JP5597885B2 - Ｌｐｐ、ｅｕｖ光源駆動レーザシステム - Google Patents

Ｌｐｐ、ｅｕｖ光源駆動レーザシステム Download PDF

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Publication number
JP5597885B2
JP5597885B2 JP2008519481A JP2008519481A JP5597885B2 JP 5597885 B2 JP5597885 B2 JP 5597885B2 JP 2008519481 A JP2008519481 A JP 2008519481A JP 2008519481 A JP2008519481 A JP 2008519481A JP 5597885 B2 JP5597885 B2 JP 5597885B2
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Prior art keywords
laser
pulse
laser beam
euv light
light source
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Expired - Fee Related
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JP2009500796A5 (enExample
JP2009500796A (ja
Inventor
アレクサンダー アイ アーショフ
アレクサンダー エヌ ビカノフ
オリー ヴィー コーディキン
イゴー ヴィー フォーメンコフ
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エーエスエムエル ネザーランズ ビー．ブイ．
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Priority claimed from US11/217,161 external-priority patent/US7482609B2/en
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Publication of JP2009500796A5 publication Critical patent/JP2009500796A5/ja
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2008519481A 2005-06-29 2006-06-27 Ｌｐｐ、ｅｕｖ光源駆動レーザシステム Expired - Fee Related JP5597885B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/174,299 2005-06-29
US11/174,299 US7439530B2 (en) 2005-06-29 2005-06-29 LPP EUV light source drive laser system
US11/217,161 2005-08-31
US11/217,161 US7482609B2 (en) 2005-02-28 2005-08-31 LPP EUV light source drive laser system
PCT/US2006/024960 WO2007005415A2 (en) 2005-06-29 2006-06-27 Lpp euv light source drive laser system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014084934A Division JP2014160670A (ja) 2005-06-29 2014-04-16 Ｌｐｐ、ｅｕｖ光源駆動レーザシステム

Publications (3)

Publication Number Publication Date
JP2009500796A JP2009500796A (ja) 2009-01-08
JP2009500796A5 JP2009500796A5 (enExample) 2009-08-13
JP5597885B2 true JP5597885B2 (ja) 2014-10-01

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US (3) US7439530B2 (enExample)
JP (1) JP5597885B2 (enExample)

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