JP5189214B2 - ポリシラザン/ポリシロキサン‐ブロック共重合体 - Google Patents
ポリシラザン/ポリシロキサン‐ブロック共重合体 Download PDFInfo
- Publication number
- JP5189214B2 JP5189214B2 JP2012117309A JP2012117309A JP5189214B2 JP 5189214 B2 JP5189214 B2 JP 5189214B2 JP 2012117309 A JP2012117309 A JP 2012117309A JP 2012117309 A JP2012117309 A JP 2012117309A JP 5189214 B2 JP5189214 B2 JP 5189214B2
- Authority
- JP
- Japan
- Prior art keywords
- polysilazane
- polysiloxane
- substituted
- block copolymer
- unsubstituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 229920001709 polysilazane Polymers 0.000 title claims abstract description 93
- -1 polysiloxane Polymers 0.000 title claims abstract description 71
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 64
- 229920001400 block copolymer Polymers 0.000 title claims abstract description 58
- 239000000203 mixture Substances 0.000 claims description 35
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000000178 monomer Substances 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 239000010703 silicon Substances 0.000 abstract description 7
- 238000002360 preparation method Methods 0.000 abstract description 2
- 230000001464 adherent effect Effects 0.000 abstract 1
- 238000005915 ammonolysis reaction Methods 0.000 description 24
- 229920000642 polymer Polymers 0.000 description 24
- 229910007991 Si-N Inorganic materials 0.000 description 17
- 229910006294 Si—N Inorganic materials 0.000 description 17
- 229920001577 copolymer Polymers 0.000 description 16
- 239000000047 product Substances 0.000 description 16
- 230000000269 nucleophilic effect Effects 0.000 description 14
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 229910001369 Brass Inorganic materials 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000010951 brass Substances 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000004215 Carbon black (E152) Substances 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- 229910018557 Si O Inorganic materials 0.000 description 6
- 229910008051 Si-OH Inorganic materials 0.000 description 6
- 229910006358 Si—OH Inorganic materials 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 239000012530 fluid Substances 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229920004482 WACKER® Polymers 0.000 description 4
- 235000019270 ammonium chloride Nutrition 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000006082 mold release agent Substances 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 229920005604 random copolymer Polymers 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920002379 silicone rubber Polymers 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 3
- 229910002808 Si–O–Si Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- 0 CC(*)(CN1)N1[Si](C)N[Si](CC1)C1(C)N Chemical compound CC(*)(CN1)N1[Si](C)N[Si](CC1)C1(C)N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910003849 O-Si Inorganic materials 0.000 description 2
- 229910003872 O—Si Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000004597 plastic additive Substances 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- ARKZLCCXKCEIKH-UHFFFAOYSA-N CC(C)(C)[ClH][SiH](C)Cl Chemical compound CC(C)(C)[ClH][SiH](C)Cl ARKZLCCXKCEIKH-UHFFFAOYSA-N 0.000 description 1
- SBJSYSHFIFOUFO-UHFFFAOYSA-N CC(C)CC[SiH](Cl)Cl Chemical compound CC(C)CC[SiH](Cl)Cl SBJSYSHFIFOUFO-UHFFFAOYSA-N 0.000 description 1
