CN104142571B - 光学系统、太赫兹发射显微镜和用于制造器件的方法 - Google Patents

光学系统、太赫兹发射显微镜和用于制造器件的方法 Download PDF

Info

Publication number
CN104142571B
CN104142571B CN201410162917.1A CN201410162917A CN104142571B CN 104142571 B CN104142571 B CN 104142571B CN 201410162917 A CN201410162917 A CN 201410162917A CN 104142571 B CN104142571 B CN 104142571B
Authority
CN
China
Prior art keywords
electromagnetic wave
terahertz electromagnetic
optical system
solid immersion
immersion lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201410162917.1A
Other languages
English (en)
Chinese (zh)
Other versions
CN104142571A (zh
Inventor
山名广章
鎌田将尚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of CN104142571A publication Critical patent/CN104142571A/zh
Application granted granted Critical
Publication of CN104142571B publication Critical patent/CN104142571B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G01N21/3586—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation by Terahertz time domain spectroscopy [THz-TDS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
CN201410162917.1A 2013-05-09 2014-04-22 光学系统、太赫兹发射显微镜和用于制造器件的方法 Expired - Fee Related CN104142571B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013099245A JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡
JP2013-099245 2013-05-09

Publications (2)

Publication Number Publication Date
CN104142571A CN104142571A (zh) 2014-11-12
CN104142571B true CN104142571B (zh) 2018-12-11

Family

ID=51851793

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410162917.1A Expired - Fee Related CN104142571B (zh) 2013-05-09 2014-04-22 光学系统、太赫兹发射显微镜和用于制造器件的方法

Country Status (3)

Country Link
US (1) US9354164B2 (enExample)
JP (1) JP6286863B2 (enExample)
CN (1) CN104142571B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104568818B (zh) * 2015-01-20 2017-08-25 中国工程物理研究院流体物理研究所 一种基于光纤传导的主动式太赫兹光谱检测内窥探头
ES2820999T3 (es) * 2015-03-03 2021-04-23 Sikora Ag Dispositivo y procedimiento para medir el grosor de pared de un tubo
JP6330703B2 (ja) * 2015-03-20 2018-05-30 ソニー株式会社 テラヘルツ波顕微鏡および焦点制御方法
CN105527265B (zh) * 2016-01-22 2023-07-04 复旦大学 激光泵浦时间分辨上转换发光活体成像系统
US20180217044A1 (en) * 2017-02-02 2018-08-02 Honeywell International Inc. Forward scatter in particulate matter sensor
CN106932357B (zh) * 2017-03-09 2020-08-11 南开大学 一种超衍射分辨极限太赫兹光谱成像系统
CN106707490B (zh) * 2017-03-17 2019-07-19 北京航空航天大学 一种载玻片型超半球固浸显微系统
KR20190052516A (ko) * 2017-11-08 2019-05-16 삼성전자주식회사 표면 검사 장치
CN110197473B (zh) * 2018-02-27 2021-12-03 国科赛思(北京)科技有限公司 塑封器件真伪识别方法及装置
JP2020153761A (ja) * 2019-03-19 2020-09-24 株式会社Ｓｃｒｅｅｎホールディングス 検査装置、検査方法、電磁波情報処理装置、電磁波情報処理方法およびプログラム
CN110118645B (zh) * 2019-04-19 2021-11-05 西北核技术研究所 一种半椭球反射面的光学性能综合评价方法
DE102019135487A1 (de) * 2019-12-20 2021-06-24 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Vorrichtung zum Senden und/oder Empfangen von Terahertz-Strahlung und Verwendung hiervon
DE102020113306A1 (de) * 2020-05-15 2021-11-18 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Vorrichtung zum Senden und/oder Empfangen von Terahertz-Strahlung und Steuereinrichtung hierfür
US12339223B2 (en) 2022-12-06 2025-06-24 Samsung Electronics Co., Ltd. Measuring apparatus and testing apparatus having the same
JP2024081200A (ja) 2022-12-06 2024-06-18 三星電子株式会社 測定装置及び検査装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6452726B1 (en) * 1999-07-16 2002-09-17 Michael J. Mandella Collimators and collimator arrays employing ellipsoidal solid immersion lenses
GB2371618B (en) * 2001-01-30 2004-11-17 Teraprobe Ltd A probe, apparatus and method for examining a sample
DE10121064A1 (de) * 2001-04-28 2002-10-31 Evotec Ag Vorrichtung und Verfahren zur optischen Messung von chemischen und/oder biologischen Proben
JP4631704B2 (ja) * 2003-08-29 2011-02-16 アイシン精機株式会社 半導体デバイスの電界分布測定方法と装置
US7230245B2 (en) * 2004-05-04 2007-06-12 Rensselaer Polytechnic Institute Field induced THz wave emission microscope
JP2006064679A (ja) * 2004-08-30 2006-03-09 Canon Inc アンテナを備える電磁波素子
JP4827490B2 (ja) 2004-10-27 2011-11-30 パナソニック株式会社 半導体装置の製造システム
US7406151B1 (en) * 2005-07-19 2008-07-29 Xradia, Inc. X-ray microscope with microfocus source and Wolter condenser
JP2008089546A (ja) * 2006-10-05 2008-04-17 Canon Inc 電磁波測定装置
JP2013076618A (ja) * 2011-09-30 2013-04-25 Sony Corp 光伝導素子、レンズ、テラヘルツ放射顕微鏡及びデバイスの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《Emission characteristics of photoconductive antennas based on low-temperature-grown GaAs and semi-insulating GaAs》;Masahiko Tani 等;《APPLIED OPTICS》;19971020;第36卷(第30期);第7854页右下角-第7855页左上角的B部分，附图2 *

