TWI375126B - - Google Patents

Download PDF

Info

Publication number
TWI375126B
TWI375126B TW097111108A TW97111108A TWI375126B TW I375126 B TWI375126 B TW I375126B TW 097111108 A TW097111108 A TW 097111108A TW 97111108 A TW97111108 A TW 97111108A TW I375126 B TWI375126 B TW I375126B
Authority
TW
Taiwan
Prior art keywords
group
component
photosensitive
compound
mass
Prior art date
Application number
TW097111108A
Other languages
English (en)
Chinese (zh)
Other versions
TW200907580A (en
Inventor
Tomohiro Yorisue
Original Assignee
Asahi Kasei Emd Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Emd Corp filed Critical Asahi Kasei Emd Corp
Publication of TW200907580A publication Critical patent/TW200907580A/zh
Application granted granted Critical
Publication of TWI375126B publication Critical patent/TWI375126B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/12Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/58Metal-containing linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612Composite web or sheet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097111108A 2007-04-04 2008-03-27 Photosensitive resin composition TW200907580A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007098089 2007-04-04

Publications (2)

Publication Number Publication Date
TW200907580A TW200907580A (en) 2009-02-16
TWI375126B true TWI375126B (enExample) 2012-10-21

Family

ID=39830719

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097111108A TW200907580A (en) 2007-04-04 2008-03-27 Photosensitive resin composition

Country Status (4)

Country Link
US (1) US8043899B2 (enExample)
JP (1) JP5078992B2 (enExample)
TW (1) TW200907580A (enExample)
WO (1) WO2008123224A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5525821B2 (ja) * 2007-12-14 2014-06-18 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP5607898B2 (ja) * 2008-07-01 2014-10-15 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP5576622B2 (ja) * 2008-07-01 2014-08-20 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
CN103154053A (zh) * 2010-10-14 2013-06-12 旭化成电子材料株式会社 感光性树脂组合物及其制造方法
JP5950937B2 (ja) 2011-01-21 2016-07-13 フラウンホーファー−ゲゼルシャフト・ツール・フェルデルング・デル・アンゲヴァンテン・フォルシュング・アインゲトラーゲネル・フェライン 重合性組成物、それと共に得られる硬化物及びこれらの材料の使用
EP3157984A1 (en) * 2014-06-19 2017-04-26 Inkron Oy Transparent siloxane encapsulant and adhesive
WO2017179438A1 (ja) * 2016-04-11 2017-10-19 日産化学工業株式会社 フェナントレン環含有反応性シルセスキオキサン化合物を含む重合性組成物
JP6792213B2 (ja) * 2016-05-30 2020-11-25 日産化学株式会社 反応性ポリシロキサン及びそれを含む重合性組成物
JP6734571B2 (ja) * 2016-05-30 2020-08-05 日産化学株式会社 重合性シラン化合物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121043A (ja) * 1986-11-10 1988-05-25 Toshiba Corp シリコ−ンレジスト材料
DE19932629A1 (de) 1999-07-13 2001-01-18 Fraunhofer Ges Forschung Organisch modifizierte, lagerstabile, UV-härtbare, NIR-durchlässige und in Schichtdicken von 1 bis 150 mum fotostrukturierbare Kieselsäurepolykondensate, deren Herstellung und deren Verwendung
KR100614976B1 (ko) * 2004-04-12 2006-08-25 한국과학기술원 광소자 또는 디스플레이에 이용되는 무기/유기혼성올리고머, 나노혼성고분자 및 그 제조방법
KR101314513B1 (ko) * 2005-03-15 2013-10-07 도레이 카부시키가이샤 감광성 수지 조성물
CN101273303B (zh) * 2005-10-26 2011-07-06 旭化成电子材料株式会社 正型感光性树脂组合物
JP5241241B2 (ja) 2006-01-24 2013-07-17 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP4799429B2 (ja) * 2006-01-25 2011-10-26 旭化成イーマテリアルズ株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
TW200907580A (en) 2009-02-16
US20100123259A1 (en) 2010-05-20
US8043899B2 (en) 2011-10-25
JP5078992B2 (ja) 2012-11-21
WO2008123224A1 (ja) 2008-10-16
JPWO2008123224A1 (ja) 2010-07-15

Similar Documents

Publication Publication Date Title
TWI375125B (enExample)
TWI363765B (enExample)
JP4336310B2 (ja) ハードマスク層としてのシリコン含有反射防止層及びその形成方法
TWI437048B (zh) 倍半矽氧烷樹脂
TWI312443B (en) Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
TWI324626B (en) Anti-reflective coatings for photolithography and methods of preparation thereof
JP4384919B2 (ja) ハードマスク層用の反射防止SiO含有組成物
TWI374914B (en) Anti-reflective coatings for via fill and photolithography applications and methods of preparation thereof
TW201111917A (en) Method and materials for reverse patterning
JP4688882B2 (ja) 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法及び電子デバイスの製造方法
TW200907580A (en) Photosensitive resin composition
TWI412890B (zh) Photosensitive organic polysiloxane composition
TW201027261A (en) Wet-etchable antireflective coatings
TW200412472A (en) Photosensitive compositions based on polycyclic polymers
TW200837097A (en) Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
JP2017020000A (ja) 湿式剥離性シリコン含有反射防止剤
TW201111918A (en) Method and materials for double patterning
TW200844144A (en) Silicon-based antireflective coating compositions
JP2016526183A (ja) ポリマー型熱酸発生剤を含む組成物及びそれの方法
TW200902632A (en) Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
JP5587791B2 (ja) シルセスキオキサン樹脂
TW201022852A (en) Switchable antireflective coatings
JP5078475B2 (ja) ポリオルガノシロキサン
JP4995096B2 (ja) 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法、電子デバイスの製造方法及びarc組成物
TWI375123B (enExample)

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees