JP5335070B2 - 樹脂組成物及びこれを用いて形成された光学フィルム - Google Patents
樹脂組成物及びこれを用いて形成された光学フィルム Download PDFInfo
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- JP5335070B2 JP5335070B2 JP2011507354A JP2011507354A JP5335070B2 JP 5335070 B2 JP5335070 B2 JP 5335070B2 JP 2011507354 A JP2011507354 A JP 2011507354A JP 2011507354 A JP2011507354 A JP 2011507354A JP 5335070 B2 JP5335070 B2 JP 5335070B2
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2333/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2425/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
- C08J2425/02—Homopolymers or copolymers of hydrocarbons
- C08J2425/04—Homopolymers or copolymers of styrene
- C08J2425/08—Copolymers of styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2471/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
- C08J2471/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08J2471/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/06—Polystyrene
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Polarising Elements (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
Claims (7)
- 前記(メタ)アクリレート系誘導体及びマレイミドの共重合体中の該(メタ)アクリレート系誘導体の含量は、該共重合体の重量に対して50%〜99%である、請求項1に記載の樹脂組成物。
- 前記スチレン誘導体及びマレイン酸無水物の共重合体は、該共重合体の重量に対して、前記スチレン系誘導体を30%〜99%、前記マレイン酸無水物を1%〜70%含む、請求項1に記載の樹脂組成物。
- 前記(b)は、1,500〜2,000,000g/molの数平均分子量を有する、請求項1に記載の樹脂組成物。
- 前記スチレン誘導体は、スチレンのベンゼン環又はビニル基に脂肪族炭化水素及びヘテロ原子を含む基から選択される1つ以上の置換基を有するかまたは有しないスチレンを含む、請求項1に記載の樹脂組成物。
- 単一のガラス転移温度を有する、請求項1に記載の樹脂組成物。
- 請求項1から6のいずれか一項に記載の樹脂組成物を用いて形成された光学フィルム。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20080040843 | 2008-04-30 | ||
KR10-2008-0040843 | 2008-04-30 | ||
KR1020090002069A KR101105424B1 (ko) | 2008-04-30 | 2009-01-09 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
KR10-2009-0002069 | 2009-01-09 | ||
PCT/KR2009/002302 WO2009134097A2 (ko) | 2008-04-30 | 2009-04-30 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011519389A JP2011519389A (ja) | 2011-07-07 |
JP5335070B2 true JP5335070B2 (ja) | 2013-11-06 |
Family
ID=41255571
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011507354A Active JP5335070B2 (ja) | 2008-04-30 | 2009-04-30 | 樹脂組成物及びこれを用いて形成された光学フィルム |
Country Status (7)
Country | Link |
---|---|
US (1) | US8344083B2 (ja) |
EP (1) | EP2272879B1 (ja) |
JP (1) | JP5335070B2 (ja) |
KR (1) | KR101105424B1 (ja) |
CN (1) | CN102015793B (ja) |
TW (1) | TWI398480B (ja) |
WO (1) | WO2009134097A2 (ja) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20090076754A (ko) * | 2008-01-08 | 2009-07-13 | 주식회사 엘지화학 | 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치 |
KR20090076753A (ko) * | 2008-01-08 | 2009-07-13 | 주식회사 엘지화학 | 투명한 수지 조성물 |
KR101105424B1 (ko) | 2008-04-30 | 2012-01-17 | 주식회사 엘지화학 | 수지 조성물 및 이를 이용하여 형성된 광학 필름 |
US8613986B2 (en) | 2008-04-30 | 2013-12-24 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
