|
US2759106A
(en)
|
1951-05-25 |
1956-08-14 |
Wolter Hans |
Optical image-forming mirror system providing for grazing incidence of rays
|
|
US3279176A
(en)
|
1959-07-31 |
1966-10-18 |
North American Aviation Inc |
Ion rocket engine
|
|
US3150483A
(en)
|
1962-05-10 |
1964-09-29 |
Aerospace Corp |
Plasma generator and accelerator
|
|
US3232046A
(en)
*
|
1962-06-06 |
1966-02-01 |
Aerospace Corp |
Plasma generator and propulsion exhaust system
|
|
US3746870A
(en)
*
|
1970-12-21 |
1973-07-17 |
Gen Electric |
Coated light conduit
|
|
US3969628A
(en)
*
|
1974-04-04 |
1976-07-13 |
The United States Of America As Represented By The Secretary Of The Army |
Intense, energetic electron beam assisted X-ray generator
|
|
US4042848A
(en)
|
1974-05-17 |
1977-08-16 |
Ja Hyun Lee |
Hypocycloidal pinch device
|
|
US3946332A
(en)
*
|
1974-06-13 |
1976-03-23 |
Samis Michael A |
High power density continuous wave plasma glow jet laser system
|
|
US3961197A
(en)
*
|
1974-08-21 |
1976-06-01 |
The United States Of America As Represented By The United States Energy Research And Development Administration |
X-ray generator
|
|
US3960473A
(en)
*
|
1975-02-06 |
1976-06-01 |
The Glastic Corporation |
Die structure for forming a serrated rod
|
|
US4223279A
(en)
|
1977-07-18 |
1980-09-16 |
Mathematical Sciences Northwest, Inc. |
Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
|
|
US4162160A
(en)
|
1977-08-25 |
1979-07-24 |
Fansteel Inc. |
Electrical contact material and method for making the same
|
|
US4143275A
(en)
*
|
1977-09-28 |
1979-03-06 |
Battelle Memorial Institute |
Applying radiation
|
|
US4203393A
(en)
*
|
1979-01-04 |
1980-05-20 |
Ford Motor Company |
Plasma jet ignition engine and method
|
|
JPS5756668A
(en)
*
|
1980-09-18 |
1982-04-05 |
Nissan Motor Co Ltd |
Plasma igniter
|
|
US4364342A
(en)
|
1980-10-01 |
1982-12-21 |
Ford Motor Company |
Ignition system employing plasma spray
|
|
USRE34806E
(en)
|
1980-11-25 |
1994-12-13 |
Celestech, Inc. |
Magnetoplasmadynamic processor, applications thereof and methods
|
|
US4550408A
(en)
|
1981-02-27 |
1985-10-29 |
Heinrich Karning |
Method and apparatus for operating a gas laser
|
|
US4538291A
(en)
|
1981-11-09 |
1985-08-27 |
Kabushiki Kaisha Suwa Seikosha |
X-ray source
|
|
US4455658A
(en)
*
|
1982-04-20 |
1984-06-19 |
Sutter Jr Leroy V |
Coupling circuit for use with a transversely excited gas laser
|
|
US4633492A
(en)
|
1982-09-20 |
1986-12-30 |
Eaton Corporation |
Plasma pinch X-ray method
|
|
US4536884A
(en)
|
1982-09-20 |
1985-08-20 |
Eaton Corporation |
Plasma pinch X-ray apparatus
|
|
US4504964A
(en)
*
|
1982-09-20 |
1985-03-12 |
Eaton Corporation |
Laser beam plasma pinch X-ray system
|
|
US4618971A
(en)
|
1982-09-20 |
1986-10-21 |
Eaton Corporation |
X-ray lithography system
|
|
US4507588A
(en)
*
|
1983-02-28 |
1985-03-26 |
Board Of Trustees Operating Michigan State University |
Ion generating apparatus and method for the use thereof
|
|
US4534035A
(en)
|
1983-08-09 |
1985-08-06 |
Northrop Corporation |
Tandem electric discharges for exciting lasers
|
|
DE3332711A1
(de)
*
|
1983-09-10 |
1985-03-28 |
Fa. Carl Zeiss, 7920 Heidenheim |
Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
|
|
JPS60175351A
(ja)
*
|
1984-02-14 |
1985-09-09 |
