JP5586559B2 - ペリクル収容容器 - Google Patents

ペリクル収容容器 Download PDF

Info

Publication number
JP5586559B2
JP5586559B2 JP2011237389A JP2011237389A JP5586559B2 JP 5586559 B2 JP5586559 B2 JP 5586559B2 JP 2011237389 A JP2011237389 A JP 2011237389A JP 2011237389 A JP2011237389 A JP 2011237389A JP 5586559 B2 JP5586559 B2 JP 5586559B2
Authority
JP
Japan
Prior art keywords
pellicle
pin
container
recess
storage container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011237389A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013097046A (ja
Inventor
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2011237389A priority Critical patent/JP5586559B2/ja
Priority to KR1020120088299A priority patent/KR101938158B1/ko
Priority to TW101139766A priority patent/TWI474957B/zh
Priority to CN201210421071.XA priority patent/CN103086050B/zh
Publication of JP2013097046A publication Critical patent/JP2013097046A/ja
Priority to HK13107847.5A priority patent/HK1180658A1/zh
Application granted granted Critical
Publication of JP5586559B2 publication Critical patent/JP5586559B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2011237389A 2011-10-28 2011-10-28 ペリクル収容容器 Active JP5586559B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011237389A JP5586559B2 (ja) 2011-10-28 2011-10-28 ペリクル収容容器
KR1020120088299A KR101938158B1 (ko) 2011-10-28 2012-08-13 펠리클 수용 용기
TW101139766A TWI474957B (zh) 2011-10-28 2012-10-26 防塵薄膜組件收容容器
CN201210421071.XA CN103086050B (zh) 2011-10-28 2012-10-29 防尘薄膜组件收纳容器
HK13107847.5A HK1180658A1 (zh) 2011-10-28 2013-07-04 防塵薄膜組件收納容器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011237389A JP5586559B2 (ja) 2011-10-28 2011-10-28 ペリクル収容容器

Publications (2)

Publication Number Publication Date
JP2013097046A JP2013097046A (ja) 2013-05-20
JP5586559B2 true JP5586559B2 (ja) 2014-09-10

Family

ID=48199272

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011237389A Active JP5586559B2 (ja) 2011-10-28 2011-10-28 ペリクル収容容器

Country Status (5)

Country Link
JP (1) JP5586559B2 (zh)
KR (1) KR101938158B1 (zh)
CN (1) CN103086050B (zh)
HK (1) HK1180658A1 (zh)
TW (1) TWI474957B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170008154A (ko) 2015-07-13 2017-01-23 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 수납 용기 및 펠리클의 인출 방법
TWI758378B (zh) * 2016-12-22 2022-03-21 日商信越化學工業股份有限公司 防塵薄膜組件框架及使用該框架之防塵薄膜組件

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2607193B2 (ja) * 1991-09-30 1997-05-07 株式会社写真化学 露光用マスクの製造方法
JP3231206B2 (ja) * 1995-02-08 2001-11-19 アルプス電気株式会社 回転コネクタ
JPH09204039A (ja) * 1996-01-25 1997-08-05 Shin Etsu Chem Co Ltd ペリクル枠保持具
JP2000173887A (ja) * 1998-12-02 2000-06-23 Asahi Kasei Denshi Kk ペリクル収納ケース
JP2000194122A (ja) * 1998-12-28 2000-07-14 Nec Corp ペリクル
JP2000302395A (ja) * 1999-04-16 2000-10-31 Komatsu Forklift Co Ltd フォークリフトのフォーク固定装置
JP4497845B2 (ja) * 2003-06-04 2010-07-07 旭化成イーマテリアルズ株式会社 大型ペリクルの収納方法
JP4354789B2 (ja) * 2003-12-05 2009-10-28 松下精機株式会社 Ｆｐｄマスク用ペリクル貼付装置
TWM249914U (en) * 2003-12-17 2004-11-11 Exon Science Inc Fast opening/closing gate for biochemical facility
JP2005326634A (ja) * 2004-05-14 2005-11-24 Mitsui Chemicals Inc ペリクルの収納方法
JP4391435B2 (ja) * 2005-03-22 2009-12-24 信越化学工業株式会社 ペリクル収納容器
JP2007039110A (ja) * 2005-08-04 2007-02-15 Kyokuhei Glass Kako Kk ガラス搬送パレット
JP4649363B2 (ja) * 2006-04-19 2011-03-09 信越化学工業株式会社 ペリクル収納容器
JP4855885B2 (ja) * 2006-09-29 2012-01-18 Ｈｏｙａ株式会社 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法
JP5052106B2 (ja) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 ペリクルの収納方法
JP4850679B2 (ja) * 2006-12-15 2012-01-11 信越ポリマー株式会社 基板収納容器
JP2010149885A (ja) * 2008-12-24 2010-07-08 Asahi Glass Co Ltd パレット
JP2011007827A (ja) * 2009-06-23 2011-01-13 Shin Etsu Polymer Co Ltd 大型精密部材収納容器
JP2011034020A (ja) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd ペリクル収納容器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170008154A (ko) 2015-07-13 2017-01-23 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 수납 용기 및 펠리클의 인출 방법
TWI758378B (zh) * 2016-12-22 2022-03-21 日商信越化學工業股份有限公司 防塵薄膜組件框架及使用該框架之防塵薄膜組件

Also Published As

Publication number Publication date
KR20130047562A (ko) 2013-05-08
KR101938158B1 (ko) 2019-01-14
TW201345806A (zh) 2013-11-16
CN103086050B (zh) 2014-12-24
TWI474957B (zh) 2015-03-01
JP2013097046A (ja) 2013-05-20
CN103086050A (zh) 2013-05-08
HK1180658A1 (zh) 2013-10-25

Similar Documents

Publication Publication Date Title
KR101223967B1 (ko) 펠리클 수납용기
TWI388475B (zh) 防塵薄膜組件收納容器
JP5268142B2 (ja) マスクブランク収納ケース及びマスクブランクの収納方法、並びにマスクブランク収納体
KR102018069B1 (ko) 펠리클 수납 용기
KR20230088663A (ko) 펠리클 수납 용기
JP2009128635A (ja) ペリクル、ペリクルを収納するペリクル収納容器ならびにペリクル収納容器内にペリクルを保管する方法
JP5586559B2 (ja) ペリクル収容容器
JP5864399B2 (ja) ペリクル収納容器
JP5586560B2 (ja) ペリクル収容容器
TWI590999B (zh) 防塵薄膜組件收納容器
JP6604651B2 (ja) ペリクル収納容器
KR102610556B1 (ko) 펠리클 수납 용기 및 펠리클의 인출 방법
KR20160101661A (ko) 펠리클 수납 용기
JP2011164404A (ja) ペリクル収納容器

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131125

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140711

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140715

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140722

R150 Certificate of patent or registration of utility model

Ref document number: 5586559

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150