KR101091534B1 (ko) * | 2008-04-30 | 2011-12-13 | 주식회사 엘지화학 | 광학 필름 및 이를 포함하는 정보전자 장치 |
KR101409208B1 (ko) * | 2011-04-13 | 2014-06-20 | 주식회사 엘지화학 | 연속괴상중합법에 의한 광학 필름용 수지 조성물의 제조 방법, 이를 이용한 광학 필름의 제조 방법 및 편광판 제조 방법 |
KR101270220B1 (ko) | 2011-04-13 | 2013-05-30 | 주식회사 엘지화학 | 광학 필름용 아크릴계 공중합체 수지의 제조방법 및 이를 이용한 광학필름의 제조방법 |
WO2012141422A1 (en) * | 2011-04-13 | 2012-10-18 | Lg Chem, Ltd. | Method for preparing acrylic copolymer resin for optical film and method for fabricating optical film using the same |
KR101269673B1 (ko) * | 2011-04-13 | 2013-05-30 | 주식회사 엘지화학 | 광학 필름용 수지 조성물 및 이를 이용한 광학 필름 |
WO2012141453A2 (en) * | 2011-04-13 | 2012-10-18 | Lg Chem, Ltd. | Method of preparing resin composition for optical film by using continuous bulk polymerization and methods of preparing optical film and polarizing plate using the resin composition |
WO2012141413A1 (en) * | 2011-04-13 | 2012-10-18 | Lg Chem, Ltd. | Resin composition for optical film and optical film using the same |
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KR101418755B1 (ko) | 2011-10-05 | 2014-07-11 | 주식회사 엘지화학 | 광학 필름용 수지 조성물 및 이를 이용한 보상필름 |
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KR101378817B1 (ko) | 2011-10-14 | 2014-04-03 | 주식회사 엘지화학 | 편광판용 접착제 및 이를 포함하는 편광판 |
KR101560033B1 (ko) | 2011-10-14 | 2015-10-16 | 주식회사 엘지화학 | 양면형 편광판 및 이를 포함하는 광학 장치 |
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WO2014021264A1 (ja) * | 2012-07-30 | 2014-02-06 | 電気化学工業株式会社 | メタクリル樹脂耐熱性向上用の共重合体 |
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KR20140118879A (ko) | 2013-03-28 | 2014-10-08 | 주식회사 엘지화학 | 양면형 편광판의 제조방법 및 이로부터 제조된 양면형 편광판 |
KR101494545B1 (ko) * | 2013-03-28 | 2015-02-23 | 주식회사 엘지화학 | 수지 조성물 및 이를 포함하는 역파장 분산성을 갖는 광학필름 |
EP2840124B1 (en) | 2013-06-18 | 2019-01-30 | LG Chem, Ltd. | Radical-curable adhesive composition and polarizing plate comprising same |
KR101503216B1 (ko) | 2013-06-18 | 2015-03-17 | 주식회사 엘지화학 | 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판 |
KR101620164B1 (ko) | 2013-09-30 | 2016-05-12 | 주식회사 엘지화학 | 라디칼 경화형 접착제 조성물 및 이를 포함하는 편광판 |
WO2015046971A1 (ko) | 2013-09-30 | 2015-04-02 | 주식회사 엘지화학 | 기능성 코팅층을 포함하는 광학 필름, 이를 포함하는 편광판 및 화상표시장치 |
KR101496617B1 (ko) | 2013-09-30 | 2015-02-25 | 주식회사 엘지화학 | 편광판 |
KR101650235B1 (ko) | 2013-09-30 | 2016-08-22 | 주식회사 엘지화학 | 편광판 |
KR101584895B1 (ko) | 2013-09-30 | 2016-01-13 | 주식회사 엘지화학 | 편광판 |
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KR102417139B1 (ko) | 2016-01-07 | 2022-07-04 | 삼성전자주식회사 | 보상 필름, 광학 필름 및 표시 장치 |
KR101903906B1 (ko) | 2017-09-22 | 2018-10-02 | 주식회사 엘지화학 | 편광판 보호층용 무용제형 광경화성 수지 조성물, 이의 경화물을 포함하는 편광판 및 화상표시장치 |
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US8344083B2 (en) | 2013-01-01 |
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