JP5276995B2 - ダイヤモンド微細粉の捕集方法 - Google Patents
ダイヤモンド微細粉の捕集方法 Download PDFInfo
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- JP5276995B2 JP5276995B2 JP2008557169A JP2008557169A JP5276995B2 JP 5276995 B2 JP5276995 B2 JP 5276995B2 JP 2008557169 A JP2008557169 A JP 2008557169A JP 2008557169 A JP2008557169 A JP 2008557169A JP 5276995 B2 JP5276995 B2 JP 5276995B2
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- 239000010432 diamond Substances 0.000 title claims description 131
- 229910003460 diamond Inorganic materials 0.000 title claims description 122
- 239000000843 powder Substances 0.000 title claims description 62
- 238000000034 method Methods 0.000 title claims description 22
- 239000002245 particle Substances 0.000 claims description 79
- 230000001133 acceleration Effects 0.000 claims description 24
- 239000002002 slurry Substances 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 238000009826 distribution Methods 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000000460 chlorine Substances 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- 125000000524 functional group Chemical group 0.000 claims description 8
- 239000011164 primary particle Substances 0.000 claims description 8
- 238000005199 ultracentrifugation Methods 0.000 claims description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- 239000002360 explosive Substances 0.000 claims description 7
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 6
- 238000011068 loading method Methods 0.000 claims description 5
- 230000003068 static effect Effects 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
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- 238000004062 sedimentation Methods 0.000 claims description 3
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- 150000001722 carbon compounds Chemical class 0.000 claims 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 239000002994 raw material Substances 0.000 description 8
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- 239000013078 crystal Substances 0.000 description 7
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
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- 238000005516 engineering process Methods 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 239000004342 Benzoyl peroxide Substances 0.000 description 4
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 4
- 235000019400 benzoyl peroxide Nutrition 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
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- 239000000203 mixture Substances 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
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- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 238000003917 TEM image Methods 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 150000001412 amines Chemical group 0.000 description 2
- -1 and for example Substances 0.000 description 2
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
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- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000000857 drug effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910021382 natural graphite Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229940124597 therapeutic agent Drugs 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Images
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-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
- B01J3/062—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies characterised by the composition of the materials to be processed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
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- Engineering & Computer Science (AREA)
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- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