Nippon Telegr & Teleph Corp <Ntt> |
Ｘ線発生装置およびｘ線露光法
|
|
US4561406A
(en)
|
1984-05-25 |
1985-12-31 |
Combustion Electromagnetics, Inc. |
Winged reentrant electromagnetic combustion chamber
|
|
US4837794A
(en)
*
|
1984-10-12 |
1989-06-06 |
Maxwell Laboratories Inc. |
Filter apparatus for use with an x-ray source
|
|
US4626193A
(en)
|
1985-08-02 |
1986-12-02 |
Itt Corporation |
Direct spark ignition system
|
|
JPH0653594B2
(ja)
|
1985-09-04 |
1994-07-20 |
株式会社フジクラ |
導体組成物
|
|
US4774914A
(en)
|
1985-09-24 |
1988-10-04 |
Combustion Electromagnetics, Inc. |
Electromagnetic ignition--an ignition system producing a large size and intense capacitive and inductive spark with an intense electromagnetic field feeding the spark
|
|
CA1239487A
(en)
*
|
1985-10-03 |
1988-07-19 |
National Research Council Of Canada |
Multiple vacuum arc derived plasma pinch x-ray source
|
|
CA1239486A
(en)
*
|
1985-10-03 |
1988-07-19 |
Rajendra P. Gupta |
Gas discharge derived annular plasma pinch x-ray source
|
|
US4891820A
(en)
*
|
1985-12-19 |
1990-01-02 |
Rofin-Sinar, Inc. |
Fast axial flow laser circulating system
|
|
US5315611A
(en)
*
|
1986-09-25 |
1994-05-24 |
The United States Of America As Represented By The United States Department Of Energy |
High average power magnetic modulator for metal vapor lasers
|
|
US5189678A
(en)
*
|
1986-09-29 |
1993-02-23 |
The United States Of America As Represented By The United States Department Of Energy |
Coupling apparatus for a metal vapor laser
|
|
US4959840A
(en)
|
1988-01-15 |
1990-09-25 |
Cymer Laser Technologies |
Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
|
|
US5023884A
(en)
*
|
1988-01-15 |
1991-06-11 |
Cymer Laser Technologies |
Compact excimer laser
|
|
US5025446A
(en)
*
|
1988-04-01 |
1991-06-18 |
Laserscope |
Intra-cavity beam relay for optical harmonic generation
|
|
US4928020A
(en)
*
|
1988-04-05 |
1990-05-22 |
The United States Of America As Represented By The United States Department Of Energy |
Saturable inductor and transformer structures for magnetic pulse compression
|
|
JPH02105478A
(ja)
|
1988-10-14 |
1990-04-18 |
Toshiba Corp |
レーザ発振器
|
|
IT1231783B
(it)
|
1989-05-12 |
1992-01-14 |
Enea |
Testa laser per eccitazione a scarica trasversa con tre elettrodi
|
|
DE3927089C1
(enExample)
*
|
1989-08-17 |
1991-04-25 |
Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De |
|
|
US5005180A
(en)
*
|
1989-09-01 |
1991-04-02 |
Schneider (Usa) Inc. |
Laser catheter system
|
|
US5102776A
(en)
*
|
1989-11-09 |
1992-04-07 |
Cornell Research Foundation, Inc. |
Method and apparatus for microlithography using x-pinch x-ray source
|
|
IL96186A
(en)
|
1989-11-20 |
1994-08-26 |
Hughes Aircraft Co |
Master oscillator power amplifier with interference isolated oscillator
|
|
US5025445A
(en)
*
|
1989-11-22 |
1991-06-18 |
Cymer Laser Technologies |
System for, and method of, regulating the wavelength of a light beam
|
|
US5027076A
(en)
*
|
1990-01-29 |
1991-06-25 |
Ball Corporation |
Open cage density sensor
|
|
US5226948A
(en)
|
1990-08-30 |
1993-07-13 |
University Of Southern California |
Method and apparatus for droplet stream manufacturing
|
|
US5171360A
(en)
|
1990-08-30 |
1992-12-15 |
University Of Southern California |
Method for droplet stream manufacturing
|
|
US5259593A
(en)
