JP5142444B2 - Ｅｕｖリソグラフィミラーにおいて脈理を回避する方法 - Google Patents

Ｅｕｖリソグラフィミラーにおいて脈理を回避する方法 Download PDF

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Publication number
JP5142444B2
JP5142444B2 JP2002535847A JP2002535847A JP5142444B2 JP 5142444 B2 JP5142444 B2 JP 5142444B2 JP 2002535847 A JP2002535847 A JP 2002535847A JP 2002535847 A JP2002535847 A JP 2002535847A JP 5142444 B2 JP5142444 B2 JP 5142444B2
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JP
Japan
Prior art keywords
mirror
striae
glass
euv
ule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2002535847A
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English (en)
Japanese (ja)
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JP2004511414A (ja
JP2004511414A5 (enExample
Inventor
エル ジュニア デイヴィス，クロード
イー ベスト，マイケル
ジェイ エドワーズ，メアリー
ダブリュ ホッブス，トーマス
エル マーレイ，グレゴリー
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Corning Inc
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Corning Inc
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Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2004511414A publication Critical patent/JP2004511414A/ja
Publication of JP2004511414A5 publication Critical patent/JP2004511414A5/ja
Application granted granted Critical
Publication of JP5142444B2 publication Critical patent/JP5142444B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/06—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor grinding of lenses, the tool or work being controlled by information-carrying means, e.g. patterns, punched tapes, magnetic tapes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/02—Re-forming glass sheets
    • C03B23/023—Re-forming glass sheets by bending
    • C03B23/025—Re-forming glass sheets by bending by gravity
    • C03B23/0252—Re-forming glass sheets by bending by gravity by gravity only, e.g. sagging

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2002535847A 2000-10-13 2001-09-18 Ｅｕｖリソグラフィミラーにおいて脈理を回避する方法 Expired - Lifetime JP5142444B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US24030300P 2000-10-13 2000-10-13
US60/240,303 2000-10-13
PCT/US2001/029100 WO2002032622A1 (en) 2000-10-13 2001-09-18 A method to avoid striae in euv lithography mirrors

Publications (3)

Publication Number Publication Date
JP2004511414A JP2004511414A (ja) 2004-04-15
JP2004511414A5 JP2004511414A5 (enExample) 2008-07-24
JP5142444B2 true JP5142444B2 (ja) 2013-02-13

Family

ID=22906005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002535847A Expired - Lifetime JP5142444B2 (ja) 2000-10-13 2001-09-18 Ｅｕｖリソグラフィミラーにおいて脈理を回避する方法

Country Status (4)

Country Link
US (1) US6776006B2 (enExample)
EP (1) EP1324857A4 (enExample)
JP (1) JP5142444B2 (enExample)
WO (1) WO2002032622A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3264827B2 (ja) 1995-07-26 2002-03-11 株式会社エヌ・ティ・ティ・データ Ｌａｎテスタ

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JP4792706B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
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US20080266651A1 (en) * 2007-04-24 2008-10-30 Katsuhiko Murakami Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and device
KR101545361B1 (ko) 2007-05-09 2015-08-19 가부시키가이샤 니콘 포토마스크용 기판, 포토마스크용 기판의 성형 부재, 포토마스크용 기판의 제조 방법, 포토마스크, 및 포토마스크를 사용한 노광 방법
JP5042714B2 (ja) 2007-06-06 2012-10-03 信越化学工業株式会社 ナノインプリントモールド用チタニアドープ石英ガラス
JP2009013048A (ja) 2007-06-06 2009-01-22 Shin Etsu Chem Co Ltd ナノインプリントモールド用チタニアドープ石英ガラス
JP5287271B2 (ja) * 2009-01-13 2013-09-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの成型方法およびそれによって成型されたＥＵＶリソグラフィ用光学部材
DE102009033497A1 (de) * 2009-07-15 2011-01-20 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus synthetischen Quarz und Verfahren zur Herstellung des Bauteils
US8857214B2 (en) * 2011-11-18 2014-10-14 Sunedison Semiconductor Limited Methods for producing crucibles with a reduced amount of bubbles
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JP6241276B2 (ja) 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
JP5992842B2 (ja) * 2013-01-24 2016-09-14 信越石英株式会社 シリカチタニアガラスの製造方法及びシリカチタニアガラスの選別方法
CN103949952B (zh) * 2014-02-26 2016-04-13 四川欧瑞特光电科技有限公司 一种大外径变形镜主镜的加工方法
DE112015004415T5 (de) 2014-09-25 2017-07-13 Nantong Schmidt Opto-Electrical Technology Co. Ltd. Herstellungsverfahren für leichtgewichtige grossformatige teleskopspiegelrohlinge und gemäss demselben hergestellte spiegelrohlinge
DE102016217428A1 (de) 2016-09-13 2017-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements
CN111002115A (zh) * 2020-01-16 2020-04-14 程凯芬 一种防眩光玻璃及加工方法

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
JP3264827B2 (ja) 1995-07-26 2002-03-11 株式会社エヌ・ティ・ティ・データ Ｌａｎテスタ

Also Published As

Publication number Publication date
EP1324857A4 (en) 2004-12-01
EP1324857A1 (en) 2003-07-09
US6776006B2 (en) 2004-08-17
US20020043080A1 (en) 2002-04-18
JP2004511414A (ja) 2004-04-15
WO2002032622A1 (en) 2002-04-25

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