JP5221858B2 - 欠陥検査装置、及び欠陥検査方法 - Google Patents

欠陥検査装置、及び欠陥検査方法 Download PDF

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Publication number
JP5221858B2
JP5221858B2 JP2006234600A JP2006234600A JP5221858B2 JP 5221858 B2 JP5221858 B2 JP 5221858B2 JP 2006234600 A JP2006234600 A JP 2006234600A JP 2006234600 A JP2006234600 A JP 2006234600A JP 5221858 B2 JP5221858 B2 JP 5221858B2
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Prior art keywords
light
illumination
defect
optical system
reflected
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Expired - Fee Related
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JP2006234600A
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Japanese (ja)
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JP2008058111A (ja
JP2008058111A5 (enExample
Inventor
啓 志村
稔 野口
昌昭 伊東
健二 愛甲
秀一 近松
繁夫 大月
茂 阿部
雅恭 越智
卓明 関口
裕之 山下
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2006234600A priority Critical patent/JP5221858B2/ja
Priority to US11/846,829 priority patent/US7672799B2/en
Publication of JP2008058111A publication Critical patent/JP2008058111A/ja
Publication of JP2008058111A5 publication Critical patent/JP2008058111A5/ja
Priority to US12/683,455 priority patent/US7953567B2/en
Priority to JP2012173713A priority patent/JP2012211926A/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/10—Image acquisition
    • G06V10/12—Details of acquisition arrangements; Constructional details thereof
    • G06V10/14—Optical characteristics of the device performing the acquisition or on the illumination arrangements
    • G06V10/145—Illumination specially adapted for pattern recognition, e.g. using gratings
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00—Indexing scheme relating to image or video recognition or understanding
    • G06V2201/06—Recognition of objects for industrial automation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Artificial Intelligence (AREA)
  • Multimedia (AREA)
  • Quality & Reliability (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2006234600A 2006-08-30 2006-08-30 欠陥検査装置、及び欠陥検査方法 Expired - Fee Related JP5221858B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006234600A JP5221858B2 (ja) 2006-08-30 2006-08-30 欠陥検査装置、及び欠陥検査方法
US11/846,829 US7672799B2 (en) 2006-08-30 2007-08-29 Defect inspection apparatus and defect inspection method
US12/683,455 US7953567B2 (en) 2006-08-30 2010-01-07 Defect inspection apparatus and defect inspection method
JP2012173713A JP2012211926A (ja) 2006-08-30 2012-08-06 検査装置、及び検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006234600A JP5221858B2 (ja) 2006-08-30 2006-08-30 欠陥検査装置、及び欠陥検査方法

Related Child Applications (1)

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JP2012173713A Division JP2012211926A (ja) 2006-08-30 2012-08-06 検査装置、及び検査方法

Publications (3)

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JP2008058111A JP2008058111A (ja) 2008-03-13
JP2008058111A5 JP2008058111A5 (enExample) 2009-10-08
JP5221858B2 true JP5221858B2 (ja) 2013-06-26

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JP2012173713A Pending JP2012211926A (ja) 2006-08-30 2012-08-06 検査装置、及び検査方法

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JP (2) JP5221858B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9566257B2 (en) 2004-11-26 2017-02-14 Ucl Business Plc Compositions comprising ornithine and phenylacetate or phenylbutyrate for treating hepatic encephalopathy

