JP5526313B2 - 磁気光学素子用透光性酸化テルビウム焼結体 - Google Patents
磁気光学素子用透光性酸化テルビウム焼結体 Download PDFInfo
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- JP5526313B2 JP5526313B2 JP2009282636A JP2009282636A JP5526313B2 JP 5526313 B2 JP5526313 B2 JP 5526313B2 JP 2009282636 A JP2009282636 A JP 2009282636A JP 2009282636 A JP2009282636 A JP 2009282636A JP 5526313 B2 JP5526313 B2 JP 5526313B2
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- terbium
- terbium oxide
- oxide sintered
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- 229910003451 terbium oxide Inorganic materials 0.000 title claims description 20
- SCRZPWWVSXWCMC-UHFFFAOYSA-N terbium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Tb+3].[Tb+3] SCRZPWWVSXWCMC-UHFFFAOYSA-N 0.000 title claims description 19
- 238000002834 transmittance Methods 0.000 claims description 11
- 229910052726 zirconium Inorganic materials 0.000 claims description 9
- 229910052735 hafnium Inorganic materials 0.000 claims description 8
- 239000000654 additive Substances 0.000 claims description 6
- 230000000996 additive effect Effects 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052771 Terbium Inorganic materials 0.000 description 25
- 239000013078 crystal Substances 0.000 description 20
- 238000010304 firing Methods 0.000 description 20
- 239000012071 phase Substances 0.000 description 19
- 230000003287 optical effect Effects 0.000 description 18
- 230000007704 transition Effects 0.000 description 18
- -1 terbium ion Chemical class 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 239000000843 powder Substances 0.000 description 14
- 150000002910 rare earth metals Chemical group 0.000 description 12
- 239000011148 porous material Substances 0.000 description 11
- 230000008033 biological extinction Effects 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052765 Lutetium Inorganic materials 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 229910052706 scandium Inorganic materials 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000007088 Archimedes method Methods 0.000 description 2
- 229910052691 Erbium Inorganic materials 0.000 description 2
- 229910052689 Holmium Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052775 Thulium Inorganic materials 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000009694 cold isostatic pressing Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000002223 garnet Substances 0.000 description 2
- 238000001513 hot isostatic pressing Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241001648319 Toronia toru Species 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010532 solid phase synthesis reaction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 239000012856 weighed raw material Substances 0.000 description 1
