JP5491856B2 - 異方性導電ペースト - Google Patents
異方性導電ペースト Download PDFInfo
- Publication number
- JP5491856B2 JP5491856B2 JP2009509040A JP2009509040A JP5491856B2 JP 5491856 B2 JP5491856 B2 JP 5491856B2 JP 2009509040 A JP2009509040 A JP 2009509040A JP 2009509040 A JP2009509040 A JP 2009509040A JP 5491856 B2 JP5491856 B2 JP 5491856B2
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- JP
- Japan
- Prior art keywords
- anisotropic conductive
- conductive paste
- solder particles
- particle size
- average particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 claims description 96
- 229910000679 solder Inorganic materials 0.000 claims description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 30
- 239000011256 inorganic filler Substances 0.000 claims description 23
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 23
- 239000003822 epoxy resin Substances 0.000 claims description 20
- 229920000647 polyepoxide Polymers 0.000 claims description 20
- 229910045601 alloy Inorganic materials 0.000 claims description 18
- 239000000956 alloy Substances 0.000 claims description 18
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 15
- 238000001938 differential scanning calorimetry curve Methods 0.000 claims description 14
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- -1 imidazole compound Chemical class 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 7
- 238000000113 differential scanning calorimetry Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 2
- 230000000052 comparative effect Effects 0.000 description 16
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- FBFIDNKZBQMMEQ-UHFFFAOYSA-N 3-(3-phenylpentan-3-yl)benzene-1,2-diamine Chemical compound C=1C=CC(N)=C(N)C=1C(CC)(CC)C1=CC=CC=C1 FBFIDNKZBQMMEQ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
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- 229910000927 Ge alloy Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910020882 Sn-Cu-Ni Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- 229910009071 Sn—Zn—Bi Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
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- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- 239000003063 flame retardant Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
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- 230000003647 oxidation Effects 0.000 description 1
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- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
- H05K3/323—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
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- C—CHEMISTRY; METALLURGY
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- H—ELECTRICITY
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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Description
ハンダ粒子2:Sn−Ag−Cu合金(Sn96.5:Ag3.0:Cu0.5)、
球状、平均粒子寸法 5μm
ハンダ粒子3:Sn−Bi合金(Sn42:Bi58)、球状、平均粒子寸法10μm
導電粒子1 :Ni粉、球状、平均粒子寸法5μm
樹脂コア金メッキ粒子:平均粒径5μmのゴム粒子の表面にNiとAuをメッキしたもの。
シリカフィラー1:球状溶融シリカ、平均粒子寸法0.5μm、BET比表面積6m2/g、最大粒子寸法5μm
シリカフィラー2:球状溶融シリカ、平均粒子寸法6μm、最大粒子寸法25μm
シランカップリング剤:γ−グリシドキシプロピルトリメトキシシラン
ヨードニウム塩:ヨードニウム,(4−メチルフェニル)[4−(2−メチルプロピル)フェニル]−ヘキサフルオロフォスフェート(1−)とプロピレンカーボネートの3:1の混合物
芳香族アミン:ジアミノジエチルジフェニルメタン
