JP5585768B2 - 液体噴射ヘッド、液体噴射装置および圧電素子 - Google Patents

液体噴射ヘッド、液体噴射装置および圧電素子 Download PDF

Info

Publication number
JP5585768B2
JP5585768B2 JP2010092907A JP2010092907A JP5585768B2 JP 5585768 B2 JP5585768 B2 JP 5585768B2 JP 2010092907 A JP2010092907 A JP 2010092907A JP 2010092907 A JP2010092907 A JP 2010092907A JP 5585768 B2 JP5585768 B2 JP 5585768B2
Authority
JP
Japan
Prior art keywords
mol
piezoelectric
piezoelectric layer
liquid ejecting
titanate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010092907A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011222884A5 (enExample
JP2011222884A (ja
Inventor
朋裕 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2010092907A priority Critical patent/JP5585768B2/ja
Priority to CN201110087450.5A priority patent/CN102233729B/zh
Priority to US13/081,158 priority patent/US8636342B2/en
Publication of JP2011222884A publication Critical patent/JP2011222884A/ja
Publication of JP2011222884A5 publication Critical patent/JP2011222884A5/ja
Application granted granted Critical
Publication of JP5585768B2 publication Critical patent/JP5585768B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047Membrane type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/85Piezoelectric or electrostrictive active materials
    • H10N30/853Ceramic compositions
    • H10N30/8561Bismuth-based oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/03Specific materials used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Coating Apparatus (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Semiconductor Memories (AREA)
JP2010092907A 2010-04-14 2010-04-14 液体噴射ヘッド、液体噴射装置および圧電素子 Expired - Fee Related JP5585768B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010092907A JP5585768B2 (ja) 2010-04-14 2010-04-14 液体噴射ヘッド、液体噴射装置および圧電素子
CN201110087450.5A CN102233729B (zh) 2010-04-14 2011-04-06 液体喷射头、液体喷射装置以及压电元件
US13/081,158 US8636342B2 (en) 2010-04-14 2011-04-06 Piezoelectric device, liquid ejecting head, liquid ejecting apparatus, ultrasonic device sensor, and timing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010092907A JP5585768B2 (ja) 2010-04-14 2010-04-14 液体噴射ヘッド、液体噴射装置および圧電素子

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014116619A Division JP5943218B2 (ja) 2014-06-05 2014-06-05 液体噴射ヘッド、液体噴射装置および圧電素子

Publications (3)

Publication Number Publication Date
JP2011222884A JP2011222884A (ja) 2011-11-04
JP2011222884A5 JP2011222884A5 (enExample) 2013-09-19
JP5585768B2 true JP5585768B2 (ja) 2014-09-10

Family

ID=44787916

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010092907A Expired - Fee Related JP5585768B2 (ja) 2010-04-14 2010-04-14 液体噴射ヘッド、液体噴射装置および圧電素子

Country Status (3)

Country Link
US (1) US8636342B2 (enExample)
JP (1) JP5585768B2 (enExample)
CN (1) CN102233729B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010150126A (ja) * 2008-11-18 2010-07-08 Ngk Insulators Ltd 圧電/電歪セラミックス組成物、圧電/電歪セラミックスの焼結体、圧電/電歪素子、圧電/電歪セラミックス組成物の製造方法及び圧電/電歪素子の製造方法
CN104640638B (zh) 2012-04-10 2018-01-05 艾诺维亚股份有限公司 提供电荷分离和可控制的微滴电荷,和低剂量体积眼的施用的喷雾喷射器机械装置和设备
ES2663879T3 (es) 2012-04-20 2018-04-17 Eyenovia, Inc. Dispositivo eyector de pulverización y métodos de uso
CA2873276A1 (en) 2012-05-14 2013-11-21 Eyenovia, Inc. Laminar flow droplet generator device and methods of use
SG11201407431RA (en) 2012-05-15 2014-12-30 Eyenovia Inc Ejector devices, methods, drivers, and circuits therefor
JP6349738B2 (ja) * 2013-03-29 2018-07-04 Tdk株式会社 圧電組成物および圧電素子
US9343650B2 (en) * 2013-03-29 2016-05-17 Fuji Chemical Co., Ltd. Piezoelectric material, piezoelectric element, multilayered piezoelectric element, liquid ejection head, liquid ejection apparatus, ultrasonic motor, optical equipment, vibration apparatus, dust removing apparatus, imaging apparatus, and electronic equipment
JP5761540B2 (ja) 2013-06-28 2015-08-12 セイコーエプソン株式会社 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置、超音波センサー、圧電モーター及び発電装置
JP5754660B2 (ja) 2013-06-28 2015-07-29 セイコーエプソン株式会社 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置、超音波センサー、圧電モーター及び発電装置
JP2015038953A (ja) 2013-06-28 2015-02-26 セイコーエプソン株式会社 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置、超音波センサー、圧電モーター及び発電装置
JP6398771B2 (ja) * 2014-03-31 2018-10-03 Tdk株式会社 圧電組成物および圧電素子
CN104496468A (zh) * 2014-11-27 2015-04-08 济南大学 一种降低钛酸铋钠基薄膜矫顽场及提高其耐压性的方法
WO2016103515A1 (ja) * 2014-12-26 2016-06-30 セイコーエプソン株式会社 圧電材料の製造方法、並びにこれにより製造された圧電材料を用いた圧電素子、及び圧電素子応用デバイス
WO2016103514A1 (ja) * 2014-12-26 2016-06-30 セイコーエプソン株式会社 圧電材料及びその製造方法、並びに圧電素子及び圧電素子応用デバイス
JP6375955B2 (ja) * 2015-01-08 2018-08-22 Tdk株式会社 圧電組成物および圧電素子

