JP5567307B2 - 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 - Google Patents
基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 Download PDFInfo
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- JP5567307B2 JP5567307B2 JP2009218709A JP2009218709A JP5567307B2 JP 5567307 B2 JP5567307 B2 JP 5567307B2 JP 2009218709 A JP2009218709 A JP 2009218709A JP 2009218709 A JP2009218709 A JP 2009218709A JP 5567307 B2 JP5567307 B2 JP 5567307B2
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32191—Real time statistical process monitoring
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- General Factory Administration (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009218709A JP5567307B2 (ja) | 2009-09-24 | 2009-09-24 | 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 |
| US12/873,413 US8639367B2 (en) | 2009-09-24 | 2010-09-01 | Substrate processing system |
| TW099131962A TWI427446B (zh) | 2009-09-24 | 2010-09-21 | 基板處理系統、群管理裝置、群管理裝置的異常檢測方法、群管理裝置的顯示方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009218709A JP5567307B2 (ja) | 2009-09-24 | 2009-09-24 | 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011071166A JP2011071166A (ja) | 2011-04-07 |
| JP2011071166A5 JP2011071166A5 (enExample) | 2012-10-18 |
| JP5567307B2 true JP5567307B2 (ja) | 2014-08-06 |
Family
ID=43757322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009218709A Active JP5567307B2 (ja) | 2009-09-24 | 2009-09-24 | 基板処理装置の異常検知システム、群管理装置、基板処理装置の異常検知方法及び基板処理システム。 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8639367B2 (enExample) |
| JP (1) | JP5567307B2 (enExample) |
| TW (1) | TWI427446B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6133164B2 (ja) | 2013-08-12 | 2017-05-24 | 東京エレクトロン株式会社 | 群管理システム及びプログラム |
| SG11201808283RA (en) * | 2016-03-31 | 2018-10-30 | Kokusai Electric Corp | Substrate processing apparatus, device management controller and recording medium |
| JP7247743B2 (ja) * | 2019-05-20 | 2023-03-29 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
| CN110879805B (zh) * | 2019-11-22 | 2022-04-05 | 北京锐安科技有限公司 | 一种数据异常发现方法、装置、服务器及存储介质 |
| US11545379B2 (en) * | 2020-07-31 | 2023-01-03 | Nanya Technology Corporation | System and method for controlling semiconductor manufacturing equipment |
| CN113111095B (zh) * | 2021-04-02 | 2021-10-26 | 国网北京市电力公司 | 一种智能化信息管理方法及系统 |
| JP2023043716A (ja) * | 2021-09-16 | 2023-03-29 | 株式会社Screenホールディングス | 処理装置群管理システム、処理装置群管理方法およびプログラム |
| JP2023110948A (ja) * | 2022-01-31 | 2023-08-10 | 株式会社Screenホールディングス | 処理レシピの生成方法、処理レシピの生成装置、処理装置システム、処理レシピ表示方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6123983A (en) * | 1998-04-23 | 2000-09-26 | Sandia Corporation | Method and apparatus for monitoring plasma processing operations |
| JP4358465B2 (ja) * | 2001-08-23 | 2009-11-04 | 株式会社日立国際電気 | 被処理体の処理装置及びその製造方法 |
| JP4474814B2 (ja) * | 2001-09-05 | 2010-06-09 | 三菱電機株式会社 | 監視システム |
| TW200516686A (en) * | 2003-11-10 | 2005-05-16 | Renesas Tech Corp | Manufacturing method for semiconductor integrated circuit device |
| JP4497462B2 (ja) * | 2004-06-24 | 2010-07-07 | 株式会社安川電機 | 装置モデル適用型ウエハ搬送コントローラ |
| JP4953427B2 (ja) * | 2006-06-21 | 2012-06-13 | 東京エレクトロン株式会社 | 基板処理装置、表示方法、記録媒体及びプログラム |
| US7966151B2 (en) * | 2006-10-24 | 2011-06-21 | Ford Motor Company | Method for analyzing operation of a machine |
| JP5145116B2 (ja) * | 2008-05-21 | 2013-02-13 | 株式会社日立ハイテクノロジーズ | 表面欠陥データ表示管理装置および表面欠陥データ表示管理方法 |
| US8467994B2 (en) * | 2010-09-28 | 2013-06-18 | General Electric Company | Monitoring system and display for use in a monitoring system |
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2009
- 2009-09-24 JP JP2009218709A patent/JP5567307B2/ja active Active
-
2010
- 2010-09-01 US US12/873,413 patent/US8639367B2/en active Active
- 2010-09-21 TW TW099131962A patent/TWI427446B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| US20110071661A1 (en) | 2011-03-24 |
| US8639367B2 (en) | 2014-01-28 |
| TW201133165A (en) | 2011-10-01 |
| JP2011071166A (ja) | 2011-04-07 |
| TWI427446B (zh) | 2014-02-21 |
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