | 2011-01-20 |
KR101643021B1 (ko) | 2016-07-26 |
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