- LWWFOCUDNWWRTJ-UHFFFAOYSA-N CC=C[SiH](Cl)Cl Chemical compound CC=C[SiH](Cl)Cl LWWFOCUDNWWRTJ-UHFFFAOYSA-N 0.000 description 1
- ZFLFQVOTPBCADM-UHFFFAOYSA-N CC[SiH](Br)Br Chemical compound CC[SiH](Br)Br ZFLFQVOTPBCADM-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- UDSFAEKRVUSQDD-UHFFFAOYSA-N Dimethyl adipate Chemical compound COC(=O)CCCCC(=O)OC UDSFAEKRVUSQDD-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910002656 O–Si–O Inorganic materials 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- XRBZWUQAUXLFDY-UHFFFAOYSA-N benzyl(dichloro)silane Chemical compound Cl[SiH](Cl)CC1=CC=CC=C1 XRBZWUQAUXLFDY-UHFFFAOYSA-N 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- DBKNQKMXXOSIOX-UHFFFAOYSA-N butyl(dichloro)silane Chemical compound CCCC[SiH](Cl)Cl DBKNQKMXXOSIOX-UHFFFAOYSA-N 0.000 description 1
- HYOFYHUOYKGDAG-UHFFFAOYSA-N butyl(diiodo)silane Chemical compound CCCC[SiH](I)I HYOFYHUOYKGDAG-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012700 ceramic precursor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- IOBUYOYOZJVCGU-UHFFFAOYSA-N chloro(dicyclohexyl)silane Chemical compound C1CCCCC1[SiH](Cl)C1CCCCC1 IOBUYOYOZJVCGU-UHFFFAOYSA-N 0.000 description 1
- SOYVLBDERBHIME-UHFFFAOYSA-N chloro(diethyl)silicon Chemical compound CC[Si](Cl)CC SOYVLBDERBHIME-UHFFFAOYSA-N 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- YCITZMJNBYYMJO-UHFFFAOYSA-N chloro(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](Cl)C1=CC=CC=C1 YCITZMJNBYYMJO-UHFFFAOYSA-N 0.000 description 1
- QKRFMMNPNXDDGT-UHFFFAOYSA-N chloro(dipropyl)silane Chemical compound CCC[SiH](Cl)CCC QKRFMMNPNXDDGT-UHFFFAOYSA-N 0.000 description 1
- GTPDFCLBTFKHNH-UHFFFAOYSA-N chloro(phenyl)silicon Chemical compound Cl[Si]C1=CC=CC=C1 GTPDFCLBTFKHNH-UHFFFAOYSA-N 0.000 description 1
- WRNUBMATUCAXHM-UHFFFAOYSA-N chloro(prop-2-enyl)silane Chemical compound Cl[SiH2]CC=C WRNUBMATUCAXHM-UHFFFAOYSA-N 0.000 description 1
- LVFFNMMFDNKFDK-UHFFFAOYSA-N chloro-bis(2-methylpropyl)silane Chemical compound CC(C)C[SiH](Cl)CC(C)C LVFFNMMFDNKFDK-UHFFFAOYSA-N 0.000 description 1
- WSGBJEXMYYBFCD-UHFFFAOYSA-N chloro-bis(4-methylphenyl)silane Chemical compound Cc1ccc(cc1)[SiH](Cl)c1ccc(C)cc1 WSGBJEXMYYBFCD-UHFFFAOYSA-N 0.000 description 1
- ZUKYLGDWMRLIKI-UHFFFAOYSA-N chloro-ethyl-methylsilicon Chemical compound CC[Si](C)Cl ZUKYLGDWMRLIKI-UHFFFAOYSA-N 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical group Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- KSFBTBXTZDJOHO-UHFFFAOYSA-N diaminosilicon Chemical compound N[Si]N KSFBTBXTZDJOHO-UHFFFAOYSA-N 0.000 description 1
- UNJIGALTJKOEIR-UHFFFAOYSA-N dibenzyl(chloro)silane Chemical compound C=1C=CC=CC=1C[SiH](Cl)CC1=CC=CC=C1 UNJIGALTJKOEIR-UHFFFAOYSA-N 0.000 description 1
- PMRZHVOZUPJRSI-UHFFFAOYSA-N dibromo(propyl)silane Chemical compound CCC[SiH](Br)Br PMRZHVOZUPJRSI-UHFFFAOYSA-N 0.000 description 1
- MYWFLJDFFCFHNT-UHFFFAOYSA-N dichloro(2-methylpropyl)silane Chemical compound CC(C)C[SiH](Cl)Cl MYWFLJDFFCFHNT-UHFFFAOYSA-N 0.000 description 1
- YUKZTICWNSSDIL-UHFFFAOYSA-N dichloro(cyclohexyl)silane Chemical compound Cl[SiH](Cl)C1CCCCC1 YUKZTICWNSSDIL-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- FRALJFRRPFOSQB-UHFFFAOYSA-N dichloro(fluoro)silane Chemical compound F[SiH](Cl)Cl FRALJFRRPFOSQB-UHFFFAOYSA-N 0.000 description 1