Also Published As

Publication number Publication date
JP2014219306A (ja) 2014-11-20
US9354164B2 (en) 2016-05-31
US20140332687A1 (en) 2014-11-13
CN104142571A (zh) 2014-11-12
JP6286863B2 (ja) 2018-03-07

Similar Documents

Publication Publication Date Title
CN104142571B (zh) 光学系统、太赫兹发射显微镜和用于制造器件的方法
TWI453440B (zh) Light transmission elements, lenses, megahertz radiation microscopes and components
Van Rudd et al. Influence of substrate-lens design in terahertz time-domain spectroscopy
CN102175636B (zh) 一种中草药检测鉴别的系统和方法
CN103983619B (zh) 一种空间分辨激光诱导击穿光谱分析系统及其分析方法
CN106442394B (zh) 一种太赫兹近场成像系统及方法
CN106124483B (zh) 一种紧凑的激光诱导击穿光谱测量系统
CN105628679B (zh) 基于红外拉曼紫外荧光超连续谱的血液鉴别仪
TW201447271A (zh) 使用表面增強電場之缺陷偵測
CN106596511A (zh) 一种反射式同轴结构激光诱导击穿光谱分析装置
CN106841082B (zh) 便携式太赫兹时域光谱仪
CN102253021A (zh) 一种线形激光光束增强型重金属含量检测方法
CN105181155A (zh) 基于单模光纤的太赫兹脉冲单次探测系统及探测方法
CN206945533U (zh) 小型化太赫兹时域光谱仪
CN109580548A (zh) 基于透射方法的散射式近场显微光学系统
JP2017009296A (ja) 電磁波伝搬装置及び情報取得装置
KR101844482B1 (ko) 고분해능 테라헤르츠파 집광모듈, 산란광 검출모듈 및 테라헤르츠파 베셀빔을 이용한 고분해능 검사 장치
CN105866095B (zh) 基于红外拉曼超连续漫综合谱的血液鉴别仪
CN204439544U (zh) 一种微弱光电流的探测系统
CN209542447U (zh) 一种基于透射方法的散射式近场显微光学系统
CN107505307A (zh) 全包围式椭圆球面镜光路激光诱导击穿光谱仪系统
CN206330890U (zh) 一种反射式同轴结构激光诱导击穿光谱分析装置
CN209102603U (zh) 一种反射式太赫兹时域光谱成像系统
CN112213297B (zh) 一种基于环形光束的旁轴双脉冲libs系统
CN114813623A (zh) 一种太赫兹近场光路调试装置及其调试方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20181211