JP5239335B2 - 樹脂組成物及びそれを含む被膜形成材料 - Google Patents
樹脂組成物及びそれを含む被膜形成材料 Download PDFInfo
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- JP5239335B2 JP5239335B2 JP2007508212A JP2007508212A JP5239335B2 JP 5239335 B2 JP5239335 B2 JP 5239335B2 JP 2007508212 A JP2007508212 A JP 2007508212A JP 2007508212 A JP2007508212 A JP 2007508212A JP 5239335 B2 JP5239335 B2 JP 5239335B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09J179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L31/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D177/00—Coating compositions based on polyamides obtained by reactions forming a carboxylic amide link in the main chain; Coating compositions based on derivatives of such polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08L2205/00—Polymer mixtures characterised by other features
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JP5011893B2 (ja) * | 2005-10-19 | 2012-08-29 | 日立化成工業株式会社 | 樹脂組成物、該樹脂組成物の製造方法、及び該樹脂組成物を含む被膜形成材料 |
JP2008297536A (ja) * | 2006-10-18 | 2008-12-11 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物、これを用いたフレキシブル基板及び電子部品 |
KR20120021331A (ko) * | 2006-10-19 | 2012-03-08 | 히다치 가세고교 가부시끼가이샤 | 수지 조성물 및 그를 포함하는 피막 형성 재료 |
JP5397819B2 (ja) * | 2010-03-30 | 2014-01-22 | 日立金属株式会社 | 絶縁塗料およびそれを用いた絶縁電線 |
JP5609732B2 (ja) | 2011-03-22 | 2014-10-22 | 日立金属株式会社 | 絶縁塗料及びそれを用いた絶縁電線 |
CN102190955A (zh) * | 2011-04-06 | 2011-09-21 | 丹阳四达化工有限公司 | 一种混合溶剂制备聚酰胺酰亚胺漆包线漆的方法 |
JP5859915B2 (ja) * | 2011-08-25 | 2016-02-16 | 日東電工株式会社 | 絶縁フィルム |
JP6108284B2 (ja) * | 2012-05-07 | 2017-04-05 | Nokクリューバー株式会社 | 摺動部材用組成物 |
EP2782103B1 (de) * | 2013-03-18 | 2019-06-19 | Schwering & Hasse Elektrodraht GmbH | Lackdraht |
KR102001282B1 (ko) * | 2013-04-16 | 2019-07-17 | 도요보 가부시키가이샤 | 금속박 적층체 |
JP6882263B2 (ja) * | 2016-04-22 | 2021-06-02 | 日本ポリテック株式会社 | 硬化性組成物、該組成物を用いる硬化膜およびオーバーコート膜 |
CN106987022A (zh) * | 2017-04-20 | 2017-07-28 | 安徽春辉仪表线缆集团有限公司 | 一种纳米氧化铝接枝尼龙改性聚酰亚胺漆包线漆及其制备方法 |
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CN110452533A (zh) * | 2019-09-25 | 2019-11-15 | 常州市宏发纵横新材料科技股份有限公司 | 一种降冰片烯封端型全芳族聚酰胺预浸料组合物及其制备方法和应用方法 |
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JPH1112500A (ja) * | 1997-06-23 | 1999-01-19 | Hitachi Chem Co Ltd | 変性ポリアミドイミド樹脂ペースト及びこれを用いた電子部品 |
JP2003138015A (ja) * | 2001-11-07 | 2003-05-14 | Hitachi Chem Co Ltd | ポリアミドイミド樹脂ペースト及びそれを含む被膜形成材料 |
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JP2004137370A (ja) * | 2002-10-17 | 2004-05-13 | Hitachi Chem Co Ltd | ポリアミドイミド樹脂ペースト及びそれを含む被膜形成材料 |
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KR20070087036A (ko) | 2007-08-27 |
KR100880500B1 (ko) | 2009-01-28 |
CN101128543B (zh) | 2013-02-13 |
TWI325438B (en) | 2010-06-01 |
TW200641051A (en) | 2006-12-01 |
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