- NYKYPUSQZAJABL-UHFFFAOYSA-N dichloro(hexyl)silane Chemical compound CCCCCC[SiH](Cl)Cl NYKYPUSQZAJABL-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- HAKOAQCVDUCPTM-UHFFFAOYSA-N dichloro(propan-2-yl)silane Chemical compound CC(C)[SiH](Cl)Cl HAKOAQCVDUCPTM-UHFFFAOYSA-N 0.000 description 1
- SJTARAZFCVDEIM-UHFFFAOYSA-N dichloro(propyl)silane Chemical compound CCC[SiH](Cl)Cl SJTARAZFCVDEIM-UHFFFAOYSA-N 0.000 description 1
- XDCTUIVHKNSQEZ-UHFFFAOYSA-N dichloro-(4-chlorophenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=C(Cl)C=C1 XDCTUIVHKNSQEZ-UHFFFAOYSA-N 0.000 description 1
- KMHWGWIJGRKBTI-UHFFFAOYSA-N dichloro-(4-methylphenyl)silane Chemical compound CC1=CC=C([SiH](Cl)Cl)C=C1 KMHWGWIJGRKBTI-UHFFFAOYSA-N 0.000 description 1
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- ZUBAIVQCZYOVOJ-UHFFFAOYSA-N ethyl(difluoro)silane Chemical compound CC[SiH](F)F ZUBAIVQCZYOVOJ-UHFFFAOYSA-N 0.000 description 1
- XKUVPZDIAKROHE-UHFFFAOYSA-N ethyl(diiodo)silane Chemical compound CC[SiH](I)I XKUVPZDIAKROHE-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000855 fermentation Methods 0.000 description 1
- 230000004151 fermentation Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000012994 industrial processing Methods 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 229910052740 iodine Chemical group 0.000 description 1
- 239000011630 iodine Chemical group 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
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- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
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- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 239000012434 nucleophilic reagent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
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- 229920001225 polyester resin Polymers 0.000 description 1
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- 239000004814 polyurethane Substances 0.000 description 1
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical group CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000004447 silicone coating Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
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- 125000006850 spacer group Chemical group 0.000 description 1
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- 238000010561 standard procedure Methods 0.000 description 1
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- 125000000547 substituted alkyl group Chemical group 0.000 description 1
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- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
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- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
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- 125000003944 tolyl group Chemical group 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
本発明のなおもう一つの目的は、ポリシラザンと、親核性置換基を有する異なる重合体とからの新規のブロック共重合体を調製することである。これには当然、少なくとも一つの親核性基を含むポリシロキサンが含まれる。この親核性基は、ヒドロキシル、アミンおよびそれらの混合物からなる群から選ばれる基であるのが望ましい。
ハロシラン類の混合物も、このポリシラザンを合成するのに有用である。というのはケイ素に付いている複数の有機の基は、多様な化学的および/または物理的な使用特性をその重合体に付与することが、よくあるからである。例えば、炭化水素含有量の多い有機残基は、炭化水素溶媒に対する溶解性を高め、さらにまた、より大きい加水分解安定性を、そのポリシラザンに付与する。
a)少なくとも一つのSi‐H結合を有する少なくとも一つのハロシランを無水の液体アンモニア中に導入する工程;(ここで、生成する任意のハロゲン化アンモニウム塩は可溶化され、そして酸性環境をその中で提供する)および