|
1990-08-30 |
1993-11-09 |
University Of Southern California |
Apparatus for droplet stream manufacturing
|
|
US5175755A
(en)
|
1990-10-31 |
1992-12-29 |
X-Ray Optical System, Inc. |
Use of a kumakhov lens for x-ray lithography
|
|
US5471965A
(en)
|
1990-12-24 |
1995-12-05 |
Kapich; Davorin D. |
Very high speed radial inflow hydraulic turbine
|
|
US5126638A
(en)
*
|
1991-05-13 |
1992-06-30 |
Maxwell Laboratories, Inc. |
Coaxial pseudospark discharge switch
|
|
US5142166A
(en)
|
1991-10-16 |
1992-08-25 |
Science Research Laboratory, Inc. |
High voltage pulsed power source
|
|
JPH0816720B2
(ja)
*
|
1992-04-21 |
1996-02-21 |
日本航空電子工業株式会社 |
軟ｘ線多層膜反射鏡
|
|
US5359620A
(en)
|
1992-11-12 |
1994-10-25 |
Cymer Laser Technologies |
Apparatus for, and method of, maintaining a clean window in a laser
|
|
US5411224A
(en)
*
|
1993-04-08 |
1995-05-02 |
Dearman; Raymond M. |
Guard for jet engine
|
|
US5313481A
(en)
*
|
1993-09-29 |
1994-05-17 |
The United States Of America As Represented By The United States Department Of Energy |
Copper laser modulator driving assembly including a magnetic compression laser
|
|
US5448580A
(en)
|
1994-07-05 |
1995-09-05 |
The United States Of America As Represented By The United States Department Of Energy |
Air and water cooled modulator
|
|
US5521031A
(en)
*
|
1994-10-20 |
1996-05-28 |
At&T Corp. |
Pattern delineating apparatus for use in the EUV spectrum
|
|
JP3650154B2
(ja)
*
|
1994-12-06 |
2005-05-18 |
オリンパス株式会社 |
レーザプラズマ光源
|
|
US5504795A
(en)
*
|
1995-02-06 |
1996-04-02 |
Plex Corporation |
Plasma X-ray source
|
|
DE69628514T2
(de)
*
|
1995-02-17 |
2004-04-29 |
Cymer, Inc., San Diego |
Leistungspulsgenerator mit energierückgewinnung
|
|
JPH08236292A
(ja)
*
|
1995-02-27 |
1996-09-13 |
Hitachi Ltd |
レーザプラズマｘ線発生装置
|
|
US5894980A
(en)
*
|
1995-09-25 |
1999-04-20 |
Rapid Analysis Development Comapny |
Jet soldering system and method
|
|
US5938102A
(en)
|
1995-09-25 |
1999-08-17 |
Muntz; Eric Phillip |
High speed jet soldering system
|
|
US6186192B1
(en)
*
|
1995-09-25 |
2001-02-13 |
Rapid Analysis And Development Company |
Jet soldering system and method
|
|
US6276589B1
(en)
|
1995-09-25 |
2001-08-21 |
Speedline Technologies, Inc. |
Jet soldering system and method
|
|
US5894985A
(en)
*
|
1995-09-25 |
1999-04-20 |
Rapid Analysis Development Company |
Jet soldering system and method
|
|
US5830336A
(en)
*
|
1995-12-05 |
1998-11-03 |
Minnesota Mining And Manufacturing Company |
Sputtering of lithium
|
|
JP2836566B2
(ja)
|
1995-12-08 |
1998-12-14 |
日本電気株式会社 |
波長安定化狭帯域エキシマレーザ装置
|
|
US5863017A
(en)
*
|
1996-01-05 |
1999-01-26 |
Cymer, Inc. |
Stabilized laser platform and module interface
|
|
US6224180B1
(en)
*
|
1997-02-21 |
2001-05-01 |
Gerald Pham-Van-Diep |
High speed jet soldering system
|
|
US6031241A
(en)
*
|
1997-03-11 |
2000-02-29 |
University Of Central Florida |
Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
|
|
US5963616A
(en)
|
1997-03-11 |
1999-10-05 |
University Of Central Florida |
Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
|
|
JP3385898B2
(ja)
|
1997-03-24 |
2003-03-10 |
安藤電気株式会社 |
可変波長半導体レーザ光源
|
|
US5982800A
(en)
|
1997-04-23 |
1999-11-09 |
Cymer, Inc. |
Narrow band excimer laser
|
|
US6128323A
(en)
|
1997-04-23 |
2000-10-03 |
Cymer, Inc. |