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WO2007092950A2 (en) 2006-02-09 2007-08-16 Kla-Tencor Technologies Corporation Methods and systems for determining a characteristic of a wafer
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JP5221858B2 (ja) * 2006-08-30 2013-06-26 株式会社日立ハイテクノロジーズ 欠陥検査装置、及び欠陥検査方法
JP2008261790A (ja) * 2007-04-13 2008-10-30 Hitachi High-Technologies Corp 欠陥検査装置
JP4876019B2 (ja) * 2007-04-25 2012-02-15 株式会社日立ハイテクノロジーズ 欠陥検査装置およびその方法
US7869025B2 (en) * 2007-06-28 2011-01-11 Hitachi-High-Technologies Corporation Optical inspection method and optical inspection system
WO2009028709A1 (ja) * 2007-08-30 2009-03-05 Ngk Insulators, Ltd. 被検体の欠陥検査方法
US8351683B2 (en) * 2007-12-25 2013-01-08 Hitachi High-Technologies Corporation Inspection apparatus and inspection method
JP5175605B2 (ja) * 2008-04-18 2013-04-03 株式会社日立ハイテクノロジーズ パターン形状検査方法
US8494802B2 (en) * 2008-06-19 2013-07-23 Kla-Tencor Corp. Computer-implemented methods, computer-readable media, and systems for determining one or more characteristics of a wafer
JP2010025713A (ja) * 2008-07-18 2010-02-04 Hitachi High-Technologies Corp 欠陥検査方法及び欠陥検査装置
JP5237874B2 (ja) * 2009-04-24 2013-07-17 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
JP2011033449A (ja) * 2009-07-31 2011-02-17 Sumco Corp ウェーハの欠陥検査方法及び欠陥検査装置
JP5216752B2 (ja) 2009-11-18 2013-06-19 株式会社日立ハイテクノロジーズ 欠陥検出方法及び欠陥検出装置並びにこれを備えた欠陥観察装置
JP2011122990A (ja) * 2009-12-14 2011-06-23 Hitachi High-Technologies Corp 欠陥検査装置及び欠陥検査方法
JP5563372B2 (ja) * 2010-05-20 2014-07-30 第一実業ビスウィル株式会社 外観検査装置
JP5525336B2 (ja) * 2010-06-08 2014-06-18 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
JPWO2013099468A1 (ja) 2011-12-27 2015-04-30 株式会社日立ハイテクノロジーズ 検査装置
FR2990271B1 (fr) * 2012-05-04 2019-07-19 European Aeronautic Defence And Space Company Eads France Controle par ultrasons laser de pieces a reflectivite speculaire base sur une detection a deux niveaux de sensibilite
JP2013250225A (ja) * 2012-06-04 2013-12-12 Toray Eng Co Ltd 外観検査装置及び外観検査方法
CN102854196B (zh) * 2012-09-24 2014-06-25 江苏物联网研究发展中心 Mems结构缺陷的晶圆级自动检测方法
JP5944850B2 (ja) * 2013-03-11 2016-07-05 株式会社日立ハイテクノロジーズ 欠陥検査方法及びこれを用いた装置
US10388098B2 (en) * 2014-02-07 2019-08-20 Korea Institute Of Machinery & Materials Apparatus and method of processing anti-counterfeiting pattern, and apparatus and method of detecting anti-counterfeiting pattern
JP6408259B2 (ja) * 2014-06-09 2018-10-17 株式会社キーエンス 画像検査装置、画像検査方法、画像検査プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器
JP6356845B1 (ja) * 2017-02-13 2018-07-11 ファナック株式会社 検査システムの動作プログラムを生成する装置および方法
JP6961394B2 (ja) * 2017-05-31 2021-11-05 株式会社キーエンス 画像検査装置、画像検査方法、画像検査装置の設定方法、画像検査プログラム、画像装置の設定検査プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器
CN109387518B (zh) * 2017-08-02 2022-06-17 上海微电子装备（集团）股份有限公司 自动光学检测方法
CN110517970B (zh) * 2019-08-29 2022-10-21 上海华力集成电路制造有限公司 晶背缺陷的检测方法
US11270110B2 (en) * 2019-09-17 2022-03-08 Boston Polarimetrics, Inc. Systems and methods for surface modeling using polarization cues
CN111060520B (zh) 2019-12-30 2021-10-29 歌尔股份有限公司 一种产品缺陷检测方法、装置与系统
EP4332557B1 (en) * 2022-08-31 2024-06-26 Unity Semiconductor A system for optical inspection of a substrate using same or different wavelengths

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9566257B2 (en) 2004-11-26 2017-02-14 Ucl Business Plc Compositions comprising ornithine and phenylacetate or phenylbutyrate for treating hepatic encephalopathy
US10610506B2 (en) 2004-11-26 2020-04-07 Ucl Business Ltd Compositions comprising ornithine and phenylacetate or phenylbutyrate for treating hepatic encephalopathy

Also Published As

Publication number Publication date
US20080059094A1 (en) 2008-03-06
US7672799B2 (en) 2010-03-02
US20100106443A1 (en) 2010-04-29
JP2008058111A (ja) 2008-03-13
JP2012211926A (ja) 2012-11-01
US7953567B2 (en) 2011-05-31

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