b)さらなる重合により出発ハロシラン中に最初に存在していたSi‐H結合数を減らすために、その酸性環境の中に、この生成したシラザンを保持する工程。
選ばれたハロシランまたはその混合物は、直接導入され、そして無水の液体アンモニアと反応される。普通、厳密に化学量論的ベースでは、アンモノリシス中に、ハロシラン上で置換される各ハロゲン原子当たり、二分子のアンモニア分子が必要である。一つのアンモニア分子は、ハロゲン原子を置換し、一方第2のアンモニア分子は、ハロゲン化アンモニウム塩を生成する。この意味で、過剰の無水の液体アンモニア、望ましくは、その単量体混合物中のX(ハロゲン)の少なくとも 2倍の量、そしてより望ましくは、その単量体混合物中のXの少なくとも 5倍の量、を既に装填してある密閉可能な容器にハロシランを導入するのが好都合であることが見いだされた。
H2 N-CH2 CH2 Si-(CH3 )2 [-O-Si(CH3 )2 ]n-O-Si(CH3 )2 CH2 CH2 CH2 NH2
このポリシラザンブロックは、市場から入手できるか、またはこの技術分野で良く知られている方法により調製できる任意のポリシロキサンまたは、異なる複数のポリシロキサンの混合物と共重合される。このポリシロキサンは、次の一般式を有するケイ素原子と酸素原子が交互に連結している直鎖、分岐または橋架け高分子系を含んでいる場合もある:
(実施例1)
本発明のポリシラザン/ポリシロキサン‐ブロック共重合体の調製を明確に説明するために、次の実験が行われた。
このブロック共重合体の合成にあたって選ばれたポリシラザンの名称は、Kion(登録商標)ML66で、ハロシラン類の混合物から調製される共重合体である。それは、Kion Corporation,150 East 58th Street,Suite 3238,New York,NY 10155、から市場を通して入手できる。このブロック共重合体用に選ばれたポリシロキサンの名称はSilicone Elastomer 80N で、Wacker Silicones Corporation,3301 Sutton Road,Adrian,MI 49221 、から市場を通して入手できる高分子量、高粘度のヒドロキシ基停止ポリシロキサンである。
Bの部
本発明の第2のブロック共重合体は、Aの部と同じ実験室装置を用い、Kion ML66 100gと、上のAの部で用いられた物より粘度の低いヒドロキシ基停止ポリシロキサンである、Silicone Elastomer 20N 15.83g を反応させることにより調製された。この試料を調製する工程は反応温度を含めて、Aの部に対応している。2 時間後、生成したこのブロック共重合体の外観は、透明な淡黄色で、Aの部で調製した共重合体より粘度の低い自由に流動する粘ちょうな液体である。
本発明のブロック共重合により調製した共重合体と比べた場合の、ランダム加水分解法で調製した共重合体の諸性質の差を明確に示すために、次の実験が行われた。
成形用離型剤として用いた時、それらが如何に有効であるかを明確に示すために一連のポリシラザン/ポリシロキサン‐ブロック共重合体が調製された。
本発明のポリシラザン/ポリシロキサン‐ブロック共重合体の光学的性質を明確に示すために、次の実験が行われた:
実施例1のAの部の装置を用い、そしてその処方に従って、25g のKion ML66 ポリシラザンと 37.5gのヒドロキシ基停止シリコーン・エラストマー20N(Wacker Silicones Corporation) とを、その混合物を、湯浴中で2 時間、95℃で加熱することにより反応させた。生成したブロック共重合体は透明で淡黄色の自由に流動する粘ちょうな液体であった。
本発明のポリシラザン/ポリシロキサン‐ブロック共重合体の腐食防止性を明確に示すために、次の実験が行われた:
実施例2の装置を用い、367.5gのKion ML66 ポリシラザンを 189.3g のヒドロキシ基停止シリコーン Fluid F1006(Wacker Silicone Corporation) が入っている500mL のフラスコに導入した。撹拌しながら、この混合物を、湯浴中で2 時間 105℃に加熱した。この反応は、ガスを遊離してブロック共重合体を生成した。この反応は、さらなるガスの発生が見られなくなった時に完了した。このブロック共重合体の外観は、透明な淡黄色の自由に流動する粘ちょうな液体であった。
本発明の接着性ポリシラザン/ポリシロキサン‐ブロック共重合体でコートした時、その物品に付与される酸化防護性を明確に示すために、次の実験が行われた:
一枚の光沢のある真鍮プレートの半分を、実施例4で説明したポリシラザン/ポリシロキサン‐ブロック共重合体を用いてコートした。他の半分は未処理のままにした。処理した半分から溶媒を蒸発させた後、この真鍮プレートの両半分を、メチルアセチレン/プロパジエン‐トーチの直接炎の中で 3分間赤熱するまで加熱した。
Claims (9)
- ポリシラザンをポリシロキサンと反応させる工程を少なくとも含んでいることを特徴とする、ポリシラザン/ポリシロキサン‐ブロック共重合体を製造する方法であって、
ポリシラザンブロック及びポリシロキサンブロックの各々が、ポリシラザン/ポリシロキサン‐ブロック共重合体の少なくとも10重量%であり、
該反応が、ヒドロキシ基停止ポリシロキサンを用いることにより行われ、
該反応の間、溶媒を用いないことを特徴とする、方法。 - Rがメチルであることを特徴とする、請求項3に記載の方法。
- Xが塩素であることを特徴とする、請求項3に記載の方法。
- その反応が、その単量体混合物中のXの総当量をベースとする無水の液体アンモニアの量の少なくとも2倍の量を用いて行われることを特徴とする、請求項3に記載の方法。
- 該ポリシラザン:該ポリシロキサン重量比が、20:80〜80:20であることを特徴とする、請求項1〜6のいずれかに記載の方法。
- ポリシラザン中の繰返し単位の数:ポリシロキサン中の繰返し単位の数の比が、1:4〜4:1であることを特徴とする、請求項1〜7のいずれかに記載の方法。
- 該ポリシラザンが直鎖のセグメントを含んでいることを特徴とする、請求項1〜8のいずれかに記載の方法。
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US09/793,224 US6534184B2 (en) | 2001-02-26 | 2001-02-26 | Polysilazane/polysiloxane block copolymers |
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JP2004529998A (ja) | 2004-09-30 |
EP1368429A1 (en) | 2003-12-10 |
US6534184B2 (en) | 2003-03-18 |
CA2439357C (en) | 2008-06-10 |
DK1368429T3 (da) | 2008-03-03 |
CA2439357A1 (en) | 2002-09-06 |
US20020165319A1 (en) | 2002-11-07 |
DE60131299T2 (de) | 2008-08-28 |
DE60131299D1 (de) | 2007-12-20 |
PT1368429E (pt) | 2008-01-23 |
JP2012197442A (ja) | 2012-10-18 |
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