JP6604651B2 - ペリクル収納容器 - Google Patents
ペリクル収納容器 Download PDFInfo
- Publication number
- JP6604651B2 JP6604651B2 JP2016030677A JP2016030677A JP6604651B2 JP 6604651 B2 JP6604651 B2 JP 6604651B2 JP 2016030677 A JP2016030677 A JP 2016030677A JP 2016030677 A JP2016030677 A JP 2016030677A JP 6604651 B2 JP6604651 B2 JP 6604651B2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- frame
- storage container
- fixture
- holding means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
Description
最初に、図1〜6に示すようなペリクル収納容器10を製作した。ペリクル収納容器本体11は、厚さ5mmの黒色難燃帯電防止ABS樹脂板を真空成形して製作した。一方、ペリクル収納容器本体11と周縁部で嵌合する蓋体12は、厚さ5mmの透明ポリカーボネート樹脂板を真空成形して製作したもので、成形加工後にその全面に帯電防止剤(信越ポリマー(株)製、商品名セプルジーダ)を塗装した。組み合わせた後の外寸は、1350x1535x120mmである。
11 ペリクル収納容器本体
12 蓋体
13 ペリクルフレーム支持手段
13a 段差部
13b 垂直面
13c テーパ面
14 フレーム固定具
14a 先端段差部
15 固定具保持手段
15a 溝
15b 角孔
16 ボルト
17 板ナット
20 ペリクル
21 ペリクルフレーム
22 マスク粘着層
23 マスク粘着層未塗布領域
24 ペリクル膜接着層
25 ペリクル膜
26 溝
51 弾性体
91 固定具保持手段
92 粘着テープ
101 弾性体
110 ペリクル収納容器
111 ペリクル収納容器本体
112 ピン
112a ピン軸
112b 突起
112c 操作部
113 ピン保持手段
113a 凹部
114 弾性体
120 ペリクル
121 ペリクルフレーム(比較例)
122 孔
Claims (1)
- ペリクル収納容器本体と、該ペリクル収納容器本体に嵌合して密閉する蓋体とから構成され、セパレータの無いペリクルを収納するペリクル収納容器であって、前記ペリクル収納容器本体上には、マスク粘着層塗布領域及び未塗布領域を有するペリクルフレームを支持するペリクルフレーム支持手段と固定具保持手段が設置され、前記ペリクルフレーム支持手段は、前記ペリクルフレームのマスク粘着層未塗布領域を支持するとともに、前記固定具保持手段は、前記ペリクルフレームの外側面に設けられた溝に挿入される板状のフレーム固定具と嵌合する溝又は孔を有し、該フレーム固定具を略水平方向に移動可能に保持するとともに、前記フレーム固定具は、前記固定具保持手段を通過した後端側の一部が前記蓋体の内側に取り付けられた弾性体により上方向から押圧されてその位置が固定されるか、または前記固定具保持手段を通過した後端が前記蓋体の内面に取り付けられた弾性体に接触して、水平方向への移動が規制されることを特徴とするペリクル収納容器。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016030677A JP6604651B2 (ja) | 2016-02-22 | 2016-02-22 | ペリクル収納容器 |
KR1020170019417A KR20170098700A (ko) | 2016-02-22 | 2017-02-13 | 펠리클 수납 용기 |
TW106105014A TWI624718B (zh) | 2016-02-22 | 2017-02-16 | 防塵薄膜組件收納容器 |
CN201710083586.6A CN107102512B (zh) | 2016-02-22 | 2017-02-16 | 防尘薄膜组件收纳容器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016030677A JP6604651B2 (ja) | 2016-02-22 | 2016-02-22 | ペリクル収納容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017151130A JP2017151130A (ja) | 2017-08-31 |
JP6604651B2 true JP6604651B2 (ja) | 2019-11-13 |
Family
ID=59674680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016030677A Active JP6604651B2 (ja) | 2016-02-22 | 2016-02-22 | ペリクル収納容器 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6604651B2 (ja) |
KR (1) | KR20170098700A (ja) |
CN (1) | CN107102512B (ja) |
TW (1) | TWI624718B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11104496B2 (en) * | 2019-08-16 | 2021-08-31 | Gudeng Precision Industrial Co., Ltd. | Non-sealed reticle storage device |
JP7442291B2 (ja) * | 2019-10-09 | 2024-03-04 | 信越化学工業株式会社 | ペリクルとその専用ペリクルケースからなるアセンブリ |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH036915Y2 (ja) * | 1986-03-07 | 1991-02-21 | ||
US5305878A (en) * | 1993-04-01 | 1994-04-26 | Yen Yung Tsai | Packaged optical pellicle |
JP3023612U (ja) * | 1995-10-06 | 1996-04-23 | 信越化学工業株式会社 | ペリクルのペリクル収納容器への固定構造 |
JP3938224B2 (ja) * | 1997-08-04 | 2007-06-27 | 旭化成エレクトロニクス株式会社 | ペリクルの収納構造 |
JP2005326634A (ja) * | 2004-05-14 | 2005-11-24 | Mitsui Chemicals Inc | ペリクルの収納方法 |
JP4581681B2 (ja) * | 2004-12-27 | 2010-11-17 | 株式会社ニコン | レチクル保護装置および露光装置 |
JP4391435B2 (ja) * | 2005-03-22 | 2009-12-24 | 信越化学工業株式会社 | ペリクル収納容器 |
JP5052106B2 (ja) * | 2006-11-22 | 2012-10-17 | 旭化成イーマテリアルズ株式会社 | ペリクルの収納方法 |
CN102681334B (zh) * | 2007-07-06 | 2015-09-30 | 旭化成电子材料株式会社 | 从容纳容器取出大型表膜构件的取出方法 |
JP5051840B2 (ja) * | 2007-11-22 | 2012-10-17 | 信越化学工業株式会社 | ペリクル収納容器内にペリクルを保管する方法 |
JP2011034020A (ja) * | 2009-08-06 | 2011-02-17 | Shin-Etsu Chemical Co Ltd | ペリクル収納容器 |
KR200469200Y1 (ko) * | 2010-05-10 | 2013-09-26 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | 펠리클 수납 용기 |
JP5864399B2 (ja) * | 2012-10-22 | 2016-02-17 | 信越化学工業株式会社 | ペリクル収納容器 |
JP2014190998A (ja) * | 2013-03-26 | 2014-10-06 | Dainippon Printing Co Ltd | 基板収納ケース |
-
2016
- 2016-02-22 JP JP2016030677A patent/JP6604651B2/ja active Active
-
2017
- 2017-02-13 KR KR1020170019417A patent/KR20170098700A/ko not_active Application Discontinuation
- 2017-02-16 CN CN201710083586.6A patent/CN107102512B/zh active Active
- 2017-02-16 TW TW106105014A patent/TWI624718B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR20170098700A (ko) | 2017-08-30 |
CN107102512B (zh) | 2020-12-18 |
JP2017151130A (ja) | 2017-08-31 |
CN107102512A (zh) | 2017-08-29 |
TW201730667A (zh) | 2017-09-01 |
TWI624718B (zh) | 2018-05-21 |
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