JP5502483B2 - 加工装置及び半導体ストリップ加工システム - Google Patents
加工装置及び半導体ストリップ加工システム Download PDFInfo
- Publication number
- JP5502483B2 JP5502483B2 JP2009532285A JP2009532285A JP5502483B2 JP 5502483 B2 JP5502483 B2 JP 5502483B2 JP 2009532285 A JP2009532285 A JP 2009532285A JP 2009532285 A JP2009532285 A JP 2009532285A JP 5502483 B2 JP5502483 B2 JP 5502483B2
- Authority
- JP
- Japan
- Prior art keywords
- unit
- semiconductor strip
- semiconductor
- transfer
- chuck table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000004065 semiconductor Substances 0.000 title claims description 456
- 238000012545 processing Methods 0.000 title claims description 99
- 238000012546 transfer Methods 0.000 claims description 317
- 238000005520 cutting process Methods 0.000 claims description 189
- 238000004140 cleaning Methods 0.000 claims description 68
- 238000007689 inspection Methods 0.000 claims description 67
- 238000000034 method Methods 0.000 claims description 55
- 238000001035 drying Methods 0.000 claims description 49
- 238000003698 laser cutting Methods 0.000 claims description 25
- 238000003754 machining Methods 0.000 claims description 2
- 230000032258 transport Effects 0.000 description 28
- 238000003860 storage Methods 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 230000002950 deficient Effects 0.000 description 11
- 239000000126 substance Substances 0.000 description 5
- 238000005507 spraying Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/30—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor to form contours, i.e. curved surfaces, irrespective of the method of working used
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
- B28D1/221—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising by thermic methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Mining & Mineral Resources (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Supply And Installment Of Electrical Components (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060098091A KR20080032413A (ko) | 2006-10-09 | 2006-10-09 | 반도체 제조장치 |
KR10-2006-0098091 | 2006-10-09 | ||
KR1020060128282A KR100814890B1 (ko) | 2006-12-15 | 2006-12-15 | 가공장치 및 반도체스트립 가공시스템 |
KR10-2006-0128282 | 2006-12-15 | ||
PCT/KR2007/004871 WO2008044840A2 (fr) | 2006-10-09 | 2007-10-05 | Appareil à usiner et système d'usinage d'une plaquette semiconductrice utilisant l'appareil |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010506422A JP2010506422A (ja) | 2010-02-25 |
JP5502483B2 true JP5502483B2 (ja) | 2014-05-28 |
Family
ID=39283280
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009532285A Active JP5502483B2 (ja) | 2006-10-09 | 2007-10-05 | 加工装置及び半導体ストリップ加工システム |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5502483B2 (fr) |
TW (1) | TWI364087B (fr) |
WO (1) | WO2008044840A2 (fr) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5457660B2 (ja) * | 2008-11-07 | 2014-04-02 | アピックヤマダ株式会社 | 切断方法及び切断装置 |
JP5420226B2 (ja) * | 2008-11-07 | 2014-02-19 | アピックヤマダ株式会社 | 切断装置 |
JP5298157B2 (ja) * | 2011-04-21 | 2013-09-25 | 西進商事株式会社 | レーザー加工装置、レーザー加工方法及びレーザー加工物 |
KR101635113B1 (ko) * | 2014-11-20 | 2016-06-30 | 서우테크놀로지 주식회사 | 반도체 스트립 그라인더 |
JP6388547B2 (ja) * | 2015-01-26 | 2018-09-12 | 株式会社ディスコ | 切削装置 |
KR101757150B1 (ko) * | 2016-07-07 | 2017-07-12 | 주식회사 영진하이텍 | Ssd용 라우터 절단경로 보정 시스템 |
KR101945039B1 (ko) * | 2017-07-11 | 2019-02-01 | 주식회사 영진하이텍 | 분진제거 기능을 포함하는 ssd용 라우터 절단경로 보정 시스템 및 그의 보정방법 |
JP7300846B2 (ja) * | 2019-02-19 | 2023-06-30 | 株式会社ディスコ | 切削装置及び半導体パッケージの製造方法 |
KR102027238B1 (ko) * | 2019-03-14 | 2019-11-04 | 인세미텍 주식회사 | 분할 기판 제조용 연삭 가공장치 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0384949A (ja) * | 1989-08-29 | 1991-04-10 | Nitto Denko Corp | ウエハと粘着テープの貼り合わせ方法 |
JP3930087B2 (ja) * | 1996-01-12 | 2007-06-13 | 株式会社東芝 | リッド装着装置及び固体撮像装置の製造方法 |
JP3388697B2 (ja) * | 1996-10-31 | 2003-03-24 | 株式会社日平トヤマ | レーザ加工装置 |
JP2001340986A (ja) * | 2000-05-31 | 2001-12-11 | Nippei Toyama Corp | レーザ加工システム及びレーザ加工方法 |
JP3530483B2 (ja) * | 2000-11-22 | 2004-05-24 | Necマシナリー株式会社 | 基板切断装置 |
JP3898624B2 (ja) * | 2002-11-08 | 2007-03-28 | 株式会社日平トヤマ | レーザ加工機のワーク搬送装置 |
KR100479417B1 (ko) * | 2003-03-31 | 2005-03-25 | 한미반도체 주식회사 | 반도체 패키지 제조공정용 쏘잉 장치 및 그 제어방법 |
KR100497506B1 (ko) * | 2003-04-08 | 2005-07-01 | 한미반도체 주식회사 | 반도체 스트립 소잉장치 및 이를 구비한 반도체 패키지의싱귤레이션 장치 |
JP4315788B2 (ja) * | 2003-11-26 | 2009-08-19 | アピックヤマダ株式会社 | 半導体装置の製造方法及び製造装置 |
WO2006025622A1 (fr) * | 2004-08-31 | 2006-03-09 | Hanmi Semiconductor Co., Ltd. | Appareil de sciage et procede de commande pour processus de fabrication de boitier semi-conducteur |
JP4527559B2 (ja) * | 2005-01-31 | 2010-08-18 | 株式会社ディスコ | 露光装置 |
JP4676288B2 (ja) * | 2005-09-14 | 2011-04-27 | 株式会社ディスコ | 切削装置 |
-
2007
- 2007-10-05 JP JP2009532285A patent/JP5502483B2/ja active Active
- 2007-10-05 WO PCT/KR2007/004871 patent/WO2008044840A2/fr active Application Filing
- 2007-10-08 TW TW096137734A patent/TWI364087B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2008044840A3 (fr) | 2008-07-24 |
TWI364087B (en) | 2012-05-11 |
JP2010506422A (ja) | 2010-02-25 |
WO2008044840A2 (fr) | 2008-04-17 |
TW200822265A (en) | 2008-05-16 |
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