JP5567307B2 - 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 - Google Patents

基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 Download PDF

Info

Publication number
JP5567307B2
JP5567307B2 JP2009218709A JP2009218709A JP5567307B2 JP 5567307 B2 JP5567307 B2 JP 5567307B2 JP 2009218709 A JP2009218709 A JP 2009218709A JP 2009218709 A JP2009218709 A JP 2009218709A JP 5567307 B2 JP5567307 B2 JP 5567307B2
Authority
JP
Japan
Prior art keywords
abnormality
substrate processing
abnormality detection
processing apparatus
detection condition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009218709A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011071166A (ja
JP2011071166A5 (enExample
Inventor
一秀 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2009218709A priority Critical patent/JP5567307B2/ja
Priority to US12/873,413 priority patent/US8639367B2/en
Priority to TW099131962A priority patent/TWI427446B/zh
Publication of JP2011071166A publication Critical patent/JP2011071166A/ja
Publication of JP2011071166A5 publication Critical patent/JP2011071166A5/ja
Application granted granted Critical
Publication of JP5567307B2 publication Critical patent/JP5567307B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41875Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/32Operator till task planning
    • G05B2219/32191Real time statistical process monitoring
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • General Factory Administration (AREA)
  • Chemical Vapour Deposition (AREA)
JP2009218709A 2009-09-24 2009-09-24 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 Active JP5567307B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009218709A JP5567307B2 (ja) 2009-09-24 2009-09-24 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。
US12/873,413 US8639367B2 (en) 2009-09-24 2010-09-01 Substrate processing system
TW099131962A TWI427446B (zh) 2009-09-24 2010-09-21 基板處理系統、群管理裝置、群管理裝置的異常檢測方法、群管理裝置的顯示方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009218709A JP5567307B2 (ja) 2009-09-24 2009-09-24 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。

Publications (3)

Publication Number Publication Date
JP2011071166A JP2011071166A (ja) 2011-04-07
JP2011071166A5 JP2011071166A5 (enExample) 2012-10-18
JP5567307B2 true JP5567307B2 (ja) 2014-08-06

Family

ID=43757322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009218709A Active JP5567307B2 (ja) 2009-09-24 2009-09-24 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。

Country Status (3)

Country Link
US (1) US8639367B2 (enExample)
JP (1) JP5567307B2 (enExample)
TW (1) TWI427446B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6133164B2 (ja) 2013-08-12 2017-05-24 東京エレクトロン株式会社 群管理システム及びプログラム
SG11201808283RA (en) * 2016-03-31 2018-10-30 Kokusai Electric Corp Substrate processing apparatus, device management controller and recording medium
JP7247743B2 (ja) * 2019-05-20 2023-03-29 東京エレクトロン株式会社 基板処理装置及び基板処理方法
CN110879805B (zh) * 2019-11-22 2022-04-05 北京锐安科技有限公司 一种数据异常发现方法、装置、服务器及存储介质
US11545379B2 (en) * 2020-07-31 2023-01-03 Nanya Technology Corporation System and method for controlling semiconductor manufacturing equipment
CN113111095B (zh) * 2021-04-02 2021-10-26 国网北京市电力公司 一种智能化信息管理方法及系统
JP2023043716A (ja) * 2021-09-16 2023-03-29 株式会社Screenホールディングス 処理装置群管理システム、処理装置群管理方法およびプログラム
JP2023110948A (ja) * 2022-01-31 2023-08-10 株式会社Screenホールディングス 処理レシピの生成方法、処理レシピの生成装置、処理装置システム、処理レシピ表示方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123983A (en) * 1998-04-23 2000-09-26 Sandia Corporation Method and apparatus for monitoring plasma processing operations
JP4358465B2 (ja) * 2001-08-23 2009-11-04 株式会社日立国際電気 被処理体の処理装置及びその製造方法
JP4474814B2 (ja) * 2001-09-05 2010-06-09 三菱電機株式会社 監視システム
TW200516686A (en) * 2003-11-10 2005-05-16 Renesas Tech Corp Manufacturing method for semiconductor integrated circuit device
JP4497462B2 (ja) * 2004-06-24 2010-07-07 株式会社安川電機 装置モデル適用型ウエハ搬送コントローラ
JP4953427B2 (ja) * 2006-06-21 2012-06-13 東京エレクトロン株式会社 基板処理装置、表示方法、記録媒体及びプログラム
US7966151B2 (en) * 2006-10-24 2011-06-21 Ford Motor Company Method for analyzing operation of a machine
JP5145116B2 (ja) * 2008-05-21 2013-02-13 株式会社日立ハイテクノロジーズ 表面欠陥データ表示管理装置および表面欠陥データ表示管理方法
US8467994B2 (en) * 2010-09-28 2013-06-18 General Electric Company Monitoring system and display for use in a monitoring system

Also Published As

Publication number Publication date
US20110071661A1 (en) 2011-03-24
US8639367B2 (en) 2014-01-28
TW201133165A (en) 2011-10-01
JP2011071166A (ja) 2011-04-07
TWI427446B (zh) 2014-02-21

Similar Documents

Publication Publication Date Title
JP5567307B2 (ja) 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。
US20080210162A1 (en) Substrate Processing Apparatus and Substrate Processing System
US8874259B2 (en) Substrate processing apparatus and method of processing error of substrate processing apparatus
TWI796622B (zh) 基板處理裝置、半導體裝置的製造方法、及程式
JP2009260251A (ja) 基板処理装置及び基板処理システム
JP5412065B2 (ja) 情報管理方法、情報管理装置及び基板処理システム
JP5275641B2 (ja) 基板処理装置、基板処理装置の表示方法、基板処理装置の制御方法及び半導体装置の製造方法
JP5394452B2 (ja) 基板処理システム、検証装置、検証装置の動作検証方法および検証プログラム
JP2013033967A (ja) 基板処理装置の異常検出方法、及び基板処理装置
JP4486692B2 (ja) 基板処理装置
US8510790B2 (en) Substrate processing apparatus
JP4616798B2 (ja) 基板処理装置及び基板処理装置の表示方法
JP5016591B2 (ja) 基板処理装システム、データ収集プログラム及びデータ処理方法
JP6018369B2 (ja) 基板処理システム、管理装置及び基板処理システムにおける表示方法
JP5142353B2 (ja) 基板処理装置、基板処理装置の異常検出方法、基板処理システム、基板処理装置の異常検出プログラム及び半導体装置の製造方法
JP5436797B2 (ja) 基板処理システム、装置データサーバ、プログラム及び基板処理装置のデータ処理方法
JP4734185B2 (ja) 基板処理装置及び基板処理装置の制御方法
JP5193244B2 (ja) 基板処理装置、基板処理装置の表示方法、及び半導体装置の製造方法
JP2009026993A (ja) 基板処理システム
JP2008078351A (ja) 基板処理システム
JP2014082497A (ja) データ検索方法、データ検索システム及び情報管理装置の管理プログラム
JP2011023589A (ja) 基板処理システム
JP2011135090A (ja) 基板処理装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120903

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120903

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20131219

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140206

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140404

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140528

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140613

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140619

R150 Certificate of patent or registration of utility model

Ref document number: 5567307

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250