HK1180658A1 - Storage container for a dust-proof film assembly - Google Patents
Storage container for a dust-proof film assemblyInfo
- Publication number
- HK1180658A1 HK1180658A1 HK13107847.5A HK13107847A HK1180658A1 HK 1180658 A1 HK1180658 A1 HK 1180658A1 HK 13107847 A HK13107847 A HK 13107847A HK 1180658 A1 HK1180658 A1 HK 1180658A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- dust
- storage container
- film assembly
- proof film
- proof
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011237389A JP5586559B2 (en) | 2011-10-28 | 2011-10-28 | Pellicle container |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1180658A1 true HK1180658A1 (en) | 2013-10-25 |
Family
ID=48199272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK13107847.5A HK1180658A1 (en) | 2011-10-28 | 2013-07-04 | Storage container for a dust-proof film assembly |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5586559B2 (en) |
KR (1) | KR101938158B1 (en) |
CN (1) | CN103086050B (en) |
HK (1) | HK1180658A1 (en) |
TW (1) | TWI474957B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6351178B2 (en) * | 2015-07-13 | 2018-07-04 | 信越化学工業株式会社 | Pellicle storage container and pellicle removal method |
JP6706575B2 (en) * | 2016-12-22 | 2020-06-10 | 信越化学工業株式会社 | Pellicle frame and pellicle using the same |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2607193B2 (en) * | 1991-09-30 | 1997-05-07 | 株式会社写真化学 | Manufacturing method of exposure mask |
JP3231206B2 (en) * | 1995-02-08 | 2001-11-19 | アルプス電気株式会社 | Rotating connector |
JPH09204039A (en) * | 1996-01-25 | 1997-08-05 | Shin Etsu Chem Co Ltd | Pellicle frame holder |
JP2000173887A (en) * | 1998-12-02 | 2000-06-23 | Asahi Kasei Denshi Kk | Pellicle housing case |
JP2000194122A (en) * | 1998-12-28 | 2000-07-14 | Nec Corp | Pellicle |
JP2000302395A (en) * | 1999-04-16 | 2000-10-31 | Komatsu Forklift Co Ltd | Fork fixing device of forklift |
JP4497845B2 (en) * | 2003-06-04 | 2010-07-07 | 旭化成イーマテリアルズ株式会社 | Large pellicle storage method |
JP4354789B2 (en) * | 2003-12-05 | 2009-10-28 | 松下精機株式会社 | Pellicle sticking device for FPD mask |
TWM249914U (en) * | 2003-12-17 | 2004-11-11 | Exon Science Inc | Fast opening/closing gate for biochemical facility |
JP2005326634A (en) * | 2004-05-14 | 2005-11-24 | Mitsui Chemicals Inc | Method for housing pellicle |
JP4391435B2 (en) * | 2005-03-22 | 2009-12-24 | 信越化学工業株式会社 | Pellicle storage container |
JP2007039110A (en) * | 2005-08-04 | 2007-02-15 | Kyokuhei Glass Kako Kk | Glass carrying pallet |
JP4649363B2 (en) * | 2006-04-19 | 2011-03-09 | 信越化学工業株式会社 | Pellicle storage container |
JP4855885B2 (en) * | 2006-09-29 | 2012-01-18 | Hoya株式会社 | Mask case, mask cassette, pattern transfer method, and display device manufacturing method |
JP5052106B2 (en) * | 2006-11-22 | 2012-10-17 | 旭化成イーマテリアルズ株式会社 | How to store the pellicle |
JP4850679B2 (en) * | 2006-12-15 | 2012-01-11 | 信越ポリマー株式会社 | Substrate storage container |
JP2010149885A (en) * | 2008-12-24 | 2010-07-08 | Asahi Glass Co Ltd | Pallet |
JP2011007827A (en) * | 2009-06-23 | 2011-01-13 | Shin Etsu Polymer Co Ltd | Storage container for large precision member |
JP2011034020A (en) * | 2009-08-06 | 2011-02-17 | Shin-Etsu Chemical Co Ltd | Pellicle storage container |
-
2011
- 2011-10-28 JP JP2011237389A patent/JP5586559B2/en active Active
-
2012
- 2012-08-13 KR KR1020120088299A patent/KR101938158B1/en active IP Right Grant
- 2012-10-26 TW TW101139766A patent/TWI474957B/en active
- 2012-10-29 CN CN201210421071.XA patent/CN103086050B/en active Active
-
2013
- 2013-07-04 HK HK13107847.5A patent/HK1180658A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR101938158B1 (en) | 2019-01-14 |
CN103086050B (en) | 2014-12-24 |
CN103086050A (en) | 2013-05-08 |
KR20130047562A (en) | 2013-05-08 |
JP2013097046A (en) | 2013-05-20 |
TWI474957B (en) | 2015-03-01 |
TW201345806A (en) | 2013-11-16 |
JP5586559B2 (en) | 2014-09-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20221101 |