JP5449130B2 - 電解質、並びに黒ルテニウムの装飾用の及び技術的な層を堆積するための方法 - Google Patents

電解質、並びに黒ルテニウムの装飾用の及び技術的な層を堆積するための方法 Download PDF

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Publication number
JP5449130B2
JP5449130B2 JP2010500099A JP2010500099A JP5449130B2 JP 5449130 B2 JP5449130 B2 JP 5449130B2 JP 2010500099 A JP2010500099 A JP 2010500099A JP 2010500099 A JP2010500099 A JP 2010500099A JP 5449130 B2 JP5449130 B2 JP 5449130B2
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Prior art keywords
acid
electrolyte
ruthenium
phosphonic acid
phosphonic
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JP2010500099A
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English (en)
Japanese (ja)
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JP2010522277A5 (OSRAM
JP2010522277A (ja
Inventor
シュラメク フィリップ
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Umicore Galvanotechnik GmbH
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Umicore Galvanotechnik GmbH
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Secondary Cells (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Chemical Treatment Of Metals (AREA)
JP2010500099A 2007-03-28 2008-03-05 電解質、並びに黒ルテニウムの装飾用の及び技術的な層を堆積するための方法 Active JP5449130B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07006380A EP1975282B1 (de) 2007-03-28 2007-03-28 Elektolyt und Verfahren zur Abscheidung von dekorativen und technischen Schichten aus Schwarz-Ruthenium
EP07006380.5 2007-03-28
PCT/EP2008/001751 WO2008116545A1 (en) 2007-03-28 2008-03-05 Electrolyte and method for depositing decorative and technical layers of black ruthenium

Publications (3)

Publication Number Publication Date
JP2010522277A JP2010522277A (ja) 2010-07-01
JP2010522277A5 JP2010522277A5 (OSRAM) 2013-06-20
JP5449130B2 true JP5449130B2 (ja) 2014-03-19

Family

ID=38372350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010500099A Active JP5449130B2 (ja) 2007-03-28 2008-03-05 電解質、並びに黒ルテニウムの装飾用の及び技術的な層を堆積するための方法

Country Status (10)

Country Link
US (1) US8211286B2 (OSRAM)
EP (1) EP1975282B1 (OSRAM)
JP (1) JP5449130B2 (OSRAM)
KR (1) KR101416253B1 (OSRAM)
CN (1) CN101675185B (OSRAM)
AT (1) ATE449201T1 (OSRAM)
BR (1) BRPI0809382A2 (OSRAM)
DE (1) DE502007002036D1 (OSRAM)
TW (1) TWI427195B (OSRAM)
WO (1) WO2008116545A1 (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011105207B4 (de) 2011-06-17 2015-09-10 Umicore Galvanotechnik Gmbh Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel
CN107722361B (zh) * 2017-09-26 2020-01-10 同济大学 一种纳米氨基三亚甲基膦酸镁负载还原氧化石墨烯阻燃剂的制备方法
DE102019109188B4 (de) * 2019-04-08 2022-08-11 Umicore Galvanotechnik Gmbh Verwendung eines Elektrolyten zur Abscheidung von anthrazit/schwarzen Rhodium/Ruthenium Legierungsschichten
CN110965088A (zh) * 2019-08-27 2020-04-07 周大福珠宝金行（深圳）有限公司 一种黄金的复古工艺以及复古黄金
CN115261937B (zh) * 2022-03-22 2024-12-13 东莞市弘裕表面处理技术有限公司 钌镀液及其制备方法、镀钌方法、钌镀层及含有其的器件
CN115787010B (zh) * 2022-12-02 2024-11-12 周大福珠宝文化产业园(武汉)有限公司 黑钌镀液及其在复古黄金或铂金等饰品制备中的应用

