JP5425475B2 - 電子カラム用真空度差維持器具 - Google Patents
電子カラム用真空度差維持器具 Download PDFInfo
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- JP5425475B2 JP5425475B2 JP2008553172A JP2008553172A JP5425475B2 JP 5425475 B2 JP5425475 B2 JP 5425475B2 JP 2008553172 A JP2008553172 A JP 2008553172A JP 2008553172 A JP2008553172 A JP 2008553172A JP 5425475 B2 JP5425475 B2 JP 5425475B2
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- 238000012423 maintenance Methods 0.000 title claims description 12
- 238000010894 electron beam technology Methods 0.000 claims description 25
- 238000007789 sealing Methods 0.000 claims description 25
- 230000008878 coupling Effects 0.000 claims description 15
- 238000010168 coupling process Methods 0.000 claims description 15
- 238000005859 coupling reaction Methods 0.000 claims description 15
- 108010083687 Ion Pumps Proteins 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/188—Differential pressure
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Description
12…密閉面13,13’…中空 15,15’,52…真空密閉部 17…ネジ
18,19…Oリング 20…電子カラム 21…電子放出源
22,23…レンズ部 25…デフレクター 26…ネジ部
28…コネクタ 29,29’…ハウジング 30…電子カラムチャンバー
32,33…フランジ 34…ゲートバルブ 40…下部フランジ
51…カラム組立部 80…電子カラムハウジング 90…試料チャンバー
Claims (8)
- 電子放出源、レンズ部、およびこれらを固定するハウジングを含む電子カラムと試料間の真空度の差を維持するための電子カラム用真空度差維持器具において、
前記ハウジングと真空密閉されるように結合するカラムハウジング結合部と、
中央に設けられ、電子カラムから放出される電子ビームが貫通する中空と、ガスケットの役割をする真空密閉部と、を一体に結合し、
前記ハウジングと結合して、電子ビームが放出される経路において最終的に位置するレンズの電極層の口径または前記中空を用いて前記真空度差維持器具を基準として両側の真空度の差がtorr単位を基準に10倍以上を維持することを特徴とする、電子カラム用真空度差維持器具。 - 前記ハウジングと前記真空度差維持器具とが一体に形成されることを特徴とする、請求項1に記載の電子カラム用真空度差維持器具。
- 前記ハウジングと前記真空度差維持器具とがゴム輪を用いて結合することを特徴とする、請求項1または2に記載の電子カラム用真空度差維持器具。
- 前記真空度差維持器具は、前記カラムハウジング結合部および前記真空密閉部に対して着脱可能であることを特徴とする、請求項1に記載の電子カラム用真空度差維持器具。
- 前記カラムハウジング結合部が少なくとも2つ備えられることにより、少なくとも2つの電子カラムが装着できることを特徴とする、請求項1〜4のいずれか1項に記載の電子カラム用真空度差維持器具。
- 請求項1〜5のいずれか1項の真空度差維持器具を用いて電子カラムチャンバーと試料チャンバーとが真空度の差を維持することを特徴とする、電子カラムシステム。
- 前記電子カラムチャンバーが前記試料チャンバー内に位置することを特徴とする、請求項6に記載の電子カラムシステム。
- 前記電子カラム用真空度差維持器具には、前記カラムハウジング結合部が少なくとも2つ備えられることにより、前記カラムハウジング結合部に対応する数だけの多数の電子カラムが装着できることを特徴とする、請求項6または7に記載の電子カラムシステム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20060009881 | 2006-02-02 | ||
KR10-2006-0009881 | 2006-02-02 | ||
PCT/KR2007/000584 WO2007089124A1 (en) | 2006-02-02 | 2007-02-02 | Device for sustaining differential vacuum degrees for electron column |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009525581A JP2009525581A (ja) | 2009-07-09 |
JP5425475B2 true JP5425475B2 (ja) | 2014-02-26 |
Family
ID=38327648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008553172A Expired - Fee Related JP5425475B2 (ja) | 2006-02-02 | 2007-02-02 | 電子カラム用真空度差維持器具 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8912506B2 (ja) |
EP (1) | EP1982346A4 (ja) |
JP (1) | JP5425475B2 (ja) |
KR (1) | KR100994516B1 (ja) |
CN (1) | CN101379585B (ja) |
WO (1) | WO2007089124A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103140014B (zh) * | 2011-11-25 | 2015-12-09 | 中国原子能科学研究院 | 电子加速器的电子枪在线拆装设备 |
US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
NL2013817C2 (en) * | 2013-11-14 | 2015-07-21 | Mapper Lithography Ip Bv | Multi-electrode electron optics. |
US9997331B1 (en) * | 2014-01-27 | 2018-06-12 | Mochii, Inc. | Charged-particle beam microscopy |
