JP5104107B2 - 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法 - Google Patents
帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法 Download PDFInfo
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- JP5104107B2 JP5104107B2 JP2007201666A JP2007201666A JP5104107B2 JP 5104107 B2 JP5104107 B2 JP 5104107B2 JP 2007201666 A JP2007201666 A JP 2007201666A JP 2007201666 A JP2007201666 A JP 2007201666A JP 5104107 B2 JP5104107 B2 JP 5104107B2
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- 238000000034 method Methods 0.000 title claims description 20
- 230000003287 optical effect Effects 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 13
- 238000005286 illumination Methods 0.000 description 11
- 125000006850 spacer group Chemical group 0.000 description 9
- 238000004804 winding Methods 0.000 description 7
- 238000003825 pressing Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007201666A JP5104107B2 (ja) | 2007-08-02 | 2007-08-02 | 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法 |
TW97116124A TWI381252B (zh) | 2007-08-02 | 2008-05-01 | A focal length adjustment method for an exposure apparatus of a belt-like workpiece and an exposure apparatus for a belt-like workpiece |
KR1020080052471A KR101217406B1 (ko) | 2007-08-02 | 2008-06-04 | 띠형상 워크의 노광 장치 및 띠형상 워크의 노광 장치에있어서의 포커스 조정 방법 |
CN2008101441114A CN101359188B (zh) | 2007-08-02 | 2008-07-29 | 带状工件的曝光装置及带状工件的曝光装置的聚焦调整方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007201666A JP5104107B2 (ja) | 2007-08-02 | 2007-08-02 | 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009037026A JP2009037026A (ja) | 2009-02-19 |
JP5104107B2 true JP5104107B2 (ja) | 2012-12-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007201666A Active JP5104107B2 (ja) | 2007-08-02 | 2007-08-02 | 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5104107B2 (zh) |
KR (1) | KR101217406B1 (zh) |
CN (1) | CN101359188B (zh) |
TW (1) | TWI381252B (zh) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010087352A1 (ja) * | 2009-01-28 | 2010-08-05 | 株式会社ニコン | アライメント方法、露光方法、電子デバイスの製造方法、アライメント装置及び露光装置 |
JP5257699B2 (ja) * | 2009-07-14 | 2013-08-07 | ウシオ電機株式会社 | 露光装置 |
JP5761034B2 (ja) * | 2010-02-12 | 2015-08-12 | 株式会社ニコン | 基板処理装置 |
JP5652105B2 (ja) * | 2010-10-13 | 2015-01-14 | 株式会社ニコン | 露光装置 |
JP2013004700A (ja) * | 2011-06-16 | 2013-01-07 | Renesas Electronics Corp | 半導体装置の製造方法 |
JP5874126B2 (ja) * | 2011-08-24 | 2016-03-02 | 株式会社ブイ・テクノロジー | フィルム露光装置 |
CN102749817A (zh) * | 2012-06-27 | 2012-10-24 | 中国电子科技集团公司第四十一研究所 | 一种介质基片零层对准标记结构 |
KR102072956B1 (ko) * | 2013-06-14 | 2020-02-03 | 가부시키가이샤 니콘 | 주사 노광 장치 |
CN104849964B (zh) * | 2014-02-14 | 2017-08-25 | 上海微电子装备(集团)股份有限公司 | 一种焦面测量装置及其测量方法 |