Reliable modular production quality narrow-band high REP rate excimer laser
|
|
US5991324A
(en)
|
1998-03-11 |
1999-11-23 |
Cymer, Inc. |
Reliable. modular, production quality narrow-band KRF excimer laser
|
|
US5936988A
(en)
|
1997-12-15 |
1999-08-10 |
Cymer, Inc. |
High pulse rate pulse power system
|
|
US5866871A
(en)
*
|
1997-04-28 |
1999-02-02 |
Birx; Daniel |
Plasma gun and methods for the use thereof
|
|
US6172324B1
(en)
*
|
1997-04-28 |
2001-01-09 |
Science Research Laboratory, Inc. |
Plasma focus radiation source
|
|
US6064072A
(en)
*
|
1997-05-12 |
2000-05-16 |
Cymer, Inc. |
Plasma focus high energy photon source
|
|
US6744060B2
(en)
*
|
1997-05-12 |
2004-06-01 |
Cymer, Inc. |
Pulse power system for extreme ultraviolet and x-ray sources
|
|
US5763930A
(en)
*
|
1997-05-12 |
1998-06-09 |
Cymer, Inc. |
Plasma focus high energy photon source
|
|
US6566667B1
(en)
*
|
1997-05-12 |
2003-05-20 |
Cymer, Inc. |
Plasma focus light source with improved pulse power system
|
|
US6815700B2
(en)
*
|
1997-05-12 |
2004-11-09 |
Cymer, Inc. |
Plasma focus light source with improved pulse power system
|
|
US6586757B2
(en)
|
1997-05-12 |
2003-07-01 |
Cymer, Inc. |
Plasma focus light source with active and buffer gas control
|
|
US6452199B1
(en)
|
1997-05-12 |
2002-09-17 |
Cymer, Inc. |
Plasma focus high energy photon source with blast shield
|
|
US6566668B2
(en)
*
|
1997-05-12 |
2003-05-20 |
Cymer, Inc. |
Plasma focus light source with tandem ellipsoidal mirror units
|
|
US5856991A
(en)
*
|
1997-06-04 |
1999-01-05 |
Cymer, Inc. |
Very narrow band laser
|
|
US6094448A
(en)
|
1997-07-01 |
2000-07-25 |
Cymer, Inc. |
Grating assembly with bi-directional bandwidth control
|
|
US6192064B1
(en)
*
|
1997-07-01 |
2001-02-20 |
Cymer, Inc. |
Narrow band laser with fine wavelength control
|
|
US6018537A
(en)
*
|
1997-07-18 |
2000-01-25 |
Cymer, Inc. |
Reliable, modular, production quality narrow-band high rep rate F2 laser
|
|
US5852621A
(en)
|
1997-07-21 |
1998-12-22 |
Cymer, Inc. |
Pulse laser with pulse energy trimmer
|
|
US6529531B1
(en)
*
|
1997-07-22 |
2003-03-04 |
Cymer, Inc. |
Fast wavelength correction technique for a laser
|
|
US6621846B1
(en)
|
1997-07-22 |
2003-09-16 |
Cymer, Inc. |
Electric discharge laser with active wavelength chirp correction
|
|
US6671294B2
(en)
*
|
1997-07-22 |
2003-12-30 |
Cymer, Inc. |
Laser spectral engineering for lithographic process
|
|
US6721340B1
(en)
*
|
1997-07-22 |
2004-04-13 |
Cymer, Inc. |
Bandwidth control technique for a laser
|
|
US6757316B2
(en)
*
|
1999-12-27 |
2004-06-29 |
Cymer, Inc. |
Four KHz gas discharge laser
|
|
US5953360A
(en)
|
1997-10-24 |
1999-09-14 |
Synrad, Inc. |
All metal electrode sealed gas laser
|
|
US6151346A
(en)
|
1997-12-15 |
2000-11-21 |
Cymer, Inc. |
High pulse rate pulse power system with fast rise time and low current
|
|
JP2000252096A
(ja)
*
|
1998-01-16 |
2000-09-14 |
Toyota Central Res & Dev Lab Inc |
Ｘ線発生装置
|
|
US5978406A
(en)
*
|
1998-01-30 |
1999-11-02 |
Cymer, Inc. |
Fluorine control system for excimer lasers
|
|
US6151349A
(en)
|
1998-03-04 |
2000-11-21 |
Cymer, Inc. |
Automatic fluorine control system
|
|
US6240117B1
(en)
*
|
1998-01-30 |
2001-05-29 |
Cymer, Inc. |
Fluorine control system with fluorine monitor
|
|
US6219360B1
(en)
*