US9564291B1 (en) | 2014-01-27 | 2017-02-07 | Mochii, Inc. | Hybrid charged-particle beam and light beam microscopy |
US9466459B2 (en) | 2014-06-03 | 2016-10-11 | Protochips, Inc. | Method for optimizing fluid flow across a sample within an electron microscope sample holder |
KR101775985B1 (ko) * | 2016-02-26 | 2017-09-08 | 선문대학교 산학협력단 | 초소형 전자칼럼용 배선 커넥터 |
KR101897460B1 (ko) * | 2016-11-16 | 2018-09-12 | 한국표준과학연구원 | 교환가능한 전자현미경용 전자총 및 이를 포함하는 전자현미경 |
TW202331763A (zh) * | 2017-04-11 | 2023-08-01 | 荷蘭商Asml荷蘭公司 | 帶電粒子源模組及具有所述帶電粒子源模組之曝光系統 |
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JPS5824953A (ja) | 1981-08-06 | 1983-02-15 | Toshiba Corp | メモリ制御方式 |
JPS5824953U (ja) * | 1981-08-12 | 1983-02-17 | 株式会社日立製作所 | 超高真空装置 |
JPS6086748A (ja) * | 1983-10-19 | 1985-05-16 | Hitachi Ltd | 電子顕微鏡用雰囲気試料室 |
US4590792A (en) * | 1984-11-05 | 1986-05-27 | Chiang William W | Microanalysis particle sampler |
JPH0687410B2 (ja) * | 1986-08-01 | 1994-11-02 | エレクトロ‐スキャン コーポレーション | 走査電子顕微鏡及び試料の表面を電子顕微鏡的に像形成する方法 |
US4823006A (en) * | 1987-05-21 | 1989-04-18 | Electroscan Corporation | Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope |
GB8918093D0 (en) * | 1989-08-08 | 1989-09-20 | Anson Ltd | Improved pipeline couplings |
EP0462554B1 (en) * | 1990-06-20 | 2000-10-11 | Hitachi, Ltd. | Charged particle beam apparatus |
US5530255A (en) * | 1990-08-17 | 1996-06-25 | Raychem Corporation | Apparatus and methods for electron beam irradiation |
JPH05234552A (ja) | 1992-02-21 | 1993-09-10 | Elionix Kk | 走査電子顕微鏡 |
JPH0660841A (ja) | 1992-06-11 | 1994-03-04 | Nikon Corp | 走査型電子顕微鏡 |
US5396067A (en) * | 1992-06-11 | 1995-03-07 | Nikon Corporation | Scan type electron microscope |
JP3023246B2 (ja) * | 1992-07-28 | 2000-03-21 | 株式会社日立製作所 | 超高真空用シール材ならびにこれを用いた超高真空装置および電子顕微鏡 |
US5828064A (en) * | 1995-08-11 | 1998-10-27 | Philips Electronics North America Corporation | Field emission environmental scanning electron microscope |
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JPH1064467A (ja) * | 1996-08-23 | 1998-03-06 | Toshiba Corp | 電子顕微鏡 |
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GB2374723B (en) * | 2001-04-20 | 2005-04-20 | Leo Electron Microscopy Ltd | Scanning electron microscope |
JP4200665B2 (ja) * | 2001-05-08 | 2008-12-24 | 株式会社日立製作所 | 加工装置 |
JP2003234080A (ja) | 2002-02-06 | 2003-08-22 | Canon Inc | 電子線照射装置 |
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-
2007
- 2007-02-02 WO PCT/KR2007/000584 patent/WO2007089124A1/en active Application Filing
- 2007-02-02 CN CN2007800044031A patent/CN101379585B/zh not_active Expired - Fee Related
- 2007-02-02 KR KR1020087019036A patent/KR100994516B1/ko active IP Right Grant
- 2007-02-02 JP JP2008553172A patent/JP5425475B2/ja not_active Expired - Fee Related
- 2007-02-02 US US12/278,219 patent/US8912506B2/en not_active Expired - Fee Related
- 2007-02-02 EP EP07708735.1A patent/EP1982346A4/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP1982346A1 (en) | 2008-10-22 |
KR100994516B1 (ko) | 2010-11-15 |
CN101379585B (zh) | 2011-07-20 |
US20090224650A1 (en) | 2009-09-10 |
KR20080096767A (ko) | 2008-11-03 |
US8912506B2 (en) | 2014-12-16 |
CN101379585A (zh) | 2009-03-04 |
EP1982346A4 (en) | 2014-05-07 |
WO2007089124A1 (en) | 2007-08-09 |
JP2009525581A (ja) | 2009-07-09 |
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