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1198527A (en) * 1966-09-16 1970-07-15 Fred I Nobel Improvements in Electrodeposition of Gold and Gold Alloys
GB1244309A (en) * 1967-10-18 1971-08-25 Int Nickel Ltd Electrodeposition of ruthenium
US3530049A (en) * 1968-10-02 1970-09-22 Technic Gold and ruthenium plating baths
DE1959907A1 (de) * 1968-11-28 1970-06-18 Johnson Matthey Co Ltd Rutheniumkomplex und seine Verwendung bei der Elektroplattierung
CH512590A (fr) * 1970-03-20 1971-09-15 Sel Rex Corp Procédé pour le dépôt électrolytique d'alliages de ruthénium, bain aqueux pour la mise en oeuvre de ce procédé, et article revêtu d'un alliage de ruthénium obtenu par ce procédé
US3939226A (en) * 1974-01-07 1976-02-17 Hooker Chemicals & Plastics Corporation Phosphonomethyl compounds
GB1520140A (en) * 1976-06-08 1978-08-02 Inco Europ Ltd Electrodeposition of ruthenium
US4082624A (en) * 1976-12-03 1978-04-04 Bell Telephone Laboratories, Incorporated Articles electrodeposited with ruthenium and processes of producing such articles
EP0018165A1 (en) * 1979-04-10 1980-10-29 Inco Europe Limited A bath and a process for electrodepositing ruthenium, a concentrated solution for use in forming the bath and an object having a ruthenium coating
US4402802A (en) * 1981-01-03 1983-09-06 Dequssa Aktiengesellschaft Electrolytic bath for the deposition of rhodium coatings
US4375392A (en) * 1981-06-02 1983-03-01 Occidental Chemical Corporation Bath and process for the electrodeposition of ruthenium
US4563405A (en) * 1983-06-23 1986-01-07 Konishiroku Photo Industry Co., Ltd. Processing solution having bleaching ability for light-sensitive silver halide color photographic material
JPS61104097A (ja) 1984-10-23 1986-05-22 Iwasaki Mekki:Kk 外装部品
JPS63259095A (ja) 1987-04-16 1988-10-26 Nippon Mining Co Ltd ルテニウムめつき液
JPH01119660A (ja) 1987-10-30 1989-05-11 Seiko Epson Corp 部分乾式メッキ法
JPH03226591A (ja) 1990-01-31 1991-10-07 Seiko Epson Corp 部分古美調装飾部品およびその製造方法
US5077442A (en) * 1990-04-26 1991-12-31 Mitsubishi Kasei Corporation Method for producing 1,4-butanediol
JPH0474883A (ja) * 1990-07-17 1992-03-10 Tanaka Kikinzoku Kogyo Kk ルテニウム合金メッキ方法
JPH0474884A (ja) * 1990-07-17 1992-03-10 Tanaka Kikinzoku Kogyo Kk ルテニウム合金メッキ方法
JPH04154988A (ja) 1990-10-16 1992-05-27 Seiko Epson Corp 装飾部材の製造方法
DE19741990C1 (de) * 1997-09-24 1999-04-29 Degussa Elektrolyt zur galvanischen Abscheidung von spannungsarmen, rißfesten Rutheniumschichten, Verfahren zur Herstellung und Verwendung
JP3302949B2 (ja) * 1999-08-03 2002-07-15 株式会社日鉱マテリアルズ 黒色ルテニウムめっき液

Also Published As

Publication number Publication date
US20100051468A1 (en) 2010-03-04
KR20090123928A (ko) 2009-12-02
CN101675185B (zh) 2011-04-13
KR101416253B1 (ko) 2014-07-09
WO2008116545A1 (en) 2008-10-02
EP1975282A1 (de) 2008-10-01
HK1138044A1 (en) 2010-08-13
US8211286B2 (en) 2012-07-03
CN101675185A (zh) 2010-03-17
JP2010522277A (ja) 2010-07-01
BRPI0809382A2 (pt) 2014-09-09
EP1975282B1 (de) 2009-11-18
DE502007002036D1 (de) 2009-12-31
TWI427195B (zh) 2014-02-21
ATE449201T1 (de) 2009-12-15
TW200914650A (en) 2009-04-01

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