JP6286863B2 - 光学系、及びテラヘルツ放射顕微鏡 - Google Patents

光学系、及びテラヘルツ放射顕微鏡 Download PDF

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Publication number
JP6286863B2
JP6286863B2 JP2013099245A JP2013099245A JP6286863B2 JP 6286863 B2 JP6286863 B2 JP 6286863B2 JP 2013099245 A JP2013099245 A JP 2013099245A JP 2013099245 A JP2013099245 A JP 2013099245A JP 6286863 B2 JP6286863 B2 JP 6286863B2
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Japan
Prior art keywords
optical system
terahertz
electromagnetic wave
photoconductive element
refractive index
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Expired - Fee Related
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JP2013099245A
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English (en)
Japanese (ja)
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JP2014219306A5 (enExample
JP2014219306A (ja
Inventor
広章 山名
広章 山名
将尚 鎌田
将尚 鎌田
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Sony Corp
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Sony Corp
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Priority to JP2013099245A priority Critical patent/JP6286863B2/ja
Priority to CN201410162917.1A priority patent/CN104142571B/zh
Priority to US14/268,768 priority patent/US9354164B2/en
Publication of JP2014219306A publication Critical patent/JP2014219306A/ja
Publication of JP2014219306A5 publication Critical patent/JP2014219306A5/ja
Application granted granted Critical
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Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G01N21/3586—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation by Terahertz time domain spectroscopy [THz-TDS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP2013099245A 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡 Expired - Fee Related JP6286863B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013099245A JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡
CN201410162917.1A CN104142571B (zh) 2013-05-09 2014-04-22 光学系统、太赫兹发射显微镜和用于制造器件的方法
US14/268,768 US9354164B2 (en) 2013-05-09 2014-05-02 Optical system, terahertz emission microscope, and method of manufacturing a device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013099245A JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡

Publications (3)

Publication Number Publication Date
JP2014219306A JP2014219306A (ja) 2014-11-20
JP2014219306A5 JP2014219306A5 (enExample) 2016-03-10
JP6286863B2 true JP6286863B2 (ja) 2018-03-07

Family

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Family Applications (1)

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JP2013099245A Expired - Fee Related JP6286863B2 (ja) 2013-05-09 2013-05-09 光学系、及びテラヘルツ放射顕微鏡

Country Status (3)

Country Link
US (1) US9354164B2 (enExample)
JP (1) JP6286863B2 (enExample)
CN (1) CN104142571B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220115861A (ko) * 2019-12-20 2022-08-19 헬무트 휘셔 게엠베하 인스티투트 퍼 엘렉트로닉 운트 메쓰테크닉 테라헤르츠 방사선을 송신 및/또는 수신하기 위한 장치 및 그 사용 방법
KR20240085107A (ko) 2022-12-06 2024-06-14 삼성전자주식회사 측정 장치 및 그것을 갖는 테스트 장비
US12339223B2 (en) 2022-12-06 2025-06-24 Samsung Electronics Co., Ltd. Measuring apparatus and testing apparatus having the same

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CN104568818B (zh) * 2015-01-20 2017-08-25 中国工程物理研究院流体物理研究所 一种基于光纤传导的主动式太赫兹光谱检测内窥探头
DE202016008526U1 (de) 2015-03-03 2018-05-22 Sikora Ag Vorrichtung zum Messen des Durchmessers und/oder der Wanddicke eines Strangs
JP6330703B2 (ja) * 2015-03-20 2018-05-30 ソニー株式会社 テラヘルツ波顕微鏡および焦点制御方法
CN105527265B (zh) * 2016-01-22 2023-07-04 复旦大学 激光泵浦时间分辨上转换发光活体成像系统
US20180217044A1 (en) * 2017-02-02 2018-08-02 Honeywell International Inc. Forward scatter in particulate matter sensor
CN106932357B (zh) * 2017-03-09 2020-08-11 南开大学 一种超衍射分辨极限太赫兹光谱成像系统
CN106707490B (zh) * 2017-03-17 2019-07-19 北京航空航天大学 一种载玻片型超半球固浸显微系统
KR20190052516A (ko) * 2017-11-08 2019-05-16 삼성전자주식회사 표면 검사 장치
CN110197473B (zh) * 2018-02-27 2021-12-03 国科赛思(北京)科技有限公司 塑封器件真伪识别方法及装置
JP2020153761A (ja) * 2019-03-19 2020-09-24 株式会社Ｓｃｒｅｅｎホールディングス 検査装置、検査方法、電磁波情報処理装置、電磁波情報処理方法およびプログラム
CN110118645B (zh) * 2019-04-19 2021-11-05 西北核技术研究所 一种半椭球反射面的光学性能综合评价方法
DE102020113306A1 (de) * 2020-05-15 2021-11-18 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Vorrichtung zum Senden und/oder Empfangen von Terahertz-Strahlung und Steuereinrichtung hierfür

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US6452726B1 (en) * 1999-07-16 2002-09-17 Michael J. Mandella Collimators and collimator arrays employing ellipsoidal solid immersion lenses
GB2371618B (en) * 2001-01-30 2004-11-17 Teraprobe Ltd A probe, apparatus and method for examining a sample
DE10121064A1 (de) * 2001-04-28 2002-10-31 Evotec Ag Vorrichtung und Verfahren zur optischen Messung von chemischen und/oder biologischen Proben
WO2005022180A1 (ja) * 2003-08-29 2005-03-10 Aisin Seiki Kabushiki Kaisha 半導体デバイスの電界分布測定方法と装置
US7230245B2 (en) * 2004-05-04 2007-06-12 Rensselaer Polytechnic Institute Field induced THz wave emission microscope
JP2006064679A (ja) * 2004-08-30 2006-03-09 Canon Inc アンテナを備える電磁波素子
JP4827490B2 (ja) 2004-10-27 2011-11-30 パナソニック株式会社 半導体装置の製造システム
US7406151B1 (en) * 2005-07-19 2008-07-29 Xradia, Inc. X-ray microscope with microfocus source and Wolter condenser
JP2008089546A (ja) * 2006-10-05 2008-04-17 Canon Inc 電磁波測定装置
JP2013076618A (ja) * 2011-09-30 2013-04-25 Sony Corp 光伝導素子、レンズ、テラヘルツ放射顕微鏡及びデバイスの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220115861A (ko) * 2019-12-20 2022-08-19 헬무트 휘셔 게엠베하 인스티투트 퍼 엘렉트로닉 운트 메쓰테크닉 테라헤르츠 방사선을 송신 및/또는 수신하기 위한 장치 및 그 사용 방법
KR102777645B1 (ko) * 2019-12-20 2025-03-10 헬무트 휘셔 게엠베하 인스티투트 퍼 엘렉트로닉 운트 메쓰테크닉 테라헤르츠 방사선을 송신 및/또는 수신하기 위한 장치 및 그 사용 방법
KR20240085107A (ko) 2022-12-06 2024-06-14 삼성전자주식회사 측정 장치 및 그것을 갖는 테스트 장비
US12339223B2 (en) 2022-12-06 2025-06-24 Samsung Electronics Co., Ltd. Measuring apparatus and testing apparatus having the same

Also Published As

Publication number Publication date
CN104142571A (zh) 2014-11-12
US20140332687A1 (en) 2014-11-13
JP2014219306A (ja) 2014-11-20
CN104142571B (zh) 2018-12-11
US9354164B2 (en) 2016-05-31

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