JP6115543B2 (ja) * | 2014-10-30 | 2017-04-19 | ウシオ電機株式会社 | アライメント装置、露光装置、およびアライメント方法 |
JP6483536B2 (ja) * | 2015-06-05 | 2019-03-13 | 株式会社アドテックエンジニアリング | パターン描画装置及びパターン描画方法 |
KR101693498B1 (ko) * | 2015-06-17 | 2017-01-17 | 주식회사 옵티레이 | 노광 장치에서의 카메라 조명 및 제어 방법 |
CN106647174B (zh) * | 2015-10-30 | 2018-08-14 | 上海微电子装备(集团)股份有限公司 | 一种调焦调平装置及调焦调平方法 |
CN106814546B (zh) * | 2015-11-30 | 2019-05-31 | 上海微电子装备(集团)股份有限公司 | 焦面检测装置、焦面标定方法与硅片曝光方法 |
CN109154784B (zh) * | 2016-05-19 | 2021-06-11 | 株式会社尼康 | 基板支承装置、曝光装置、及图案化装置 |
TWI606530B (zh) * | 2017-03-29 | 2017-11-21 | 台灣愛司帝科技股份有限公司 | 位置偵測與晶片分離裝置 |
CN109240047B (zh) * | 2018-11-06 | 2023-11-21 | 苏州源卓光电科技有限公司 | 一种直写式曝光机及其标定方法 |
CN109884860B (zh) * | 2019-03-22 | 2020-12-04 | 上海微电子装备(集团)股份有限公司 | 多工位柔性卷带曝光装置及曝光方法 |
CN113966490A (zh) * | 2019-06-03 | 2022-01-21 | Asml荷兰有限公司 | 图像形成设备 |
CN110299318A (zh) * | 2019-07-01 | 2019-10-01 | 武汉新芯集成电路制造有限公司 | 晶圆对准方法 |
CN110658698B (zh) * | 2019-11-07 | 2021-12-28 | 江苏上达电子有限公司 | 一种cof基板的曝光定位方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62114222A (ja) * | 1985-11-14 | 1987-05-26 | Hitachi Ltd | 露光装置 |
JP2767774B2 (ja) * | 1990-03-30 | 1998-06-18 | ウシオ電機株式会社 | 投影露光装置 |
JP2886675B2 (ja) * | 1990-03-30 | 1999-04-26 | ウシオ電機株式会社 | フィルム露光装置およびフィルム露光方法 |
JP2786945B2 (ja) * | 1990-08-10 | 1998-08-13 | ウシオ電機株式会社 | フィルム露光装置 |
JP2786946B2 (ja) * | 1990-08-10 | 1998-08-13 | ウシオ電機株式会社 | フィルム露光装置及びフィルム露光方法 |
JP2000035676A (ja) * | 1998-05-15 | 2000-02-02 | Nippon Seiko Kk | 分割逐次近接露光装置 |
JP2000012452A (ja) * | 1998-06-18 | 2000-01-14 | Nikon Corp | 露光装置 |
JP3201473B2 (ja) * | 1998-12-02 | 2001-08-20 | 日本電気株式会社 | 最適フォーカス位置測定方法およびフォーカス位置測定用マスク |
JP3949853B2 (ja) * | 1999-09-28 | 2007-07-25 | 株式会社東芝 | 露光装置の制御方法及び半導体製造装置の制御方法 |
JP2002134392A (ja) * | 2000-10-23 | 2002-05-10 | Nikon Corp | 位置計測装置及び方法、露光装置、並びにデバイス製造方法 |
JP3850746B2 (ja) * | 2002-03-27 | 2006-11-29 | 株式会社東芝 | フォトマスク、フォーカスモニター方法、露光量モニター方法及び半導体装置の製造方法 |
JP2004014876A (ja) * | 2002-06-07 | 2004-01-15 | Nikon Corp | 調整方法、空間像計測方法及び像面計測方法、並びに露光装置 |
JP4603814B2 (ja) * | 2004-04-23 | 2010-12-22 | キヤノン株式会社 | 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法 |
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2007
- 2007-08-02 JP JP2007201666A patent/JP5104107B2/ja active Active
-
2008
- 2008-05-01 TW TW97116124A patent/TWI381252B/zh active
- 2008-06-04 KR KR1020080052471A patent/KR101217406B1/ko active IP Right Grant
- 2008-07-29 CN CN2008101441114A patent/CN101359188B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
TW200907595A (en) | 2009-02-16 |
CN101359188B (zh) | 2012-02-01 |
KR101217406B1 (ko) | 2013-01-02 |
KR20090013676A (ko) | 2009-02-05 |
CN101359188A (zh) | 2009-02-04 |
TWI381252B (zh) | 2013-01-01 |
JP2009037026A (ja) | 2009-02-19 |
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