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- Life Sciences & Earth Sciences (AREA)
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- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Carbon And Carbon Compounds (AREA)
- Separation Of Suspended Particles By Flocculating Agents (AREA)
- Separation Of Solids By Using Liquids Or Pneumatic Power (AREA)
Description
(1) 一次粒子径が50nm以下のダイヤモンド粒子を含有するダイヤモンド微細粉において、ダイヤモンド粒子表面に親水性官能基を結合乃至付着させて表面親水性とする工程、
(2) 表面親水性ダイヤモンドを水中に分散させてスラリー化した後、該スラリーを遠心分離機に装填する工程、
(3) 遠心分離機にて、前記スラリーを、4×103G以上の加速度及び加速度と遠心力負荷時間との積(以下「遠心負荷積」と言う)1000×103G・分以上(但しGは重力の加速度)にて超遠心分離操作に供し、比較的粒径の大きな粒子を沈降させて分離する工程、及び
(4) スラリー中に陽イオンを添加することにより、スラリー中に懸濁している微細粒子を捕集する工程。
Claims (9)
- (1)一次粒子径が50nm以下のダイヤモンド粒子を含有するダイヤモンド微細粉において、ダイヤモンド粒子表面に親水性官能基を結合乃至付着させて表面親水性とする工程、
(2)表面親水性ダイヤモンドを水中に分散させてスラリー化した後、該スラリーを遠心分離機に装填する工程、
(3)遠心分離機にて、前記スラリーを、4×103G以上の加速度及び加速度と遠心力負荷時間との積(以下「遠心負荷積」と言う)1000×103G・分以上(但しGは重力の加速度)にて超遠心分離操作に供し、比較的粒径の大きな粒子を沈降させて分離する工程、及び
(4)スラリー中に陽イオンを添加することにより、スラリー中に懸濁している微細粒子を捕集する工程
を含み、
粒度別検出に基づく粒度分布ヒストグラムにおいて、中央値D50が20nm以下であり、さらにD50に対するD10及びD90の比が一定範囲にあるダイヤモンド微細粉の捕集方法。 - 前記粒度別検出がマイクロトラックUPA150による、請求項1に記載の方法。
- 上記超遠心分離操作において、D50値が10nm以下である、請求項1又は2に記載の方法。
- 前記ダイヤモンド微細粉が、静的超高圧下で非ダイヤモンド炭素からの転換によって合成された単結晶質ダイヤモンドである、請求項1に記載の方法。
- 前記ダイヤモンド微細粉が、動的超高圧下で非ダイヤモンド炭素からの転換によって合成され、解砕されたダイヤモンドである、請求項1に記載の方法。
- 前記ダイヤモンド微細粉が、動的超高圧下で爆薬に含有された炭素化合物からの転換によって合成され、解砕されたダイヤモンドである、請求項1に記載の方法。
- 捕集された前記ダイヤモンド微細粉をさらに水素気流中で加熱し、ダイヤモンドの粒子の表面を水素で終端する、請求項1に記載の方法。
- 捕集された前記ダイヤモンド微細粉をさらに塩素ガス中で加熱し、ダイヤモンドの粒子の表面を塩素で終端し、1バッチの微細粉に対する塩素の比率を0.2質量%以上とする、請求項1に記載の方法。
- 捕集された前記ダイヤモンド微細粉をさらにアンモニアガス中で加熱し、ダイヤモンドの粒子の表面をアミノ基で終端し、フーリエ変換赤外分光光度計(FTIR)による吸収スペクトル図形において、NH伸縮に帰属する1600cm -1 付近の吸収ピークを呈する粉末とする、請求項1に記載の方法。
Priority Applications (1)
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JP2008557169A JP5276995B2 (ja) | 2007-02-09 | 2008-02-08 | ダイヤモンド微細粉の捕集方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JP2007031367 | 2007-02-09 | ||
JP2007031367 | 2007-02-09 | ||
JP2008557169A JP5276995B2 (ja) | 2007-02-09 | 2008-02-08 | ダイヤモンド微細粉の捕集方法 |
PCT/JP2008/052147 WO2008096854A1 (ja) | 2007-02-09 | 2008-02-08 | ダイヤモンド微細粉及びその捕集方法、並びに該ダイヤモンド微細粉を分散したダイヤモンドスラリー |
Publications (2)
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JPWO2008096854A1 JPWO2008096854A1 (ja) | 2010-05-27 |
JP5276995B2 true JP5276995B2 (ja) | 2013-08-28 |
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JP2008557169A Expired - Fee Related JP5276995B2 (ja) | 2007-02-09 | 2008-02-08 | ダイヤモンド微細粉の捕集方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9546093B2 (ja) |
EP (1) | EP2123603A4 (ja) |
JP (1) | JP5276995B2 (ja) |
KR (1) | KR101484339B1 (ja) |
CN (1) | CN101641286A (ja) |
WO (1) | WO2008096854A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102010008682A1 (de) | 2010-02-19 | 2011-08-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 | Diamantpartikel und Verfahren zum Erhalt von Diamantpartikeln aus Aggregatstrukturen |
KR20150015245A (ko) * | 2013-07-31 | 2015-02-10 | 주식회사 네오엔비즈 | 표면이 개질된 나노 다이아몬드 및 나노 다이아몬드의 표면 개질 방법 |
CN105565312B (zh) * | 2014-10-13 | 2019-01-18 | 彭碳科技有限公司 | 三维石墨烯包覆单粒子纳米金刚石材料的纯化过程中的酸化方法 |
CN105565298B (zh) * | 2014-10-13 | 2018-12-18 | 彭碳科技有限公司 | 三维石墨烯包覆单粒子纳米金刚石材料的纯化过程中的再酸化方法 |
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ITUA20164907A1 (it) * | 2016-06-15 | 2017-12-15 | Renato Vallania | Pressa a centrifuga con gradiente interno di separazione variabile. |
JP2019006626A (ja) * | 2017-06-23 | 2019-01-17 | 株式会社ダイセル | ナノダイヤモンド分散液製造方法およびナノダイヤモンド分散液 |
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KR101484339B1 (ko) | 2015-01-19 |
KR20090125089A (ko) | 2009-12-03 |
EP2123603A1 (en) | 2009-11-25 |
WO2008096854A1 (ja) | 2008-08-14 |
CN101641286A (zh) | 2010-02-03 |
US9546093B2 (en) | 2017-01-17 |
EP2123603A4 (en) | 2014-01-29 |
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