|
1998-04-24 |
2001-04-17 |
Trw Inc. |
High average power solid-state laser system with phase front control
|
|
US6016325A
(en)
*
|
1998-04-27 |
2000-01-18 |
Cymer, Inc. |
Magnetic modulator voltage and temperature timing compensation circuit
|
|
JP2000058944A
(ja)
|
1998-05-20 |
2000-02-25 |
Cymer Inc |
高信頼性・モジュラ製造高品質狭帯域高繰り返しレ―トｆ２レ―ザ
|
|
US6580517B2
(en)
*
|
2000-03-01 |
2003-06-17 |
Lambda Physik Ag |
Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
|
|
US6618421B2
(en)
*
|
1998-07-18 |
2003-09-09 |
Cymer, Inc. |
High repetition rate gas discharge laser with precise pulse timing control
|
|
US6442181B1
(en)
|
1998-07-18 |
2002-08-27 |
Cymer, Inc. |
Extreme repetition rate gas discharge laser
|
|
US6477193B2
(en)
|
1998-07-18 |
2002-11-05 |
Cymer, Inc. |
Extreme repetition rate gas discharge laser with improved blower motor
|
|
US6208675B1
(en)
*
|
1998-08-27 |
2001-03-27 |
Cymer, Inc. |
Blower assembly for a pulsed laser system incorporating ceramic bearings
|
|
US6067311A
(en)
*
|
1998-09-04 |
2000-05-23 |
Cymer, Inc. |
Excimer laser with pulse multiplier
|
|
US6493374B1
(en)
|
1999-09-03 |
2002-12-10 |
Cymer, Inc. |
Smart laser with fast deformable grating
|
|
US6567450B2
(en)
*
|
1999-12-10 |
2003-05-20 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
|
JP2000091096A
(ja)
|
1998-09-14 |
2000-03-31 |
Nikon Corp |
Ｘ線発生装置
|
|
US6285743B1
(en)
|
1998-09-14 |
2001-09-04 |
Nikon Corporation |
Method and apparatus for soft X-ray generation
|
|
US6208674B1
(en)
*
|
1998-09-18 |
2001-03-27 |
Cymer, Inc. |
Laser chamber with fully integrated electrode feedthrough main insulator
|
|
US6031598A
(en)
*
|
1998-09-25 |
2000-02-29 |
Euv Llc |
Extreme ultraviolet lithography machine
|
|
AU1454100A
(en)
|
1998-10-27 |
2000-05-15 |
Jmar Research, Inc. |
Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation
|
|
US6219368B1
(en)
*
|
1999-02-12 |
2001-04-17 |
Lambda Physik Gmbh |
Beam delivery system for molecular fluorine (F2) laser
|
|
US6782031B1
(en)
|
1999-03-19 |
2004-08-24 |
Cymer, Inc. |
Long-pulse pulse power system for gas discharge laser
|
|
US6104735A
(en)
|
1999-04-13 |
2000-08-15 |
Cymer, Inc. |
Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
|
|
US6164116A
(en)
|
1999-05-06 |
2000-12-26 |
Cymer, Inc. |
Gas module valve automated test fixture
|
|
US6535531B1
(en)
*
|
2001-11-29 |
2003-03-18 |
Cymer, Inc. |
Gas discharge laser with pulse multiplier
|
|
US6625191B2
(en)
*
|
1999-12-10 |
2003-09-23 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
|
US6381257B1
(en)
*
|
1999-09-27 |
2002-04-30 |
Cymer, Inc. |
Very narrow band injection seeded F2 lithography laser
|
|
US6590922B2
(en)
|
1999-09-27 |
2003-07-08 |
Cymer, Inc. |
Injection seeded F2 laser with line selection and discrimination
|
|
US6414979B2
(en)
|
2000-06-09 |
2002-07-02 |
Cymer, Inc. |
Gas discharge laser with blade-dielectric electrode
|
|
US6795474B2
(en)
|
2000-11-17 |
2004-09-21 |
Cymer, Inc. |
Gas discharge laser with improved beam path
|
|
US6370174B1
(en)
*
|
1999-10-20 |
2002-04-09 |
Cymer, Inc. |
Injection seeded F2 lithography laser
|
|
US6549551B2
(en)
*
|
1999-09-27 |
2003-04-15 |
Cymer, Inc. |
Injection seeded laser with precise timing control
|
|
US6228512B1
(en)
*
|
1999-05-26 |
2001-05-08 |
