JP2014219306A5 - - Google Patents

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Publication number
JP2014219306A5
JP2014219306A5 JP2013099245A JP2013099245A JP2014219306A5 JP 2014219306 A5 JP2014219306 A5 JP 2014219306A5 JP 2013099245 A JP2013099245 A JP 2013099245A JP 2013099245 A JP2013099245 A JP 2013099245A JP 2014219306 A5 JP2014219306 A5 JP 2014219306A5
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JP
Japan
Prior art keywords
optical system
electromagnetic wave
terahertz electromagnetic
photoconductive element
elliptical
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JP2013099245A
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English (en)
Japanese (ja)
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JP6286863B2 (ja
JP2014219306A (ja
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Priority to JP2013099245A priority Critical patent/JP6286863B2/ja
Priority claimed from JP2013099245A external-priority patent/JP6286863B2/ja
Priority to CN201410162917.1A priority patent/CN104142571B/zh
Priority to US14/268,768 priority patent/US9354164B2/en
Publication of JP2014219306A publication Critical patent/JP2014219306A/ja
Publication of JP2014219306A5 publication Critical patent/JP2014219306A5/ja
Application granted granted Critical
Publication of JP6286863B2 publication Critical patent/JP6286863B2/ja
Expired - Fee Related legal-status Critical Current
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JP2013099245A 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡 Expired - Fee Related JP6286863B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013099245A JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡
CN201410162917.1A CN104142571B (zh) 2013-05-09 2014-04-22 光学系统、太赫兹发射显微镜和用于制造器件的方法
US14/268,768 US9354164B2 (en) 2013-05-09 2014-05-02 Optical system, terahertz emission microscope, and method of manufacturing a device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013099245A JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡

Publications (3)

Publication Number Publication Date
JP2014219306A JP2014219306A (ja) 2014-11-20
JP2014219306A5 true JP2014219306A5 (enExample) 2016-03-10
JP6286863B2 JP6286863B2 (ja) 2018-03-07

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Family Applications (1)

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JP2013099245A Expired - Fee Related JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡

Country Status (3)

Country Link
US (1) US9354164B2 (enExample)
JP (1) JP6286863B2 (enExample)
CN (1) CN104142571B (enExample)

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CN104568818B (zh) * 2015-01-20 2017-08-25 中国工程物理研究院流体物理研究所 一种基于光纤传导的主动式太赫兹光谱检测内窥探头
DE202016008526U1 (de) 2015-03-03 2018-05-22 Sikora Ag Vorrichtung zum Messen des Durchmessers und/oder der Wanddicke eines Strangs
JP6330703B2 (ja) * 2015-03-20 2018-05-30 ソニー株式会社 テラヘルツ波顕微鏡および焦点制御方法
CN105527265B (zh) * 2016-01-22 2023-07-04 复旦大学 激光泵浦时间分辨上转换发光活体成像系统
US20180217044A1 (en) * 2017-02-02 2018-08-02 Honeywell International Inc. Forward scatter in particulate matter sensor
CN106932357B (zh) * 2017-03-09 2020-08-11 南开大学 一种超衍射分辨极限太赫兹光谱成像系统
CN106707490B (zh) * 2017-03-17 2019-07-19 北京航空航天大学 一种载玻片型超半球固浸显微系统
KR20190052516A (ko) * 2017-11-08 2019-05-16 삼성전자주식회사 표면 검사 장치
CN110197473B (zh) * 2018-02-27 2021-12-03 国科赛思(北京)科技有限公司 塑封器件真伪识别方法及装置
JP2020153761A (ja) * 2019-03-19 2020-09-24 株式会社Screenホールディングス 検査装置、検査方法、電磁波情報処理装置、電磁波情報処理方法およびプログラム
CN110118645B (zh) * 2019-04-19 2021-11-05 西北核技术研究所 一种半椭球反射面的光学性能综合评价方法
DE102019135487A1 (de) * 2019-12-20 2021-06-24 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Vorrichtung zum Senden und/oder Empfangen von Terahertz-Strahlung und Verwendung hiervon
DE102020113306A1 (de) * 2020-05-15 2021-11-18 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Vorrichtung zum Senden und/oder Empfangen von Terahertz-Strahlung und Steuereinrichtung hierfür
JP2024081200A (ja) 2022-12-06 2024-06-18 三星電子株式会社 測定装置及び検査装置
US12339223B2 (en) 2022-12-06 2025-06-24 Samsung Electronics Co., Ltd. Measuring apparatus and testing apparatus having the same

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
US6452726B1 (en) * 1999-07-16 2002-09-17 Michael J. Mandella Collimators and collimator arrays employing ellipsoidal solid immersion lenses
GB2371618B (en) * 2001-01-30 2004-11-17 Teraprobe Ltd A probe, apparatus and method for examining a sample
DE10121064A1 (de) * 2001-04-28 2002-10-31 Evotec Ag Vorrichtung und Verfahren zur optischen Messung von chemischen und/oder biologischen Proben
WO2005022180A1 (ja) * 2003-08-29 2005-03-10 Aisin Seiki Kabushiki Kaisha 半導体デバイスの電界分布測定方法と装置
US7230245B2 (en) * 2004-05-04 2007-06-12 Rensselaer Polytechnic Institute Field induced THz wave emission microscope
JP2006064679A (ja) * 2004-08-30 2006-03-09 Canon Inc アンテナを備える電磁波素子
JP4827490B2 (ja) 2004-10-27 2011-11-30 パナソニック株式会社 半導体装置の製造システム
US7406151B1 (en) * 2005-07-19 2008-07-29 Xradia, Inc. X-ray microscope with microfocus source and Wolter condenser
JP2008089546A (ja) * 2006-10-05 2008-04-17 Canon Inc 電磁波測定装置
JP2013076618A (ja) * 2011-09-30 2013-04-25 Sony Corp 光伝導素子、レンズ、テラヘルツ放射顕微鏡及びデバイスの製造方法

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