Description
Θ=VHL
で表される。比例係数のVはヴェルデ定数といい、材料に依存する特性値である。Vの大きな材料をファラデー回転子に用いると、ファラデー回転子と永久磁石が小さくても同等のアイソレーション性能を得ることができるため、素子の小型化が可能となる。光アイソレータの利用分野としては半導体の微細加工用レーザ、光ファイバ通信用の半導体レーザ、鋼材やセラミックスの切断及び熱処理用レーザ、医療用レーザメス等に組み込まれ、近年ではSHG(第二高調波)素子を用いて波長変換した可視のグリーンレーザやブルーレーザに組み込まれて利用することも行なわれている。
2Tb4O7→4Tb2O3+O2 (1)
発生する酸素が、気孔として焼結体の内部に残留するとレーザ光の散乱原因となるために、光アイソレータの挿入損失が大きくなる。
Journal of Applied Physics, Volume 35, Number 8, 2338
(1)組成式(Tb1−aMa)2O3(式中、MはMg、Zr、Hfから選択される一種以上の元素、0.01≦a<0.3)で示される立方晶系の多結晶焼結体であって、気孔率が0.2%以下であり、1.06μmと532nmにおける3mm長さあたりの直線透過率がいずれも70%以上であることを特徴とする、磁気光学素子用透光性酸化テルビウム焼結体。
(2)前記添加元素Mが二種以上であって、一種はMgであり、他の一種以上はZrまたはHfであって、組成比が{Tb1−aMga/2(Zr,Hf)a/2}2O3(0.01≦a<0.2)となる(1)記載の磁気光学素子用透光性酸化テルビウム焼結体
(3)前記(1)〜(2)の透光性酸化テルビウム焼結体を磁気光学素子として用いたことを特徴とする磁気光学デバイス
に関する。
純度99.9%で粒径1μm以下のTb2O3粉末を100g、エチルアルコール150g、PVA1gを秤量し、表面を樹脂コートしたボールを用いてボールミル混合した。24時間後にスラリーを取り出し、エチルアルコールを蒸発させて乾燥粉末を得た。乾燥した粉末は乳鉢と乳棒を用いて解砕した。
原料に相転移を抑制するための添加元素を含む粉末を加えた以外は、実施例1と同じ手順で焼結体を作製した。焼結体の一部からサンプリングし、X線回折分析したところ、その結晶構造は、全て立方晶系のC型希土類構造であった。
Claims (3)
- 組成式(Tb1−aMa)2O3(式中、MはMg、Zr、Hfから選択される一種以上の元素、0.01≦a<0.3)で示される立方晶系の多結晶焼結体であって、
前記焼結体は、気孔率が0.2%以下であり、1.06μmと532nmにおける3mm長さあたりの直線透過率がいずれも70%以上であることを特徴とする、磁気光学素子用透光性酸化テルビウム焼結体。 - 前記添加元素Mが二種以上であって、一種はMgであり、他の一種以上はZrまたはHfであって、組成比が{Tb1−aMga/2(Zr,Hf)a/2}2O3(0.01≦a<0.2)となる請求項1記載の磁気光学素子用透光性酸化テルビウム焼結体。
- 請求項1〜2のいずれかの透光性酸化テルビウム焼結体を磁気光学素子として用いたことを特徴とする磁気光学デバイス。
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JP2011121837A JP2011121837A (ja) | 2011-06-23 |
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JP5762715B2 (ja) * | 2010-10-06 | 2015-08-12 | 信越化学工業株式会社 | 磁気光学材料、ファラデー回転子、及び光アイソレータ |
JP5692127B2 (ja) * | 2011-03-16 | 2015-04-01 | 信越化学工業株式会社 | セラミックス磁気光学材料の選定方法 |
DK2687500T3 (en) * | 2011-03-16 | 2018-07-23 | Shinetsu Chemical Co | Transparent ceramics, method of making them, and magneto-optical apparatus |
JP5575719B2 (ja) * | 2011-09-16 | 2014-08-20 | 信越化学工業株式会社 | 磁気光学素子用焼結体及び磁気光学デバイス |
JP5695594B2 (ja) * | 2012-03-27 | 2015-04-08 | 信越化学工業株式会社 | 磁気光学素子用焼結体及び磁気光学素子 |
JP6119528B2 (ja) | 2012-10-03 | 2017-04-26 | 信越化学工業株式会社 | 透明セスキオキサイド焼結体の製造方法 |
CN105378542B (zh) * | 2013-07-19 | 2018-01-16 | 信越化学工业株式会社 | 磁光材料及其制造方法以及磁光器件 |
TWI634093B (zh) | 2013-09-12 | 2018-09-01 | 信越化學工業股份有限公司 | 磁光材料以及磁光裝置 |
JP5962619B2 (ja) * | 2013-09-12 | 2016-08-03 | 信越化学工業株式会社 | シンチレータ材料、放射線検出器及び放射線検査装置 |
WO2016143859A1 (ja) | 2015-03-11 | 2016-09-15 | 信越化学工業株式会社 | 磁気光学材料及びその製造方法、並びに磁気光学デバイス |
JP2018048035A (ja) * | 2016-09-20 | 2018-03-29 | 住友金属鉱山株式会社 | ファラデー素子の製造方法、及びファラデー素子 |
JP7135920B2 (ja) * | 2018-03-09 | 2022-09-13 | 信越化学工業株式会社 | 透明複合酸化物焼結体の製造方法、透明複合酸化物焼結体並びに磁気光学デバイス |
CN115124342A (zh) * | 2022-06-28 | 2022-09-30 | 中国工程物理研究院化工材料研究所 | 氧化镱铽磁光透明陶瓷基纳米粉体的合成方法、氧化镱铽磁光透明陶瓷及制备方法 |
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