HK1180658A1 - 防塵薄膜組件收納容器 - Google Patents

防塵薄膜組件收納容器

Info

Publication number
HK1180658A1
HK1180658A1 HK13107847.5A HK13107847A HK1180658A1 HK 1180658 A1 HK1180658 A1 HK 1180658A1 HK 13107847 A HK13107847 A HK 13107847A HK 1180658 A1 HK1180658 A1 HK 1180658A1
Authority
HK
Hong Kong
Prior art keywords
dust
storage container
film assembly
proof film
proof
Prior art date
Application number
HK13107847.5A
Other languages
English (en)
Inventor
關原敏
Original Assignee
信越化學工業株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業株式會社 filed Critical 信越化學工業株式會社
Publication of HK1180658A1 publication Critical patent/HK1180658A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK13107847.5A 2011-10-28 2013-07-04 防塵薄膜組件收納容器 HK1180658A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011237389A JP5586559B2 (ja) 2011-10-28 2011-10-28 ペリクル収容容器

Publications (1)

Publication Number Publication Date
HK1180658A1 true HK1180658A1 (zh) 2013-10-25

Family

ID=48199272

Family Applications (1)

Application Number Title Priority Date Filing Date
HK13107847.5A HK1180658A1 (zh) 2011-10-28 2013-07-04 防塵薄膜組件收納容器

Country Status (5)

Country Link
JP (1) JP5586559B2 (zh)
KR (1) KR101938158B1 (zh)
CN (1) CN103086050B (zh)
HK (1) HK1180658A1 (zh)
TW (1) TWI474957B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6351178B2 (ja) 2015-07-13 2018-07-04 信越化学工業株式会社 ペリクル収納容器およびペリクルの取り出し方法
JP6706575B2 (ja) * 2016-12-22 2020-06-10 信越化学工業株式会社 ペリクルフレーム及びこれを用いたペリクル

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2607193B2 (ja) * 1991-09-30 1997-05-07 株式会社写真化学 露光用マスクの製造方法
JP3231206B2 (ja) * 1995-02-08 2001-11-19 アルプス電気株式会社 回転コネクタ
JPH09204039A (ja) * 1996-01-25 1997-08-05 Shin Etsu Chem Co Ltd ペリクル枠保持具
JP2000173887A (ja) * 1998-12-02 2000-06-23 Asahi Kasei Denshi Kk ペリクル収納ケース
JP2000194122A (ja) * 1998-12-28 2000-07-14 Nec Corp ペリクル
JP2000302395A (ja) * 1999-04-16 2000-10-31 Komatsu Forklift Co Ltd フォークリフトのフォーク固定装置
JP4497845B2 (ja) * 2003-06-04 2010-07-07 旭化成イーマテリアルズ株式会社 大型ペリクルの収納方法
JP4354789B2 (ja) * 2003-12-05 2009-10-28 松下精機株式会社 Ｆｐｄマスク用ペリクル貼付装置
TWM249914U (en) * 2003-12-17 2004-11-11 Exon Science Inc Fast opening/closing gate for biochemical facility
JP2005326634A (ja) * 2004-05-14 2005-11-24 Mitsui Chemicals Inc ペリクルの収納方法
JP4391435B2 (ja) * 2005-03-22 2009-12-24 信越化学工業株式会社 ペリクル収納容器
JP2007039110A (ja) * 2005-08-04 2007-02-15 Kyokuhei Glass Kako Kk ガラス搬送パレット
JP4649363B2 (ja) * 2006-04-19 2011-03-09 信越化学工業株式会社 ペリクル収納容器
JP4855885B2 (ja) * 2006-09-29 2012-01-18 Ｈｏｙａ株式会社 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法
JP5052106B2 (ja) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 ペリクルの収納方法
JP4850679B2 (ja) * 2006-12-15 2012-01-11 信越ポリマー株式会社 基板収納容器
JP2010149885A (ja) * 2008-12-24 2010-07-08 Asahi Glass Co Ltd パレット
JP2011007827A (ja) * 2009-06-23 2011-01-13 Shin Etsu Polymer Co Ltd 大型精密部材収納容器
JP2011034020A (ja) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd ペリクル収納容器

Also Published As

Publication number Publication date
KR20130047562A (ko) 2013-05-08
KR101938158B1 (ko) 2019-01-14
TW201345806A (zh) 2013-11-16
CN103086050B (zh) 2014-12-24
JP5586559B2 (ja) 2014-09-10
TWI474957B (zh) 2015-03-01
JP2013097046A (ja) 2013-05-20
CN103086050A (zh) 2013-05-08

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20221101