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN85100513B (zh) * 1985-04-01 1987-08-19 中国科学院上海硅酸盐研究所 钛酸铋钠钡系超声用压电陶瓷材料
JP4748291B2 (ja) * 2001-01-10 2011-08-17 Tdk株式会社 積層体変位素子
JP4708667B2 (ja) * 2002-08-08 2011-06-22 キヤノン株式会社 アクチュエータおよび液体噴射ヘッド
ATE537568T1 (de) * 2003-01-31 2011-12-15 Canon Kk Piezoelektrisches element
JP4165347B2 (ja) * 2003-06-25 2008-10-15 セイコーエプソン株式会社 圧電素子の製造方法
JP3994163B2 (ja) 2003-09-26 2007-10-17 独立行政法人物質・材料研究機構 Nbt強誘電体薄膜の製造方法
CN100478179C (zh) * 2005-08-09 2009-04-15 精工爱普生株式会社 致动器装置及其制造方法、液体喷射头以及液体喷射装置
JP5127268B2 (ja) * 2007-03-02 2013-01-23 キヤノン株式会社 圧電体、圧電体素子、圧電体素子を用いた液体吐出ヘッド及び液体吐出装置
JP4973931B2 (ja) * 2007-03-27 2012-07-11 Tdk株式会社 圧電磁器組成物
JP5253894B2 (ja) * 2007-06-08 2013-07-31 富士フイルム株式会社 強誘電体膜、圧電素子、及び液体吐出装置
EP2269965B1 (en) * 2008-03-26 2016-02-10 TDK Corporation Piezoelectric ceramic and piezoelectric ceramic composition
JP5394765B2 (ja) * 2008-03-31 2014-01-22 富士フイルム株式会社 ペロブスカイト型酸化物膜、強誘電体、圧電素子、液体吐出装置
JP5345868B2 (ja) * 2008-03-31 2013-11-20 富士フイルム株式会社 ペロブスカイト型酸化物膜、強誘電体、圧電素子、液体吐出装置
JP5248168B2 (ja) * 2008-04-01 2013-07-31 セイコーエプソン株式会社 圧電材料および圧電素子
JP5320886B2 (ja) * 2008-07-28 2013-10-23 セイコーエプソン株式会社 液体噴射ヘッド及び液体噴射装置並びに圧電素子
CN101798214A (zh) * 2010-03-03 2010-08-11 天津大学 (Na1/2Bi1/2)TiO3/BaTiO3陶瓷介质材料及其电容器的制备方法

Also Published As

Publication number Publication date
US8636342B2 (en) 2014-01-28
US20110254901A1 (en) 2011-10-20
CN102233729A (zh) 2011-11-09
CN102233729B (zh) 2014-07-09
JP2011222884A (ja) 2011-11-04

Similar Documents

Publication Publication Date Title
JP5585768B2 (ja) 液体噴射ヘッド、液体噴射装置および圧電素子
JP5585767B2 (ja) 液体噴射ヘッド、液体噴射装置および圧電素子
JP5858226B2 (ja) 液体噴射ヘッド、液体噴射装置、圧電素子、圧電セラミックス、アクチュエーター、およびセンサー
JP5672443B2 (ja) 液体噴射ヘッド、液体噴射装置、圧電素子及び圧電素子の製造方法
JP2011066382A (ja) 液滴噴射ヘッド、液滴噴射装置、圧電素子およびセラミックス
JP2011061118A (ja) 圧電素子、液体噴射ヘッドおよび液体噴射装置
JP5375688B2 (ja) 液体噴射ヘッド、圧電素子および圧電アクチュエーター
JP5552842B2 (ja) 圧電素子、液滴吐出ヘッド、および液滴吐出装置
CN102189798B (zh) 液体喷射头、液体喷射装置和压电元件
JP2011222849A (ja) 液体噴射ヘッド、液体噴射装置、および圧電素子
JP2011243722A (ja) 圧電素子、液滴噴射ヘッドおよび液滴噴射装置
JP5828368B2 (ja) 液体噴射ヘッド、液体噴射装置、圧電素子及び圧電センサー
JP5943218B2 (ja) 液体噴射ヘッド、液体噴射装置および圧電素子
JP5843081B2 (ja) 圧電素子、液体噴射ヘッドおよび液体噴射装置
JP5700200B2 (ja) 液体噴射ヘッド、液体噴射装置、圧電素子、および圧電セラミックス
US8348395B2 (en) Piezoelectric element, liquid ejection head, and liquid ejecting apparatus
JP2012114391A (ja) 液体噴射ヘッド、液体噴射装置、圧電素子、および圧電セラミックス
JP2011187817A (ja) 液体噴射ヘッド、液体噴射装置および圧電素子
JP5678472B2 (ja) 圧電素子、液滴噴射ヘッドおよび液滴噴射装置
JP5700201B2 (ja) 液体噴射ヘッド、液体噴射装置、圧電素子、および圧電セラミックス
JP2011240647A (ja) 圧電材料、圧電素子、液体噴射ヘッド及び液体噴射装置
JP5463816B2 (ja) 液滴噴射ヘッド、液滴噴射装置及び圧電アクチュエーター

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130329

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130809

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140409

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140605

TRDD Decision of grant or rejection written
RD07 Notification of extinguishment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7427

Effective date: 20140619

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140625

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140708

R150 Certificate of patent or registration of utility model

Ref document number: 5585768

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees