JP5078992B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
JP5078992B2
JP5078992B2 JP2009509107A JP2009509107A JP5078992B2 JP 5078992 B2 JP5078992 B2 JP 5078992B2 JP 2009509107 A JP2009509107 A JP 2009509107A JP 2009509107 A JP2009509107 A JP 2009509107A JP 5078992 B2 JP5078992 B2 JP 5078992B2
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JP
Japan
Prior art keywords
group
component
mol
groups
resin composition
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Expired - Fee Related
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JP2009509107A
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English (en)
Japanese (ja)
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JPWO2008123224A1 (ja
Inventor
友裕 頼末
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Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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Priority to JP2009509107A priority Critical patent/JP5078992B2/ja
Publication of JPWO2008123224A1 publication Critical patent/JPWO2008123224A1/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/58—Metal-containing linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2009509107A 2007-04-04 2008-03-25 感光性樹脂組成物 Expired - Fee Related JP5078992B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009509107A JP5078992B2 (ja) 2007-04-04 2008-03-25 感光性樹脂組成物

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007098089 2007-04-04
JP2007098089 2007-04-04
JP2009509107A JP5078992B2 (ja) 2007-04-04 2008-03-25 感光性樹脂組成物
PCT/JP2008/055518 WO2008123224A1 (ja) 2007-04-04 2008-03-25 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPWO2008123224A1 JPWO2008123224A1 (ja) 2010-07-15
JP5078992B2 true JP5078992B2 (ja) 2012-11-21

Family

ID=39830719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009509107A Expired - Fee Related JP5078992B2 (ja) 2007-04-04 2008-03-25 感光性樹脂組成物

Country Status (4)

Country Link
US (1) US8043899B2 (enExample)
JP (1) JP5078992B2 (enExample)
TW (1) TW200907580A (enExample)
WO (1) WO2008123224A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101802033B (zh) * 2007-12-14 2013-03-13 旭化成电子材料株式会社 感光性树脂组合物
JP5607898B2 (ja) * 2008-07-01 2014-10-15 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP5576622B2 (ja) * 2008-07-01 2014-08-20 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
KR20130066684A (ko) * 2010-10-14 2013-06-20 아사히 가세이 이-매터리얼즈 가부시키가이샤 감광성 수지 조성물 및 그의 제조 방법
EP2665762B1 (en) 2011-01-21 2020-12-02 Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V. Polymerizable compositions, cured products obtained therewith, and use of these materials
EP3157984A1 (en) 2014-06-19 2017-04-26 Inkron Oy Transparent siloxane encapsulant and adhesive
CN109071731B (zh) * 2016-04-11 2021-08-13 日产化学株式会社 含有反应性含菲环倍半硅氧烷化合物的聚合性组合物
CN109196008B (zh) * 2016-05-30 2021-07-06 日产化学株式会社 反应性聚硅氧烷及包含该反应性聚硅氧烷的聚合性组合物
KR102411928B1 (ko) * 2016-05-30 2022-06-22 닛산 가가쿠 가부시키가이샤 중합성 실란 화합물

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121043A (ja) * 1986-11-10 1988-05-25 Toshiba Corp シリコ−ンレジスト材料
WO2001004186A1 (de) * 1999-07-13 2001-01-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Organisch modifizierte kieselsäurepolykondensate, deren herstellung und deren verwendung
JP2005298800A (ja) * 2004-04-12 2005-10-27 Korea Advanced Inst Of Sci Technol 無機／有機混成オリゴマー、ナノ混成高分子及びこれらの製造方法
JP2007226209A (ja) * 2006-01-25 2007-09-06 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101314513B1 (ko) * 2005-03-15 2013-10-07 도레이 카부시키가이샤 감광성 수지 조성물
WO2007049524A1 (ja) * 2005-10-26 2007-05-03 Asahi Kasei Emd Corporation ポジ型感光性樹脂組成物
WO2007086323A1 (ja) 2006-01-24 2007-08-02 Asahi Kasei Emd Corporation 感光性樹脂組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121043A (ja) * 1986-11-10 1988-05-25 Toshiba Corp シリコ−ンレジスト材料
WO2001004186A1 (de) * 1999-07-13 2001-01-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Organisch modifizierte kieselsäurepolykondensate, deren herstellung und deren verwendung
JP2005298800A (ja) * 2004-04-12 2005-10-27 Korea Advanced Inst Of Sci Technol 無機／有機混成オリゴマー、ナノ混成高分子及びこれらの製造方法
JP2007226209A (ja) * 2006-01-25 2007-09-06 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPWO2008123224A1 (ja) 2010-07-15
US20100123259A1 (en) 2010-05-20
TW200907580A (en) 2009-02-16
TWI375126B (enExample) 2012-10-21
US8043899B2 (en) 2011-10-25
WO2008123224A1 (ja) 2008-10-16

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