CN107102512B - 防尘薄膜组件收纳容器 - Google Patents

防尘薄膜组件收纳容器 Download PDF

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Publication number
CN107102512B
CN107102512B CN201710083586.6A CN201710083586A CN107102512B CN 107102512 B CN107102512 B CN 107102512B CN 201710083586 A CN201710083586 A CN 201710083586A CN 107102512 B CN107102512 B CN 107102512B
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CN
China
Prior art keywords
thin film
frame
film assembly
dustproof
dustproof thin
Prior art date
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Active
Application number
CN201710083586.6A
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English (en)
Chinese (zh)
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CN107102512A (zh
Inventor
关原一敏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of CN107102512A publication Critical patent/CN107102512A/zh
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Publication of CN107102512B publication Critical patent/CN107102512B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN201710083586.6A 2016-02-22 2017-02-16 防尘薄膜组件收纳容器 Active CN107102512B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-030677 2016-02-22
JP2016030677A JP6604651B2 (ja) 2016-02-22 2016-02-22 ペリクル収納容器

Publications (2)

Publication Number Publication Date
CN107102512A CN107102512A (zh) 2017-08-29
CN107102512B true CN107102512B (zh) 2020-12-18

Family

ID=59674680

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710083586.6A Active CN107102512B (zh) 2016-02-22 2017-02-16 防尘薄膜组件收纳容器

Country Status (4)

Country Link
JP (1) JP6604651B2 (ja)
KR (1) KR20170098700A (ja)
CN (1) CN107102512B (ja)
TW (1) TWI624718B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11104496B2 (en) * 2019-08-16 2021-08-31 Gudeng Precision Industrial Co., Ltd. Non-sealed reticle storage device
JP7442291B2 (ja) * 2019-10-09 2024-03-04 信越化学工業株式会社 ペリクルとその専用ペリクルケースからなるアセンブリ

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH036915Y2 (ja) * 1986-03-07 1991-02-21
US5305878A (en) * 1993-04-01 1994-04-26 Yen Yung Tsai Packaged optical pellicle
JP3023612U (ja) * 1995-10-06 1996-04-23 信越化学工業株式会社 ペリクルのペリクル収納容器への固定構造
JP3938224B2 (ja) * 1997-08-04 2007-06-27 旭化成エレクトロニクス株式会社 ペリクルの収納構造
JP2005326634A (ja) * 2004-05-14 2005-11-24 Mitsui Chemicals Inc ペリクルの収納方法
JP4581681B2 (ja) * 2004-12-27 2010-11-17 株式会社ニコン レチクル保護装置および露光装置
JP4391435B2 (ja) * 2005-03-22 2009-12-24 信越化学工業株式会社 ペリクル収納容器
JP5052106B2 (ja) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 ペリクルの収納方法
CN101689018B (zh) * 2007-07-06 2013-03-20 旭化成电子材料株式会社 大型表膜构件的框体及该框体的把持方法
JP5051840B2 (ja) * 2007-11-22 2012-10-17 信越化学工業株式会社 ペリクル収納容器内にペリクルを保管する方法
JP2011034020A (ja) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd ペリクル収納容器
KR200469200Y1 (ko) * 2010-05-10 2013-09-26 아사히 가세이 이-매터리얼즈 가부시키가이샤 펠리클 수납 용기
JP5864399B2 (ja) * 2012-10-22 2016-02-17 信越化学工業株式会社 ペリクル収納容器
JP2014190998A (ja) * 2013-03-26 2014-10-06 Dainippon Printing Co Ltd 基板収納ケース

Also Published As

Publication number Publication date
KR20170098700A (ko) 2017-08-30
JP6604651B2 (ja) 2019-11-13
TWI624718B (zh) 2018-05-21
JP2017151130A (ja) 2017-08-31
TW201730667A (zh) 2017-09-01
CN107102512A (zh) 2017-08-29

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