The Regents Of The University Of California |
MoRu/Be multilayers for extreme ultraviolet applications
|
|
TW561279B
(en)
|
1999-07-02 |
2003-11-11 |
Asml Netherlands Bv |
Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
|
|
US6317448B1
(en)
|
1999-09-23 |
2001-11-13 |
Cymer, Inc. |
Bandwidth estimating technique for narrow band laser
|
|
US6359922B1
(en)
*
|
1999-10-20 |
2002-03-19 |
Cymer, Inc. |
Single chamber gas discharge laser with line narrowed seed beam
|
|
US6831963B2
(en)
*
|
2000-10-20 |
2004-12-14 |
University Of Central Florida |
EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
|
|
US6377651B1
(en)
*
|
1999-10-11 |
2002-04-23 |
University Of Central Florida |
Laser plasma source for extreme ultraviolet lithography using a water droplet target
|
|
US6532247B2
(en)
*
|
2000-02-09 |
2003-03-11 |
Cymer, Inc. |
Laser wavelength control unit with piezoelectric driver
|
|
TWI246872B
(en)
|
1999-12-17 |
2006-01-01 |
Asml Netherlands Bv |
Radiation source for use in lithographic projection apparatus
|
|
US6493423B1
(en)
|
1999-12-24 |
2002-12-10 |
Koninklijke Philips Electronics N.V. |
Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
|
|
US6392743B1
(en)
*
|
2000-02-29 |
2002-05-21 |
Cymer, Inc. |
Control technique for microlithography lasers
|
|
US6195272B1
(en)
*
|
2000-03-16 |
2001-02-27 |
Joseph E. Pascente |
Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
|
|
DE10016008A1
(de)
|
2000-03-31 |
2001-10-11 |
Zeiss Carl |
Villagensystem und dessen Herstellung
|
|
US6647086B2
(en)
|
2000-05-19 |
2003-11-11 |
Canon Kabushiki Kaisha |
X-ray exposure apparatus
|
|
US6562099B2
(en)
|
2000-05-22 |
2003-05-13 |
The Regents Of The University Of California |
High-speed fabrication of highly uniform metallic microspheres
|
|
US6491737B2
(en)
|
2000-05-22 |
2002-12-10 |
The Regents Of The University Of California |
High-speed fabrication of highly uniform ultra-small metallic microspheres
|
|
US6520402B2
(en)
*
|
2000-05-22 |
2003-02-18 |
The Regents Of The University Of California |
High-speed direct writing with metallic microspheres
|
|
US6584132B2
(en)
*
|
2000-11-01 |
2003-06-24 |
Cymer, Inc. |
Spinodal copper alloy electrodes
|
|
US6904073B2
(en)
|
2001-01-29 |
2005-06-07 |
Cymer, Inc. |
High power deep ultraviolet laser with long life optics
|
|
US6466602B1
(en)
|
2000-06-09 |
2002-10-15 |
Cymer, Inc. |
Gas discharge laser long life electrodes
|
|
JP2002008891A
(ja)
*
|
2000-06-22 |
2002-01-11 |
Nikon Corp |
電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
|
|
JP2002006096A
(ja)
|
2000-06-23 |
2002-01-09 |
Nikon Corp |
電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
|
|
JP2002184597A
(ja)
*
|
2000-12-15 |
2002-06-28 |
Shimadzu Corp |
レーザー誘起ｘ線源
|
|
US6576912B2
(en)
*
|
2001-01-03 |
2003-06-10 |
Hugo M. Visser |
Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
|
|
JP2002214400A
(ja)
|
2001-01-12 |
2002-07-31 |
Toyota Macs Inc |
レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
|
|
US6538737B2
(en)
*
|
2001-01-29 |
2003-03-25 |
Cymer, Inc. |
High resolution etalon-grating spectrometer
|
|
US6804327B2
(en)
*
|
2001-04-03 |
2004-10-12 |
Lambda Physik Ag |
Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
|
|
WO2002082600A2
(en)
*
|
2001-04-04 |