2MAOK:2,4−ジアミノ−6−[2’−メチルイミダゾリル−(1’)]−エチル−s−トリアジンイソシアヌル酸付加物
評価に用いた実装サンプルは、以下のようにして製造した。
チップ:9.6mm×9.6mm。バンプ径85μm、高さ70μmのAuスタッドバンプがピッチ150μmで240個ペリフェラル状に配置されたICチップ。
配線板:チップのバンプに対応する位置にNi/Auメッキがされた銅の電極を有するFR−4基板。
1.合金の形成
試験1:チップを配線板から引き剥がし、電極にハンダ溶融の痕跡があるかを、金属顕微鏡で確認した。
試験2:実装サンプルの断面をSEMにより観察し、バンプ−電極間にハンダが存在することを確認した。
試験1及び2で、ハンダの存在が確認された場合を○、それ以外の場合を×とした。結果を表1、表2に示す。
デジタルマルチメーターにより抵抗値を測定した。接続が取れている場合を○、オープン不良の場合を×とした。結果を表1、表2に示す。
万能試験機でチップ−配線板間の剪断強度を測定し、接続強度とした。初期値と、PCT試験(条件:121℃、2気圧(飽和)、20時間)後の値を、表1、表2に示す。
上記PCT試験後の重量変化を測定することにより測定した。吸水率(%)は、(PCT試験後の実装サンプルの重量−初期の実装サンプルの重量)/(初期の実装サンプルの重量)×100により求めた。結果を表1、表2に示す。
実施例1と比較例6の異方性導電ペースト及び実施例1と比較例6で使用したハンダ粒子5mgを、Perkin Elmer社製示差走査熱分析装置(型番:Pyris1)を用いて、30〜300℃の温度範囲を毎分500℃で等速昇温させて示差走査熱分析曲線を得た。結果を図1に示す。
Claims (12)
- エポキシ樹脂、イミダゾール化合物、ハンダ粒子及び絶縁性無機フィラーを含み、ハンダ粒子の平均粒子寸法よりも、絶縁性無機フィラーの平均粒子寸法が小さく、
エポキシ樹脂100重量部に対して、イミダゾール化合物が10〜50重量部であり、
熱板の温度150〜400℃、圧力1g/chip〜50kg/chip、時間0.1〜5秒の条件で接続対象物同士を熱圧着させる際に用いられる、
異方性導電ペースト。 - エポキシ樹脂100重量部に対して、ハンダ粒子が5〜900重量部である、請求項1記載の異方性導電ペースト。
- 異方性導電ペーストの示差走査熱分析曲線から求められた最大発熱ピーク温度が、ハンダ粒子の示差走査熱分析曲線から求められた最大吸熱ピーク温度より高く、ここで、示差走査熱分析は、30〜300℃の温度範囲を毎分500℃で等速昇温させる、請求項1または請求項2に記載の異方性導電ペースト。
- 異方性導電ペーストの示差走査熱分析曲線から求められた全発熱量に対して、ハンダ粒子の最大吸熱ピーク温度以下の温度における発熱量が20%以下であり、ここで、示差走査熱分析は、30〜300℃の温度範囲を毎分500℃で等速昇温させる、請求項1〜3のいずれか1項記載の異方性導電ペースト。
- ハンダ粒子が、Sn含有合金である、請求項1〜4のいずれか1項記載の異方性導電ペースト。
- ハンダ粒子の平均粒子寸法が、0.5〜50μmである、請求項1〜5のいずれか1項記載の異方性導電ペースト。
- 絶縁性無機フィラーが、シリカである、請求項1〜6のいずれか1項記載の異方性導電ペースト。
- 絶縁性無機フィラーの平均粒子寸法が、0.025〜25μmである、請求項1〜7のいずれか1項記載の異方性導電ペースト。
- 異方性導電ペースト中の絶縁性無機フィラーが2.5〜35重量%である、請求項1〜8のいずれか1項記載の異方性導電ペースト。
- 電子機器の実装において、接続対象物同士を、請求項1〜9のいずれか1項記載の異方性導電ペーストを介在させて熱圧着させることを含む、接続方法。
- 接続対象物の一方が、チップの端子のバンプであり、もう一方が配線板上の電極である、請求項10記載の接続方法。
- 請求項1〜9のいずれか1項記載の異方性導電ペーストを用いた接続を含む半導体装置。
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JP5542470B2 (ja) * | 2009-02-20 | 2014-07-09 | パナソニック株式会社 | はんだバンプ、半導体チップ、半導体チップの製造方法、導電接続構造体、および導電接続構造体の製造方法 |
JP5842084B2 (ja) * | 2010-09-27 | 2016-01-13 | パナソニックIpマネジメント株式会社 | 半導体部品実装基板 |
KR101365107B1 (ko) * | 2012-09-21 | 2014-02-20 | 제일모직주식회사 | 이방성 도전 필름 및 이를 포함하는 반도체 장치 |
TWI499775B (zh) * | 2013-01-28 | 2015-09-11 | Tanaka Precious Metal Ind | 氣體感測電極形成用之金屬膏 |
WO2015056754A1 (ja) * | 2013-10-17 | 2015-04-23 | デクセリアルズ株式会社 | 異方性導電接着剤及び接続構造体 |
CN105684096B (zh) * | 2014-03-07 | 2018-04-17 | 积水化学工业株式会社 | 导电糊剂、连接结构体及连接结构体的制造方法 |
JP6347635B2 (ja) * | 2014-03-19 | 2018-06-27 | デクセリアルズ株式会社 | 異方性導電接着剤 |
JP2014209624A (ja) * | 2014-04-18 | 2014-11-06 | パナソニック株式会社 | 回路基板と半導体部品との接合部構造 |
JP6430148B2 (ja) * | 2014-05-23 | 2018-11-28 | デクセリアルズ株式会社 | 接着剤及び接続構造体 |
JP6419457B2 (ja) * | 2014-05-23 | 2018-11-07 | デクセリアルズ株式会社 | 接着剤及び接続構造体 |
WO2015178482A1 (ja) * | 2014-05-23 | 2015-11-26 | デクセリアルズ株式会社 | 接着剤及び接続構造体 |
JP2016054296A (ja) * | 2014-09-01 | 2016-04-14 | 積水化学工業株式会社 | 接続構造体の製造方法 |
CN107636773B (zh) * | 2015-08-24 | 2019-09-27 | 积水化学工业株式会社 | 导电材料及连接结构体 |
CN108251030A (zh) * | 2016-12-28 | 2018-07-06 | 株式会社田村制作所 | 各向异性导电糊及电子基板的制造方法 |
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TW200902673A (en) | 2009-01-16 |
KR20090129478A (ko) | 2009-12-16 |
TWI476266B (zh) | 2015-03-11 |
WO2008123087A1 (ja) | 2008-10-16 |
JPWO2008123087A1 (ja) | 2010-07-15 |
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