2002-10-17 |
Coherent Deos |
Q-switched cavity dumped co2 laser for material processing
|
|
US6396900B1
(en)
*
|
2001-05-01 |
2002-05-28 |
The Regents Of The University Of California |
Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
|
|
US7439530B2
(en)
*
|
2005-06-29 |
2008-10-21 |
Cymer, Inc. |
LPP EUV light source drive laser system
|
|
US20030008148A1
(en)
|
2001-07-03 |
2003-01-09 |
Sasa Bajt |
Optimized capping layers for EUV multilayers
|
|
JP4963149B2
(ja)
|
2001-09-19 |
2012-06-27 |
ギガフォトン株式会社 |
光源装置及びそれを用いた露光装置
|
|
CA2358242A1
(en)
*
|
2001-10-05 |
2003-04-05 |
Bruce Mitchell |
Annular pressure spool
|
|
DE10151080C1
(de)
*
|
2001-10-10 |
2002-12-05 |
Xtreme Tech Gmbh |
Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
|
|
DE10208854A1
(de)
*
|
2002-03-01 |
2003-09-04 |
Zeiss Carl Semiconductor Mfg |
Beleuchtungssystem mit genestetem Kollektor zur annularen Ausleuchtung einer Austrittspupille
|
|
JP4111487B2
(ja)
*
|
2002-04-05 |
2008-07-02 |
ギガフォトン株式会社 |
極端紫外光源装置
|
|
JP4298336B2
(ja)
|
2002-04-26 |
2009-07-15 |
キヤノン株式会社 |
露光装置、光源装置及びデバイス製造方法
|
|
TWI229242B
(en)
*
|
2002-08-23 |
2005-03-11 |
Asml Netherlands Bv |
Lithographic projection apparatus and particle barrier for use in said apparatus
|
|
US20040057475A1
(en)
*
|
2002-09-24 |
2004-03-25 |
Robert Frankel |
High-power pulsed laser device
|
|
TWI275325B
(en)
*
|
2003-03-08 |
2007-03-01 |
Cymer Inc |
Discharge produced plasma EUV light source
|
|
DE10314849B3
(de)
|
2003-03-28 |
2004-12-30 |
Xtreme Technologies Gmbh |
Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
|
|
US7217940B2
(en)
*
|
2003-04-08 |
2007-05-15 |
Cymer, Inc. |
Collector for EUV light source
|
|
FR2860385B1
(fr)
|
2003-09-26 |
2007-06-01 |
Cit Alcatel |
Source euv
|
|
JP2005116331A
(ja)
*
|
2003-10-08 |
2005-04-28 |
National Institute Of Advanced Industrial & Technology |
レーザープラズマ発生装置
|
|
US6822251B1
(en)
|
2003-11-10 |
2004-11-23 |
University Of Central Florida Research Foundation |
Monolithic silicon EUV collector
|
|
WO2005069451A1
(en)
*
|
2004-01-07 |
2005-07-28 |
The Regents Of The University Of Michigan |
Ultra-short wavelength x-ray system
|
|
JP4535732B2
(ja)
*
|
2004-01-07 |
2010-09-01 |
株式会社小松製作所 |
光源装置及びそれを用いた露光装置
|
|
US7164144B2
(en)
*
|
2004-03-10 |
2007-01-16 |
Cymer Inc. |
EUV light source
|
|
US7087914B2
(en)
*
|
2004-03-17 |
2006-08-08 |
Cymer, Inc |
High repetition rate laser produced plasma EUV light source
|
|
US7078717B2
(en)
*
|
2004-03-22 |
2006-07-18 |
Gigaphoton Inc. |
Light source device and exposure equipment using the same
|
|
FR2871622B1
(fr)
*
|
2004-06-14 |
2008-09-12 |
Commissariat Energie Atomique |
Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
|
|
JP5100990B2
(ja)
*
|
2004-10-07 |
2012-12-19 |
ギガフォトン株式会社 |
極端紫外光源装置用ドライバーレーザ及びｌｐｐ型極端紫外光源装置
|
|
US7482609B2
(en)
*
|
2005-02-28 |
2009-01-27 |
Cymer, Inc. |
LPP EUV light source drive laser system
|
|
US20060222034A1
(en)
*
|
2005-03-31 |
2006-10-05 |
Cymer, Inc. |
6 Khz and above gas discharge laser system
|
|
US7705331B1
(en)
*
|
2006-06-29 |
2010-04-27 |
Kla-Tencor Technologies Corp. |
Methods and systems for providing illumination of a specimen for a process performed on the specimen
|
|
JP5758569B2
(ja)
*
|
2008-06-12 |
2015-08-05 |
ギガフォトン株式会社 |
スラブ型レーザ装置
|